• 제목/요약/키워드: columnar structure

검색결과 277건 처리시간 0.024초

Electrical Characteristics of $(Ba,Sr)TiO_3/RuO_2$ Thin films

  • Park Chi-Sun
    • 마이크로전자및패키징학회지
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    • 제11권3호
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    • pp.63-70
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    • 2004
  • The structural, electrical properties of $(Ba, Sr)TiO_3[BSTO]/RuO_2$ thin films were examined by the addition of amorphous BSTO layer between crystlline BSTO film and $RuO_2$ substrate. We prepared BSTO films with double-layered structure, that is, amorphous layers deposited at $60^{\circ}C$ and crystalline films. Crystalline films were prepared at 550 on amorphous BSTO layer. The thickness of the amorphous layers was varied from 0 to 170 nm. During the deposition of crystalline films, the crystallization of the amorphous layers occurred and the structure was changed to circular while crystalline BSTO films showed columnar structure. Due to insufficient annealing effect, amorphous BSTO phase was observed when the thickness of the amorphous layers exceeded 30 nm. Amorphous BSTO layer could also prevent the formation of oxygen deficient region in $RuO_2$ surface. Leakage current of total BSTO films decreased with increasing amorphous layer thickness due to structural modifications. Dielectric constant showed maxi-mum value of 343 when amorphous layer thickness was 30 nm at which the improvement by grain growth and the degradation by amorphous phase were balanced.

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Optical Properties and Structural Characteristics of Gallium Nitride Thin Films Prepared by Radio Frequency Magnetron Sputtering

  • Cho, Yeon Ki;Kim, Joo Han
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.248.2-248.2
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    • 2014
  • In this study, the optical properties and structural characteristics of gallium nitride (GaN) thin films prepared by radio frequency (RF) magnetron sputtering were investigated. Auger electron and X-ray photoelectron spectra showed that the deposited films consisted mainly of gallium and nitrogen. The presence of oxygen was also observed. The optical bandgap of the GaN films was measured to be approximately 3.31 eV. The value of the refractive index of the GaN films was found to be 2.36 at a wavelength of 633 nm. X-ray diffraction data revealed that the crystalline phase of the deposited GaN films changed from wurtzite to zinc-blende phase upon decreasing the sputtering gas pressure. Along with the phase change, a strong dependence of the microstructure of the GaN films on the sputtering gas pressure was also observed. The microstructure of the GaN films changed from a voided columnar structure having a rough surface to an extremely condensed structure with a very smooth surface morphology as the sputtering gas pressure was reduced. The relationship between the phase and microstructure changes in the GaN films will be discussed.

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반응성 마그네트론 스퍼터링법으로 제조한 Ti-Al-V-N 박막의 미세조직 및 부착특성에 관한 연구 (The microstructure and adhesive characteristics of Ti-Al-V-N films prepared by reactive magnetron sputtering)

  • 손용운;이영기
    • 열처리공학회지
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    • 제12권3호
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    • pp.199-205
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    • 1999
  • The quaternary Ti-Al-V-N films have been grown on glass substrates by reactive dc and rf magnetron sputter deposition from a Ti-6Al-4V target in mixed Ar-$N_2$ discharges. The Ti-Al-V-N films were investigated by means of X-ray diffraction(XRD), electron probe microanalysis(EPMA) and scratch tester. Both XRD and EPMA results indicated that the Ti-Al-V-N films were of single B1 NaCl phase having columnar structure with the (111) preferred orientation. Scratch tester results showed that the adhesion strength of Ti-Al-V-N films which treated with substrate heating and vacuum annealing was superior to that of as-deposited film. The good adhesion strength was also achieved in the double-layer structure of Ti-Al-V-N/Ti-Al-V/Glass.

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$Si_3N_4-TiC$ Ceramic 공구에 화학증착된 TiC, TiN 및 Ti(C, N)에 관한 연구 (A Study on the Chemically Vapor Deposited TiC, TiN, and TiC(C, N) on $Si_3N_4$-TiC Ceramic Tools.)

  • 김동원;김시범;이준근;천성순
    • Tribology and Lubricants
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    • 제4권2호
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    • pp.36-43
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    • 1988
  • Titanium carbide(TiC) and titanium nitride(TiN) flims were deposited on $Si_3N_4$-TiC composite cutting tools by chemical vapor deposition(CVD) using $TiCl_4-CH_4-H_2$ and $TiCl_4-H_2-N_2$ gas mixtures, respectively. The nonmetal to metal ratio of deposit increases with increasing $m_{C/Ti}$(mole ratio of CH$_4$ to TiCl$_4$ in the input) for TiC coatings and $m_{N/Ti}$(mole ratio of N$_2$ to TiCl$_4$ in the input) for TiN coatings. The nearly stoiahiometric films could be obtained under the deposition condition of $m_{C/Ti}$ between 1.15 and 1.61 for TiC, and that of $m_{N/Ti}$ between 25 and 28 for TiN. Also maximum microhardness of the coatings can be obtained in these ranges. The interfacial region of TiC coatings on $Si_3N_4$-TiC ceramics is wider than that of TiN coatings according to Auger depth profile analysis, which indicates good interfacial bonding for TiC. Experimental results show that TiC coatings have an randomly equiaxed structure and Columnar structure with(220) preferred orientation can be obtained for TiN coatings. And, multilayer coatings have a dense and equiaxed structure.

한탄강 용암대지의 재인폭포와 개석곡의 지형 형성 (Geomorphological Processes of Jaein Waterfall and Dissection Valley in Hantangang Lava Plateau, Central Korea)

  • 이민부;이광률
    • 한국지형학회지
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    • 제24권3호
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    • pp.47-59
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    • 2017
  • This study aims to analyze geomorphologically Jaein Falls in Hantangang Lava Plateau for the landform structure, landform classification, falls dissection and recession. The height and recession length of the Falls are approximately 18m and 340m. after dissection valley arrive at area of the Jijangbong Volcanic Rock Complex of Mesozoic era, the fall will disappear. The structure of the dissection valley shows totally well vertical columnar joint near falls and plunge pool, colluvial talus deposits toward lower reach by the freezing-thawing and wet-dry activities, and alluvial cone and delta in estuary to Hantangang River. The Falls' age date and recession rate in the valley maybe relate to the age of the lava plateau. The estimated recession rate of the fall should be 8.75m/ka to 2.3m/ka, depending on the age 500ka to 40ka in lava plateau.

Electrical Properties and Microstructures in Ti Films Deposited by TFT dc Sputtering

  • Han, Chang-Suk;Jeon, Seung-Jin
    • 한국재료학회지
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    • 제26권4호
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    • pp.207-211
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    • 2016
  • Ti films were deposited on glass substrates under various preparation conditions in a chamber of two-facing-target type dc sputtering; after deposition, the electric resistivity values were measured using a conventional four-probe method. Crystallographic orientations and microstructures, including the texture and columnar structure, were also investigated for the Ti films. The morphological features, including the columnar structures and surface roughness, are well explained on the basis of Thornton's zone model. The electric resistivity and the thermal coefficient of the resistivity vary with the sputtering gas pressure. The minimum value of resistivity was around 0.4 Pa for both the $0.5{\mu}m$ and $3.0{\mu}m$ thick films; the apparent tendencies are almost the same for the two films, with a small difference in resistivity because of the different film thicknesses. The films deposited at high gas pressures show higher resistivities. The maximum of TCR is also around 0.4 Pa, which is the same as that obtained from the relationship between the resistivity and the gas pressure. The lattice spacing also decreases with increasing sputtering gas pressure for both the $0.5{\mu}m$ and $3.0{\mu}m$ thick films. Because they are strongly related to the sputtering gas pressures for Ti films that have a crystallographic anisotropy that is different from cubic symmetry, these changes are well explained on the basis of the film microstructures. It is shown that resistivity measurement can serve as a promising monitor for microstructures in sputtered Ti films.

Polyester 상에서 Sputter 증착되는 고 밀도 은경 박막의 물리적 특성에 미치는 공정조건 변화의 효과 (The Effect of Various Process Conditions on the Physical Properties of Dense Silver Films, Prepared by Using Sputter Deposition on Polyester Substrate)

  • 리의재;황태수
    • 한국재료학회지
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    • 제9권7호
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    • pp.707-714
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    • 1999
  • 형광등으로 사용되는 전기 에너지의 40%를 절약할 수 있는 방법으로서 그 반사값을 특수 은 반사박막으로 처리하여 고효율 및 내구성을 갖는 기술이 최근에 알려지고 있다. 이 박막들은 sputtering법을 이용한 것으로 주로 미국에서 생산되어지고 있다. 한편. evaporation 법으로 제작된 은 박막들은 일반적으로 반사효율에는 별문제가 없으나 부착력이 떨어지는 단점이 있다. 우리는 수년간 polyester를 기판으로 하고 몇가지 PVB 방법을 동원하여 고 반사율 및 부착력을 갖는 은경 박막을 확보하기 위해 연구를 해왔다. 그 결과, evaporation 법으로 제작된 은 박막은 96.4%의 반사율을 보이나 부착력은 $12 Kg/\textrm{cm}^2$에 불과함을 확인하였고. sputter 법으로 제작한 시편들의 반사율은 96.3 %로 비슷하였으나 부착력이 /$20 Kg\textrm{cm}^2$로 거의 두배로 뛰어올라 sputter법의 공정조건이 그 결과박막들의 물리적 특성에 미치는 긍정적 영향을 확인할 수 있었다. X-선 회절 분석결과 sputter의 경우에 (111)면이 우선성장함을 알 수 있었고, 시편의 단면으로부터 관찰된 치밀한 columnar 구조가 부착력을 향상시키고 있음이 확인되었다.

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지중해담치, Mytilus galloprovincialis 소화맹낭의 미세해부학적 구조 (Microanatomical Structure of the Digestive Diverticulum of Mytilus galloprovincialis (Bivalvia: Mytilidae))

  • 주선미;이정식
    • Applied Microscopy
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    • 제41권4호
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    • pp.257-263
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    • 2011
  • 지중해담치 소화맹낭의 해부학적 구조와 미세구조를 광학 및 전자현미경을 이용하여 기재하였다. 소화맹낭은 황갈색으로 위를 둘러싸고 위치하며, 일차소관으로 위와 연결되어 있었다. 소화맹낭은 다수의 소화선세관들로 구성되며, 각각의 소화선세관은 단층 상피층으로 호염기성세포와 소화세포들로 이루어져 있었다. 호염기성세포는 원주형이며, 세포질에는 잘 발달된 조면소포체, 관상의 미토콘드리아, 골지체 및 전자밀도가 높고 막을 가진 분비과립들을 함유하고 있었다. 소화세포는 원주형이며, 자유면에는 섬모와 미세융모가 발달되어 있었다. 세포질 상부에서는 음소포, 활성 용해소체 및 미토콘드리아가 관찰되었다. 본 연구에서 이러한 결과는 소화선세관의 호염기성세포와 소화세포는 각각 세포외 소화와 세포내 소화에 적당하게 분화되었음을 의미한다.

검은과부거미 (Latrodectus mactans) 독 생성과정의 미세구조 (Fine Structural Aspects of the Venom Production in the Black Widow Spider, Latrodectus mactans)

  • 문명진
    • Applied Microscopy
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    • 제26권1호
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    • pp.17-31
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    • 1996
  • 검은과부거미의 독 분비장치는 두흉부에 있는 가위턱과 한쌍의 독선으로 이루어져 있다. 독선은 한겹의 얇은 장막과 횡문근 섬유의 다발에 의해 둘러싸여 있었고. 근육층을 따라서 운동신경의 축삭 돌기와 근섬유 사이에 신경근육간 연접이 형성되어 있었다. 분비상피를 이루는 단층 원주상피세포에는 복잡한 수지상의 돌기가 형성되었고, 독선 전체가 단포상선을 이루고 있음이 관찰되었다. 상피의 분비면은 기저막으로부터 선의 내강쪽으로 확장된 세포질 돌기에 의해 표면적이 현저히 증가되었고, 상피의 내강면에는 조밀한 미세융모가 형성되어 있었다. 독성 분비물은 상피세포 내에서 두 종류의 분비과립으로부터 생성되었다. 분비기동안 이들 분비과립은 과적의 형태로 변형, 농축된 후, 이출분비의 형태로 내강으로 방출되었다. 방출 후의 기저부 상피세포들은 고도의 증식과정을 거쳐 원주상의 상피세포로 재생됨이 확인되었다.

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내열 금형강 DED 금속적층재의 조직, 결함 및 기계적 물성 평가 (Microstructure, Defects and Mechanical Properties of DED Metal Deposited Heat-Resistant Mold Steel)

  • 최성종;김호찬
    • 한국기계가공학회지
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    • 제21권3호
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    • pp.12-21
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    • 2022
  • Directed energy deposition (DED) was adopted as a metal additive manufacturing method to develop a mold for the hot stamping process. The test piece was machined from Heatvar laminate material, and results were obtained through microstructure and defect observations, as well as hardness, tensile strength, and joint strength tests. 1) Spherical pores and irregular-shaped cavities were observed as lamination defects, and columnar dendrites formed in the structure, which tended to become coarse upon heat treatment. 2) The hardness of the heat-treated material (480HV) was slightly lower than that of the non-heat-treated material (500HV). 3) In the tensile test, the maximum tensile stress and strain of the heat-treated material were 1392 MPa and 15%, respectively, which were slightly higher than the values of 1381 MPa and 13%, respectively, for the non-heat-treated material. 4) In the case of the early final fracture in the tensile test, in most cases, pores or irregularly shaped cavities were observed at the fracture surface or near the surface. 5) In the joint strength test, most of the specimens finally fractured in the laminated metal area, and the fracture surface was intragranular. In addition, dimples formed over the entire area on the fracture surface of the fractured specimen after sufficient elongation.