• Journal of Conservation Science
• /
• v.35 no.2
• /
• pp.159-168
• /
• 2019

Plasticizers, which are added to plastics, can cause exudation, which means that the plasticizer comes out from surface of the plastics. This causes the surface of plastic artworks to become sticky, and this allows dust and pollutants to become attached to the surface. Therefore, in this study, the degradation characteristics and chemical cleaning methods of each type of plasticizer are evaluated using PVC specimens. To evaluate the degradation characteristics and chemical cleaning methods, microscopic observation, chromaticity and weight measurement, and FT-IR spectroscopy were performed. The results showed that PVCs containing different plasticizers have different degradation patterns. Especially, the PVC containing TOTM showed discoloration and exudation. In the evaluation of the chemical cleaning methods, ethyl alcohol and KOH solution showed good effects, but their stability was not good. Surfactant was found to have a good cleaning effect and stability as a cleaner for exudated plasticizers.

• Clean Technology
• /
• v.12 no.1
• /
• pp.1-9
• /
• 2006

Aqueous cleaning agents which are considered to be environmental-friendly and promising alternative ones among various industrial cleaning agents were evaluated in this words. In order to formulate aqueous cleaning agents, primary alcohol ethoxylates with 3, 5 and 7 moles of ethylene oxides among nonionic surfactants were selected as main surfactants. And anionic surfactants and alcohols were chosen as their cosurfactants. Builders such as NaOH, KOH, $Na_2CO_3$ and $NaHCO_3$ were also evaluated as additives for improvement of cleaning efficiency of aqueous cleaning agents. The experimental results of cleaning ability tests show that introduction of anionic surfactant TLS as cosurfactant in alcohol ethoxylate-based aqueous solution gives the best cleaning efficiency for removing mixed soil of cutting oil and grease. NaOH and $Na_2CO_3$ are also shown to play an important role for improvement of cleaning efficiency in a aqueous cleaning agent.

• Journal of the Korean Institute of Telematics and Electronics A
• /
• v.31A no.4
• /
• pp.63-69
• /
• 1994

The Ultrahigh Vacuum Electron Cyclotron Resonance Chemical Vapor Deposition(UHV-ECRCVD) system whose base pressure is 1${\times}10^{9}$ torr has been constructed. In-situ cleaning prior to the epitaxial growth was carried out at 56$0^{\circ}C$ by ECR generated uniform hydrogen plasma whose density is $10^{10}/cm{3}$. The natural oxide was effectively removed without damage by applying positive DC bias(+10V) to the substrate. RHEED(Reflection High Energy Electron Diffraction) analysis has been used to confirm the removal of the surgace oxide and the streaky 2$\times$1 reconstruction of the Si surface, and the suppression of the substrate damage is anaylized by X-TEM(cross-sectional Transmission Electron Microscopy). Surface cleaning technique by ECR hydrogen plasma confirmed good quality epitaxial growth at low temperature.

• Journal of the Korean Applied Science and Technology
• /
• v.13 no.3
• /
• pp.111-117
• /
• 1996

Many alternatives to Trichlorothane & Trichlorotrifluoroethane mainly used as cleaning solvent for industrial parts are developed and commercialized because the solvent is scheduled to phaseout after 1996. Considering there are many kinds of parts and contaminants in all parts cleaning, It is essential to investigating the characteristics and performance of the alternatives prior to use. For the contaminant of a standard oil, waters, hydrocarbon and halogen parts which are the comercially available and promising alternatives were experimented at the same condition of Trichlorothane & Trichlorotrifluoroethane to check the cleaning performance. Overally, the removal efficiency of halogen solvent parts was better than that of hydrocarbon or waters parts for removing the standard oil used in this experiment.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
• /
• 1997.04a
• /
• pp.656-661
• /
• 1997

Ultrasonic cleaning at high frequency near 1MHz, called megasonic cleaning, is commonly used to remove particles less than 1.mu.m by generating accelerations on them. Ultrasonic waves generated from piezoelectric transducers are transmitted through a non-metallic inner container which is used to isolate a cleaning object from metallic ions. The transmission characteristics of a double-structured megasonic cleaner on the variations of parameters such as the thickness and oblique angle of a inner container, chemical ratio of a cleaning agent and temperature and transmittivity are investigated. The results are used to determine an optimum cleaning condition.

• Membrane Journal
• /
• v.28 no.1
• /
• pp.62-66
• /
• 2018

In this study the cleaning spherical beads with same density as water were fabricated. Bead moving velocity was measured with respect to the aeration rate and bead concentration in water reservoir. The permeation experiments for FR (filtration and relaxation) and SFCO (sinusoidal filtration continuous operation) modes were simultaneously carried out under the condition of 1 to 3% cleaning spherical bead concentration, 20 LMH and 500 mL/min aeration rate in the MLSS 8,000 mg/L activated sludge solution. The used membrane was the $90cm^2$ effective area and $0.4{\mu}m$ nominal pore size flat membrane. The TMP (transmembrane pressure) decreased as the bead concentration increased, and was shown most effective in FR mode with 2% bead concentration.

• Journal of the Korean Applied Science and Technology
• /
• v.27 no.2
• /
• pp.107-113
• /
• 2010

The object of this research is to conform of practicable possibility and recycling of producing junk after citrus fruits is processed. With extracting d-limonene oil that have 70~90% a component of oil out of junk citrus peel, making certain the about 12000ppm concentration of it. Limonene derived from citrus in jeju using conventional synthetic detergents can be replaced with the development of environmentally friendly natural detergent investigated the possibility. Mostly due to ocean dumping, disposal and cause environmental problems by recycling natural citrus cleaner alternative to the research conducted on the possibility. Cleaning efficiency with temperature did not affect the largest concentrations were able to identify the difference between cleaning efficiency. At least 10% of the d-limonene oil could be from the cleaning performance, increasing the concentration of the cleaning efficiency was increased in size. Ultrasonic is very high removal efficiency under the conditions shown in the cause of pure self-generated ultrasonic cleaning power as co-effects of d-limonene oil appears to chemical cleaning effect of ultrasonic cavitation occurs in the physical cleaning effect due to a combination of synergistic stability is maximized by low concentrations of d-limonene oil in a short time showed an excellent cleaning ability. Having the ability of cleaning at the same time, considering the side recycling in the junk citrus peels reflects possibility of basic materials utility eco-friendly in the skin soap, bath soap, cosmetics etc, through ability of exclusion a contaminant in based cleaning effect(EC) it can prospect substitution effect environmentally in the pre existence synthetic detergents.

• Journal of Environmental Science International
• /
• v.16 no.8
• /
• pp.873-879
• /
• 2007

For the purpose of development of an environmentally friendly aqueous cleanser, some experimental researches on emulsification of D-limonene were performed. OA series surfactants with different molecular weight were adapted as an emulsifier for preparation of O/W emulsion. Cleaning power of aqueous cleanser was measured by a dipping method adapting abietic acid(AA) as a solubilizate. Besides, drop size and drop size distribution, contact angle and storage stability of the aqueous cleansers were also measured and relationships among them were examined. Decrease in molecular weight of surfactant induced small drop size and contact angie, resulting in high cleaning power of aqueous cleanser. Aqueous cleanser consisted of 3wt.% OA300 and 30wt.% D-limonene showed the highest cleaning power, but displayed unfortunately with low storage stability. The storage stability of the aqueous cleanser with OA300 was significantly enhanced by addition of 0.5wt.% OA600 at the expanse of decrease in cleaning power.

• Journal of the Korean Institute of Telematics and Electronics A
• /
• v.30A no.11
• /
• pp.99-104
• /
• 1993

We analyzed the D.I. water used in wet cleaning process of semiconductor device manufacturing both at the D.I. water plant and at the wafer cleaning bath to detect the impurity source of D.I. water contamination. This shows that the quantity of impurity is related to the resistivity of D.I. water, and we found that the cleanliness of the wafer surface processed in D.I. water bath was affected by the degree of the ionic impurity contamination. So we evaluated the cleaning effect as different method for Fe ion, having the best adsoptivity on wafer surface. Moreover the temperature effect of the D.I. water is investigated in case of anion in order to remove the chemical residue after wet process. In addition to the control of D.I. water resistivity, chemical analysis of impurity control in D.I. water should be included and a suitable cleaning an drinsing method needs to be investigated for a high yielding semiconductor device.

• Transactions on Electrical and Electronic Materials
• /
• v.10 no.3
• /
• pp.71-74
• /
• 2009

Electroplated Cu is a cost efficient metallization method in microelectronic packaging applications. Typically in 3-D chip staking technology, utilizing through silicon via (TSV), electroplated Cu metallization is inevitable for the throughput as well as reducing the cost of ownership (COO).To achieve a comparable film quality to sputtering or CVD, a pre-cleaning process as well as plating process is crucial. In this research, atmospheric plasma is employed to reduce the usage of chemicals, such as trichloroethylene (TCE) and sodium hydroxide (NaHO), by substituting the chemical assisted organic cleaning process with plasma surface treatment for Cu electroplating. By employing atmospheric plasma treatment, marginally acceptable electroplating and cleaning results are achieved without the use of hazardous chemicals. The experimental results show that the substitution of the chemical process with plasma treatment is plausible from an environmentally friendly aspect. In addition, plasma treatment on immersion Sn/Cu was also performed to find out the solderability of plasma treated Sn/Cu for practical industrial applications.