• 한국추진공학회지
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• 제20권1호
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• pp.43-49
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• 2016

초음파 진동자에 의해 미립화된 탄화수소계 액체연료를 분사하는 버너(burner)의 연소특성을 고찰하기 위한 실험이 수행되었다. DSLR 카메라를 이용하여 미립화된 액체연료의 화염형상을 획득하였고, 이미지 후처리를 통해 그 구조를 면밀히 분석하였다. 또한 열전대를 이용하여 연소장의 온도도 측정하였다. 그 결과, 버너 내부에 주입되는 수송가스의 질량유량과, 초음파 진동자의 진폭에 비례하여 화염의 크기가 커졌다. 또한, 버너 작동조건의 변이에 따른 연소장의 온도분포를 측정, 제시한다.

• 한국태양에너지학회 논문집
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• 제37권2호
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• pp.13-22
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• 2017

Two-step water splitting thermochemical cycle with $CeO_2/ZrO_2$ foam device was investigated by using a solar simulator composed of 2.5 kW Xe-Arc lamp and mirror reflector. The hydrogen production of $CeO_2/ZrO_2$ foam device depending on heat recovery of Thermal-Reduction step and Water-Decomposition step was analyzed, and the hydrogen production of $CeO_2/ZrO_2$ and $NiFe_2O_4/ZrO_2$ foam devices was compared. Resultantly, the quantity of hydrogen generation increased by 52.02% when the carrier gas of Thermal-Reduction step is preheated to $200^{\circ}C$ and, when the $N_2/steam$ is preheated to $200^{\circ}C$ in the Water-Decomposition step, the quantity of hydrogen generation increased by 35.85%. Therefore, it is important to retrieve the heat from the highly heated gases discharged from each of the reaction spaces in order to increase the reaction temperature of each of the stages and thereby increasing the quantity of hydrogen generated through this.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.105-105
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• 1999

차세대 기억소자에서는 집접도의 증가, 고속화, 그리고 미세화에 따라 배선간으 최소선폭이 작아지고, 새로운 다층 배선기술이 요구되는 가운데 층간절연막의 재료와 형성기술은 소자의 특성을 향상시켜주는 중요한 요소로서 열적안정성, 저유전율, 평탄화특성 등에 핵심을 두고 연구되고 있다. 본 연구에서는 5인치 p-Si(100) 위에 FTES와 O2를 precursor로 하고 carrier gas를 Ar gas하여 ICP CVD 방법으로 저유전율의 Fluorocarbonated-SiO2 박막을 형성하였다. 0.1-1kW, 13.56MHz인 rf power를 사용하였으며, 증착은 RT에서 5~10분으로 하였다. 형성된 박막은 FTIR(fourier transform infrared), XPS(x-ray photoelectron spectroscopy), 그리고 ellipsopsometer 등을 이용하여 결합모드와 F농도, 균일도 등을 측정하고, I-V와 C-V 측정장치, 그리고 SERM(scanning electrion microscopy) 등을 이용하여 유전상수, 누설전류, dielectric breakdown voltage, 그리고 박막의 stepcoverage를 측정하였다. 제작된 박막의 신뢰성은 열처리에 따른 전기적 특성으로부터 조사하였다. 형성된 fluorocarbonated 박막 결합모드는 Si-F, Si-O, O-C, C-C와 C-F였고 O2:FTES:Ar 유량을 1sccm:10sccm:6sccm으로 하여 증착한 시료에서 유전율은 2.8이었으며, 누설전류밀도는 8$\times$10-9A/cm2, Breakdown voltage는 10MV/cm 이상, 그리고 stepcoverage는 91%로 측정되었다.

• 한국결정성장학회지
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• 제17권5호
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• pp.187-191
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• 2007

The device performance of ZnO-thin film transistors(ZnO-TFTs) with gate dielectrics of $SiO_2,\;SiN_x$ and Polyvinylphenol(PVP) having a bottom gate configuration were investigated. ZnO-TFTs can induce high device performance with low intrinsic carrier concentration of ZnO only by controlling gas flow rates without additional doping or annealing processes. The field effect mobility and on/off ratio of ZnO-TFTs with $SiN_x$ were $20.2cm^2V^{-1}s^{-1}\;and\;5{\times}10^6$ respectively which is higher than those previously reported. The device adoptable values of the mobility of $1.37cm^2V^{-1}s^{-1}$ and the on/off ratio of $6{\times}10^3$ were evaluated from the device with organic PVP dielectric.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 춘계학술대회 논문집 반도체 재료 센서 박막재료 전자세라믹스
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• pp.1-4
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• 2004

Polycrystalline CdSe thin films were grown on ceramic substrate using a chemical bath deposition(CBD)method. They were annealed at various temperature and X-ray diffraction patterns were measured by X-ray diffractometer in order to study CdSe polycrystal structure. Using extrapolation method of X-ray diffraction patterns for the CdSe samples annealed in $N_2$ gas at $450^{\circ}C$ it was found hexagonal structure whose lattice parameters $a_0$ and $c_0$ were $4.302{\AA}$ and 7.014 ${\AA}$, respectively. Its grain size was about 0.3 ${\mu}m$. Hall effect on this sample was measured by Van der Pauw method and studied on carrier density and movility depending on temperature. From Hall data, the mobility was likely to be decreased by piezo electric scattering at temperature range of 33K and 200K, and by polar optical scattering at temperature range of 200K and 293K. We measured also spectral response, sensitivity$(\gamma)$, maximum allowable power dissipation and response time on these samples.

• Journal of Advanced Marine Engineering and Technology
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• 제8권2호
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• pp.51-66
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• 1984

The cost percentage of engine part in the total building cost of a ship is about 30-40% and the main engine occupies about 50% of the engine part cost. For certain ships the fuel bill can be as high as about 60-70% of the total operating cost after two oil shocks and its amount for one year is nearly equivalent to her main engine price. This fact has further increased the pressure on the engine builders to develop engines of higher efficiency and better possibilities to burn further deteriorated fuel qualities. But the energy-saving plants are ordinarily more expensive and their available amount of exhaust gas energy is less and therefore, they are not always profitable and optimum systems. This paper is prepared to decide the most economical and efficient engine systems by presenting reasonable selecting and economical evaluation methods of the main engine, which is the largest single unit and the most expensive, and its auxiliaries. In order to demonstrate the application of investigated methods in a practical case, a 46, 000 DWT class bulk carrier is selected as a model ship and her main engine and its auxiliaries are selected and evaluated. The result shows that the optimum determined has one year three months POP, 0.903 IRR at a year, 4, 116, 000 dollars PW in 15 years (for 5% escalation rate of fuel cost) and 9.522 BCR for same condition, when the engine plant of a same existing ship is taken as the basis.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.180-180
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• 2010

The design and implementation of high rate deposition process and anti-scratch property of silicon oxide film by PECVD with UHF power were investigated according to the effect of UHF input power with HF bias. New regime of high rate deposition of SiOx films by hybrid plasma process was investigated. The dissociation of OMCTS (C8H24Si4O4) precursor was controlled by plasma processes. SiOx films were deposited on polyethylene terephthalate (PET) and polycarbonate substrate by plasma enhanced chemical vapor deposition (PECVD) using OMCTS with oxygen carrier gas. As the input energy increased, the deposition rate of SiOx film increased. The plasma diagnostics were performed by optical emission spectrometry. The deposition rate was characterized by alpha-step. The mechanical properties of the coatings were examined by nano-indenter and pencil hardness, respectively. The deposition rate of the SiOx films could be controlled by the appropriate intensity of excited neutrals, ionized atoms and UHF input power with HF bias at room temperature, as well as the dissociation of OMCTS.

• 한국재료학회지
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• 제7권9호
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• pp.811-823
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• 1997

차세대 반도체 배선분야에서, Cu박막은 현재의 AI을 대체할 물질로서 대두되고 있으며 CVD에 의한 선택적 증착은 Cu의 patterning과 관련하여 상당한 관심을 일으키고 있다. 본 연구에서는 (hfac)Cu(VTMS)의 유기원료를 사용하여, CVD공정변수, 운반기체, 표면 처리 공정에 따른 SiO$_{2}$, TiN, AI기판에 대한 선택성을조사하였다. 선택성은 저온(15$0^{\circ}C$), 저합(0.3Torr)에서 향상될 수 있었으며, 특히, HMDS in-situ-predosing공정에 의해 더욱 향상될 수 있었다. 모든 경우에 대해, H$_{2}$운반기체가 Ar 보다 짧은 incubation time과 높은 증착 속도가 얻어졌으며, Cu입자들의 크기가 작고 연결상태가 보다 양호하였다. 이는 H$_{2}$경우에 기판표면에 원료가 흡착되어 핵을 형성시키는 위치 (-OH)가 보다 많이 제공되기 때문으로 여겨진다. 이러한 미세구조의 차이는 H$_{2}$경우에 보다 낮은 비저항을 얻게 했다. HMDS in-situ predosing공정에 의한 Cu박막내 불순물 차이는 없었으며 뚜렷한 비저항의 차이도 나타나지 않았다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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• pp.533-536
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• 2001

Single crystal cubic silicon carbide(3C-SiC) thin film were deposited on Si(100) substrate up to a thickness of $4.3{\mu}m$ by APCVD(atmospheric pressure chemical vapor deposition) method using hexamethyildisilane(HMDS) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like. The growth rate of the 3C-SiC films was $4.3{\mu}m/hr$. The 3C-SiC epitaxical layers on Si(100) were characterized by XRD(X-ray diffraction), raman scattering and RHEED(reflection high-energy electron diffraction), respectively. The 3C-SiC distinct phonons of TO(transverse optical) near $796cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The deposition films were identified as the single crystal 3C-SiC phase by XRD spectra($2{\theta}=41.5^{\circ}$). Also, with increase of films thickness, RHEED patterns gradually changed from a spot pattern to a streak pattern.

• 대한조선학회논문집
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• 제48권3호
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• pp.189-199
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• 2011

Austenite stainless steel(ASS), aluminum alloy and nickel steel alloy are the most widely used in many cryogenic applications due to superior mechanical properties at low temperature. The Face-Centered Cubic(FCC) and Hexagonal Close-Packed(HCP) materials are used for the primary and secondary insulation barrier of Liquefied Natural Gas(LNG) carrier tank and various kinds of LNG applications currently. In this study, tensile tests of ASS, aluminum alloy and nickel steel alloy were carried out for the acquisition of quantitative mechanical properties under the cryogenic environment. The range of thermal condition was room temperature to $-163^{\circ}C$ and strain rate range was 0.00016/s to 0.01/s considering the dependencies of temperatures and strain rates. The comprehensive test data were analyzed in terms of the characteristics of mechanical behavior for the development of constitutive equation and its application.