• 제목/요약/키워드: breakdown point

검색결과 168건 처리시간 0.032초

수종 임플랜트 금속의 내식성에 관한 전기화학적 연구 (AN ELECTROCHEMICAL STUDY ON THE CORROSION RESISTANCE OF THE VARIOUS IMPLANT METALS)

  • 전진영;김영수
    • 대한치과보철학회지
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    • 제31권3호
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    • pp.423-446
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    • 1993
  • Titanium and its alloys are finding increasing use in medical devices and dental implants. The strong selling point of titanium is its resistance to the highly corrosive body fluids in which an implant must survive. This corrosion resistance is due to a tenacious passive oxide or film which exists on the metal's surface and renders it passive. Potentiodynamic polarization measurement is one of the most commonly used electro-chemical methods that have been applied to measure corrosion rates. And the potentiodynamic polarization test supplies detailed information such as open circuit, rupture, and passivation potential. Furthermore, it indicates the passive range and sensitivity to pitting corrosion. This study was designed to compare the corrosion resistance of the commonly used dental implant materials such as CP Ti, Ti-6A1-4V, Co-Cr-Mo alloy, and 316L stainless steel. And the effects of galvanic couples between titanium and the dental alloys were assessed for their useful-ness-as. materials for superstructure. The working electrode is the specimen , the reference electrode is a saturated calomel electrode (SCE), and the counter electrode is made of carbon. In $N_2-saturated$ 0.9% NaCl solutions, the potential scanning was performed starting from -800mV (SCE) and the scan rate was 1 mV/sec. At least three different polarization measurements were carried out for each material on separate specimen. The galvanic corrosion measurements were conducted in the zero-shunt ammeter with an implant supraconstruction surface ratio of 1:1. The contact current density was recorded over a 24-hour period. The results were as follows : 1. In potential-time curve, all specimens became increasingly more noble after immersion in the test solution and reached between -70mV and 50mV (SCE) respectively after 12 hours. 2. The Ti and Ti alloy in the saline solution were most resistant to corrosion. They showed the typical passive behavior which was exhibited over the entire experimental range. Therefore no breakdown potentials were observed. 3. Comparing the rupture potentials, Ti and Ti alloy had the high(:st value (because their break-down potentials were not observed in this study potential range ) followed by Co-Cr-Mo alloy and stainless steel (316L). So , the corrosion resistance of titanium was cecellent, Co-Cr-Mo alloy slightly inferior and stainless steel (316L) much less. 4. The contact current density sinks faster than any other galvanic couple in the case of Ti/gold alloy. 5. Ag-Pd alloy coupled with Ti yielded high current density in the early stage. Furthermore, Ti became anodic. 6. Ti/Ni-Cr alloy showed a relatively high galvanic current and a tendency to increase.

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Atmospheric Plasma Spray코팅을 이용한 Yttrium계 소재의 내플라즈마성 및 세정 공정에 관한 연구 (A Study on Plasma Corrosion Resistance and Cleaning Process of Yttrium-based Materials using Atmospheric Plasma Spray Coating)

  • 권혁성;김민중;소종호;신재수;정진욱;맹선정;윤주영
    • 반도체디스플레이기술학회지
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    • 제21권3호
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    • pp.74-79
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    • 2022
  • In this study, the plasma corrosion resistance and the change in the number of contamination particles generated using the plasma etching process and cleaning process of coating parts for semiconductor plasma etching equipment were investigated. As the coating method, atmospheric plasma spray (APS) was used, and the powder materials were Y2O3 and Y3Al5O12 (YAG). There was a clear difference in the densities of the coatings due to the difference in solubility due to the melting point of the powdered material. As a plasma environment, a mixed gas of CF4, O2, and Ar was used, and the etching process was performed at 200 W for 60 min. After the plasma etching process, a fluorinated film was formed on the surface, and it was confirmed that the plasma resistance was lowered and contaminant particles were generated. We performed a surface cleaning process using piranha solution(H2SO4(3):H2O2(1)) to remove the defect-causing surface fluorinated film. APS-Y2O3 and APS-YAG coatings commonly increased the number of defects (pores, cracks) on the coating surface by plasma etching and cleaning processes. As a result, it was confirmed that the generation of contamination particles increased and the breakdown voltage decreased. In particular, in the case of APS-YAG under the same cleaning process conditions, some of the fluorinated film remained and surface defects increased, which accelerated the increase in the number of contamination particles after cleaning. These results suggest that contaminating particles and the breakdown voltage that causes defects in semiconductor devices can be controlled through the optimization of the APS coating process and cleaning process.

펄스 반복률에 의한 반도체 소자의 오동작 모드와 고장률에 관한 연구 (A Study on Malfunction Mode and Failure Rate Properties of Semiconductor by Impact of Pulse Repetition Rate)

  • 박기훈;방정주;김륙완;허창수
    • 한국전기전자재료학회논문지
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    • 제28권6호
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    • pp.360-364
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    • 2015
  • Electronic systems based on solid state devices have changed to be more complicated and miniaturized as the electronic systems developed. If the electronic systems are exposed to HPEM (high power electromagnetics), the systems will be destroyed by the coupling effects of electromagnetic waves. Because the HPEM has fast rise time and high voltage of the pulse, the semiconductors are vulnerable to external stress factor such as the coupled electromagnetic pulse. Therefore, we will discuss about malfunction behavior and DFR (destruction failure rate) of the semiconductor caused by amplitude and repetition rate of the pulse. For this experiment, the pulses were injected into the pins of general purpose IC due to the fact that pulse injection test enables the phenomenon after the HPEM is coupled to power cables. These pulses were produced by pulse generator and their characteristics are 2.1 [ns] of pulse width, 1.1 [ns] of pulse rise time and 30, 60, 120 [Hz] of pulse repetition rate. The injected pulses have changed frequency, period and duty ratio of output generated by Timer IC. Also, as the pulse repetition rate increases the breakdown threshold point of the timer IC was reduced.

하이테크 구조물을 모티브로 한 섬유 패션디자인상품의 소재개발 및 적용 (Study on Creating Textile Designs for Fashion Products Inspired by High Tech Architectural Structures)

  • 윤수인
    • 한국의상디자인학회지
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    • 제12권1호
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    • pp.25-34
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    • 2010
  • Design in the 21st Century requires showing extraordinary and revolutionary possibilities by merging multiple cultures or different art forms. 21C fashion also increases its's complexity through the blending in of other design field's styles and forms. In other words, 21C's fashion design involves not only clothing, but combines techniques, aspects and functions fulled from various design categories. As a result, Current fashion design becomes more unique, and shows various styles. From this point of view, this study focuses on creating and suggesting unique textile designs through the understanding of design processes of textiles, which are inspired by high tech architectural structures. The fundamental shape of the architectural structures were simplified into thick lines and geometric shapes. these design elements were then transferred into textile designs. As a result, unique textile looks were created, and were applied to the apparel designs by CAD to see 3d simulations. Exchanging or merging ideas of different design categories leads innovative and fresh looks. 21C is rapidly changing, and designers need to continually introduce new looks every season. Incorporating 21st Century consumption patterns, designers must understand the process of creating original designs through various methods. The innovative fabric designs for this study involved a creative process of drawing from a step by step breakdown of two separate design fields, which were then merged into one finished design. The data and research from this study can be used as a reference tool for any further applicable fashion and textile designs in the future.

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고에너지 분쇄 매체 지르코니아 Beads의 미세구조 및 기계적 특성에 따른 마모율 분석 (Analysis of Attrition Rate of Y2O3 Stabilized Zirconia Beads with Different Microstructure and Mechanical Properties)

  • 김정환;윤세중;한병동;안철우;윤운하;최종진
    • 한국재료학회지
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    • 제28권6호
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    • pp.349-354
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    • 2018
  • Particle size reduction is an important step in many technological operations. The process itself is defined as the mechanical breakdown of solids into smaller particles to increase the surface area and induce defects in solids, which are needed for subsequent operations such as chemical reactions. To fabricate nano-sized particles, several tens to hundreds of micron size ceramic beads, formed through high energy milling process, are required. To minimize the contamination effects during high-energy milling, the mechanical properties of zirconia beads are very important. Generally, the mechanical properties of $Y_2O_3$ stabilized tetragonal zirconia beads are closely related to the mechanism of phase change from tetragonal to monoclinic phase via external mechanical forces. Therefore, $Y_2O_3$ distribution in the sintered zirconia beads must also be closely related with the mechanical properties of the beads. In this work, commercially available $100{\mu}m-size$ beads are analyzed from the point of view of microstructure, composition homogeneity (especially for $Y_2O_3$), mechanical properties, and attrition rate.

낙뢰로 인한 전기화재의 현장조사기법 연구 (A Study on Investigation Method of the Electric Fire Scene Caused by Lightning)

  • 송재용;사승훈;남정우;김진표;박남규
    • 한국화재소방학회논문지
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    • 제25권1호
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    • pp.50-56
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    • 2011
  • 최근 지구온난화에 의한 영향으로 낙뢰의 발생빈도가 증가하는 추세이고, 낙뢰에 수반되는 뇌격전류의 강도 또한 강해지고 있는 추세이다. 2008년 기준 국내의 낙뢰 발생 빈도는 56만여 건 정도가 발생하였으며, 낙뢰로 인한 인명피해 사고 및 건축구조물의 피해는 나날이 증가하고 있다. 특히, 낙뢰로 인한 전기화재는 낙뢰 발생에 따른 대지전위 상승으로 접지선과 전원선간 절연파괴 과정에서 발생되며, 현장조사 결과, 낙뢰 발생 지역에 인접한 지역에서 동시다발적으로 전기적 피해가 발생하였다. 낙뢰에 대한 피해를 방지하기 위해서는 낙뢰 보호 장치의 설치 및 등전위 접지 시행 등의 방법이 요구된다. 또한 낙뢰로 인한 화재현장 조사에 있어서는 기상청에서 제공되는 낙뢰 발생 기록 및 화재현장과 인접한 지역에서 동시다발적인 전기적 특이점 형성 여부에 대한 검토가 필요하다.

코로나 방전에 의한 자기 및 폴리머 애자의 자외선 발생특성 (The Ultraviolet Generation Characteristics of porcelain and Polymer Insulators by Corona Discharge)

  • 송길목;방선배;김종민;김영석
    • 조명전기설비학회논문지
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    • 제22권4호
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    • pp.147-152
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    • 2008
  • 본 논문은 코로나 방전에 의한 자기애자와 폴리머애자의 자외선 발생 특성에 관한 것이다. 자외선 카메라를 이용하여 측정하고, KS C IEC 60060-1(2006)의 전압조건을 준수하여 실험하였다. 결과로서 자기애자에서의 코로나 방전은 애자 접합면에서 가장 취약한 부분에서 시작되었다. 폴리머애자는 취약한 접합면에서 자외선이 발생하였으며, 전원 측에서 나타났다. 이로써 자외선 검출을 통해 절연애자의 취약부분이 쉽게 확인되는 것을 알 수 있었다. 또한, 기존의 초음파 검출기술과 비교하여 열화단계가 정량화될 수 있음을 확인하였다. 이는 신뢰성 있는 데이터를 통해 전력설비의 열화를 판단하는 기준에 활용될 수 있다. 향후 현장진단에 적합한 기술로서 앞으로 많은 연구가 기대된다.

이축 연신된 폴리프로필렌 필름의 전하주입 현상이 절연특성에 미치는 영향 (Influence of the Insulating Properties on Charge Injection Phenomena of Biaxially-Drawn Polypropylene Film)

  • 이준웅;김병태;박승협
    • 한국조명전기설비학회지:조명전기설비
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    • 제1권2호
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    • pp.74-81
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    • 1987
  • 고분자 절연재료에 전하주입시 발생하는 캐리어 트랩현상은 재료의 절연성을 저하시키는데 중요한 영향을 미치는 것으로 알려져 있다. 따라서 본 연구에서는 절연재료의 전기적 특성을 개선한다는 측면에서 캐리어의 거동을 파악하기 위해 내열성이 폴리프로필렌보다 우수한 이축 연신된 폴리프로필렌 필름(두께 $50\mu\textrm{m}$)을 선정하여 전계변화에 따른 열자격전류 스펙트라를 분석 검토하였다. 온도범위 303~413[K]와 전계범위 2~80[㎹/m]에서 열자격 전류의 변화를 살펴본 결과 전계 12[㎹/m]이하에서는 전하주입의 효과가 관찰되지 않았으나 전계가 점점 높아지면 트랩된 공간전하와 전극으로부터 주입된 공간전하가 형성되어 Hetero 및 Homo성 열자격전류 스펙트라가 나타나며 이는 결국 절연파괴를 야기시키는 것으로 예측되어진다. 또한 이축 연신된 시료가 미연신 재료보다 우수한 절연특성을 가지고 있음을 확인 할 수 있었다.

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Function of the pentose phosphate pathway and its key enzyme, transketolase, in the regulation of the meiotic cell cycle in oocytes

  • Kim, Yunna;Kim, Eun-Young;Seo, You-Mi;Yoon, Tae Ki;Lee, Woo-Sik;Lee, Kyung-Ah
    • Clinical and Experimental Reproductive Medicine
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    • 제39권2호
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    • pp.58-67
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    • 2012
  • Objective: Previously, we identified that transketolase (Tkt), an important enzyme in the pentose phosphate pathway, is highly expressed at 2 hours of spontaneous maturation in oocytes. Therefore, this study was performed to determine the function of Tkt in meiotic cell cycle regulation, especially at the point of germinal vesicle breakdown (GVBD). Methods: We evaluated the loss-of-function of Tkt by microinjecting Tkt double-stranded RNAs (dsRNAs) into germinal vesicle-stage oocytes, and the oocytes were cultured in vitro to evaluate phenotypic changes during oocyte maturation. In addition to maturation rates, meiotic spindle and chromosome rearrangements, and changes in expression of other enzymes in the pentose phosphate pathway were determined after Tkt RNA interference (RNAi). Results: Despite the complete and specific knockdown of Tkt expression, GVBD occurred and meiosis was arrested at the metaphase I (MI) stage. The arrested oocytes exhibited spindle loss, chromosomal aggregation, and declined maturation promoting factor and mitogen-activated protein kinase activities. The modified expression of two enzymes in the pentose phosphate pathway, Prps1 and Rbks, after Tkt RNAi and decreased maturation rates were amended when ribose-5-phosphate was supplemented in the culture medium, suggesting that the Tkt and pentose phosphate pathway are important for the maturation process. Conclusion: We concluded that Tkt and its associated pentose phosphate pathway play an important role in the MI-MII transition of the oocytes' meiotic cell cycle, but not in the process of GVBD.

$Si_3N_4$를 이용한 금속-유전체-금속 구조 커패시터의 유전 특성 및 미세구조 연구 (A Study on the Dielectric Characteristics and Microstructure of $Si_3N_4$ Metal-Insulator-Metal Capacitors)

  • 서동우;이승윤;강진영
    • 한국진공학회지
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    • 제9권2호
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    • pp.162-166
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    • 2000
  • 플라즈마 화학증착법(Plasma Enhanced Chemical Vapor Deposition, PECVD)을 이용하여 양질의 $Si_3N_4$ 금속-유전막-금속(Metal-Insulator-Metal, MIM) 커패시터를 구현하였다. 유전체인 $Si_3N_4$와 전극인 Al의 계면반응을 억제시키기 위해 티타늄 나이트라이드(TiN)를 확산 장벽으로 사용한 결과 MIM 커패시터의 전극과 유전체 사이의 계면에서는 어떠한 hillock이나 석출물도 관찰되지 않았다. 커패시턴스와 전류전압 특성분석으로부터 양질의 MIM 커패시터 특성을 보이는 $Si_3N_4$의 최소 두께는 500 $\AA$이며, 그 두께 미만에서는 대부분의 커패시터가 전기적으로 단락되어 웨이퍼 수율이 낮아진다는 사실을 알 수 있었다. 투과전자현미경(transmission Electron Microscope, TEM)을 이용한 단면 미세구조 관찰을 통해 $Si_3N_4$층의 두께가 500 $\AA$ 미만인 커패시터의 경우에 TiN과 $Si_3N_4$의 계면에서 형성되는 슬릿형 공동(slit-like void)01 의해 커패시터의 유전특성이 파괴된다는 사실을 알게 되었으며, 열 유기 잔류 응력(thermally-induced residual stress) 계산에 기초하여 공동의 형성 기구를 규명하였다.

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