• 한국결정성장학회지
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• 제23권3호
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• pp.119-123
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• 2013

Most of the world's solar cells in photovoltaic industry are currently fabricated using crystalline silicon. Czochralski-grown silicon crystals are more expensive than multicrystalline silicon crystals. The future of solar-grade Czochralski-grown silicon crystals crucially depends on whether it is usable for the mass-production of high-efficiency solar cells or not. It is generally believed that the main obstacle for making solar-grade Czochralski-grown silicon crystals a perfect high-efficiency solar cell material is presently light-induced degradation problem. In this work, the substitution of boron with gallium in p-type silicon single crystal is studied as an alternative to reduce the extent of lifetime degradation. The diamond-wire sawing technology is employed to slice the silicon ingot. In this paper, the quality of the diamond wire-sawn gallium-doped silicon wafers is studied from the chemical, electrical and structural points of view. It is found that the characteristic of gallium-doped silicon wafers including texturing behavior and surface metallic impurities are same as that of conventional boron-doped Czochralski crystals.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1999년도 춘계학술발표강연 및 눈문개요집
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• pp.31-31
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• 1999

• 한국전기전자재료학회논문지
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• 제17권12호
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• pp.1301-1307
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• 2004

Reduced pressure chemical vapor deposition(RPCYD) technology has been investigated for the growth of SiGe epitaxial films with two dimensional in-situ doped boron impurities. The two dimensional $\delta$-doped impurities can supply high mobility carriers into the channel of SiGe heterostructure MOSFETs(HMOS). Process parameters including substrate temperature, flow rate of dopant gas, and structure of epitaxial layers presented significant influence on the shape of two dimensional dopant distribution. Weak bonds of germanium hydrides could promote high incorporation efficiency of boron atoms on film surface. Meanwhile the negligible diffusion coefficient in SiGe prohibits the dispersion of boron atoms: that is, very sharp, well defined two-dimensional doping could be obtained within a few atomic layers. Peak concentration and full-width-at-half-maximum of boron profiles in SiGe could be achieved in the range of 10$^{18}$ -10$^{20}$ cm$^{-3}$ and below 5 nm, respectively. These experimental results suggest that the present method is particularly suitable for HMOS devices requiring a high-precision channel for superior performance in terms of operation speed and noise levels to the present conventional CMOS technology.

• 한국재료학회지
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• 제31권10호
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• pp.552-561
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• 2021

For the purpose of manufacturing a high efficiency TiO₂ photocatalyst, B-doped TiO₂ photocatalysts are synthesized using a plasma electrolytic oxidation method in 0.5 M H₂SO₄ electrolyte with different concentrations of H₃BO₃ as additive. For the B doped TiO₂ layer fabricated from sulfuric electrolyte having a higher concentration of H₃BO₃ additive, the main XRD peaks of (101) and (200) anatase phase shift gradually toward the lower angle direction, indicating volume expansion of the TiO₂ anatase lattice by incorporation of boron, when compared with TiO₂ layers formed in sulfuric acid with lower concentration of additive. Moreover, XPS results indicate that the center of the binding energy peak of B1s increases from 191.45 eV to 191.98 eV, which suggests that most of boron atoms are doped interstitially in the TiO₂ layer rather than substitutionally. The B doped TiO₂ catalyst fabricated in sulfuric electrolyte with 1.0 M H₃BO₃ exhibits enhanced photocurrent response, and high efficiency and rate constant for dye degradation, which is ascribed to the synergistic effect of the new impurity energy band induced by introducing boron to the interstitial site and the improvement of charge transfer reaction.

• 한국응용과학기술학회지
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• 제31권4호
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• pp.731-739
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• 2014

투명 전도성 산화물로서 알루미늄과 붕소가 함께 도핑된 아연산화물(AZOB)이 $900^{\circ}C$에서 분무 열분해법에 의해 제조되었다. 얻어진 마이크론 크기의 AZOB 분말은 알루미늄, 붕소 및 아연의 수용액으로부터 얻어진다. 분무 열분해로 얻어진 마이크론 크기의 AZOB 분말은 $700^{\circ}C$에서 두 시간동안의 후 소성 과정과 24 시간 동안의 볼 밀링을 통해 나노 크기의 AZOB으로 변환된다. AZOB을 구성하는 일차 입자의 크기를 Debye-Scherrer 식에 의해 계산하였고 압축된 AZOB 펠렛의 표면 저항을 측정하였다.

• 한국진공학회지
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• 제9권2호
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• pp.110-115
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• 2000

열-필라멘트 CVD 장치를 이용하여 다이아몬드 박막의 증착 조건을 최적화시켰다. $B_4C $ 고체 펠렛을 사용하여 보론두핑된 다이아몬드 박막을 제조하여 그 질적 특성을 알아보고, 전류전압 특성과 전계 방출 측정을 통해 박막의 전계방출소자(field emission display (FED)로의 특성을 조사하였다. 보론 도핑의 양이 증가함에 따라 다이아몬드 결정의 평균 입자 크기가 조금씩 감소하지만 다이아몬드의 질은 소량 도핑인 경우에 크게 바뀌지 않았다. Al/Diamond/p-Si 소자의 전류전압 특성을 조사한 결과 도핑된 다이아몬드 박막의 전류는 도핑되지 않은 박막의 전류에 비해 $10^4$~$10^5$배 정도 증가하였다. 전계방출 특성을 조사한 결과 보론-도핑이 증가함에 따라 점차 낮은 전기장에서 전자를 방출하며, 또한 높은 방출 전류를 나타냈다. 전자가 방출되기 시작하는 onset-field는 펠렛의 수가 2개일 때 15.5 V/$\mu\textrm{m}$, 3개일 때 13.6 V/$\mu\textrm{m}$, 4개일 때는 11.1 V/$\mu\textrm{m}$. 체계적으로 감소하였다. 도핑의 강도가 세어짐에 따라 Fowler-Nordheim 그래프의 기울기는 감소하는 경향을 보였으며, 이로서 보론 도핑으로 인해 유효 장벽 에너지가 감소되어 전자 방출 특성이 향상됨을 알 수 있었다.

• 한국재료학회지
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• 제32권4호
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• pp.210-215
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• 2022

Extensive research is being carried out on Ni-rich Li(Ni_xCo_yMn_1-x-y)O₂ (NCM) due to the growing demand for electric vehicles and reduced cost. In particular, Ni-rich Li(Ni_xCo_yMn_1-x-y-zAl_z)O₂ (NCMA) is attracting great attention as a promising candidate for the rapid development of Co-free but electrochemically more stable cathodes. Al, an inactive element in the structure, helps to improve structural stability and is also used as a doping element to improve cycle capability in Ni-rich NCM. In this study, NCMA was successfully synthesized with the desired composition by direct coprecipitation. Boron and tin were also used as dopants to improve the battery performance. Macro- and microstructures in the cathodes were examined by microscopy and X-ray diffraction. While Sn was not successfully doped into NCMA, boron could be doped into NCMA, leading to changes in its physicochemical properties. NCMA doped with boron revealed substantially improved electrochemical properties in terms of capacity retention and rate capability compared to the undoped NCMA.

• 대한전자공학회논문지
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• 제26권5호
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• pp.38-45
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• 1989

보론이 100ppm으로 도우핑된 비정질 실리콘을 이용한 쌍극 박막 트랜지스터를 CVD 방법으로 제작하여 전기적 특성을 조사하였다. 쌍극 박막 트랜지스터에 인가한 트레인 전압이 증가하면 정공채널의 드레인 전류는 전자와 정공의 주입에 의해 크게 증가한다. 또한 게이트 전압의 인가 시간에 따른 드레인 전류는 streched exponential로 감소하는데, 이는 전자축적층에 의해 생기는 댕글린 본드 밀도의 변화가 수소의 확산과 동일한 시간 의존성을 갖는 것을 의미한다. 이러한 실험 결과로 부터 보론이 도우핑된 수소화된 비정질 실리콘에 게이트 전압을 인가하거나, 빛 조사시 도우핑 효율이 변화함을 알 수 있다.

• Bulletin of the Korean Chemical Society
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• 제33권7호
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• pp.2274-2278
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• 2012

To test the efficiency of the BDD electrode for complete mineralization of organic wastewater, phenol and 2-chlorophenol (2-CP) were treated electrochemically with both an active Pt/Ti electrode and a nonactive boron doped diamond (BDD) electrode, respectively, in neutral aqueous medium. Aqueous solutions of both phenol and 2-chlorophenol were treated electrochemically using an in-house fabricated flow through electrochemical cell (FTEC). The experimental variables included current input, treatment time, and the flow rate of the solutions. Depending on the magnitude of the applied current and reaction time, the compounds were either completely degraded or partially oxidized to other intermediates. Removal efficiencies reached as high as 93.2% and 94.8% both at the Pt/Ti electrode and BDD electrode, respectively, at an applied current of 200 mA for a 3.0 hr reaction and a flow rate of 4 mL/min. The BDD electrode was much more efficient for the complete mineralization of phenol and 2-chlorophenol than the Pt/Ti electrode.

• 열처리공학회지
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• 제32권4호
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• pp.155-160
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• 2019

Diamond Like Carbon (DLC) is a metastable form of amorphous carbon that have superior material properties such as high mechanical hardness, chemical inertness, abrasion resistance, and biocompatibility. Furthermore, its material properties can be tuned by additional doping such as nitrogen or boron. However, either pure DLC or doped DLC show poor adhesion property that makes it difficult to apply contact processing technique. Therefore we propose ultrafast laser micromachining which is non-contact precision process without mechanical degradation. In this study, we developed precision machining process of DLC thin film using an ultrafast laser by investigating the process window in terms of laser fluence and laser wavelength. We have also demonstrated various patterns on the film without generating any microcracks and debris.