• 제목/요약/키워드: blocking oxide

검색결과 226건 처리시간 0.026초

티타늄 실리콘 옥사이드 나노입자를 첨가제로 사용한 4-iodoaniline을 포함한 하이드로젤 착색 콘택트렌즈의 특성 (Characterization of Hydrogel Tinted Contact Lens Containing 4-iodoaniline using Titanium Silicon Oxide Nanoparticles as Additive)

  • 조선아;성아영
    • 한국안광학회지
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    • 제19권3호
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    • pp.315-322
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    • 2014
  • 목적: 4-iodoaniline을 포함한 하이드로젤 콘택트렌즈 기본 재료에 티타늄 실리콘 산화물 나노입자를 첨가하여 친수성 착색 콘택트렌즈의 물리적 및 광학적 특성을 측정하고 제조된 고분자의 자외선 투과율을 측정하여 티타늄 실리콘 옥사이드 나노입자의 자외선 차단 안의료용 렌즈 소재로의 활용도 및 4-iodoaniline만을 기본 콘택트렌즈 재료에 공중합하여 두 실험군의 물성을 비교 분석하였다. 방법: 하이드로젤 렌즈 제조를 위해, HEMA, MA, MMA, 4-iodoaniline, 교차결합제인 EGDMA 및 개시제인 AIBN을 사용하여 공중합 하였다. 또한, 티타늄 실리콘 옥사이드 나노입자는 첨가제로 사용되었다. 중합 후 제조된 콘택트렌즈 재료의 함수율, 굴절률, 접촉각 및 분광투과율 등의 물리적 특성을 측정하였다. 결과: 하이드로젤 렌즈 고분자의 물성을 측정한 결과, 함수율 35.01~ 38.68%, 굴절률 1.4350~1.4418, 접촉각 $34.15{\sim}57.25^{\circ}$ 그리고 UV-B 투과율의 경우 1.0~10.0%의 범위로 나타났다. 또한 첨가제를 사용하지 않은 실험군에서는 함수율 34.0~36.8%, 굴절률 1.4378~1.4420, 접촉각 $40.15{\sim}60.16^{\circ}$ 그리고 UV-B 투과율의 경우 1.8~25.0% 범위의 분포를 나타내었다. 결론: 티타늄 실리콘 옥사이드 나노입자를 첨가한 조합에서 자외선 투과율이 크게 감소하는 것으로 나타났다.

3D NAND Flash Memory에서 Tapering된 O/N/O 및 O/N/F 구조의 Threshold Voltage 변화 분석 (The Analysis of Threshold Voltage Shift for Tapered O/N/O and O/N/F Structures in 3D NAND Flash Memory)

  • 이지환;이재우;강명곤
    • 전기전자학회논문지
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    • 제28권1호
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    • pp.110-115
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    • 2024
  • 본 논문은 3D NAND Flash memory에서 tapering된 O/N/O(Oxide/Nitride/Oxide) 구조와 blocking oxide를 ferroelectric material로 대체한 O/N/F(Oxide/Nitride/Ferroelectric) 구조의 Vth(Threshold Voltage) 변화량을 분석했다. Tapering 각도가 0°일 때 O/N/F 구조는 O/N/O 구조보다 저항이 작고 WL(Word-Line) 상부와 WL 하부의 Vth 변화량이 감소한다. Tapering된 3D NAND Flash memory는 WL 상부에서 WL 하부로 내려갈수록 channel 면적이 감소하며 channel 저항이 증가한다. 따라서 tapering 각도가 증가할수록 WL 상부의 Vth가 감소하고 WL 하부의 Vth는 증가한다. Tapering된 O/N/F 구조는 channel 반지름 길이와 비례하는 Vfe로 인해 WL 상부의 Vth는 O/N/O 구조보다 더 감소한다. 또한 O/N/F 구조의 WL 하부는 O/N/O 구조보다 Vth가 증가하기 때문에 tapering 각도에 따른 Vth 변화량이 O/N/O 구조보다 더 증가한다.

p채널 SONOS 전하트랩 플래시메모리의 제작 및 특성 (The Fabrication and Characteristics of p-channel SONOS Charge-Trap Flash Memory)

  • 김병철;김주연
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2008년도 추계종합학술대회 B
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    • pp.604-607
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    • 2008
  • 본 연구에서는 NAND 플래시메모리를 위한 기본 셀로서 p채널 SONOS (silicon-oxide-nitride-oxide-silicon) 트랜지스터를 제작하고 이것의 메모리특성을 조사하였다. SONOS 트랜지스터의 제작은 $0.13{\mu}m$ low power용 standard logic 공정기술을 사용하였다. 게이트 절연막의 두께는 터널 산화막 $20{\AA}$, 질화막 $14{\AA}$, 그리고 블로킹산화막의 두께는 $49{\AA}$이다. 제작된 SONOS 트랜지스터는 낮은 쓰기/지우기 전압, 빠른 지우기 속도, 그리고 비교적 우수한 기억유지특성과 endurance 특성을 나타내었다.

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PFO : MEH-PPV 발광층과 정공 차단층을 이용한 고분자 발광다이오드의 특성 (Properties of Polymer Light Emitting Diodes Using PFO : MEH-PPV Emission Layer and Hole Blocking Layer)

  • 이학민;공수철;신상배;박형호;전형탁;장호정
    • 반도체디스플레이기술학회지
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    • 제7권2호
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    • pp.49-53
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    • 2008
  • The yellow base polymer light emitting diodes(PLEDs) with double emission and hole blocking layers were prepared to improve the light efficiency. ITO(indium tin oxide) and PEDOT : PSS[poly(3,4-ethylenedioxythiophene) : poly(styrene sulfolnate)] were used as cathode and hole transport materials. The PFO[poly(9,9-dioctylfluorene)] and MEH-PPV[poly(2-methoxy-5(2-ethylhe xoxy)-1,4-phenylenevinyle)] were used as the light emitting host and guest materials, respectively. TPBI[Tpbi1,3,5-tris(N-phenylbenzimidazol-2-yl)benzene] was used as hole blocking layer. To investigate the optimization of device structure, we prepared four kinds of PLED devices with different structures such as single emission layer(PFO : MEH-PPV), two double emission layer(PFO/PFO : MEH-PPV, PFO : MEH-PPV/PFO) and double emission layer with hole blocking layer(PFO/PFO : MEH-PPV/TPBI). The electrical and optical properties of prepared devices were compared. The prepared PLED showed yellow emission color with CIE color coordinates of x = 0.48, y = 0.48 at the applied voltage of 14V. The maximum luminance and current density were found to be about 3920 cd/$m^2$ and 130 mA/$cm^2$ at 14V, respectively for the PLED device with the structure of ITO/PEDOT : PSS/PFO/PFO : MEH-PPV/TPBI/LiF/Al.

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이온전도성 poly(ethylene oxide)고분자전해질의 전도특성 (Conductivity properties of ion conducting polymer electrolyte based on poly(ethylene oxide))

  • 김종욱;문성인;진봉수;구할본;윤문수
    • E2M - 전기 전자와 첨단 소재
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    • 제8권4호
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    • pp.487-494
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    • 1995
  • The purpose of this study is to research and develop solid polymer electrolyte(SPE) for Li secondary battery. We investigated the effects of lithium salts, plasticizer addition, temperature dependence of conductivity and electrochemical stability window of polyethylene oxide(PEO) electrolytes. PEO electrolyte completed with LiCIO$\_$4/ shows the better conductivity than the others. PEO-LiCIO$\_$4/ electrolyte, when EO/Li$\^$+/ ratio is 8, showed adequate conductivity around room temperature. By adding propylene carbonate and ethylene carbonate to PEO-LiCIO$\_$4/ electrolyte, its conductivity was higher than that of PEO-LiCIO$\_$4/ without those. Also PEO$\_$8/LiCIO$\_$4/ electrolyte remains stable up to 4.5V vs. Li/Li.

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다양한 기울기를 갖는 TEOS 필드 산화막의 경사식각 (Tapered Etching of Field Oxide with Various Angle using TEOS)

  • 김상기;박일용;구진근;김종대
    • 한국전기전자재료학회논문지
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    • 제15권10호
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    • pp.844-850
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    • 2002
  • Linearly graded profiles on the field area oxide are frequently used in power integrated circuits to reduce the surface electric field when power devices are operated in forward or reverse blocking modes. It is shown here that tapered windows can be made using the difference of etch rates between the bottom and the top layer of TEOS film. Annealed TEOS films are etched at a lower rate than the TEOS film without annealing Process. The fast etching layer results in window walls having slopes in the range of 25$^{\circ}$∼ 80$^{\circ}$ with respect to the wafer surface. Taper etching technique by annealing the TEOS film applies to high voltage LDMOS, which is compatible with CMOS process, due to the minimum changes in both of design rules and thermal budget.

Simulation of a Novel Lateral Trench Electrode IGBT with Improved Latch-up and Forward Blocking Characteristics

  • Kang, Ey-Goo;Moon, Seung-Hyun;Kim, Sangsig;Sung, Man-Young
    • Transactions on Electrical and Electronic Materials
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    • 제2권1호
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    • pp.32-38
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    • 2001
  • A new small sized Lateral Trench electrode Insulated Gate Bipolar Transistor(LTEIGBT) was proposed to improve the characteristics of conventional Lateral IGBT (LIGBT) and Lateral Trench gate IGBT (LTIGBT). The entire electrode of LTEIGBT was replace with trench-type electrode. The LTEIGBT was designed so that the width of device was no more than 19 ㎛. The Latch-up current densities of LIGBT, LTIGBT and the proposed LTEIGBT were 120A/㎠, 540A/㎠, and 1230A/㎠, respectively. The enhanced latch-up capability of the LTEIGBT was obtained through holes in the current directly reaching the cathode via the p+ cathode layer underneath n+ cathode layer. The forward blocking voltage of the LTEIGBT is 130V. Conventional LIGBT and LTIGBT of the same size were no more than 60V and 100V, respectively. Because the the proposed device was constructed of trench-type electrodes, the electric field moved toward trench-oxide layer, and punch through breakdown of LTEIGBT is occurred, lately.

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차단막 코팅을 이용한 광전기화학셀 효율 개선 (Improvement of Efficiency of Photoelectrochemical Cells by Blocking Layer Coatings)

  • 문병호;곽동주;박차수;성열문
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1485-1486
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    • 2011
  • A layer of $TiO_2$ thin film less than ~500nm in thickness, as a blocking layer, was coated by sol-gel method directly onto the anode electrode to be isolated from the electrolyte in dye-sensitized solar cells (DSCs). This is to prevent the electrons from back-transferring from the electrode to the electrolyte (I-/I3-). The effects of heat treatment conditions of the gel and as-coated film on the thickness and consolidation to substrate were studied. The flexible DSCs were fabricated with working electrode of Ti thin foil coated with blocking $TiO_2$ layer, dye-attached mesoporous $TiO_2$ film, gel electrolyte and counter electrode of Pt-deposited indium doped tin oxide/polyethylene naphthalate (ITO/PEN). The photo-current conversion efficiency of the cell was 5.3% ($V_{oc}=0.678V$, $J_{sc}=12.181mA/cm^2$, ff=0.634) under AM1.5, 100 mW/$cm^2$ illumination.

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Characteristics of MINOS Structure using $TiO_2$ as Blocking Layer for Nonvolatile Memory applicable to OLED

  • Lee, Kwang-Soo;Jung, Sung-Wook;Kim, Kyung-Hae;Jang, Kyung-Soo;Hwang, Sung-Hyun;Lee, Jeoung-In;Park, Hyung-Jun;Kim, Jae-Hong;Son, Hyuk-Joo;Yi, Jun-Sin
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1284-1287
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    • 2007
  • Titanium dioxide ($TiO_2$) is promising candidate for fabricating blocking layer of gate dielectrics in non-volatile memory (NVM). In this work, we investigated $TiO_2$ as high dielectric constant material instead of silicon dioxide ($SiO_2$), which is generally used as blocking layer for NVM.

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Blocking Layers Deposited on TCO Substrate and Their Effects on Photovoltaic Properties in Dye-Sensitized Solar Cells

  • Yoo, Beom-Hin;Kim, Kyung-Kon;Lee, Doh-Kwon;Kim, Hong-Gon;Kim, Bong-Soo;Park, Nam-Gyu;Ko, Min-Jae
    • Journal of Electrochemical Science and Technology
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    • 제2권2호
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    • pp.68-75
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    • 2011
  • In this review, we have investigated the effect of $TiO_2$-based blocking layers (t-BLs), deposited on a transparent conductive oxide (TCO)-coated glass substrate, on the photovoltaic performance of dye-sensitized solar cells (DSSCs). The t-BL was deposited using spin-coating or sputtering technique, and its thicknesses were varied to study the influence of the thin $TiO_2$ layer in between transparent conducting glass and nanocrystalline $TiO_2$ (nc-$TiO_2$). The DSSC with the t-BL showed the improved adhesion and the suppressed charge recombination at a TCO glass substrate than those without the t-BL, which led to the higher conversion efficiency.