• JSTS:Journal of Semiconductor Technology and Science
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• v.6 no.3
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• pp.131-135
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• 2006

High electron mobility transistors with InAs channels and antimonide barriers were grown on Si and GaAs substrates by means of molecular beam epitaxy. While direct growth of Sb materials on Si substrate generates disordered and coalescences 3-D growth, smooth and mirror-like 2D growth can be repeatedly obtained by inserting AlSb QD layers between them. Room-temperature electron mobilities of over 10,000 $cm^2/V-s$ and 20,000 $cm^2/v-s$ can be routinely obtained on Si and GaAs substrates, respectively, after optimizing the buffer structure as well as maintaining InSb-like interface.

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.16-23
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• 2000

The epitaxial growth of $CeO_2$ films has been investigated on three different substrates-Si(111), $SrTiO_3$(001), and MgO(001)-over wide range of growth parameters using oxygen-plasma-assisted molecular beam epitaxy. Pure-phase, single-crystalline epitaxial films of $CeO_2$ (001) have been grown only on $SrTiO_3$(001). We discuss the growth conditions in conjunction with the choice of substrates required to synthe-size this oxide, as well as the associated characterization by menas of x-ray diffraction, reflection high-energy electron diffraction, low-energy electron diffraction, and x-ray photoelectron spectroscopy and diffraction. Successful growth of single crystalline $CeO_2$ depends critically on the choice of substrate and is rather insensitive to the growth conditions studied in this investigation. $CeO_2$(001) films on $SrTiO_3$exhibit the sturcture of bulk $CeO_2$ without surface reconstructions. Ti outdiffusion is observed on the films grown temperatures above $650^{\circ}C$.

• Korean Journal of Materials Research
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• v.22 no.4
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• pp.185-189
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• 2012

We report plasma-assisted molecular beam epitaxy of $In_XGa_{1-X}N$ films on c-plane sapphire substrates. Prior to the growth of $In_XGa_{1-X}N$ films, GaN film was grown on the nitride c-plane sapphire substrate by two-dimensional (2D) growth mode. For the growth of GaN, Ga flux of $3.7{\times}10^{-8}$ torr as a beam equivalent pressure (BEP) and a plasma power of 150 W with a nitrogen flow rate of 0.76 sccm were fixed. The growth of 2D GaN growth was confirmed by $in-situ$ reflection high-energy electron diffraction (RHEED) by observing a streaky RHEED pattern with a strong specular spot. InN films showed lower growth rates even with the same growth conditions (same growth temperature, same plasma condition, and same BEP value of III element) than those of GaN films. It was observed that the growth rate of GaN is 1.7 times higher than that of InN, which is probably caused by the higher vapor pressure of In. For the growth of $In_xGa_{1-x}N$ films with different In compositions, total III-element flux (Ga plus In BEPs) was set to $3.7{\times}10^{-8}$ torr, which was the BEP value for the 2D growth of GaN. The In compositions of the $In_xGa_{1-x}N$ films were determined to be 28, 41, 45, and 53% based on the peak position of (0002) reflection in x-ray ${\theta}-2{\theta}$ measurements. The growth of $In_xGa_{1-x}N$ films did not show a streaky RHEED pattern but showed spotty patterns with weak streaky lines. This means that the net sticking coefficients of In and Ga, considered based on the growth rates of GaN and InN, are not the only factor governing the growth mode; another factor such as migration velocity should be considered. The sample with an In composition of 41% showed the lowest full width at half maximum value of 0.20 degree from the x-ray (0002) omega rocking curve measurements and the lowest root mean square roughness value of 0.71 nm.

• Proceedings of the Korean Vacuum Society Conference
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• 2009.02a
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• pp.66-66
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• 2009

• Journal of the Korean Vacuum Society
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• v.19 no.5
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• pp.365-370
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• 2010

The growth interruption effects on growth mode of the GaAs and AlGaAs epitaxial layers grown on GaAs substrate by molecular beam epitaxy were investigated. Growth process of the epitaxial layers as a function of the growth interruption time was observed by reflection high energy electron diffraction (RHEED). The growth interruption time was 0, 15, 30, 60 s. The GaAs/$Al_{0.3}Ga_{0.7}As$ multi quantum wells (MQWs) with different growth interruption time were grown and its properties were investigated. RHEED intensity oscillation and optical property of the MQWs were dependent on the growth interruption time. When the growth interruption time was 30 s, interface between the well and barrier layers became sharper.

• Food Science of Animal Resources
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• v.18 no.3
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• pp.232-239
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• 1998

This experiment was conducted to investigate radurization effects of gamma ray and electron beam irradiation at 1.5 and 3.0 kGy on beef steaks during 8 days of storage at 5$^{\circ}C$. Total bacteria count, psychrotrophs, mesophiles and thermophiles were analyzed at 2 days intervals. Nonirradiated beef steak was used a scontrol Total bacteria counts, psychrotrophs, mesophiles and thermophiles of the control samples showed 3.03∼4.72 logCFU / g at 0 day and increased to 7.67∼10.90 logCFU / g during 8 days storage except thermophiles. Total bacteria counts, psychrotrophs and mesophiles of beef steaks at 8 days were significantly (p＜0.05) decreased to 3.61∼5.43 logCFU / g by gamma ray and to 3.83∼7.02 logCFU / g by electron beam irradiation at 1.5 and 3.0 kGy. Thermophiles of all irradiated samples at any dose were not detectable through 8 days storage. These results suggested that both gamma ray and electron beam irradiation were effective to extend lag phase of bacterial growth of refrigerated beef. Gamma ray irradiation was better than electron beam irradiation in terms of radurization effects of beef.

• Korean Journal of Crystallography
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• v.3 no.2
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• pp.85-97
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• 1992

EBFZM( Electron Beam Floating Zone Melting) 법을 이용하여 몰리브덴에서의 금속계 불순물과 침입형 불순물의 정련기구 및 단결정 성장기구를 연구하 였다. Fe, Cr, Co등의 금속계 불순물은 몰리브덴과의 평형증기압의 차이에 따른 불순물의 선택적 증발에 의하여 우수한 정련효과를 나타내며, 몰리브덴보다 응점이 높은 Ta, W는 잘 제거되지 않았다. 한편 대역 정제에 의한 정련효과는 미약함을 확인하였다. EBF ZM은 C,0,N등의 침입형 불순물의 정련에도 효과적 이었다. 본 연구의 모든 조건에서 몰리브덴은 단결정으로 성장하였으며 2차 재결정 epitaxy에 의한 단결 정 성장기구가 제시되었다. 몰리브덴 단결정 내의 전 위밀도는 strain-anneal법에 의한 단결정의 경우보다 높았으며,본 실험의 열처리 조건에서는 변화하지 않았다. The purification and single crystal growth mechanisms of molybdenum were analysed in EBFZM ( electron beam floating zone melting). Metallic impurities of Fe, Cr, Co were purified efficiently but Ta and W were not removed well in this study. It was due to a preferential evaporation of the elements caused by the difference in equillibrium vapor pressure between the elements and molybdenum. The pu- rification effect by zone refining was not significant. The EBFZM also refined the interstitial impurities of C, 0 and N, effectively. The single crystals of molybdenum were grown regardless of the experimental conditions and the secondary recrystallization epitaxy was surge sled as a growth mechanism. The dislocation density in single crystal was higher than that by strain-anneal method, and was not reduced by heat treatments.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.1
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• pp.1-5
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• 1999

The rare-earth ions ($R^{3+}$, R=Nd, Er) doped $CaF_{2}$ layers have been grown on $CaF_{2}$ (111) substrate by molecular beam epitaxy. The surface structure and the crystallinity of $CaF_{2}:R^{3+}$ layers depending on the doping concentration of $R^{3+}$ and layer thickness were studied by reflection high-energy electron diffraction (RHEED). In aspect of application as buffer layer in semiconductor-related hybrid structure, the lattice displacement between $CaF_{2}:R^{3+}$ layers and $CaF_{2}$ (111) substrate was investigated by X-ray rocking curve analysis.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2001.10a
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• pp.298-303
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• 2001

Most of mechanical failures are caused by repeated loadings and therefore they are strongly related to fatigue. To avoid the failures caused by fatigue, determination of an optimal shape of a structure is one of the very important factors in the initial design stage. Shape optimization for a compact tension specimen in opening mode in fracture mechanics, was accomplished by the linear elastic fracture mechanics and the growth-strain method in this study. Also shape optimization for a cantilever beam in mixed mode was carried out by the same techniques. The linear elastic fracture mechanics was used to estimate stress intensity factors and fatigue lives. And the growth-strain method was used to optimize the shape of the initial shape of the specimens. From the results of the shape optimization, it was found that shapes of two types of specimens and a cantilever beam optimized by the growth-strain method prolong their fatigue lives very much. Therefore, it was verified that the growth-strain method is an appropriate technique for shape optimization of a structure having a crack.

• Computers and Concrete
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• v.4 no.2
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• pp.83-100
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• 2007

Applying a direct formulation for the enrichment of the displacement field an extended finite element (XFEM) scheme for modeling of cohesive crack growth is developed. Only elements cut by the crack is enriched and the scheme fits within the framework of standard FEM code. The scheme is implemented for the 3-node constant strain triangle (CST) and the 6-node linear strain triangle (LST). Modeling of standard concrete test cases such as fracture in the notched three point beam bending test (TPBT) and in the four point shear beam test (FPSB) illustrates the performance. The XFEM results show good agreement with results obtained by applying standard interface elements in FEM and with experimental results. In conjunction with criteria for crack growth local versus nonlocal computation of the crack growth direction is discussed.