• Title/Summary/Keyword: band gap

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Design of 0.6~6 GHz Ultra Wideband Quad-ridge Horn Antenna (0.6~6 GHz 초 광대역 쿼드릿지 혼 안테나 설계)

  • Choi, Cheoljin;Lee, Moonhee;Son, Taeho
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.68 no.1
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    • pp.77-82
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    • 2019
  • In this paper, a 0.6~6GHz quad-ridge horn antenna which can be used for the antenna measurement of 5.8GHz WiFi system from lowest frequency band of mobile LTE (Long Term Evolution) is designed and implemented. The quad-ridge horn antenna has quadruple ridges of exponential function, a back-short and a cavity. Based on this structure, we design the cavity size, ridge gap and feed gap to have broadband characteristics. For implementation, the plates material of aluminum and copper are used for the horn and four ridges, respectively. And the insulator supports are used to maintain the gap between ridges. By measurement, antenna has the gain of 6.2~13.35dBi with the return loss of less than -6dB (under VSWR 3 : 1) in the entire design band. The results of this study can be widely used to the antenna studies on the mobile communication including low frequency band of LTE, the EMI measurement and the standard calibration measurement.

Investigation of thermal annealing effects on the optical transparency and luminescent characteristics of Eu-doped Y2O3 thin films

  • Chung, Myun Hwa;Kim, Joo Han
    • Journal of Ceramic Processing Research
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    • v.20 no.4
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    • pp.431-435
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    • 2019
  • The thermal annealing effects on the optical transparency and luminescent characteristics of the Eu-doped Y2O3 thin films have been investigated. The as-deposited Y2O3:Eu films exhibited an optical band gap of 5.78 eV with a transparency of 89 % at a wavelength of 550 nm. As the annealing temperature increased from 1000 to 1300 ℃, the optical band gap and transparency of the films decreased from 5.77 to 4.91 eV and from 86.8 to 64.5 % at 550 nm, respectively. The crystalline quality of the films was improved with increasing annealing temperature. The annealed Y2O3:Eu films emitted a red-color photoluminescence (PL) with the highest emission peak near 612 nm. The PL intensity was increased with increasing annealing temperature to 1200 ℃, resulting from the improvement in the crystalline quality of the films. The PL intensity was decreased with further increasing temperature above 1200 ℃ due to the formation of Y2SiO5 phase by the reaction of the film with the quartz substrate.

Effect on Al Concentration of AlGaAs Ternary Alloy (AlGaAs합금의 Al 도핑농도에 대한 효과)

  • Kang, B.S.
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.4
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    • pp.125-129
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    • 2021
  • We investigated the electronic property and atomic structure for chalcopyrite (CH) AlxGa1-xAs semiconductor by using first-principles FPLMTO method. The CH-AlxGa1-xAs exhibits a p-type semiconductor with a direct band-gap. For low Al concentration unoccupied hole-carriers are induced, but for high Al concentration it is formed a localized bonding or anti-bonding state below Fermi level. The hybridization of Al(3s)-Ga(4s, or 4p) is larger than that of Al(3s)-As(4s, or 4p). And the Al film on As-terminated surface, Al/AsGa(001), is more energetically favorable one than that on Ga-terminated (001) surface. Consequently, the band-gap of CH-AlxGa1-xAs system increases exponentially with increasing Al concentration. The change of lattice parameter is shown two different configurations with increasing Al concentration. The calculated lattice parameters for CH-AlxGa1-xAs system are compared to the experimental ones of zinc-blend GaAs and AlAs.

The Growth and Optical Properties of $MgGa_2Se_4$ Single Crystal ($MgGa_2Se_4$ 단결정의 성장과 광학적 특성)

  • 김형곤;이광석;이기형
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.25 no.4
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    • pp.402-406
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    • 1988
  • The MgGa2Se4 single crystal for study of optical properties is for the first time grown by Bridgmna method. The crystal structure of grown MgGa2Se4 single crystal has the Rhomobohedral structure (R3m) and its lattice constant are a=3.950\ulcorner c=38.893\ulcornerin Hexagonal structure. The energy band structure of grown MgGa2Se4 single crystal structure has direct band gap and the optical energy gap measured from optical absorption in this crystal is 2.20eV at 290K. The temperature dependence of energy gap was given Eg(T)=Eg(O)-aT\ulcorner)B+T), from varshni equation, where Eg(O)=2.34eV, a=8.79x10**-4eV/and b=250K.

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Trends of Power Semiconductor Device (전력 반도체의 개발 동향)

  • Yun, Chong-Man
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.3-6
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    • 2004
  • Power semiconductor devices are being compact, high performance and intelligent thanks to recent remarkable developments of silicon design, process and related packaging technologies. Developments of MOS-gate transistors such as MOSFET and IGBT are dominant thanks to their advantages on high speed operation. In conjunction with package technology, silicon technologies such as trench, charge balance and NPT will support future power semiconductors. In addition, wide band gap material such as SiC and GaN are being studies for next generation power semiconductor devices.

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An Inset-Fed Microstrip Patch Antenna Having Modified Feeding Structure in the S-Band (급전구조를 변형한 5-Band용 INSET-FED 마이크로스트립 패치 안테나)

  • 정동근;이석문;하천수
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.6 no.6
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    • pp.897-903
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    • 2002
  • In this paper, a modified feeding structure for microstrip patch antenna is suggested for improving the performances. The proposed antenna has a gap between the transmission line and the recessed part of the radiating patch which makes a capacitive coupling. It shows higher 511(-l4dB) and lower cross polarization level(-2OdB) compare with the conventional inset ftd patch antenna while having a similar characteristics in another evaluating items. Experimental results are examined and considered to apply to the S-Band application, and the effectiveness has been confirmed by FDTD simulation and measurement simultaneously.

Fabrication of M-Doped TiO2 (M=Co, Cr, Fe) : Its Electronic Band Structure-(1) (M-Doped TiO2 (M=Co, Cr, Fe)의 제조 : 전자 밴드구조-(1))

  • Bae, Sang-Won;Kim, Hyun-Gyu;Ji, Sang-Min;Jang, Jum-Suk;Jeong, Euh-Duck;Hong, Suk-Joon;Lee, Jae-Sung
    • Journal of the Korean Ceramic Society
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    • v.43 no.1 s.284
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    • pp.22-27
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    • 2006
  • The electronic band structures of Metal-doped titanium dioxide, M-doped $TiO_2$ (M=Co, Cr, Fe), have been studied by using XRD, UV-vis diffuse reflectance spectrometer and FP-LAPW (Full-Potential Linearized Augmented-Plane-Wave) method. The UV-vis of M-doped $TiO_2$ (M=Co, Cr, Fe) showed two absorption edges; the main edge due to the titanium dioxide at 387 nm and a shoulder due to the doped metals at around 560 nm. The band gap energies of Co, Cr and Fe-doped $TiO_2$ calculated by FP-LAPW method were 2.6, 2.0, and 2.5 eV, respectively. The theoretically calculated band gap energy of $TiO_2$ by using FP-LAPW method was the same as experimental results. FP-LAPW method will be useful for fabrication and development of photo catalysts working under visible light.

Electronic Structure of the SrTiO3(001) Surfaces: Effects of the Oxygen Vacancy and Hydrogen Adsorption

  • Takeyasua, K.;Fukadaa, K.;Oguraa, S.;Matsumotob, M.;Fukutania, K.
    • Applied Science and Convergence Technology
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    • v.23 no.5
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    • pp.201-210
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    • 2014
  • The influence of electron irradiation and hydrogen adsorption on the electronic structure of the $SrTiO_3$ (001) surface was investigated by ultraviolet photoemission spectroscopy (UPS). Upon electron irradiation of the surface, UPS revealed an electronic state within the band gap (in-gap state: IGS) with the surface kept at $1{\times}1$. This is considered to originate from oxygen vacancies at the topmost surface formed by electron-stimulated desorption of oxygen. Electron irradiation also caused a downward shift of the valence band maximum indicating downward band-bending and formation of a conductive layer on the surface. With oxygen dosage on the electron-irradiated surface, on the other hand, the IGS intensity was decreased along with upward band-bending, which points to disappearance of the conductive layer. The results indicate that electron irradiation and oxygen dosage allow us to control the surface electronic structure between semiconducting (nearly-vacancy free: NVF) and metallic (oxygen de cient: OD) regimes by changing the density of the oxygen vacancy. When the NVF surface was exposed to atomic hydrogen, in-gap states were induced along with downward band bending. The hydrogen saturation coverage was evaluated to be $3.1{\pm}0.8{\times}10^{14}cm^{-2}$ with nuclear reaction analysis. From the IGS intensity and H coverage, we argue that H is positively charged as $H^{{\sim}0:3+}$ on the NVF surface. On the OD surface, on the other hand, the IGS intensity due to oxygen vacancies was found to decrease to half the initial value with molecular hydrogen dosage. H is expected to be negatively charged as $H^-$ on the OD surface by occupying the oxygen vacancy site.

GaN를 기반으로 하는 고분자 MDMO-PPV의 두께 변화와 온도에 따른 Photovoltaics의 효율 측정

  • Lee, Sang-Deok;Lee, Chan-Mi;Gwon, Dong-O;Sin, Min-Jeong;Lee, Sam-Nyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.305-305
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    • 2013
  • 태양전지는 무기태양전지와 유기태양전지 등이 연구 되고 있는데 [1] 그 중 유기물질의 장점(높은 수율, solution phase processing, 저비용으로 전력 생산)과 무기재료의 장점(높은 전자 이동도, 넓은 흡수 범위, 우수한 환경 및 열 안정성)을 융합함으로써 장기적 구조안정성의 확보와 광전변환의 고 효율화를 동시에 달성하기 위한 유기무기 하이브리드 태양전지가 최근 큰 관심을 끌고 있다[2]. 본 연구에서는 hybrid photovoltaics에 유기물 MDMO-PPV와 전도성 고분자 PEDOT:PSS를 무기물 GaN 위에 spin coating 하여 두께에 다른 효율을 측정하였다. 유기물 MDMO-PPV는 p-형으로 클로로벤젠, 톨루엔과 같은 유기 용매에 잘 녹으며 HOMO 5.33eV, LUMO 2.97eV, energy band gap 2.4eV이며 99.5%의 순도 물질을 사용하였다. 또한 정공 수송층(hole transport layer, HTL)으로 PEDOT:PSS를 사용하였으며, HOMO 5.0eV, LUMO 3.6eV, energy band gap 1.4eV를 가지며 증류수나 에탄올과 같은 수용성 용매에 잘 녹는 특성을 가지고 있다. 무기물은 III-V 족 물질 n-GaN(002)을 사용하였고 valence band energy 1.9eV, conduction band energy 6.3eV, energy band gap 3.4eV, 높은 전자 이동도와 높은 포화 속도, 광전자 소자에 유리한 광 전기적 특성을 가지고 있다. 기판으로는 GaN와 격자 부정합도와 열팽창계수 부정합도가 큰 Sapphire (Al2O3) 이종 기판을 사용하였다. 전극으로 Au를 사용하였으며 E-beam증착하였다. Reflector로서 Al를 thermal evaporator로 증착하였다 [3]. 실험 과정은 두께에 따른 효율을 알아보기 위해 MDMO-PPV를 900~1,500 rpm으로 spin coating 하였고, 열처리에 따른 효율을 알아보기 위해 열처리 온도 조건을 $110{\sim}170^{\circ}C$의 변화를 주었다. FE-SEM으로 표면과 단면을 관찰하였으며 J-V 특성을 알아보기 위해 각 샘플마다 solar simulator를 사용하여 측정하였고 그 결과를 논의하였다.

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Isogeometric Optimal Design of Kelvin Lattice Structures for Extremal Band Gaps (극대화된 밴드갭을 갖는 켈빈 격자 구조의 아이소-지오메트릭 최적 설계)

  • Choi, Myung-Jin;Oh, Myung-Hoon;Cho, Seonho;Koo, Bonyong
    • Journal of the Computational Structural Engineering Institute of Korea
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    • v.32 no.4
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    • pp.241-247
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    • 2019
  • A band gap refers to a certain frequency range where the propagation of mechanical waves is prohibited. This work focuses on engineering three-dimensional Kelvin lattices having external band gaps at low audible frequency ranges using a gradient-based design optimization method. Elastic wave propagation in an infinite periodic lattice is investigated by employing the Bloch theorem. We model the ligaments using a shear-deformable beam model obtained by consistent linearization in a geometrically exact beam theory. For a given lattice topology, we enlarge band gap sizes by controlling the configuration of the beam neutral axis and cross-section thickness that are smoothly parameterized by B-spline basis functions within the isogeometric analysis framework.