• 제목/요약/키워드: anti-reflective

검색결과 87건 처리시간 0.029초

반사방지 나노구조의 성형성과 광학적 특성에 대한 이형 온도의 영향 (Effects of Demolding Temperature on Formability and Optical Properties of Anti-reflective Nanostructure)

  • 여나은;심영보;조상욱;김두인;김기남;장경수;정명영
    • 마이크로전자및패키징학회지
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    • 제23권2호
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    • pp.91-96
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    • 2016
  • 본에서는 저반사 나노구조 필름의 열 나노임프린트 공정 최적화를 위해 나노구조의 성형성과 광학적 특성에 대한 이형 온도의 영향을 평가하였다. 이형 온도에 따른 광학적 특성을 평가한 결과 $70^{\circ}C$까지는 이형 온도가 증가함에 따라 투과율과 반사율 특성이 향상되는 거동을 보였으나 그 이후에는 오히려 투과율이 감소하고 반사율이 증가하는 경향을 보였다. 이와 같은 이형온도에 따른 거동은 성형성에도 유사하게 관찰되었으며 자유체적 형성과 고분자 유동에 의한 것으로 보인다. 따라서, 이형 온도에 따라 고분자의 유동과 자유체적의 형성에 의한 패턴의 성형성이 결정되며, 이로 인해 광학적 특성에 영향을 줄 수 있음을 확인하였다.

콜로이드 실리카 나노입자의 부착에 의한 반사방지막 제조 및 굴절율 조절 (Convective Deposition of Silica Nano-Colloidal Particles and Preparation of Anti-Reflective Film by Controlling Refractive Index)

  • 황연
    • 한국재료학회지
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    • 제15권5호
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    • pp.285-292
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    • 2005
  • Anti-reflection film was coated by using spherical silica nano colloids. Silica colloid sol was reserved between two inclined slide glasses by capillary force, and particles were convectively stacked to form a film onto the substrate as the water evaporates. As the sliding speed increased, the thickness of the film decreased and the wavelength at the maximum transmittance decreased. The microstructure observed by SEM showed that silica particles were nearly close packed, which enabled the calculation of the effective refractive index of the film. The film thickness was measured by proffer and calculated from the wavelength of maximum transmittance and the effective refractive index. The effective refractive index of the film could be controlled by a subtle controlling of the coating speed and by mixing two different sized silica particles. When the 100 nm and 50 m particles were mixed at 4:1-5:1 volume ratio, the maximum transmittance of $95.2\%$ for one-sided coating was obtained. This is the one that has increased by $3.8\%$ compared to bare glass substrate, and shows that $99.0\%$ of transmittance or $1.0\%$ of reflectance can be achieved by the simple process if both sides of the substrate are coated.

Reflectivity Control at Substrate / Photoresist Interface by Inorganic Bottom Anti-Reflection Coating for Nanometer-scaled Devices

  • Kim, Sang-Yong;Kim, Yong-Sik
    • Transactions on Electrical and Electronic Materials
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    • 제15권3호
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    • pp.159-163
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    • 2014
  • More accurate CD (Critical Dimension) control is required for the nanometer-scaled devices. However, since the reflectivity between substrate and PR (Photoresist) becomes higher, the CD (Critical Dimension) swing curve was intensified. The higher reflectivity also causes PR notching due to the pattern of sub-layer. For this device requirement, it was optimized for the thickness, refractive index(n) and absorption coefficient(k) in the bottom anti-reflective coating(BARC; SiON) and photoresist with the minimum reflectivity. The computational simulated conditions, which were determined with the thickness of 33 nm, n of 1.89 and k of 0.369 as the optimum condition, were successfully applied to the experiments with no standing wave for the 0.13um-device. At this condition, the lowest reflectivity was 0.44%. This optimum condition for BARC SiON film was applied to the process for 0.13um-device. The optimum SiON film as BARC to PR and sub-layer could be formed with the accurate CD control and no standing waver for the nanometer-scaled semiconductor manufacturing process.

Sol-gel법에 의한 단층 반사 방지막 제조 (Fabrication of Single Layer Anti-reflection Thin Film by Sol-gel Method)

  • 박종국;전대우;이미재;임태영;황종희;배동식;김진호
    • 한국전기전자재료학회논문지
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    • 제28권12호
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    • pp.821-825
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    • 2015
  • Anti-reflective (AR) thin film was fabricated on a glass substrate by sol-gel method. The coating solution was synthesized with TEOS (tetraethlyorthosilicate) and poly ethylene glycol (PEG, 4.0 wt%). As the withdrawal speed of coating was changed from 0.1 mm/sec to 0.3 mm/sec, the thickness and refractive index of prepared thin films were changed. The reflectance and transmittance of coating glass fabricated by the withdrawal speed of 0.1 mm/sec were 0.62% and 95.0% in visible light range. The refractive index and thickness of single layer thin film were n= 1.29 and ca. 99.0 nm.

졸-겔 스핀코팅법에 의한 반사방지 및 정전기방지 복층막의 제조 및 특성 (Preparation and Characterization of Anti-reflective and Anti-static Double Layered Films by Sol-Gel Spin-Coating Method)

  • 이준종;최세영
    • 한국세라믹학회지
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    • 제34권1호
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    • pp.79-87
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    • 1997
  • 졸-겔 스핀코팅법을 이용하여 VDT 기판에 반사방지 및 정전기방지 복층막을 코팅하고 코팅졸과 겔분말의 특성 및 코팅막의 전기적, 광학적, 기계적 특성을 조사하였다. 1층막은 복층막의 간섭조건을 만족시키는 굴절율을 얻기위해 투명 전도성 재료인 ATO(Antimony doped Tin Oxide) 졸과 SiO2 졸을 몰비 68:32로 혼합한 ATO-SiO2 복합졸을, 2층막에는 저굴절율의 SiO2 졸을 사용하였다. 각 코팅막을 45$0^{\circ}C$에서 30분간 열처리하였을 때 잔류 유기물은 완전히 제거되었다. ATO막의 표면저항은 3mol%의 Sb 첨가시 약 6$\times$107$\Omega$/$\square$로 최소를 나타내었고 SiO2 졸과의 혼합시 약 30mol% 까지는 표면저항이 완만히 증가하다가 그 이후에는 급격히 증가하는 경향을 나타내었으며, 간섭조건을 만족시키는 조성인 32mol%에서는 약 3$\times$108$\Omega$/$\square$를 나타내었다. 복층막의 반사율은 550nm의 기준파장에서 약 0.64%를 나타내었으며 광투과율은 약 3.20% 증가하였다. 복층막의 미소경도는 약 471.4kg.f/mm2로 코팅하지 않은 VDT기판의 경도와 유사한 값을 나타내었다.

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Amelioration of $Cd^{++}$ Toxicity by $Ca^{++}$ on Germination, Growth and Changes in Anti-Oxidant and Nitrogen Assimilation Enzymes in Mungbean(Vigna mungo) Seedlings

  • Kochhar Sunita;Ahmad Gayas;Kochhar Vinod Kumar
    • Journal of Plant Biotechnology
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    • 제6권4호
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    • pp.259-264
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    • 2004
  • The present study describes the ameliorating effect of $Ca^{++}\;on\;Cd^{++}$ toxicity on the germination, early growth of mungbean seedlings, nitrogen assimilation enzyme. s-nitrate reductase (NR), nitrite reductase (NIR), anti-oxidant enzymes (POD, CAT and SOD) and on the accumulation of hydrogen peroxide and sulphydryls. $Cd^{++}$ inhibited seed germination and root and shoot length of seedlings. While NR activity was down- regulated, the activities of NIR, POD and SOD were up- regulated with $Cd^{++}$ treatment. $Cd^{++}$ treatment also increased the accumulation of sulphydryls and peroxides, which is reflective of increased thiol rich proteins and oxidative stress. $Ca^{++}$ reversed the toxic effects of $Cd^{++}$ on germination and on early growth of seedlings as well as on the enzyme activities, which were in turn differentially inhibited with a combined treatment with calcium specific chelator EGTA. The results indicate that the external application of $Ca^{++}$ may increase the tolerance capacity of plants to environmental pollutants by both up and down regulating metabolic activities. Abbreviations: $Cd^{++}= cadmium,\;Ca^{++} = calcium$, NR= nitrate reductase, NIR=nitrite reductase, POD = peroxidse, SOD= superoxide dismutase, CAT= catalase, EGTA= ethylene glycol-bis( $\beta-aminoethyl ether$)-N,N,N,N-tetraacetic acid.

AlTiO 선택적 투과막의 광학적 특성 개선

  • 정소운;방기수;임정욱;이승윤
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.334-334
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    • 2012
  • 태양전지 기술은 우주 항공에서부터 핸드폰과 같은 소규모 가전 시설에까지 폭 넓게 사용되고 있다. 현재 태양전지 기술은 기존의 화석 에너지에 비해 효율 측면에서의 열세함으로 인해 변환 효율을 높이는 연구가 진행되고 있다. 태양전지의 기본 구조에서 고반사막을 대신하여 선택적 투과막을 채용하면 적외선 영역은 광흡수층으로 재반사시키고 가시광선 영역은 선택적으로 투과시킬 수 있기 때문에 태양전지의 변환 효율을 높임과 동시에 채광에 유리한 투명 태양전지를 얻을 수 있다. 본 연구에서는 반응성 분위기에서 AlTi 단일 타겟을 스퍼터링하여 유리 기판 위에 AlTiO 선택적 투과막을 형성하고 광학적 특성을 평가하였다. 기존의 연구에서 스퍼터링으로 형성한 AlTiO 선택적 투과막은 가시광선 영역에서 약 30%의 비교적 높은 반사율을 나타내었다. 이번 연구에서는 광학 두께를 조절함으로써 가시광선 영역에서 반사율이 평균 20% 이상 감소하고 적외선 영역에서 약 30% 이상의 반사율을 나타내는 선택적 투과막을 형성한 결과를 보고한다.

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AR Coating에 따른 고출력 반도체 레이저의 특성변화 (Characteristic ependences of High Power Semiconductor Laser on AR Coating)

  • 오윤경;곽계달
    • 전자공학회논문지A
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    • 제32A권11호
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    • pp.29-34
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    • 1995
  • Mirror coating is applied to laser facets to improve properties of edge emitting laser diodes. In this experiment, InGaAsP/GaAs high power laser diodes were studied with respect to different degrees of anti-reflective coating. Sputterred $Al_{2}$O$_{3}$ was used as the coating material and the HR coating was kept constant at 90%. Threshold current density, differential quantum efficiency, emission wavelength and the operating current at 500mW were measured for a range of AR coating and compared with theoretically calculated values; that showed good agreements. Precise wavelength control is important for laser diodes for solid state pumping because of small absorption bandwidth. In addition, since these lasers operate under CW condition, a lowest possible operating current for a given power is desired in order to minimize the heat produced. From the results of this experiment, we were able to obtain a optimum range of AR coatings for minimum operating current. The wavelength can be varied up to 4nm within this range.

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ArF 포토리소그라피공정을 위한 실리콘이 함유된 반사방지막코팅 (Silicon Containing Bottom Anti-Reflective Coating for ArF Photolithography)

  • 이준호;김형기;김명웅;임영택;박주현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.66-66
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    • 2006
  • Development of ArF Photo-lithography process has proceeded with the increase of numerical aperature (NA) and the decrease of resist thickness. It makes many problems such as cost and process complexity. A novel spin-on hard mask system is proposed to overcome many problems Spin-on hard mask composed of two layers of siloxane and carbon. The optical thickness of two layers is designed from reflectivity measurement at specified n, k respectively. The property of photo-resist shows different results according to Si contents. Si-contents was measured XPS(X-ray Photoelectron spectroscopy).

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태양전지모듈적용 투명유리의 광특성 분석 (The Analysis of Optical Characteristics of Glasses for PV Module Application)

  • 김경수;강기환;유권종
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2008년도 춘계학술발표대회 논문집
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    • pp.98-103
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    • 2008
  • The glass for crystalline PV module fabrication should have high thermal and mechanical resistance to environmental also have high transparency. In this paper, we analyze the optical characteristics of glasses for photovoltaic module application. The transmittance of several glasses are measured. The effects of texturing on low iron glass, glass thickness, anti-reflective glass, photocatalyst-treated glass and special glass are compared each other. Then this will give some information to select PV glass for manufacturing. The detailed analysis is described in the following paper.

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