• 신재생에너지
• /
• 제16권3호
• /
• pp.1-12
• /
• 2020

Shingled technology is the latest cell interconnection technology developed in the photovoltaic (PV) industry due to its reduced resistance loss, low-cost, and innovative electrically conductive adhesive (ECA). There are several advantages associated with shingled technology to develop cell to module (CTM) such as the module area enlargement, low processing temperature, and interconnection; these advantages further improves the energy yield capacity. This review paper provides valuable insight into CTM loss when cells are interconnected by shingled technology to form modules. The fill factor (FF) had improved, further reducing electrical power loss compared to the conventional module interconnection technology. The commercial PV module technology was mainly focused on different performance parameters; the module maximum power point (Pmpp), and module efficiency. The module was then subjected to anti-reflection (AR) coating and encapsulant material to absorb infrared (IR) and ultraviolet (UV) light, which can increase the overall efficiency of the shingled module by up to 24.4%. Module fabrication by shingled interconnection technology uses EGaIn paste; this enables further increases in output power under standard test conditions. Previous research has demonstrated that a total module output power of approximately 400 Wp may be achieved using shingled technology and CTM loss may be reduced to 0.03%, alongside the low cost of fabrication.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
• /
• pp.421.2-421.2
• /
• 2016

고효율 태양전지에서 후면 반사 방지막은 장파장대(900nm~1200nm) 빛의 내부 반사를 증가시켜 광흡수도를 개선한다. 태양전지 후면에 박형 절연층 구조를 구성함으로써 특정 파장에서 높은 반사도를 얻을 수 있는 Bragg mirror 구조를 이론적으로 계산할 수 있다. Bragg mirror 구조를 이용하여 태양전지의 후면 반사층(Rear reflector layer)을 형성함으로써 태양전지 내부의 광흡수도를 개선할 수 있다. 후면 반사 방지막(Rear anti-reflection coating)으로 사용되는 Al2O3와 SiOxNy 또는 이러한 두 가지 물질의 겹층 구조를 구성하여 장파장대 빛의 반사도 차이에 의한 광흡수도 개선 정도를 광학 시뮬레이션을 통해 계산하였다. 광학 시뮬레이션은 TCAD를 이용하였으며 두 가지 겹층 구조에서 각 반사 방지막의 두께에 따른 단락 전류(Jsc)의 개선 정도, 후면 반사층 두께의 최적화 조건을 계산하였다. 후면 반사방지막을 제외한 기본적인 태양전지 구조는 n-type PERC 구조를 사용하였으며, 후면 반사방지막만의 광학적 특성을 살펴보기 위해 전극은 광학적으로 투명하다고 가정하였다. 반사방지막 두께의 범위는 Al2O3(5-30nm), SiNx(150-300nm), SiOxNy(150-300nm)에서 수행하였으며, 각각 1nm, 2nm 간격으로 진행하였다. Al2O3/SiOxNy 구조에서는 단락 전류가 32.45-32.87mA/cm2 값을 가진다. Al2O3/SiNx 구조에서는 단락 전류가 32.59-32.87mA/cm2 값을 가진다. 결론적으로, 후면 반사방지막의 겹층 구조를 통해 광흡수도를 증가 시킬 수 있으며, TCAD 시뮬레이션을 통하여 입사되는 태양광 스펙트럼에 최적화된 구조를 설계할 수 있다.

• 한국정밀공학회지
• /
• 제32권10호
• /
• pp.897-902
• /
• 2015

This study reports on a uniform resin coating method by using a doctor blade type dispenser. For high productivity, continuous imprint-lithography has been studied, and developed fabrication systems are used in several applications such as anti-reflection films, dry adhesives, and water collecting surfaces. In the continuous fabrication field, researchers have typically focused on patterning and demolding procedures. During the roll-to-roll fabrication process, however, the uniform resin coating process is also important in order to obtain a high quality product, which can be evaluated by uniform thickness, precise geometric expressions, and a thin residual layer. To achieve these, a doctor blade type dispenser was designed and fabricated. As a result, thickness of coated resin was well controlled by modulating the flow rate of the resin and blading gap. In addition, a very thin layer coating process (${\sim}10{\mu}m$) was achieved by softly contacting the blade on the substrate.

• 한국신재생에너지학회:학술대회논문집
• /
• 한국신재생에너지학회 2011년도 춘계학술대회 초록집
• /
• pp.112.1-112.1
• /
• 2011

The back contact solar cell (BCSC) has several advantages compared to the conventional solar cell since it can reduce grid shadowing loss and contact resistance between the electrode and the silicon substrate. This paper presents the effect of the surface texturing of the silicon BCSC by varying the texturing depth or the texturing gap in the commercially available simulation software, ATHENA and ATLAS of the company SILVACO. The texturing depth was varied from $5{\mu}m$ to $150{\mu}m$ and the texturing gap was varied from $1{\mu}m$ to $100{\mu}m$ in the simulation. The resulting efficiency of the silicon BCSC was evaluated depending on the texturing condition. The quantum efficiency and the I-V curve of the designed silicon BCSC was also obtained for the analysis since they are closely related with the solar cell efficiency. Other parameters of the simulated silicon BCSC are as follows. The substrate was an n-type silicon, which was doped with phosphorous at $6{\times}10^{15}cm^{-3}$, and its thickness was $180{\mu}m$, a typical thickness of commercial solar cell substrate thickness. The back surface field (BSF) was $1{\times}10^{20}\;cm^{-3}$ and the doping concentration of a boron doped emitter was $8.5{\times}10^{19}\;cm^{-3}$. The pitch of the silicon BCSC was $1250{\mu}m$ and the anti-reflection coating (ARC) SiN thickness was $0.079{\mu}m$. It was assumed that the texturing was anisotropic etching of crystalline silicon, resulting in texturing angle of 54.7 degrees. The best efficiency was 25.6264% when texturing depth was $50{\mu}m$ with zero texturing gap in case of low texturing depth (< $100{\mu}m$).

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
• /
• pp.230-230
• /
• 2013

In amorphous or microcrystalline thin-film silicon solar cells, p-i-n structure is used instead of p/n junction structure as in wafer-based Si solar cells. Hence, these p-i-n structured solar cells inevitably consist of many interfaces and the cell efficiency critically depends on the effective control of these interfaces. In this study, in-situ plasma treatment process of the interfaces was developed to improve the efficiency of a-Si:H solar cell. The p-i-n cell was deposited using a single-chamber VHF-PECVD system, which was driven by a pulsed-RF generator at 80 MHz. In order to solve the cross-contamination problem of p-i layer, high RF power was applied without supplying SiH4 gas after p-layer deposition, which effectively cleaned B contamination inside chamber wall from p-layer deposition. In addition to the p-i interface control, various interface control techniques such as thin layer of TiO2 deposition to prevent H2 plasma reduction of FTO layer, multiple applications of thin i-layer deposition and H2 plasma treatment, H2 plasma treatment of i-layer prior to n-layer deposition, etc. were developed. In order to reduce the reflection at the air-glass interface, anti-reflective SiO2 coating was also adopted. The initial solar cell efficiency over 11% could be achieved for test cell area of 0.2 $cm^2$.

• Current Photovoltaic Research
• /
• 제2권4호
• /
• pp.173-176
• /
• 2014

We have investigated the seed layer formation of front side contact using the inkjet printing process. Conductive silver ink was printed on textured Si wafers with 80 nm thick $SiN_x$ anti reflection coating (ARC) layers and thickened by light induced plating (LIP). The inkjet printable sliver inks were specifically formulated for inkjet printing on these substrates. Also, a novel method to prepare nano-sized glass frits by the sol-gel process with particle sizes around 5 nm is presented. Furthermore, dispersion stability of the formulated ink was measured using a Turbiscan. By implementing these glass frits, it was found that a continuous and uniform seed layer with a line width of $40{\mu}m$ could be formed by a inkjet printing process. We also investigated the contact resistance between the front contact and emitter using the transfer length model (TLM). On an emitter with the sheet resistance of $60{\Omega}/sq$, a specific contact resistance (${\rho}_c$) below $10m{\Omega}{\cdot}cm^2$ could be achieved at a peak firing temperature around $700^{\circ}C$. In addition, the correlation between the contact resistance and interface microstructures were studied using scanning electron microscopy (SEM). We found that the added glass particles act as a very effective fire through agent, and Ag crystallites are formed along the interface glass layer.

• E2M - 전기 전자와 첨단 소재
• /
• 제9권5호
• /
• pp.463-469
• /
• 1996

The double insulating layer consisting of anodic oxide and ZnS was formed for HgCdTe metal insulator semiconductor(MIS) structure. ZnS was evaporated on the anodic oxide grown in H$_{2}$O$_{2}$ electrolyte. Recently, this insulating mechanism for HgCdTe MIS has been deeply studied for improving HgCdTe surface passivation. It was found through TEM observation that an interface layer is formed between ZnS and anodic oxide layers for the first time in the study of this area. EDS analysis of chemical compositions using by electron beam of 20.angs. in diameter and XPS depth composition profile indicated strongly that the new interface is composed of ZnO. Also TEM high resolution image showed that the structure of oxide layer has been changed from the amorphous state to the microsrystalline structure of 100.angs. in diameter after the evaporation of ZnS. The double insulating layer with the resistivity of 10$^{10}$ .ohm.cm was estimated to be proper insulating layer of HgCdTe MIS device. The optical reflectance of about 7% in the region of 5.mu.m showed anti-reflection effect of the insulating layer. The measured C-V curve showed the large shoft of flat band voltage due to the high density of fixed oxide charges about 1.2*10$^{12}$ /cm$^{2}$. The oxygen vacancies and possible cationic state of Zn in the anodic oxide layer are estimated to cause this high density of fixed oxide charges.

• 전자공학회논문지D
• /
• 제36D권7호
• /
• pp.66-79
• /
• 1999

본 논문에서는 얕은 양자 우물(extremely shaliow quantum wells, ESQWs)을 사용한 광 쌍안정 대칭형 자기 전광 소자(symmetric self elctrooptic effect device, S-SEED)의 성능에 있어서 높은 입사 광전력의 영향을 조사한다 . 다음과 같은 네 가지 ESQWs S-SEED 구조를 고려하였다. 무 반사 입힘(AR-coated) ESQWs S-SEED, back-to-back ARcoated ESQWs S-SEED, 비대칭 공명구조(AFP) ESQWs S-SEED, back-toback AFP ESQWs S-SEED. 입사 광 전력이 증가함에 따라 On/Off 대조비, On/Off 반사율 차이와 같은 소자성능은 ohmic heating 과 여기자 포화(exciton saturation)의 영향으로 심각하지 않게 저하된다. 한편 소자의 스위칭 속도는 지속적으로 증가하다가 특정 입사 광 전력 하에서 점차 감소하기 시작한다. 직렬 광 연결 시스템(cascading optical interconnection system)에 있어서 소자의 최대 속도 스위칭 동작을 위한 최대 입사 광 전력의 최적화를 바탕으로 0 V와 5 V의 외부 전압 조건에서 양자우물의 수를 변화시키면서 $5{\times}5{\mu}m^2$의 mesa 영역에 대하여 네 가지 ESQWs S-SEED의 시스템 비트 레이트를 모의 실험하고 그 결과를 분석하였다.

• 한국결정성장학회지
• /
• 제6권2호
• /
• pp.263-274
• /
• 1996

타이타늄 옥사이드층을 태양전지의 표면 보호막으로 사용시, 그 적합성에 대해 조사하였다. 스프레이법으로 형성된 타이타늄 옥사이드의 박막층은 태양전지 제조 과정중 사용되는 화학약품에 잘 견디며, 이 층을 사용함으로서 고온산화공정을 줄일 수 있다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
• /
• pp.280-284
• /
• 2004

Multicrystalline silicon wafers were textured in an alkaline bath, basically using sodium hydroxide and in acidic bath, using mainly hydrofluoric acid (HF), nitric acid $(HNO_3)$ and de-ionized water (DIW). Some wafers were also acid polished for the comparative study. Comparison of average reflectance of the samples treated with the new recipe of acidic solution showed average diffuse reflectance less than even 5 percent in the optimized condition. Solar cells were thus fabricated with the samples following the main steps such as phosphorus doping for emitter layer formation, silicon nitride deposition for anti-reflection coating by plasma enhanced chemical vapor deposition (PECVD) and front surface passivation, screen printing metallization, co-firing in rapid thermal processing (RTP) Furnace and laser edge isolation and confirmed >14 % conversion efficiency from the best textured samples. This isotropic texturing approach can be instrumental to achieve high efficiency in mass production using relatively low cost silicon wafers as starting material.