• Title/Summary/Keyword: anodization

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Effects of Current Density and Anodization Time on the Properties of Porous Si (양극산화 시간 및 전류밀도 변화에 따른 다공질 실리콘의 특성 변화)

  • Choi, Hyun-Young;Kim, Min-Su;Kim, Ghun-Sik;Cho, Min-Young;Jeon, Su-Min;Yim, Kwang-Gug;Lee, Dong-Yul;Kim, Jin-Soo;Kim, Jong-Su;Leem, Jae-Young
    • Journal of the Korean institute of surface engineering
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    • v.43 no.3
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    • pp.121-126
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    • 2010
  • The PS(porous Si) were fabricated with different anodization time and current density. The structural and optical properties of PS were investigated by SEM(scanning electron microscopy), AFM(atomic force microscopy), and PL(photoluminescence). It is found that the pore size and surface roughness of PS are proportional to the current density. The PL spectra show that the PL peak position is red-shifted with increasing anodization time. This behavior corresponds to the change of pore size which is consistent with the quantum confinement model. The FWHM(full width at half maximum) of PL peak is decreased from 97 to 51 nm and the PL peak position is blue-shifted with increasing current density up to 10 mA/$cm^2$. The PL peak intensity of the PS fabricated under 1 mA/$cm^2$ is the highest among samples.

Electrochemical Properties of Metal Aluminum and Its Application (금속알루미늄의 전기화학적 성질과 응용)

  • Tak, Yongsug;Kang, Jinwook;Choi, Jinsub
    • Applied Chemistry for Engineering
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    • v.17 no.4
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    • pp.335-342
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    • 2006
  • Metal aluminum, of which has a low standard reduction potential, participates in the electrochemical oxidation reaction and results in the structural change and accompanying property variation of aluminum and its oxide film. Aluminum was electrochemically etched in acid solution and the surface area was magnified by the formation of high density etch pits. Etched aluminum was covered with a compact and dense dielectric oxide film by anodization and applied to the capacitor electrode. Anodization of aluminum in acid solution at low temperature makes a nanoporous aluminum oxide layer which can be used for the fabrication template of nanostructural materials. Electrochemical characteristics of aluminum turn the metal aluminum into functional materials and it will bring the diverse applications of metal aluminum.

Effects of applied voltages on nano-structures of anodized metal oixdes and their electrochromic applications (인가 전압에 따른 양극산화된 금속 산화물의 나노 구조 변화와 전기변색 응용)

  • Kim, Tae-Ho;Lee, Jae-Uk;Kim, Byeong-Seong;Jeon, Hyeong-Jin;Na, Yun-Chae
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.115.1-115.1
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    • 2016
  • Electrochemical anodization has been interested due to its useful way for the nano-scale architecture of metal oxides obtained from a metal substrate. By using this method, it is easy to control the morphology of the oxide materials by controlling electrochemical conditions. Among oxide materials obtained from the transition metals such as Ti, V, W, etc., in this paper, the morphological study of anodized $TiO_2$ was employed at various voltage conditions in fluoric based electrolyte, and the effects of applied voltage (sweep rate and retention time) on the tube morphologies were investigated. Furthermore, by using anodization of tungsten substrate (W), we fabricated the porous structure of $WO_3$ and provided merits of tailored structure for the hybridization of inorganic and organic materials as electrochromic (EC) applications. The hybrid porous $WO_3$ shows multi-chromic properties during the EC reactions at specific voltage conditions. From these results, the anodization process with tailoring nano-structure is one of the promising methods for EC applications.

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Effects of In-situ doping Concentration on the Characteristics of Porous 3C-SiC Thin Films (In-situ 도핑량이 다공성 3C-SiC 박막의 특성에 미치는 영향)

  • Kim, Kang-San;Chung, Gwiy-Sang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.6
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    • pp.487-490
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    • 2010
  • This paper describes the elecrtical and optical characteristics of $N_2$ doped porous 3C-SiC films. Polycrystalline 3C-SiC thin films are anodized by $HF+C_2H_5OH$ solution with UV-LED exposure. The growth of in-situ doped 3C-SiC thin films on p-type Si (100) wafers is carried out by using APCVD (atmospheric pressure chemical vapor deposition) with a single-precursor of HMDS (hexamethyildisilane: $Si_2(CH_3)_6)$. 0 ~ 40 sccm $N_2$ was used for doping. After the growth of doped 3C-SiC, porous 3C-SiC is formed by anodization with $7.1\;mA/cm^2$ current density for anodization time of 60 sec. The average pore diameter is about 30 nm, and etched area is increased with $N_2$ doping rate. These results are attributed to the decrease of crystallinity by $N_2$ doping. Mobility is dramatically decreased in porous 3C-SiC. The band gaps of polycrystalline 3C-SiC films and doped porous 3C-SiC are 2.5 eV and 2.7 eV, respectively.

Formation of Porous Si by Indirect Electrode Anodization (간접전극 양극산화에 의한 다공성 실리콘의 형성)

  • Kim, Soon-Kyu;Chang, Joon-Yeon
    • Journal of the Korean Vacuum Society
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    • v.15 no.3
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    • pp.273-279
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    • 2006
  • This study explored the possibility of porous Si (PS) formed by indirect electrode anodization used for effective isolation material for radio frequency integrated circuits (RFIC). We investigated the effect of current density and reaction time on the porosity size and depth, and X-ray diffraction of bulk Si and porous Si to evaluate the change in lattice parameter. Porosity size and depth usually increases with an increase in the current density and reaction time. PS increases the lattice parameter of Si compared to the bulk Si which causes the compressive stress of around 8 MPa. PS formed by the method is believed to be suitable for isolation material for RFIC because it is simple process as well as good compatibility to Si VLSI process.

Wire-like Bundle Arrays of Copper Hydroxide Prepared by the Electrochemical Anodization of Cu Foil

  • La, Duc-Duong;Park, Sung-Yeol;Choi, Young-Wook;Kim, Yong-Shin
    • Bulletin of the Korean Chemical Society
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    • v.31 no.8
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    • pp.2283-2288
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    • 2010
  • Nanostructured copper compounds were grown by electrochemical anodization of copper foil in aqueous NaOH under varying conditions including electrolyte concentration, reaction temperature, current density, and reaction time. Their morphology and atomic composition were investigated by using SEM, TEM, XRD, EDS and XPS. At the conditions ([NaOH] = 1 M, $20^{\circ}C$, $2\;mA\;cm^{-2}$), wire-like orthorhombic $Cu(OH)_2$ nanobundles with an average width of 100 - 300 nm and length of $10\;{\mu}m$ were synthesized with the preferential [100] growth direction. Furthermore, when the concentration decreased to 0.5 M NaOH, the 1D nanobundle structure became narrower and longer without any change in compositions or crystalline structure. Side reaction pathways appeared to compete with the 1D nanostructure formation channels: the formation of CuO nanoleaves at $50^{\circ}C$ via the sequential dehydration of $Cu(OH)_2$, CuO/$Cu_2O$ aggregates in 4 M NaOH, and $Cu_2O$ nanoparticles and CuO nanosheets at lower current density.

Fabrication of Nanometer-sized Pattern on PMMA Plate Using AAO Membrane As a Template for Nano Imprint Lithography (AAO 나노기공을 나노 임프린트 리소그래피의 형틀로 이용한 PMMA 나노패턴 형성 기술)

  • Lee, Byoung-Wook;Hong, Chin-Soo;Kim, Chang-Kyo
    • Journal of Institute of Control, Robotics and Systems
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    • v.14 no.5
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    • pp.420-425
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    • 2008
  • PMMA light guiding plate with nano-sized pattern was fabricated using anodized aluminum oxide membrane as a template for nano imprint lithography. Nano-sized pore arrays were prepared by the self-organization processes of the anodic oxidation using the aluminum plate with 99.999% purity. Since the aluminum plate has a rough surface, the aluminum plate with thickness of 1mm was anodized after the pre-treatments of chemical polishing, and electrochemical polishing. The surface morphology of the alumina obtained by the first anodization process was controlled by the concentration of electrochemical solution during the first anodization. The surface morphology of the alumina was also changed according to temperature of the solution during chemical polishing performed after first anodization. The pore widening process was employed for obtaining the one-channel with flat surface and height of the channel because the pores of the alumina membrane prepared by the fixed voltage method shows the structure of two-channel with rough surface. It is shown from SPM results that the nano-sized pattern on PMMA light guiding plate fabricated by nano imprint lithography method was well transferred from that of anodized aluminum oxide template.

Effect of Equal Channel Angular Pressing on the Pitting Corrosion Resistance of Hard Anodized Al5052 Alloy (경질양극산화를 실시한 Al5052합금의 내공식성에 미치는 ECAP의 영향)

  • Son, Injoon
    • Journal of the Korean institute of surface engineering
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    • v.48 no.4
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    • pp.142-148
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    • 2015
  • The effect of equal channel angular pressing (ECAP) on the pitting corrosion resistance of hard anodized Al5052 alloy was investigated. The degree of internal stress generated in anodic oxide films during hard anodization was also evaluated with a strain gauge method. The pitting corrosion resistance of hard anodized Al5052 alloy was greatly decreased by ECAP. Cracks occurred in the anodic oxide film during hard anodization and these cracks were larger and deeper in the alloy with ECAP than without. The pitting corrosion was accelerated by cracks. The internal stress present in the anodic oxide films was compressive and the stress was higher in the alloys with ECAP than without, resulting in an increased likelihood of cracks. The pitting corrosion resistance of hard anodized Al5052 alloy was improved by annealing at the range of 473-573K after ECAP processed at room temperature for four passes. The compressive internal stress gradually decreased with increasing annealing temperature. It is assumed that the improvement in the pitting corrosion resistance of hard anodized Al5052 alloy by annealing may be attributed to a decrease in the likelihood of cracks due to the decreased internal stresses in anodic oxide films.

Effect of Aluminum Purity on the Pore Formation of Porous Anodic Alumina

  • Kim, Byeol;Lee, Jin Seok
    • Bulletin of the Korean Chemical Society
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    • v.35 no.2
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    • pp.349-352
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    • 2014
  • Anodic alumina oxide (AAO), a self-ordered hexagonal array, has various applications in nanofabrication such as the fabrication of nanotemplates and other nanostructures. In order to obtain highly ordered porous alumina membranes, a two-step anodization or prepatterning of aluminum are mainly conducted with straight electric field. Electric field is the main driving force for pore growth during anodization. However, impurities in aluminum can disturb the direction of the electric field. To confirm this, we anodized two different aluminum foil samples with high purity (99.999%) and relatively low purity (99.8%), and compared the differences in the surface morphologies of the respective aluminum oxide membranes produced in different electric fields. Branched pores observed in porous alumina surface which was anodized in low-purity aluminum and the size; dimensions of the pores were found to be usually smaller than those obtained from high-purity aluminum. Moreover, anodization at high voltage proceeds to a significant level of conversion because of the high speed of the directional electric field. Consequently, anodic alumina membrane of a specific morphology, i.e., meshed pore, was produced.

Photocatalytic decomposition of polyethylene composite film with TiO2 nanotube powders prepared by rapid breakdown anodization (급속 파괴 양극산화로 제조된 TiO2 나노 튜브 분말을 활용한 폴리에틸렌 복합 필름의 UV 광촉매 분해)

  • Lim, Kyungmin;Kim, Yong-Tae;Choi, Jinsub
    • Journal of the Korean institute of surface engineering
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    • v.53 no.4
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    • pp.153-159
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    • 2020
  • Photocatalytic decomposition of polyethylene film with TiO2 nanotube powders (NTs) was investigated under UV irradiation at ambient conditions. TiO2 NTs composed of individual nanotubes are prepared by rapid breakdown anodization technique. A comparative study on the photocatalytic decomposition of polyethylene-TiO2 composite films prepared using TiO2 nanoparticles (NPs) or TiO2 NTs (NTs), respectively, was conducted under UV irradiation. Polyethylene film incorporated with TiO2 NTs showed 26 wt% weight loss after 200 h under UV irradiation about two times faster decomposition rate than TiO2 NPs which is attributed to large surface area of TiO2 NTs.