• Title/Summary/Keyword: anode copper

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Ion Migration Failure Mechanism for Organic PCB under Biased HAST (고온고습 전압인가(Biased HAST) 시험에서 인쇄회로기판의 이온 마이그레이션 불량 메커니즘)

  • Huh, Seok-Hwan;Shin, An-Seob;Ham, Suk-Jin
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.1
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    • pp.43-49
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    • 2015
  • By the trends of electronic package to be smaller, thinner and more integrative, organic printed circuit board is required to be finer Cu trace pitch. This paper reports on a study of failure mechanism for PCB with fine Cu trace pitch using biased HAST. In weibull analysis of the biased HAST lifetime, it is found that the acceleration factor (AF) of between $135^{\circ}C/90%RH/3.3V$ and $130^{\circ}C/85%RH/3.3V$ is 2.079. A focused ion beam (FIB) was used to polish the cross sections to reveal details of the microstructure of the failure mode. It is found that $Cu_xO/Cu(OH)_2$ colloids and Cu dendrites were formed at anode (+) and at cathode (-), respectively. Thus, this gives the evidence that Cu dendrites formed at cathode by $Cu^{2+}$ ion migration lead to a short failure between a pair of Cu nets.

A Study on the Treatment of soil Flushing Effluent Using Electrofloatation (전기부상법을 이용한 토양세정 유출수 처리에 관한 연구)

  • 소정현;최상일
    • Journal of Soil and Groundwater Environment
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    • v.7 no.3
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    • pp.79-84
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    • 2002
  • The optimal operation conditions, including voltage applied, reaction time, distance between electrodes. and electrode material. were investigated for the treatment of soil flushing effluent using electrofloatation. When 3V was applied for 1 hour, 88% oil-water separation efficiency was achieved. In case of 6V and above, 90% efficiencies were achieved. As reaction time and distance between electrodes were longer, separation efficiencies were higher and lower, respectively. Separation efficiencies for different anode materials were copper > aluminum > iron > titanium. It might result from the differences of their electrical conductivities.

Enhancing Electricity Generation Using a Laccase-Based Microbial Fuel Cell with Yeast Galactomyces reessii on the Cathode

  • Chaijak, Pimprapa;Sukkasem, Chontisa;Lertworapreecha, Monthon;Boonsawang, Piyarat;Wijasika, Sutthida;Sato, Chikashi
    • Journal of Microbiology and Biotechnology
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    • v.28 no.8
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    • pp.1360-1366
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    • 2018
  • The fungi associated with termites secrete enzymes such as laccase (multi-copper oxidase) that can degrade extracellular wood matrix. Laccase uses molecular oxygen as an electron acceptor to catalyze the degradation of organic compounds. Owing to its ability to transfer electrons from the cathodic electrode to molecular oxygen, laccase has the potential to be a biocatalyst on the surface of the cathodic electrode of a microbial fuel cell (MFC). In this study, a two-chamber MFC using the laccase-producing fungus Galactomyces reessii was investigated. The fungus cultured on coconut coir was placed in the cathode chamber, while an anaerobic microbial community was maintained in the anode chamber fed by industrial rubber wastewater and supplemented by sulfate and a pH buffer. The laccase-based biocathode MFC (lbMFC) produced the maximum open circuit voltage of 250 mV, output voltage of 145 mV (with a $1,000{\Omega}$ resistor), power density of $59mW/m^2$, and current density of $278mA/m^2$, and a 70% increase in half-cell potential. This study demonstrated the capability of laccase-producing yeast Galactomyces reessii as a biocatalyst on the cathode of the two-chamber lbMFC.

Lifetime analysis of organic light-emitting diodes in ITO/Buffer $layer/TPD/Alq_3/LiAl$ structure (유기 발광소자 ITO/Buffer $layer/TPD/Alq_3/LiAl$ 구조에서의 수명 분석)

  • Chung, Dong-Hoe;Choi, Woon-Shik;Park, Kwon-Hwa;Lee, Joon-Ung;Kim, Jin-Chol;Kim, Tae-Wan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.158-161
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    • 2004
  • We have studied a lifetime in organic light-emitting diodes depending on buffer layer. A transparent electrode of indium-tin-oxide(ITO) was used as an anode. And the cathode for electron injection was LiAl. Phthalocyanine Copper(CuPc), Poly(3,4-ethylenedioxythiophene):poly (PEDOT:PSS), or poly (9-vinylcarbazole)(PVK) material was used as a buffer layer. A thermal evaporation was performed to make a thickness of 40nm of TPD layer at a rate of $0.5{\sim}1\;{\AA}/s$ at a base pressure of $5{\times}10^{-6}\;torr$. A material of tris(8-hydroxyquinolinate) Aluminum($Alq_3$) was used as an electron transport and emissive layer. A thermal evaporation of $Alq_3$ was done at a deposition rate of $0.7{\sim}0.8[{\AA}/s]$ at a base pressure of $5{\times}10^{-6}\;torr$. By varying the buffer material, hole injection at the interface could be controlled because of the change in work function. Devices with CuPc and PEDOT:PSS buffer layer are superior to the other PVK buffer layer.

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Study of the Optimization and the Depth Profile Using a Flat Type Ion Source in Glow Discharge Mass Spectrometry

  • Woo Jin Chun;Kim, Hyo Jin;Lim Heoung Bin;Moon Dae Won;Lee Kwang Woo
    • Bulletin of the Korean Chemical Society
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    • v.13 no.6
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    • pp.620-624
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    • 1992
  • The analytical performance of glow discharge mass spectrometer (GD-MS), using a flat type ion source is discussed. The efficiency of ion extraction was maximized at the distance between anode and cathode of 6 mm. At the operation condition of 4 mA, -1000 volt, and 1 mbar for the source, the optimum voltages for sampler and skimmer were40 volt and -280 volt, respectively. The intensities of Cu, Zn, and Mn were increased as a function of square root of current approximately. Korea standard reference materials (KSRM) were tested for an application study. The detection limits of most elements were obtained in the range of several ppm at the optimized operating condition. The peaks of aluminum and chromium were interfered by those of residual gases. The depth profile of nickel coated copper specimens (3, 5, 10 ${\mu}m$ thickness) were obtained by plotting time versus intensities of Ni and Cr after checking the thickness of nickel coated using a scanning electron microscope (SEM). At this moment, the sputtering rate of 0.2 ${\mu}m/min$ at the optimum operating condition was determined from the slope of the plot of time to the coating thickness. The roughness spectra of specimen's crater after 16 min, discharge were obtained using a Talysuf5m-120 roughness tester as well.

Experimental Results of New Ion Source for Performance Test

  • Kim, Tae-Seong;Jeong, Seung-Ho;Jang, Du-Hui;Lee, Gwang-Won;In, Sang-Yeol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.269-269
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    • 2012
  • A new ion source has been designed, fabricated, and installed at the NBTS (Neutral Beam Test Stand) at the KAERI (Korea Atomic Energy Research Institute) site. The goalis to provide a 100 keV, 2MW deuterium neutral beam injection as an auxiliary heating of KSTAR (Korea Super Tokamak Advanced Research). To cope with power demand, an ion current of 50 A is required considering the beam power loss and neutralization efficiency. The new ion source consists of a magnetic cusp bucket plasma generator and a set of tetrode accelerators with circular copper apertures. The plasma generator for the new ion source has the same design concept as the modified JAEA multi-cusp plasma generator for the KSTAR prototype ion source. The dimensions of the plasma generator are a cross section of $59{\times}25cm^2$ with a 32.5 cm depth. The anode has azimuthal arrays of Nd-Fe permanent magnets (3.4 kG at surface) in the bucket and an electron dump, which makes 9 cusp lines including the electron dump. The discharge properties were investigated preliminarily to enhance the efficiency of the beam extraction. The discharge of the new ion source was mainly controlled by a constant power mode of operation. The discharge of the plasma generator was initiated by the support of primary electrons emitted from the cathode, consisting of 12 tungsten filaments with a hair-pin type (diameter = 2.0 mm). The arc discharge of the new ion source was achieved easily up to an arc power of 80 kW (80 V/1000 A) with hydrogen gas. The 80 kW capacity seems sufficient for the arc power supply to attain the goal of arc efficiency (beam extracted current/discharge input power = 0.8 A/kW). The accelerator of the new ion source consists of four grids: plasma grid (G1), gradient grid (G2), suppressor grid (G3), and ground grid (G4). Each grid has 280 EA circular apertures. The performance tests of the new ion source accelerator were also finished including accelerator conditioning. A hydrogen ion beam was successfully extracted up to 100 keV /60 A. The optimum perveance is defined where the beam divergence is at a minimum was also investigated experimentally. The optimum hydrogen beam perveance is over $2.3{\mu}P$ at 60 keV, and the beam divergence angle is below $1.0^{\circ}$. Thus, the new ion source is expected to be capable of extracting more than a 5 MW deuterium ion beam power at 100 keV. This ion source can deliver ~2 MW of neutral beam power to KSTAR tokamak plasma for the 2012 campaign.

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A 3-D Measuring System of Thermoluminescence Spectra and Thermoluminescence of CaSO4 : Dy, P (열자극발광 스펙트럼의 3차원 측정 장치와 CaSO4 : Dy, P의 열자극발광)

  • Lee, Jung-Il;Moon, Jung-Hak;Kim, Douk-Hoon
    • Journal of Korean Ophthalmic Optics Society
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    • v.6 no.2
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    • pp.71-75
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    • 2001
  • In this paper, a three-dimensional measuring system of thermoluminescence(TL) spectra based on temperature, wavelength and luminescence intensity was introduced. The system was composed of a spectrometer, temperature control unit for thermal stimulation, photon detector and personal computer for control the entire system. Temperature control was achieved by using feedback to ensure a linear-rise in the sample temperature. Digital multimeter(KEITHLEY 195A) measures the electromotive force of Copper-Constantan thermocouple and then transmits the data to the computer through GPIB card. The computer converts this signal to temperature using electromotive force-temperature table in program, and then control the power supply through the D/A converter. The spectrometer(SPEX 1681) is controlled by CD-2A, which is controlled by the computer through RS-232 communication port. For measuring the luminescence intensity during the heating run, the electrometer(KEITHLEY 617) measures the anode current of photomultiplier tube(HAMAMATSU R928) and transmits the data to computer through the A/D converter. And, we measured and analyzed thermoluminescence of $CaSO_4$ : Dy, P using the system. The measuring range of thermoluminescence spectra was 300K-575K and 300~800 nm, $CaSO_4$ : Dy. P was fabricated by the Yamashita's method in Korea Atomic Energy Research Institute(KAERI) for radiation dosimeter. Thermoluminesce spectra of the $CaSO_4$ : Dy, P consist of two main peak at temperature of $205^{\circ}C$, wavelength 476 nm and 572 nm and with minor ones at 658 nm and 749 nm.

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미세금형 가공을 위한 전기화학식각공정의 유한요소 해석 및 실험 결과 비교

  • Ryu, Heon-Yeol;Im, Hyeon-Seung;Jo, Si-Hyeong;Hwang, Byeong-Jun;Lee, Seong-Ho;Park, Jin-Gu
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.81.2-81.2
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    • 2012
  • To fabricate a metal mold for injection molding, hot-embossing and imprinting process, mechanical machining, electro discharge machining (EDM), electrochemical machining (ECM), laser process and wet etching ($FeCl_3$ process) have been widely used. However it is hard to get precise structure with these processes. Electrochemical etching has been also employed to fabricate a micro structure in metal mold. A through mask electrochemical micro machining (TMEMM) is one of the electrochemical etching processes which can obtain finely precise structure. In this process, many parameters such as current density, process time, temperature of electrolyte and distance between electrodes should be controlled. Therefore, it is difficult to predict the result because it has low reliability and reproducibility. To improve it, we investigated this process numerically and experimentally. To search the relation between processing parameters and the results, we used finite element simulation and the commercial finite element method (FEM) software ANSYS was used to analyze the electric field. In this study, it was supposed that the anodic dissolution process is predicted depending on the current density which is one of major parameters with finite element method. In experiment, we used stainless steel (SS304) substrate with various sized square and circular array patterns as an anode and copper (Cu) plate as a cathode. A mixture of $H_2SO_4$, $H_3PO_4$ and DIW was used as an electrolyte. After electrochemical etching process, we compared the results of experiment and simulation. As a result, we got the current distribution in the electrolyte and line profile of current density of the patterns from simulation. And etching profile and surface morphologies were characterized by 3D-profiler(${\mu}$-surf, Nanofocus, Germany) and FE-SEM(S-4800, Hitachi, Japan) measurement. From comparison of these data, it was confirmed that current distribution and line profile of the patterns from simulation are similar to surface morphology and etching profile of the sample from the process, respectively. Then we concluded that current density is more concentrated at the edge of pattern and the depth of etched area is proportional to current density.

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