• 한국진공학회:학술대회논문집
• /
• 한국진공학회 1996년도 제11회 학술발표회 논문개요집
• /
• pp.40-41
• /
• 1996

Nitridation technique has been receiving much attention for the formation of a thin nitrided buffer layer on which high quality nitride films can be formedl. Particularly, gallium nitride (GaN) has been considered as a promising material for blue-and ultraviolet-emitting devices. It can also be used for in situ formed and stable passivation layers for selective growth of $GaAs_2$. In this work, formation of a thin nitrided layer is investigated. Nitrogen electron cyclotron resonance(ECR)-plasma is employed for the formation of thin nitrided layer. The plasma source used in this work is a compact ECR plasma gun3 which is specifically designed to enhance control, and to provide in-situ monitoring of plasma parameters during plasma-assisted processing. Microwave power of 100-200 W was used to excite the plasma which was emitted from an orifice of 25 rnm in diameter. The substrate were positioned 15 em away from the orifice of plasma source. Prior to nitridation is performed, the surface of n-type (001)GaAs was exposed to hydrogen plasma for 20 min at $300{\;}^{\circ}C$ in order to eliminate a native oxide formed on GaAs surface. Change from ring to streak in RHEED pattern can be obtained through the irradiation of hydrogen plasma, indicating a clean surface. Nitridation was carried out for 5-40 min at $RT-600{\;}^{\circ}C$ in a ECR plasma-assisted molecular beam epitaxy system. Typical chamber pressure was $7.5{\times}lO^{-4}$ Torr during the nitridations at $N_2$ flow rate of 10 seem.(omitted)mitted)

• 청정기술
• /
• 제19권3호
• /
• pp.300-305
• /
• 2013

ZnO(산화아연)와 rGO(환원 흑연산화물, reduced graphite oxide)로 구성된 복합체를 제조하여 중저온 영역($300-500^{\circ}C$)에서 $H_2S$(황화수소) 흡착실험을 수행하였다. rGO에 붙어있는 수산화기, 에폭시기, 그리고 카르복실기와 같은 산소를 포함하는 관능기들이 $H_2S$흡착에 미치는 영향을 조사하기 위해서 다양한 특성분석(TGA, XRD, FT-IR, SEM, 그리고 XPS)을 실시하였다. GO(흑연산화물, graphite oxide)를 rGO로 환원시키기 위해서 마이크로파 조사법을 사용하였다. 마이크로파 조사법에 의한 환원공정에서는 온화한 환원분위기를 조성하여 rGO 표면에 상당량의 산소 관능기들이 남아있는 것을 확인하였다. 이러한 관능기들은 나노 크기의 ZnO가 2D rGO 표면에 균일하게 부착되도록 유도하여 고온 영역에서도 ZnO의 응집 및 소결이 일어나는 것을 방지하는 효과가 있다. 이로 인해 ZnO/rGO 복합체는 순수한 ZnO와 비교하여 3.5배 정도의 흡착량을 보여주었다.