• Transactions on Electrical and Electronic Materials
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• v.4 no.6
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• pp.13-16
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• 2003

Mn-doped $ZnGa_{2}O_{4}$:$Mn^{2+}$ (M=S, Se) thin film phosphors have been grown using a pulsed laser deposition technique under various growth conditions. The structural characterization carr~ed out on a series of $ZnGa_{2}O_{4}$:$Mn^{2+}$ (M=S, Se) films grown on MgO(l00) substrates usmg Zn-rich ceramic targets. Oxygen pressure was varied from 50 to 200 mTorr and Zn/Ga ratio was the function of oxygen pressure. XRD patterns showed that the lattice constants of the $ZnGa_{2}O_{4}$:$Mn^{2+}$ (M=S, Se) thin film decrease with the substitution of sulfur and selenium for the oxygen in the $ZnGa_2O_4$. Measurements of photoluminescence (PL) properties of $ZnGa_{2}O_{4}$:$Mn^{2+}$ (M=S, Se) thin films have indicated that MgO(100) is one of the most promised substrates for the growth of high quality $ZnGa_2O_{4-x}M_{x}$:$Mn^{2+}$ (M=S, Se) thin films. In particular, the incorporation of Sulfur or Selenium into $ZnGa_2O_4$ lattice could induce a remarkable increase in the intensity of PL. The increasing of green emission intensity was observed with $ZnGa_2O_{3.925}Se_{0.075}:$Mn^{2+}$ and $ZnGa_2O_{3.925}S_{0.05}$:$Mn^{2+}$ films, whose brightness was increased by a factor of 3.1 and 1.4 in comparison with that of $ZnGa_{2}O_{4}$:$Mn^{2+}$ films, respectively. These phosphors may promise for application to the flat panel displays.

• Journal of the Korean Ceramic Society
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• v.41 no.5
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• pp.359-363
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• 2004

Photoluminescence excitation (PLE) spectroscopy studies were performed for anodically etched porous Zn, which exhibited a PL in the blue/violet spectral range peaking at 420 nm (2.95 eV), and oxidzed porous Zn at 380$^{\circ}C$ for 10 min and 12 h. A broad absorption band was observed at 4.07 eV (305 nm), 3.49 (355 nm) for anodically etched porous Zn. In contrast, both the oxidized porous Zn and sintered ZnO exhibited an almost identical one broad absorption band at 3.85 eV (322 nm), when PLE spectra were measured at 378 nm (3.28 eV). The oxidized porous Zn and sintered ZnO, which displayed both UV and green luminescence band, showed an additional absorption band at 389 nm (3.19 eV) and 467 nm (2.66 eV). In contrast, no significant absorption band was detected for a 10-min oxidized porous Zn, which only displayed one UV luminescence void of deep-level luminescence. These absorption bands determined by PLE studies enabled a clear understanding of an emission mechanism for the UV and green luminescence from ZnO.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.50 no.9
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• pp.434-437
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• 2001

ZnSe, ZnSe:Ho/sup 3+/, Mg/sub x/Zn/sub 1-x/Se and Mg/sub x/Zn/sub 1-x/Se:Ho/sup 3+/ crystals were grown by the chemical transport reaction method. The crystal structures and optical energy band gaps of the single crystals were investigated. Their photoluminescence(PL) spectra were measured at 10 [K]. Sharp emission peaks in the blue-green wavelength range and broad emission peaks in the yellow-red wavelength range were observed. The single crystals doped with 1.0 [mol%] of holmium did not show the sharp emission peaks because of defects which were thought to be originated to the holmium dopant.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.202.1-202.1
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• 2013

ZnO nanostructure was fabricated on a Si substrate using two-step growth. The seed layer was grown on the Si substrate by a sol-gel spin-coating. In the first step, ZnO nanorods were grown by a hydrothermal method at $140^{\circ}C$ for 5 min. In the second step, a ZnO thin film was grown on the ZnO nanorods by spin-coating. After growth, these films were annealed at $800^{\circ}C$ for 10 min. Electrical and optical properties of ZnO nanostructures have modified by plasma-assisted molecular beam epitaxy (PA-MBE) regrowth. The carrier concentration and resistivity increased by PA-MBE regrowth. In the photoluminescence, the full width at half maximum and intensity were decreased and increased, respectively, by PA-MBE regrowth.

• Korean Journal of Materials Research
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• v.15 no.11
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• pp.741-744
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• 2005

Atomic layer deposition (ALD) is a very promising deposition technique for ZnO thin films. However, there have been very few reports on ZnO grown by ALD. Effects of substrate temperature in both ALD and post annealing on the microstructure and PL properties of ZnO thin films were investigated using X-ray diffraction, photoluminescence, and scanning electron microscopy. The temperature window of ALD is found to be between $130-180^{\circ}C$. The growth rate of ZnO thin film increases as the substrate temperature increases in the temperature range except the temperature window. The crystal quality depends most strongly on the substrate temperature among all the growth parameters of ALD. The crystallinity of the film is improved by increasing the growth thine per ALD cycle or doing post-annealing treatment. The grain size of the film tends to increase and the grain shape tends to change from a worm-like longish shape to a round one as the annealing temperature increases from $600^{\circ}C\;to\;1,000^{\circ}C$.

• Journal of Sensor Science and Technology
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• v.16 no.4
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• pp.307-312
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• 2007

The films of Er-doped ZnO (ZnO:Er) were prepared onto MgO wafers by ultrasonic spray pyrolysis at $550^{\circ}C$. The concentration of Er in the deposition source varied from 0.5 wt% to 3.0 wt%. The crystallographic properties and surface morphologies of the films were investigated by X-ray diffraction (XRD) and scanning electron microscope (SEM), respectively. The properties of photoluminescence (PL) for the films were investigated by dependence of PL spectra on the Er concentration in the films. The films were grown as polycrystalline with a dominant direction of [002]. The grain size of the films were reduced by Er-doping. Er-doping enhanced the ultraviolet emission of ZnO:Er films. The ZnO:Er films prepared with the deposition source of 2.0 wt% Er showed the strongest ultraviolet light emission peak among the films in this study.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.66 no.10
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• pp.1488-1493
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• 2017

Boron-doped ZnO:Al films were deposited by rf magnetron sputtering. The structural and optical property variations of the films with the boron amounts were studied. ZnO nanorods were grown on $SiO_2/Si$ wafers and glass by a hydrothermal method. ~50 nm-thick boron-doped ZnO:Al films were deposited on the substrates as seed layers. The mixed solution of zinc nitrate hexahydrate and hexamethylenetetramine in DI water was used as a precursor for ZnO nanorods. The concentration of zinc nitrate hexahydrate and that of hexamethylenetetramine were 0.05 mol, respectively. ZnO nanorods were grown at $90^{\circ}C$ for 2 hours. X-ray diffraction was conducted to observe the crystallinity of ZnO nanorods. A field emission scanning electron microscope was employed to study the morphology of nanorods. Optical transmittance was measured by a UV-Vis spectrophotometer, and photoluminescence was carried out with 266 nm light. The ZnO nanorods grown on the 0.5 wt% boron-doped ZnO seed layer showed the best crystallinity.

• Journal of Korean Ophthalmic Optics Society
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• v.13 no.3
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• pp.73-77
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• 2008

Purpose: This research is that prepare amorphous or crystalline ZnO thin films with pure strong UV emission on soda-lime-silica glass (SLSG) substrates by low-temperature annealing. Methods: Growth characteristic and optical properties of the amorphous or nano-crystalline ZnO thin films prepared on soda - lime - silica glass substrates by chemical solution deposition at 100, 150, 200, 250 and $300^{\circ}C$ were investigated using X-ray diffraction analysis, ultraviolet - visible - near infrared spectrophotometer, and photoluminescence. Results: The films exhibited an amorphous pattern even when finally annealed at $100^{\circ}C{\sim}200^{\circ}C$ for 60 min, while crystalline ZnO was obtained by prefiring at 250 and $300^{\circ}C$. The photoluminescence spectrum of amorphous ZnO films shows a strong NBE emission, while the visible emission is nearly quenched. Conclusions: These results indicate it should be possible to cheaply and easily fabricate ZnO-based optoelectronic devices at low temperature, below $200^{\circ}C$, in the future.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.247-247
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• 2011

플라즈마 분자선 에피택시(plasma-assisted molecular beam epitaxy)법을 이용하여 다공질 실리콘(porous silicon)에 ZnO 박막을 성장하였다. 성장 후, 아르곤 분위기에서 10분 간 다양한 온도(500~700$^{\circ}C$)로 열처리하였다. 다공질 실리콘 및 열처리 온도가 ZnO 박막의 특성에 미치는 영향을 scanning electron microscopy (SEM), X-ray diffraction (XRD), photoluminescence (PL)을 이용하여 분석하였다. 실리콘 기판에 성장된 ZnO 박막은 일반적은 섬구조(island structure)로 성장된 반면, 다공질 실리콘에 성장된 ZnO 박막은 산맥과 같은 구조(mountain range-like structure)로 성장되었다. 열처리 온도가 증가함에 따라 ZnO 박막의 grain size는 증가하였다. 실리콘 기판 위에 성장된 ZnO 박막은 wurtzite 구조를 나타내는 여러 개의 회절 피크가 관찰된 반면, 다공질 실리콘에 성장된 ZnO 박막은 c-축 배향성(c-axis preferred orientation)을 나타내는 ZnO (002) 회절 피크만이 나타났다. 다공질 실리콘에 성장된 ZnO 박막의 구조적 및 광학적 특성이 실리콘 기판에 성장된 ZnO 박막의 특성보다 우수하게 나타났다. 뿐만 아니라, 열처리 온도가 증가함에 따라 다공질 실리콘에 성장된 ZnO 박막의 PL 강도비(intensity ratio)가 실리콘 기판에 성장된 ZnO 박막의 강도비보다 월등하게 증가하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.19-22
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• 2002

Three different ZnO nanomaterials (nanobelts, nanorods, and nanowires) were synthesized at three different substrate temperatures from the thermal evaporation of ball-milled ZnO powders at $1380^{\circ}C$. Transmission electron microscopy (TEM) revealed that the ZnO nanobelts are single crystalline with the growth direction perpendicular to the (010) lattice planes, and that the ZnO nanorods and nanowires are single crystalline with the growth directions perpendicular to the (001) and (110) lattice planes, respectively. In photoluminescence (PL), the peak energy of near band-edge (NBE) emission was determined for nanobelts, nanorods, and nanowires.