• Title/Summary/Keyword: ZnO : Al

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Effect of Al2O3 Filler Addition on Sintering Behavior and Physical Characteristics of BaO-B2O3-ZnO Glass Ceramic System (BaO-B2O3-ZnO 결정화 유리계에서 Al2O3 Filler의 첨가에 따른 소결거동 및 물성변화)

  • Kim, Byung-Sook;Kim, Young-Nam;Lim, Eun-Sub;Lee, Joon-Hyung;Kim, Jeong-Joo
    • Journal of the Korean Ceramic Society
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    • v.42 no.2 s.273
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    • pp.110-116
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    • 2005
  • Suitable compositions which are sinterable at low temperature in the $BaO-B_{2}O_{3}-ZnO$ glass system were investigated as a function of the ratio between BaO and ZnO. The effect of $Al_{2}O_3$ filler on densification and physical characteristics of the glass was also examined. When the amount of $Al_{2}O_3$ filler increased, the densification rate and the values of dielectric constant, thermal expansion coefficient and hardness in the glass-filler composites decreased gradually. The decreasing rate of the physical properties accelerated when fine $Al_{2}O_3$ filler was used. However, the fracture toughness of the composite rather increased due to the existence of filler particles and pores which effectively suppressed crack propagation with addition of fine $Al_{2}O_3$ filler.

Influence of Heat Treatment on the Structural, Electrical and Optical Properties of Aluminum-Doped Zinc Oxide Thin Films Prepared by Magnetron Sputtering

  • Jung, Sung Hee;Kong, Seon Mi;Chung, Chee Won
    • Current Photovoltaic Research
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    • v.1 no.2
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    • pp.97-102
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    • 2013
  • Aluminum-doped zinc oxide (AZO) thin films were prepared by dc magnetron sputtering at room temperature and the effect of heat treatment on the structural, electrical and optical properties of the films were examined. As the annealing temperature and time increased, the resistivity decreased and the transmittance improved. All AZO films had c-axis oriented (002) plane of ZnO, regardless of the annealing process employed. As the annealing temperature and time increased, the crystallinity of AZO thin films increased due to the formation of a new ZnO phase in which Al was substituted for Zn. However, at the high annealing temperature of $400^{\circ}C$, the resistivity of the films increased via separation of Zn and Al from ZnO phase due to their low melting points. X-ray diffraction, field emission scanning electron micrograph and Hall effect measurement confirmed the formation of uniformly distributed new grains of ZnO substituted with Al. The variation of Al contents in AZO films was shown to be the primary factor for the changes in resistivity and carrier concentration of the films.

Photoluminescence Behaviors of the ZnGa2O4 Phosphor Thin Films on Al2O3 substrates as a Function of Oxygen Pressures (Al2O3 기판위에 증착한 ZnGa2O4 형광체 박막의 산소분압에 따른 형광특성)

  • Yi, Soung-Soo
    • Journal of Sensor Science and Technology
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    • v.11 no.2
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    • pp.118-123
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    • 2002
  • $ZnGa_2O_4$ thin film phosphors have been deposited using a pulsed laser deposition technique on $Al_2O_3$(0001) substrates at a substrate temperature of $550^{\circ}C$ with various oxygen pressures 100, 200 and 300 mTorr. The films grown under different growth oxygen pressures have been characterized using microstructural and luminescent measurements. The different photoluminescence (PL) characteristics with the increase in oxygen pressures may result from the change of the crystallinity and the composition ratio of Zn and Ga in the films. The luminescent spectra show a broad band extending from 300 to 600 nm peaking at 460 nm. The PL brightness data obtained from the $ZnGa_2O_4$ films grown under optimized conditions have indicated that the sapphire is a promising substrate for the growth of high quality $ZnGa_2O_4$ thin film phosphor.

Epitaxial Growth of ZnO Thin Films on (100) $LaAlO_3$ Substrate by Pulsed Laser Deposition (PLD를 이용한 (100) $LaAlO_3$ 기판위의 ZnO 에피택셜 박막 성장)

  • Cho, Dae-Hyung;Kim, Ji-Hong;Moon, Byung-Moo;Jo, Yeong-Deuk;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.256-256
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    • 2008
  • We report epitaxial growth of ZnO thin films on (100) single-crystalline $LaAlO_3$ (LAO) substrates using pulsed laser deposition (PLD) at different substrate temperatures (400~$800^{\circ}C$). The structural and electrical properties of the films have been investigated by means of X-ray diffraction (XRD), atomic force microscope (AFM), transmission line method (TLM). The poly-crystalline of $\alpha$- and c-axis oriented ZnO film was formed at lower deposition temperature ($T_s$) of $400^{\circ}C$. At higher $T_s$, however, the films exhibit single-crystalline of $\alpha$-axis orientation represented by ZnO[$\bar{1}11$ || LAO <001>. The electrical properties of ZnO thin films depend upon their crystalline orientation, showing lower electrical resistivity values for $\alpha$-axis oriented ZnO films.

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Characteristics of Atomic Layer-Controlled ZnO:Al Films by Atomic Layer Deposition (원자층 증착법을 이용한 ZnO:Al 박막의 특성)

  • Oh, Byeong-Yun;Baek, Seong-Ho;Kim, Jae-Hyun;Lee, Hee-Jun;Kang, Young-Gu;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.40-40
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    • 2010
  • Structural, electrical, and optical properties of atomic layer-controlled AI-doped ZnO (ZnO:Al) films grown on glass by atomic layer deposition (ALD) were characterized with various $Al_2O_3$ film contents for use as transparent electrodes. Unlike films made using sputtering methods, the diffraction peak position of the films grown by ALD based on alternate self-limiting surface chemical reactions moved progressively to a wider angle (red shift) with increasing $Al_2O_3$ film content, which seems to be evidence of Zn substitution in the film by layer-by-layer growth. By adjusting the $Al_2O_3$ film content, the electrical resistivity of ZnO:Al film with the $Al_2O_3$ film content of 2.96% reached the lowest electrical resistivity of $9.80{\times}10^{-4}\Omega{\cdot}cm$, in which the carrier mobility, carrier concentration, and optical transmittance were $11.20\;cm^2V^{-1}s^{-1}$, $5.69{\times}10^{20}\;cm^{-3}$, and 94.23%, respectively. Moreover, the estimated figure of merit value for the transparent conductive oxide applications from our best sample was $7.7\;m{\Omega}^{-1}$.

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NO Gas Sensing Characteristics of Wire-Like Layered Composites Between Zinc Oxide and Carbon Nanotube (산화아연과 탄소나노튜브의 선형 층상 복합체의 일산화질소 가스 감지특성)

  • Kim, Ok-Kil;Kim, Hyo-Jin;Kim, Do-Jin
    • Korean Journal of Materials Research
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    • v.22 no.5
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    • pp.237-242
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    • 2012
  • We report on the NO gas sensing properties of Al-doped zinc oxide-carbon nanotube (ZnO-CNT) wire-like layered composites fabricated by coaxially coating Al-doped ZnO thin films on randomly oriented single-walled carbon nanotubes. We were able to wrap thin ZnO layers around the CNTs using the pulsed laser deposition method, forming wire-like nanostructures of ZnO-CNT. Microstructural observations revealed an ultrathin wire-like structure with a diameter of several tens of nm. Gas sensors based on ZnO-CNT wire-like layered composites were found to exhibit a novel sensing capability that originated from the genuine characteristics of the composites. Specifically, it was observed by measured gas sensing characteristics that the gas sensors based on ZnO-CNT layered composites showed a very high sensitivity of above 1,500% for NO gas in dry air at an optimal operating temperature of $200^{\circ}C$; the sensors also showed a low NO gas detection limit at a sub-ppm level in dry air. The enhanced gas sensing properties of the ZnO-CNT wire-like layered composites are ascribed to a catalytic effect of Al elements on the surface reaction and an increase in the effective surface reaction area of the active ZnO layer due to the coating of CNT templates with a higher surface-to-volume ratio structure. These results suggest that ZnO-CNT composites made of ultrathin Al-doped ZnO layers uniformly coated around carbon nanotubes can be promising materials for use in practical high-performance NO gas sensors.

Characterization of Surface Morphology and Light Scattering of Transparent Conducting ZnO:Al Films as Front Electrode for Silicon Thin Film Solar Cells (실리콘 박막 태양전지 전면 전극용 ZnO : Al 투명전도막의 표면형상 및 산란광 특성)

  • Kim, Young-Jin;Cho, Jun-Sik;Lee, Jeong-Chul;Wang, Jin-Suk;Song, Jin-Soo;Yoon, Kyung-Hoon
    • Korean Journal of Materials Research
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    • v.19 no.5
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    • pp.245-252
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    • 2009
  • Changes in the surface morphology and light scattering of textured Al doped ZnO thin films on glass substrates prepared by rf magnetron sputtering were investigated. As-deposited ZnO:Al films show a high transmittance of above 80% in the visible range and a low electrical resistivity of $4.5{\times}10^{-4}{\Omega}{\cdot}cm$. The surface morphology of textured ZnO:Al films are closely dependent on the deposition parameters of heater temperature, working pressure, and etching time in the etching process. The optimized surface morphology with a crater shape is obtained at a heater temperature of $350^{\circ}C$, working pressure of 0.5 mtorr, and etching time of 45 seconds. The optical properties of light transmittance, haze, and angular distribution function (ADF) are significantly affected by the resulting surface morphologies of textured films. The film surfaces, having uniformly size-distributed craters, represent good light scattering properties of high haze and ADF values. Compared with commercial Asahi U ($SnO_2$:F) substrates, the suitability of textured ZnO:Al films as front electrode material for amorphous silicon thin film solar cells is also estimated with respect to electrical and optical properties.

Sol-Gel법에 의해 제조된 ZnO 투명전도막의 특성

  • Ju, Jang-Hwan;Park, Byeong-Ok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.69-69
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    • 2009
  • Al이 doping된 ZnO 투명전도막을 fusion 1737 기판위에 Sol- Gel법으로 제조하였다. 제조된 Sol은 48시간 이상 숙성하여 안정화 시킨 다음, 박막을 제조하여 doping한 Al의 at%에 따른 박막의 전기, 광학적 특성을 조사하였다. XRD 측정 결과 순수한 ZnO Sol로 제조된 박막의 경우보다 0.75at%의 Al을 첨가하였을 때 가장 강한 peak intensity를 얻을 수 있었으며, 또한 0.75at% 첨가 시 순수한 ZnO 투명전도막보다 3~4order 정도 낮은 비저항을 나타내었다. 광투과율은 Al의 첨가량에 관계없이 90%를 넘는 높은 값을 나타내었다.

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Sol-gel synthesis and luminescence of $Zn_2SiO_4$:Mn, Al phosphor (Sol-gel법에 의한 $Zn_2SiO_4$:Mn, Al 형광체의 합성과 발광특성)

  • Kim, Chang-Jun;Kwon, Myoung-Seok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.271-278
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    • 2006
  • Green light emitting $Zn_2SiO_4$Mn and Al co-doped $Zn_2SiO_4$:Mn phosphor were synthesized by a sol-gel method combined with a furnace firing. The luminescent properties of the sample have been investigated. We have found that the phosphor powder with uniform shape show the maximum luminescent intensity when it is prepared with sol-gel method and fired at relatively high temperature ($1100{\sim}1300^{\circ}C$).

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Characteristics of ZnO:Al Thin Films for TCO Prepared by RE Magnetron Sputtering in $H_2/Ar$ Atmosphere ($H_2/Ar$분위기에서 제조한 투명전극용 ZnO:Al 박막의 특성)

  • Tark, Sung-Ju;Lee, Jeong-Seop;Kim, Won-Mok;Kim, Dong-Hwan
    • 한국신재생에너지학회:학술대회논문집
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    • 2006.06a
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    • pp.162-165
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    • 2006
  • AZO (ZnO:Al) were fabricated by RF magnetron sputtering In $H_2/Ar(5%\;H_2)$ atmosphere, and structural, electrical and optical properties were investigated. The substrate temperatures were varied at RT, $100^{\circ}C,\;150^{\circ}C$ and$200^{\circ}C$. The resistivity of the films grown in $H_2/Ar(5%\;H_2)$ were reduced from $7.67{\times}10^{-4}{\Omega}\;cm$ to $5.95{\times}10^{-4}{\Omega}\;cm$ comparing that Ar (100%) and the transmittance of the ZnO:Al films in the visible range was 85%.

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