• 한국재료학회:학술대회논문집
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• 한국재료학회 1998년도 한국재료학회 춘계학술발표강연 및 논문개요집
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• pp.82-82
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• 1998

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.234-235
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• 2006

In this study, the plasma sprayed $Al_2O_3$ and $Y_2O_3$ coatings have been investigated for applications of microelectronic components. The plasma sprayed coatings had a well-defined splatted lamellae microstructure, intersplat pores and a higher amount of microcracks within the splats. The plasma sprayed $Y_2O_3$ coating had a relatively lower hardness of 300-400Hv, compared to 650-800Hv for $Al_2O_3$ coating, and would be readily damaged by mechanical attacks such as erosion, wear and friction. For a reactive ion etching against F-containing plasmas, however, the $Y_2O_3$ coating had a much higher resistance than the $Al_2O_3$ coating because of the reduced erosion rate of by-products.

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2000년도 추계학술대회논문집
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• pp.25.1-28
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• 2000

In this study, $Y_2O_3$ thin films were etched with inductively coupled plasma (ICP). The etch rate of $Y_2O_3$ , and the selectivity of $Y_2O_3$ to YMnO$_3$were investigated by varying $Cl_2$/($Cl_2$+Ar) gas mixing ratio. The maximum etch rate of $Y_2O_3$ , and the selectivity of $Y_2O_3$ to YMnO$_3$ were 302/min, and 2.4 at $Cl_2$/($Cl_2$+Ar) gas mixing ratio of 0.2 repetitively. In x-ray photoelectron spectroscopy (XPS) analysis, $Y_2O_3$ thin film was dominantly etched by Ar ion bombardment, and was assisted by chemical reaction of Cl radical. These results were confirmed by secondary ion mass spectroscopy(SIMS) analysis. YCl, and $YC_3$ existed at 126.03 a.m.u, and 192.3 a.m.u, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 추계학술대회 논문집
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• pp.25-28
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• 2000

In this study, $Y_2$O$_3$ thin films were etched with inductively coupled plasma (ICP). The etch rate of $Y_2$O$_3$, and the selectivity of $Y_2$O$_3$ to YMnO$_3$ were investigated by varying Cl$_2$/(Cl$_2$+Ar) gas mixing ratio. The maximum etch rate of $Y_2$O$_3$, and the selectivity Of $Y_2$O$_3$ to YMnO$_3$ were 302/min, and 2.4 at Cl$_2$/(Cl$_2$+Ar) gas mixing ratio of 0.2 repectively. In x-ray photoelectron spectroscopy (XPS) analysis, $Y_2$O$_3$ thin film was dominantly etched by Ar ion bombardment, and was assisted by chemical reaction of Cl radical. These results were confirmed by secondary ion mass spectroscopy(SIMS) analysis. YCI, and YCl$_3$ existed at 126.03 a.m.u, and 192.3 a.m.u, respectively

• 한국광물학회지
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• 제19권2호
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• pp.81-88
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• 2006

[ $ZrO_2+Y_2O_3$ ] 계 분말결정을 $ZrOCl_2{\cdot}8H_O-YCl_33{\cdot}6H_2O$를 출발물질로 하여 공침법으로 합성하였다. 출발물질의 농도, 용액의 pH, 부분안정화제로 사용된 $Y_2O_3$의 양, 합성 후 소결온도 등 합성에 요구되는 실험변수에 따른 상 변이에 대한 연구결과를 바탕으로 실험조건을 고정시켜 3 mole% $Y_2O_3$를 포함하는 부분안정화 지르코니아 3YSZ를 합성할 수 있었다. 합성된 3YSZ의 소결특성에 따른 $ZrO_2$ 상전이에 대한 연구를 위하여 XRD, Raman, DTA 및 SEM을 사용하였다. 순수한 $ZrO_2$에 비하여 합성된 3YSZ는 $ZrO_2+Y_2O_3$ 계에서 $Y_2O_3$의 함량 면화에 따라 순수한 $ZrO_2$고온상의 단사정상에서 정방정상으로 상전이가 일어나게 되고 이때 Raman 스팩트럼이 낮은 파수쪽에서 현저하게 나타나는 것으로 쉽게 구분이 되었다.

• 한국세라믹학회지
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• 제26권5호
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• pp.655-660
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• 1989

The physical properties and sinterabilities of ZrO2-Y2O3-Bi2O3 ternary system powder prepared by coprecipitation were investigated. The crystallization temperatures of ternary system were increased and the specific surface areas were decreased with increasing Bi2O3 amount as sintering agents both PSZ and FSZ. Especially, the partially stabilized zirconia showed monoclinic phase. The sinterability was increased with the amount of Bi2O3 added which caused liquid phase sintering.

• 한국세라믹학회지
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• 제32권4호
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• pp.507-515
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• 1995

The monolithic dry gels of the Li2O-Al2O3-TiO2-SiO2 system were prepared by the sol-gel technique using metal alkoxides as starting materials to obtain monolithic glass-ceramics at low temperature without melting. Activation energy for the crystal growth of the gel with 6.05% TiO2, nucleating ageng, for the preparation of Li2O-Al2O3-TiO2-SiO2 system glass-ceramic was 101.14kcal/mol. As a result of the analysis of DTA & XRD, it was confirmed that the crytallization of Li2O-Al2O3-TiO2-SiO2 system glass-ceramic was the most efficient when 6.05% TiO2, nucleating agent, was added. $\beta$-eucryptite solid solution crystals and $\beta$-spodumene solid solution crystals were detected in the sample heat treated above 85$0^{\circ}C$. The sintered gel heat treated at 85$0^{\circ}C$ had the specific surface area of 185$m^2$/g, the pore volume of 0.19cc/g and the average pore radius of 20.8$\AA$. This shows that the sintered gel is also comparatively porous material. In temperature range of 25~85$0^{\circ}C$ thermal expansion coefficient of the specimen which was crystallized for 10hrs at 85$0^{\circ}C$ was 6.7$\times$10-7/$^{\circ}C$, which indicated that the crystallized specimen was turned out to be the glass-ceramic with low thermal expansion.

• Progress in Superconductivity
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• 제7권2호
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• pp.120-129
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• 2006

We comparatively studied the epitaxial growth conditions of $CeO_2$ and $Y_2O_3$ thin buffers on textured Ni tapes using rf magnetron sputtering and investigated the feasibility of getting a single mixture layer or sequential layers of $CeO_2$ and $Y_2O_3$ for more simplified buffer architecture. All the buffer layers were first deposited using the reducing gas of $Ar/4%H_2$ and subsequently the reactive gas mixture of Ar and $O_2$, The crystalline quality and biaxial alignment of the films were investigated using X-ray diffraction techniques (${\Theta}-2{\Theta},\;{\phi}\;and\;{\omega}\;scans$, pole figures). The $CeO_2$ single layer exhibited well developed (200) epitaxial growth at the condition of $10%\;O_2$ below an $450^{\circ}C$, but the epitaxial property was decreased with increasing the layer thickness. $Y_2O_3$ seldom showed optimum condition for (400) epitaxial growth. The sequential architecture of $CeO_2/Y_2O_3/CeO_2$ having good epitaxial property was achieved by sputtering at a temperature of $700^{\circ}C$ on the initial $CeO_2$ bottom layer sputtered at $400^{\circ}C$. Cracking of the sputtered buffer layers was seldom observed except the double layer structure of $CeO_2/Y_2O_3$.

• 한국전기전자재료학회논문지
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• 제30권1호
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• pp.7-12
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• 2017

3YSZ + (x) $Al_2O_3$ composites (x = 20, 40, 60, 80 wt%) were fabricated and the influences of particle sizes of $Al_2O_3$ on their microstructures and mechanical properties were investigated with XRD, SEM, vickers hardness and fracture toughness. $Al_2O_3$-3YSZ composites containing $Al_2O_3$ powder of a $0.3{\mu}m$ and an $1.0{\mu}m$, which are here in after named as $Al_2O_3$($0.3{\mu}m$)-3YSZ and $Al_2O_3$($1.0{\mu}m$)-3YSZ, respectively, were made by mixing raw materials, uni-axial pressing and sintering at $1,400^{\circ}C$, $1,500^{\circ}C$, and $1,600^{\circ}C$. $Al_2O_3$($0.3{\mu}m$)-3YSZ composites show the higher density and the better mechanical properties than $Al_2O_3$($1.0{\mu}m$)-3YSZ composites. The Vickers hardness of the $Al_2O_3$($0.3{\mu}m$)-3YSZ composites show a peak value of 1,997 Hv at the content of 60 wt% $Al_2O_3$, which is a slightly higher value in comparison with 1,938 Hv of the $Al_2O_3$($1.0{\mu}m$)-3YSZ composite. However, the fracture toughness of $Al_2O_3$-3YSZ composites monotonically increases with decreasing the content of $Al_2O_3$ without any peak values. $Al_2O_3$($0.3{\mu}m$)-3YSZ and $Al_2O_3$($1.0{\mu}m$)-3YSZ composites sintered at $1,600^{\circ}C$ have a maximum value of a $6.9MPa{\cdot}m^{1/2}$ and a $6.2MPa{\cdot}m^{1/2}$, respectively at the composition of containing 20 wt% $Al_2O_3$. It should be noticed that the mechanical properties and the sintering density of the $Al_2O_3$-3YSZ composites can be enhanced by using more fine $Al_2O_3$ powder due to their denser microstructure and smaller grain size.

• 공업화학
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• 제10권2호
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• pp.231-236
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• 1999

결정상과 분산도가 조절된 $MoO_3$/$SiO_2$ 담지촉매를 제조하여 촉매의 표면특성과 디벤조티오펜 탈황반응의 활성도를 고찰하였다. Mo의 표면담지량은 4 atoms $Mo/nm^2$이었으며, 실리카 표면 위에 형성된 $MoO_3$의 결정상은 sintered hexagonal, sintered orthorhombic, 및 dispersed hexagonal상이었다. XRD, Raman, 및 $O_2$ 흡착 결과 $MoO_3$의 표면분산도는 sintered hexagonal < sintered orthorhombic < dispersed hexagonal 순으로 증가하였다. TPR 결과 $MoO_3$ 결정은 $650^{\circ}C$에서 $MoO_2$로, $1000^{\circ}C$에서 Mo로 환원됨을 알 수 있었다. 디벤조티오펜 탈황반응을 30기압, $350{\sim}500^{\circ}C$ 온도범위에서 수행하였으며, 실험 결과 활성도는 $MoO_3$ 결정체의 $SiO_2$ 표면에서의 분산도에 비례하여 증가함을 알 수 있었다.