• Journal of the Korean Vacuum Society
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• v.1 no.1
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• pp.106-114
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• 1992

Abstract-Quantitative surface analysis of Co-Ni and Au-Cu alloys by XPS and SIMS was studied. For Co-Ni alloy, quantitative XPS analysis could be done within 1-2% relative error with pure element standards without any correction. For Au-Cu, quantitative XPS analysis was not possible without any correction. But it could be done with standard alloys of various composition within 1-2% relative error. Without standard alloys, Au-Cu alloys could be analyzed by XPS within 10% relative error with pure element standards. For SIMS analysis of Co-Ni alloys, the relative secondary ion yields of Co+/Nit has linear relation with ratio of each composition so that quantitative SIMS analysis was possible for Co-Ni alloys. Preliminary results of XPS round robin test of VAMAS-SCA Japan Project are given.

• Journal of the Korean Vacuum Society
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• v.5 no.2
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• pp.93-98
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• 1996

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.175.1-175.1
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• 2015

CuSn thin films were deposited by rf magnetron co-sputtering method with pure Cu and Sn metal targets with a variety of rf powers. CuSn thin films were studied with a surface profiler (alpha step), X-ray photoelectron spectroscopy (XPS), X-ray induced Auger electron spectroscopy (XAES), X-ray diffraction (XRD), and contact angle measurement. The thickness of CuSn thin films was fixed at $200{\pm}10nm$ and deposition rate was calculated by the measured with a surface profiler. From the survey XPS spectra, the characteristic peaks of Cu and Sn were observed. Therefore, CuSn thin films were successfully synthesized on the Si (100) substrate. The oxidation state and chemical environment of Cu and Sn were investigated with the binding energy regions of Cu 2p XPS spectra, Sn 3d XPS spectra, and Cu LMM Auger spectra. Change of the crystallinity of the films was observed with XRD spectra. Using contact angle measurement, surface free energy (SFE) and wettability of the CuSn thin films were studied with distilled water (DW) and ethylene glycol (EG).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.236-239
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• 2002

Surface states of silicone polymer treated by plasma were investigated by the analysis by x-ray photoelectron spectroscopy (XPS) and surface voltage decay. Plasma treatment causes the silica-like oxidative layer, which is confirmed with XPS, and lowers surface resistivity with increasing the plasma treatment time. Using the decay time constant of surface voltage, the calculated surface resistivity was compared with the value directly measured by a voltage-current method. A good agreement between two methods was obtained. In addition, we estimated the thermal activation energy for surface conduction, Based on our results, we could understand the relationship between surface chemical states and surface electrical properties.

• Vacuum Magazine
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• v.3 no.4
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• pp.8-13
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• 2016

The need of space-resolved x-ray photoelectron spectroscopy (XPS) has developed scanning photoelectron microscopy (SPEM). SPEM provides space-resolved XPS data from a spot of a sample as well as images of specific element, chemical state, valency distribution on the surface of a sample. Based on technical advancement of tight x-ray focusing, sample positioning accuracy, and electron analyzer efficiency, SPEM is now capable of providing ~100 nm space resolution for typical XPS functionality, and SPEM has become actively applied for the investigation of chemical state, valency, and electronic structure on the surface of newly discovered materials, such as graphene layers, dichalcogenide 2D-materials, and heterogenous new functional materials.

• International conference on construction engineering and project management
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• 2007.03a
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• pp.417-423
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• 2007

This paper describes how using the XPS Document technologies of Windows Vista support and enhances interactions with the structural design and construction process. It illustrates the document workflows and the document life cycle in a typical construction base knowledge system. It provides engineers and decision makers and implementers with information about this new technology and how they can apply it to their design and construction models. The paper also highlights opportunities for the new format of data exchange in the recent efforts to develop National Management System Standards for Transportation Applications to benefit from these emerging technologies.

• Journal of Sensor Science and Technology
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• v.5 no.1
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• pp.51-56
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• 1996

Structural properties of rf sputtered boron nitride films were studied as a function of deposition parameters such as nitrogen pressure, substrate temperature and substrate bias using X-ray photoelectron spectroscopy and Auger electron spectroscopy. Composition and information on chemical bonding of resultant films was determined by XPS. XPS core level spectra showed that ratio of boron to nitrogen varied from 3.11 to 1.45 with respect to partial nitrogen pressure. Curve fitting of XPS spectra revealed three kinds of bonding mechanism of boron in the films. XPS peak positions of both B 1s and N 1s shifted to higher energy with higher nitrogen pressure as well as increase in substrate bias voltage. AES was used to see possible contamination of films by carbon or oxygen as well.

• Journal of Radiation Protection and Research
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• v.36 no.4
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• pp.190-194
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• 2011

After the first report that electrons with sub-ionization energy of DNA could cause single strand breaks or double strand breaks to DNA, there have been various studies to investigate the mechanisms of DNA damage by low-energy electrons. In this paper, we examined the possibility of using X-ray photoelectron spectroscopy (XPS) to analyze the dissociation patterns of the molecular bonds by electron irradiation on DNA thin films and tried to establish the method as a general tool for studying the radiation damage of biomolecules by low energ yelectrons. For the experiment, pBR322 plasmid DNA solution was formed into the films on tantalum plates by lyophilization and was irradiated by 5-eV electrons. Un-irradiated and irradiated DNA films were compared and analyzed using the XPS technique.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.5
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• pp.455-459
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• 2002

I have investigated the effects of annealing on a polymeric $\alpha-C_3N_{4.2}$ at high pressure and temperature in the presence of seeds of crystalline carbon nitride films prepared by a high voltage discharge plasma. The samples were evaluated by x-ray photoelectron spectroscopy (XPS), infrared spectroscopy, Auger electron spectroscopy and x-ray diffraction(XRD). Notably, XPS studies of the film composition before and after annealing demonstrate that the nitrogen composition in $\alpha-C_3N_{4.2}$ material initially containing more than 58% nitrogen decreases during the annealing process and reaches a common, stable composition of ~43%. XPS analysis also shows that the nitrogen composition in the annealed films without polymeric $\alpha-C_3N_{4.2}$ was reduced from 35% to 17%. Furthermore the concentration of the sp$^3$bonded phase increased with the increment of the annealing temperature.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.678-679
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• 2006

The effects of particle size on the surface properties of hydro-thermally synthesized barium titanate powders were investigated by means of particle size analysis, specific surface area, SEM, zeta potential and XPS. Particle sizes were measured by laser light scattering and are in the range of 150 to 1100nm. Zeta potential increased with increasing particle size and it was large minus value in the range of particle size from 500 to 900nm, which seems to be related with the dissolution of $Ba^{2+}$ ion in these particle sizes from the analysis of surface properties by XPS.