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Huang, N.K.;Naramoto, H.
- Journal of the Korean Vacuum Society
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- v.7 no.s1
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- pp.78-84
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- 1998
Niobium ions of 380 keV energy have been implanted at 300k in sapphire with a dose of $5\times10^{16}\textrm{ions/cm}^2$ and subsequently thermal annealed up to $1100^{\circ}C$ at reducing atmosphere. The behavior of the radiation damage produced by ion implantation followed by annealing is investigated using optical absorption technique and X-ray photoelectron spectroscopy(XPS). It is found that different defects annealed are dependent on the annealing temperature owing to different mechanisms which are proposed on the basis of the optical absorption measurement, and the implanted niobium in sapphire is in different local environments with different charge states after annealing, which are analyzed by XPS measurements.
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Ernesto G. Maffia;Mercedes Munoz;Pablo A. Fetsis;Carmen I. Cabello;Delia Gazzoli;Aldo A. Rubert
- Advances in materials Research
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- v.13 no.2
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- pp.141-151
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- 2024
The aim of this work was to determine the behavior of alloy elements and compounds formed during solidification in the manufacturing process of the CuAgZrCr alloy under an oxidizing environment. Bulk and surface analysis techniques, such as Scanning Electron Microscopy (SEM), X-ray Photoelectron Spectroscopy (XPS), Raman and X-ray diffraction (XRD) were used to characterize the phases obtained in the solidification process. In order to focus the analysis on the on grain boundary interface, partial removal of the matrix phase by acid attack was performed. The compositional differences obtained by SEM-EDX, Raman and XPS on post-manufacturing materials allowed us to conclude that the composition of grain boundaries of the alloy is directly influenced by the oxidizing environment of alloy manufacturing.
https://doi.org/10.12989/amr.2024.13.2.141 인용