• 제목/요약/키워드: Win-Win

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Utilization of Simulation and Machine Learning to Analyze and Predict Win Rates of the Characters Battle

  • Kang, Hyun-Syug
    • 한국컴퓨터정보학회논문지
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    • 제25권7호
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    • pp.39-46
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    • 2020
  • 최근, 대전 게임 분야에서, 가상 캐릭터들의 효과적인 설계를 위해 캐릭터의 승률을 효율적으로 예측할 수 있는 방법들이 매우 필요하다. 우리는 본 논문에서 이 문제를 해결하기 위해 시뮬레이션과 기계 학습을 결합하는 방법을 제안한다. 우선 대전 게임에서 가상 캐릭터의 대전 승률을 분석하기 위해서 시뮬레이션을 사용하고, 가상 캐릭터의 능력치에 따라서 승률을 예측하기 위해 회귀 모델에 기반한 기계 학습 기법을 적용한다. 제안한 기법으로 실험한 결과는 시뮬레이션 결과로 나온 승률과 기계 학습 기법이 예측한 승률이 거의 차이가 없다는 것을 확인하였다. 그리고 간단한 회귀 모델에 기반한 기계 학습으로도 실험에서 좋은 성능을 얻을 수 있었다.

BASINS/WinHSPF를 이용한 남한강 상류 유역의 비점오염원 저감효율평가 (A Study on BASINS/WinHSPF for Evaluation of Non-point Source Reduction Efficiency in the Upstream of Nam-Han River Watershed)

  • 윤춘경;신아현;정광욱;장재호
    • 한국물환경학회지
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    • 제23권6호
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    • pp.951-960
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    • 2007
  • Window interface to Hydrological Simulation Program-FORTRAN (WinHSPF) developed by the United States Environmental Protection Agency (EPA) was applied to the upstream of Nam-Han river watershed to examine its applicability for loading estimates in watershed scale and to evaluate non-point source control scenarios using BMPRAC in WinHSPF. The WinHSPF model was calibrated and verified for water flow using Ministry of Construction and Transportation (MOCT, 3 stations, 2003~2005) and water qualities using Ministry of Environment (MOE, 5 station, 2000~2006). Water flow and water quality simulation results were also satisfactory over the total simulation period. But outliers were occurred in the time series data of TN and TP at some regions and periods. Therefore, it required more profit calibration process for more various parameters. As a result, all the study was performed within the expectation considering the complexity of the watershed, pollutant sources and land uses intermixed in the watershed. The estimated pollutant load for annual average about $BOD_5$, T-N and T-P respectively. Nonpoint source loading had a great portion of total pollutant loading, about 86.5~95.2%. In WinHSPF, BMPRAC was applied to evaluate non-point source control scenarios (constructed wetland, wet detention ponds and infiltration basins). All the scenarios showed efficiency of non-point source removal. Overall, the HSPF model is adequate for simulating watersheds characteristics, and its application is recommended for watershed management and evaluation of best management practices.

오염총량관리지역내 소하천에 대한 BASINS 4.0 및 WinHSPF의 적용과 유전알고리즘을 이용한 매개변수의 보정 (Application of BASIN 4.0 and WinHSPF to a Small Stream in Total Water Pollution Load Management Area and Calibration of Model Parameter using Genetic Algorithm)

  • 조재현;윤승진
    • 환경영향평가
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    • 제21권1호
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    • pp.161-169
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    • 2012
  • Recently various attempts have been made to apply HSPF model to calculate runoff and diffuse pollution loads of stream and reservoir watersheds. Because the role of standard flow is very important in the water quality modelling of Total Water Pollution Load Management, HSPF was used as a means of estimating standard flow. In this study, BASINS 4.0 and WinHSPF was applied to the Gomakwoncheon watershed, genetic algorithm(GA) and influence coefficient algorithm were used to calibrate the runoff parameters of the WinHSPF. The objective function is the sum of the squares of the normalized residuals of the observed and calculated flow and it is optimized using GA. Estimates of the optimum runoff parameters are made at each iteration of the influence coefficient algorithm. The calibration results showed a relatively good correspondence between the observed and the calculated values. The standard flow(Q275) of the Gomakwoncheon watershed was estimated using the ten years of weather data.

Dry thermal development of negative electron beam resist polystyrene

  • Con, Celal;Abbas, Arwa Saud;Yavuz, Mustafa;Cui, Bo
    • Advances in nano research
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    • 제1권2호
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    • pp.105-109
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    • 2013
  • We report dry thermal development of negative resist polystyrene with low molecular weight. When developed on a hotplate at $350^{\circ}C$ for 30 min, polystyrene showed reasonable high contrast and resolution (30 nm half-pitch), but low sensitivity. Resist sensitivity was greatly improved at lower development temperatures, though at the cost of reduced contrast. In addition, we observed the thickness reduction due to thermal development was higher for larger remaining film thickness, implying the thermal development process is not just a surface process and the more volatile chains below the top surface may diffuse to the surface and get evaporated.