• Title/Summary/Keyword: Visible transmittance

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Monitoring of Atmospheric Aerosol using GMS-5 Satellite Remote Sensing Data (GMS-5 인공위성 원격탐사 자료를 이용한 대기 에어러솔 모니터링)

  • Lee, Kwon Ho;Kim, Jeong Eun;Kim, Young Jun;Suh, Aesuk;Ahn, Myung Hwan
    • Journal of the Korean Association of Geographic Information Studies
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    • v.5 no.2
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    • pp.1-15
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    • 2002
  • Atmospheric aerosols interact with sunlight and affect the global radiation balance that can cause climate change through direct and indirect radiative forcing. Because of the spatial and temporal uncertainty of aerosols in atmosphere, aerosol characteristics are not considered through GCMs (General Circulation Model). Therefor it is important physical and optical characteristics should be evaluated to assess climate change and radiative effect by atmospheric aerosols. In this study GMS-5 satellite data and surface measurement data were analyzed using a radiative transfer model for the Yellow Sand event of April 7~8, 2000 in order to investigate the atmospheric radiative effects of Yellow Sand aerosols, MODTRAN3 simulation results enable to inform the relation between satellite channel albedo and aerosol optical thickness(AOT). From this relation AOT was retreived from GMS-5 visible channel. The variance observations of satellite images enable remote sensing of the Yellow Sand particles. Back trajectory analysis was performed to track the air mass from the Gobi desert passing through Korean peninsular with high AOT value measured by ground based measurement. The comparison GMS-5 AOT to ground measured RSR aerosol optical depth(AOD) show that for Yellow Sand aerosols, the albedo measured over ocean surfaces can be used to obtain the aerosol optical thickness using appropriate aerosol model within an error of about 10%. In addition, LIDAR network measurements and backward trajectory model showed characteristics and appearance of Yellow Sand during Yellow Sand events. These data will be good supporting for monitoring of Yellow Sand aerosols.

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Application of CMP Process to Improving Thickness-Uniformity of Sputtering-deposited CdTe Thin Film for Improvement of Optical Properties (스퍼터링 증확 CdTe 박막의 두께 불균일 현상 개선을 위한 화학적기계적연마 공정 적용 및 광특성 향상)

  • Park, Ju-Sun;Lim, Chae-Hyun;Ryu, Seung-Han;Myung, Kuk-Do;Kim, Nam-Hoon;Lee, Woo-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.375-375
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    • 2010
  • CdTe as an absorber material is widely used in thin film solar cells with the heterostructure due to its almost ideal band gap energy of 1.45 eV, high photovoltaic conversion efficiency, low cost and stable performance. The deposition methods and preparation conditions for the fabrication of CdTe are very important for the achievement of high solar cell conversion efficiency. There are some rearranged reports about the deposition methods available for the preparation of CdTe thin films such as close spaced sublimation (CSS), physical vapor deposition (PVD), vacuum evaporation, vapor transport deposition (VTD), closed space vapor transport, electrodeposition, screen printing, spray pyrolysis, metalorganic chemical vapor deposition (MOCVD), and RF sputtering. The RF sputtering method for the preparation of CdTe thin films has important advantages in that the thin films can be prepared at low growth temperatures with large-area deposition suitable for mass-production. The authors reported that the optical and electrical properties of CdTe thin film were closely connected by the thickness-uniformity of the film in the previous study [1], which means that the better optical absorbance and the higher carrier concentration could be obtained in the better condition of thickness-uniformity for CdTe thin film. The thickness-uniformity could be controlled and improved by the some process parameters such as vacuum level and RF power in the sputtering process of CdTe thin films. However, there is a limitation to improve the thickness-uniformity only in the preparation process [1]. So it is necessary to introduce the external or additional method for improving the thickness-uniformity of CdTe thin film because the cell size of thin film solar cell will be enlarged. Therefore, the authors firstly applied the chemical mechanical polishing (CMP) process to improving the thickness-uniformity of CdTe thin films with a G&P POLI-450 CMP polisher [2]. CMP process is the most important process in semiconductor manufacturing processes in order to planarize the surface of the wafer even over 300 mm and to form the copper interconnects with damascene process. Some important CMP characteristics for CdTe were obtained including removal rate (RR), WIWNU%, RMS roughness, and peak-to-valley roughness [2]. With these important results, the CMP process for CdTe thin films was performed to improve the thickness-uniformity of the sputtering-deposited CdTe thin film which had the worst two thickness-uniformities of them. Some optical properties including optical transmittance and absorbance of the CdTe thin films were measured by using a UV-Visible spectrophotometer (Varian Techtron, Cary500scan) in the range of 400 - 800 nm. After CMP process, the thickness-uniformities became better than that of the best condition in the previous sputtering process of CdTe thin films. Consequently, the optical properties were directly affected by the thickness-uniformity of CdTe thin film. The absorbance of CdTe thin films was improved although the thickness of CdTe thin film was not changed.

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