• Journal of the Korean institute of surface engineering
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• v.20 no.2
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• pp.43-48
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• 1987

Chromium and Aluminum films were deposited by evaporation technique in $3{\times}10^{-6}$ mbar vacuum level at the incident angles ranging from $0^{\circ}\;to\;60^{\circ}$ with various evaporation rates. We measured the sheet resistances and light transmittances, and observed diffraction patterns by TEM of these films. Relations among diffraction patterns, sheet resistances and light transmittances were discussed. The sheet resistances and light transmittances were shown the lowest values at 25$^{\circ}C$ of incident angle for all kinds of evaporation rates.

• Journal of the Korean Vacuum Society
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• v.3 no.1
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• pp.111-116
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• 1994

본 연구는 CdS, CdSe 분말을 불순물, flux와 혼합하여 질소 분위기에서 소결한 후 전자빔으로 증착하여 적절한 조건에서 열처리 하였다, 이 박막의 결정구조를 X-ray 회절 실험을 통하여 조사하고 제작된 CdS1-xSex 발광 소자의 전기적 특성은 Hall 효과 측정을 이용하고 광학적특성은 광발광 및 광전 류 스펙트럼, 감도, 최대 허용소비전력, 응답시간 등을 분서하교, 발광소자로서의 기능을 검토하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2009.08a
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• pp.179-179
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• 2009

• Journal of Korean Vacuum Science & Technology
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• v.6 no.1
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• pp.36-39
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• 2002

Molybdena powder was heated at both 660$^{\circ}C$ and 700$^{\circ}C$ for half-hour in an evaporation-deposition device. The molybdena thin films deposited on the surfaces of alumina ceramics displayed two kinds of fractal aggregates, i.e., the stackings of ribbon-like crystals and ramified palm-like structures. It is revealed from the experimental results that the microstructures of these fractal aggregates depended strongly on their growth conditions. The dynamics of fractal growth of molybdena thin film is discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 1995.06a
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• pp.138-138
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• 1995

• Journal of the Korean Society for Heat Treatment
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• v.14 no.5
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• pp.292-296
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• 2001

In this work, an ultra-high vacuum activated reactive evaporation equipment was built. With reaction of Al and oxygen plasma, $Al_2O_3$ was deposited on the surface of etched Al foil. The chamber was evacuated down to $2{\times}10^{-7}$ torr initially. The Ar and $O_2$ gas introduced into the chamber to maintain $5{\times}10^{-5}$ torr during deposition. Ar gas prevents recombining of the ionized oxygen. Evaporation was maintained by electron beam evaporator continuously. Heating filament and electrode were used in order to generate plasma. The substrate bias of -300V was introduced to accelerate deposition of evaporated Al atoms. The composition and morphology of deposited $Al_2O_3$ films were analyzed by x-ray photoelectron spectroscopy(XPS) and atomic force microscopy (AFM), respectively. The Al oxide was formed on the surface of etched Al foil. According to AFM results, the surface morphology of $Al_2O_3$ film indicates uniform feature. Dielectric characteristic was measured as a function of frequency. Measured withstanding voltage and capacitance were 52V and $24{\mu}F/cm^2$, respectively. The obtained $Al_2O_3$ film shows clean condition without contaminants, which could be adapted to capacitor production.

• Journal of Advanced Marine Engineering and Technology
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• v.27 no.2
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• pp.280-288
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• 2003

We need refrigeration system which can maintain the freshness of agricultural products, because of being distance from a tiller to a consumer. Vacuum Pre-cooling system has an advantage in quality maintenance through vapid cooling down by using latent heat of evaporation of stored products. A number or thawing methods in current use have also several disadvantages in thawing time. discoloration mass loss caused by drying, capital costs and running cost. These damages are, it is claimed, either eliminated or improved by the vacuum thawing system. An experimental study on the pre-cooling for the bean sprouts and cabbage, and thawing for hairtail and croaker by the low temperature vacuum system were carried out. The cabbage cooling time with this Pre-cooling vacuum system took about 60 minutes to reach from $23.2^{circ}C to 4.5^{\circ}C$ at 5 mmHg abs. ($6.66\times10^{-4}$ MPa). The croaker thawing time with this low temperature vacuum thawing system took about 170 minutes to reach from $-10.3^{circ}C to -0.8^{\circ}C$ at 20 mmHg abs ($2.67\tiems10^{-3}$MPa). The vacuum Pre-cooling and thawing system have merits compared with present systems in their short intervals to cool down and to thaw without any quality losses.

• Journal of the Korean Vacuum Society
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• v.8 no.4A
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• pp.432-437
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• 1999

We have fabricated an in situ ellipsometer operating at He-Ne wavelength. It can be applied to the real-time, in-situ tracking of the ellisometric change which occurs during various sample treatments. As a rotating analyzer type, all optical elements and related parts are designed to share a common hollow-axis configuration, and hence the ellipsometer is compact in shape and simple in design. It is mountable on the spare ports of vacuum chamber with ease. Using this ellipsometer, we observed the effective density variation of previously grown $TiO_2$ thin films by using electron beam evaporation. The packing density of the as-grown film was 82%. When exposed to atomsphere, the micro-void of the film was filled with water vapor. This water-filled $TiO_2$ thin film was subject to heating/cooling cycles in vacuum and the ellipsometric variation versus temperature and cycling number was measured in real time using this in situ He-Ne ellipsometer.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.28-30
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• 2009

PDP panels with MgO protective layer are manufactured by using the "all-in-vacuum" process we have established [1]. This is the process aiming to keep the MgO surface as clean as possible after the evaporation. The panels are evaluated in term of discharge voltage, aging time, luminance, luminous efficacy, discharge time-lag. It is confirmed that the "all-in-vacuum" process particularly improves the aging time, discharge voltage and the discharge time-lag.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.163-163
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• 2000

In this research, we used the ion irradiation technique which has an advantae in improving intentionally the properties of surface and interface in a non-equilibrium, instead of the conventional annealing method which has been known to improve the material properties in the equilibrium stat. Cu/Co multilayered films were prepared on SiN4/SiO2/Si substrates by the electron-beam evaporation for the Co layers and the thermal evaporation for the Cu layers in a high vacuum. The ion irradiation with a 80keV Ar+ was carried out at various ion doses in a high vacuum. Hysteresis loops of the films were investigated by magneto-optical polar Kerr spectroscopy at various experimental conditions. The change of atomic structure of the films before and after the ion irradiation was studied by glancing angle x-ray diffraction, and the intermixing between Co and Cu sublayers was confirmed by Rutherford backscattering spectroscopy. The surface roughness and magneto-resistance were measured by atomic force microscopy and with a four-point probe system, respectively. During the magneto-resistance measurement, we changed temperature and the direction of magnetization. From the results of experiments, we found that the change at the interfaces of the Cu/Co multilayered film induced by ion irradiation cause the change of magnetic properties. According to the change in hysteresis loop, the surface inplane component of magnetic easy axis was isotropic before the ion irradiation, but became anisotropic upon irradiation. It was confirmed that this change influences the axial behavior of magneto-resistance. Especially, the magneto-resistance varied in accordance with an external magnetic field and the direction of current, which means that magneto-resistance also shows the uniaxial behavior.