• The Transactions of The Korean Institute of Electrical Engineers
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• v.59 no.9
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• pp.1652-1657
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• 2010

This paper analyzes optimal stirrer parameter to improve field uniformity in a mode-stirred reverberation chamber. Stirrer parameter is varied about stirrer height and stirrer angle. Also we analyze quality factor, number of excited modes and stirrer efficiency that affect field uniformity. The results show good performance as higher as stirrer height. Isotropic field distribution is formed at $45^{\circ}$ stirrer angle. When stirrer angle varies, scattering characteristic of incident wave are changed. So electric field distribution in a mode-stirred reverberation chamber is also changed. Therefore, it affect field uniformity. The results expect to help that designs stirrer for get better field uniformity. Immunity test performed designed mode-stirred reverberation chamber for semiconductor that categorized by technology. Test result shows that good recurrence compared wave-guide immunity test.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.9 no.6
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• pp.21-28
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• 2010

This study shows an optimization procedure for an automatic determination on the gate position to ensure the fill-uniformity within a part cavity by using the injection molding simulation. For an optimization, the maximum pressure-difference within a part cavity induced at the stage of filling is used to evaluate degree of fill-uniformity. In addition, a direct search scheme based on the reduction of design space is developed and applied in the optimization problem. This corresponding proposed methodology was applied in the optimization on the gate location for a CD-tray molding, as a result, showed the improvement of the fill-uniformity within the cavity.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.4
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• pp.309-313
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• 2006

Pad surface characteristics such as roughness, groove and wear rate of pad have a effect on the within wafer non-uniformity(WIWNU) in chemical mechanical polishing(CMP). Although WIWNU increases as the uniformity of roughness(Rpk: Reduced peak height) becomes worse in an early stage of polishing time, WIWNU decreases as non-uniformity of the Rpk value. Also, WIWNU decreases with the reduction of the pad stiffness, though original mechanical properties of pad are unchanged by the grooving process. In addition, conditioning process causes the inequality of pad wear during in CMP. The profile of pad wear generated by the conditioning process has a significant effect on the WIWNU. These experiments results could help to understand the effect of pad surface characteristics in CMP.

• 한국전산유체공학회:학술대회논문집
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• 2010.05a
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• pp.567-570
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• 2010

With continuously increasing flat panel display size, uniformity of thin film deposition has been drawing more attentions and associated fabrication methodologies are being actively investigated. Since the convective flow field of mixture gas plays a significant role for deposition characteristics of thin film in an APCVD system, it is greatly important to maintain uniform distribution and consistent concentration of mixture gas species. In this paper, computational study has been performed for the improvement of flow uniformity of mixture gas in an APCVD reactor during thin film deposition process. A diffuser slit has bee designed to spread the locally concentrated gas flow exiting from the flow distributor. A uniform flow distributor has been developed which has less dependency on operating conditions for global flow uniformity

• Journal of the Semiconductor & Display Technology
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• v.8 no.4
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• pp.59-63
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• 2009

This paper presents two dimensional simulation results of an inductively coupled $Ar/O_2$ plasma reactor. The effects of operating conditions on the plasma properties and the uniformity of atomic oxygen near the wafer were systematically investigated. The plasma density had the linear dependence on the chamber pressure, the flow rate of the feed gas and the power deposited into the plasma. On the other hand, the electron temperature decreased almost linearly with the chamber pressure and the flow rate of the feed gas. The power deposited into the plasma nearly unaffected the electron temperature. The simulation results showed that the uniformity of atomic oxygen near the wafer could be improved by lowering the chamber pressure and/or the flow rate of the feed gas. However, the power deposited into the plasma had an adverse effect on the uniformity.

• Proceedings of the KSME Conference
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• 2000.11a
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• pp.262-267
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• 2000

This paper describes a weight in motion(WIM) sensor to measure the weight of a vehicle in motion. The main sensing element of the WIM sensor is the PVDF(Polyvinylidene fluoride) film that shows rapid response to an external excitation. Due to the property of rapid response, it is possible to measure the weight of a vehicle in motion with high speed. In the development of the WIM sensor, the dominant target value was the uniformity of the sensor. To increase the uniformity, We employed shrinkable tube made of rubber to enhance the uniformity, and performed the rolling of the brass tube repeatedly. The uniformity of the sensor was examined experimentally. It was comparable to that of a WIM sensor of the MSI which was the benchmark of this development. This paper also describes the mechanical modeling of the sensor and the suitable charge amplifier for the sensor.

• Journal of Pharmaceutical Investigation
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• v.6 no.2
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• pp.58-68
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• 1976

120 tablets of 25mg phenformin hydrochloride tablet and 4mg chlorpheniramine maleate tablet, respectively, were assayed and analyzed to obtain basic data on the content uniformity of domestic pharmaceuticals. All of the tablets of phenformin hydrochloride and that of chlorpheniramine maleate were met the requirements of the test for weight variation and content but no regularity was found in the content unformity specifications. In case of chlorpheniramine maleate tablets, standard deviation of active ingredient content of B maker was 4.1% and that of C maker 7.1%.

• Journal of the Semiconductor & Display Technology
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• v.3 no.3
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• pp.41-44
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• 2004

The aim of this study is the confirmation of the coating uniformity affected by the surface tension and wall attachment angle in a slit-coater model. In this work, we use the commercial code (Fluent) to solve the two-phase flow formed with air and photo resist numerically. The results show that the surface tension is the most important factor to determine the coating efficiency in the view of coating uniformity, and the coating uniformity is 2% for our slit-coater model and conditions. To improve the coating uniformity, it is in need of minimization of the sidewall effect of slit-coater.

• Korean Journal of Remote Sensing
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• v.26 no.6
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• pp.645-652
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• 2010

The performance of the payload Electro-Optical System (EOS) in satellite system is affected by various factors, such as optics design, camera electronics design, and the characteristics of the CCD (Charge Coupled Device) used, etc. Of these factors, the camera electronics design is somewhat unique in that its operational parameters can be adjusted even after the satellite launch. In this paper, the effect of video gain on the non-uniformity correction performance is addressed. And a new optimal non-uniformity correction scheme is proposed and analyzed using the data from real camera electronics unit based on a TDI (Time Delayed Integration) type of CCD. The test results show that the performance of the conventional non-uniformity correction scheme is affected significantly when the video gain is added. On the other hand, in our proposed scheme, the performance is not dependent on the video gain. The insensitivity of the non-uniformity performance on the video-gain is mainly due to the fact that the correction is performed after the dark signal is subtracted from system response.

• Journal of the Korean Society of Visualization
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• v.16 no.3
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• pp.59-64
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• 2018

Numerical simulations were carried out to analyze the flow characteristics of the wind tunnel. Flow field characteristics with velocity uniformity at the test sections are largely affected by inlet conditions of air flow rate and temperature. Axial average velocity of the flow field inside the test area was almost linearly decreased by 0.026% each 1m. The uniformity distributions of axial velocity showed the highest reduction rate of about 24% between nozzle outlets 1 ~ 2m. In addition, average velocity and the uniformity are increased with air temperature in the wind tunnel due to density variation. The results of this paper are expected to be useful for the basic design of wind tunnel and to be used for efficient design.