• Title/Summary/Keyword: Ultrasonication

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Size and Dispersion Characteristics of Silver Nanoparticles Prepared Using Liquid Phase Reduction Method (액상환원법으로 제조한 은 나노입자의 크기와 분산특성)

  • Lee, Jong Jib
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.17 no.5
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    • pp.10-16
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    • 2016
  • This work investigates the size and dispersion characteristics of silver nanoparticles synthesized by a liquid phase reduction method using PAA. The experimental variables were the molecular weight and doses of the PAA, reducing agent, dispersant, and organic solvent (ethanol-acetone). UV-visible spectrophotometer results confirm the formation of the silver particles, and SEM indicates size in the nanometer range. As the ultrasonication time increases, there is a tendency toward smaller agglomerates of nanoparticles. The agglomerates were dispersed into 1-5 agglomerates of particles by ultrasonication for 3 hours or more. Relatively spherical nanoparticles were produced with a completely homogeneous dispersion and size of 49.56-85.75 nm by ultrasonication using BYK-192, a dispersant containing copolymer with a pigment affinic group. The average size of the silver nanoparticles was increased to 36.82, 50.66, and 56.06 nm with increasing molecular weight of PAA. Also, the size of the nanoparticles increased with the capping of PAA on the surfaces of the nanoparticles when increasing the amount of PAA. The addition of hydrazine as a reducing agent produced relatively small particles because many nuclei were created by the reduction reaction. The ethanol-acetone solvent helped with the regular arrangement of the silver nanoparticles.

The Nitrogen and Phosphorus Removal of MUNR Process Using Sludge Carbon Source (초음파처리 슬러지 탄소원을 첨가한 침지헝 분리막공법의 질소, 인 처리에 관한 연구)

  • 김영규;황성희
    • Journal of Environmental Health Sciences
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    • v.28 no.5
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    • pp.1-3
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    • 2002
  • This study was to evaluate on the removal efficiencies of total nitrogen and phosphorus in municipal wastewater at MUNR process using sludge carbon source for environmental micro-organism. The removal efficiencies of total suspended solid were 85.9~91%, total nitrogen were 38.6~87.2% and total phosphorus were 30.8~39.0%, respectively. It was shown that removal efficiency of nitrogen was effectively influenced by sludge carbon source treated with ultrasonication. The removal efficiency of total phosphorus was low because the sludge was not wasted during this treatment.

Dispersion Characteristics of Wettable Powder Suspension by Ultrasonication (초음파 처리에 의한 수화제 현탁액의 분산 특성)

  • 송민근;나우정;주은선;강규영;이경열
    • Proceedings of the Korean Society for Agricultural Machinery Conference
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    • 2003.02a
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    • pp.434-439
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    • 2003
  • 20세기 후반부에 이르러 초음파는 과학 및 산업분야 전반에 걸쳐 다각도로 활용 및 응용되고 있다. 본 연구는 초음파를 이용한 분무입경의 미세화 및 균일입경의 분무를 위한 초음파 응용기기의 설계를 위한 선행연구로서 초음파 에너지에 의한 고형성분의 파쇄여부를 측정하였다. 초음파 에너지를 부가한 후, 즉 초음파 처리된 상태에서의 수화제의 물리적인 파쇄특성을 광학현미경과 SEM을 이용하여 관찰하였다. (중략)

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Electrodeposition of Nano TiO2 Powder Dispersed Nickel Composite Coating (전기도금법을 이용한 나노 산화티타늄 니켈 복합도금에 관한 연구)

  • Park, So-Yeon;Lee, Jae-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.4
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    • pp.65-69
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    • 2012
  • Composite coating can be manufactured during the electroplating with the bath containing a suspension of particles: ceramic, polymer, nanopowders. Improvement of hardness, wear resistance, corrosion resistance and lubrication properties are well-known advantage of composite coating. In this study, nano $TiO_2$ powder dispersed Ni composite plating was investigated. The improvement of surface hardness and photo decomposition effects can be expected in this coating. Zeta potential was measured with pH. The effect of ultrasonication time and types of ultrasonicator were studied to minimize the agglomeration of $TiO_2$ nanopowders in the electrolyte. Optimum conditions for nano $TiO_2$ dispersed Ni composite coating were $40mA/cm^2$ of current density, pH 3.5, and $50^{\circ}C$. At these conditions, $TiO_2$ nanoparticles contents in the Ni deposit was 15-20 at.%.

Separation of 6-Gingerol from Ginger [Zingiber officinale Roscoe] and Antioxidative Activity (생강으로부터 6-Gingerol의 분리 및 항산화 활성)

  • Lee, Bong-Soo;Ko, Meyong-Seok;Kim, Hyun-Jong;Kwak, In-Seob;Kim, Dong-Ho;Chung, Bong-Woo
    • KSBB Journal
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    • v.21 no.6 s.101
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    • pp.484-488
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    • 2006
  • Ginger (Zingiber officinale) is widely used as a dietary condiment throughout the world. Its major constituent, 6-gingerol, exhibits diverse pharmacological activities including anti-oxidant and anti-tumor. Ginger were extracted by 0% to 95% ethanol. Maximum yield of 6-gingerol was obtained with 80% ethanol as extracting solvent at $30^{\circ}C$. We obtained increased yield (7%) of extraction by pretreatment with ultrasonication. Gingerols in the crude ginger extract was isolated by Sepacore preparative liquid chromatography on silica gel. We got the 6-gingerol which weight is 0.53 mg/mL, from fraction F9. Antioxidant effect of 6-gingerol were detected by DPPH moth(10. Its radical scavenging activity was $95{\sim}99%$ which compared with ascorbic acid.

Efficient Stripping of High-dose Ion-implanted Photoresist in Supercritical Carbon Dioxide (초임계 이산화탄소를 이용한 고농도이온주입 포토레지스트의 효율적인 제거)

  • Kim, Do-Hoon;Lim, Eu-Sang;Lim, Kwon-Taek
    • Clean Technology
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    • v.17 no.4
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    • pp.300-305
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    • 2011
  • A mixture of supercritical carbon dioxide and a co-solvent was employed to strip a high-dose ion-implanted photoresist (HDIPR) from the surface of semiconductor wafers. The stripping efficiency was highly improved by the physical force generated from a ultrasonication tip inside the reactor. In addition, helium gas was injected in the reactor as a barrier gas before the introduction of pure supercritical $CO_2$ ($scCO_2$), which reduced the rinsing time significantly. The effect of co-solvents on the stripping efficiency was investigated. The wafer surfaces were analyzed by scanning electron microscopy and by an energy dispersive X-ray spectrometer.

Stripping of High-Dose Ion-Implanted Photoresist Using Co-solvent and Ultra-sonication in Supercritical Carbon Dioxide (초임계이산화탄소 내에서 공용매 및 초음파를 이용한 고농도이온주입 포토레지스트의 제거)

  • Kim, Seung-Ho;Lim, Kwon-Taek
    • Clean Technology
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    • v.15 no.2
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    • pp.69-74
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    • 2009
  • A high-dose ion-implanted photoresist (HDIPR) was stripped off from the surface of a semiconductor wafer by using a mixture of supercritical carbon dioxide and a co-solvent. The additional ultrasonication improved the stripping efficiency remarkably and thus reduced the stripping time by supplying physical force to the substrate. We investigated the effect of co-solvents, co-solvent concentration, and stripping temperature and pressure on the stripping efficiency. The wafer surfaces before and after stripping were analyzed by scanning electron microscopy and by an energy dispersive X-ray spectrometer. The HDIPR could be stripped off completely in 3 min with 10%(w/w) acetone/sc$C0_2$ mixture at 27.6 MPa and 343 K.