• Journal of Magnetics
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• v.8 no.1
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• pp.7-12
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• 2003

The method for evaluation of the particle size distribution of fine particles from hysteresis loop measurements is Presented. The method is illustrated on the SiO$_2$-based Co nanoparticle systems. The influence of technological conditions of sample preparation onto particle size distribution is investigated.

• Applied Chemistry for Engineering
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• v.8 no.6
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• pp.901-906
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• 1997

Ultrafine silicon dioxide($SiO_2$) powder was prepared from tetraethylorthosilicate(TEOS) by the gas-phase reaction. The effects of reaction temperature, flow rate of gas, TEOS concentration, and preheating temperature of reactants on the particle size were investigated. As the reaction temperature increased, average particle size of the silicone dioxide powder became smaller. Smaller particles were also obtained with decreasing the residence time of reactants in the reaction zone. Larger particles having narrow size distribution were produced with the high concentrations of the reactants. The effect of the preheating temperature was not considerable on the average particle size. The range of average particle size was from 30 nm to 58 nm depending on experimental conditions.

• Proceedings of the IEEK Conference
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• 2001.10a
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• pp.715-718
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• 2001

This study uses traditional alum coagulation and sedimentation process to treat CMP wastewater from cleaning after polishing. The primary goal is to successfully recycle both solid fines and water for semiconductor manufacturing. Results indicated that CMP wastewater may be successfully treated to recover clean water and fine particles by alum coagulation. The optimum operating conditions for coagulation are as fellowing: alum dosage of 10 ppm, pH at 5, rapid mixing speed at 800 rpm, 5 min rapid mixing time, and long slow mixing time. The treated water with low turbidity and an average residual aluminum ion concentration of 0.23 ppm may be considered for reuse. The settled sludge after alum coagulation contains mainly SiO$_2$particle with a minor content of aluminum (1.7 wt%) may be considered as raw materials for glass and ceramic industry.

• Journal of the Korean Ceramic Society
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• v.40 no.12
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• pp.1202-1207
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• 2003

Using a recently developed Hybric Plasma-Particle Accelerating Impact Deposition (HP-PAID) process, synthesis of nanostructured silicon coatings has been investigated by injecting vapor-phase TEOS (tetraethosysilane, (C$_2$H$\_$5/O)$_4$Si) into an Ar hybrid plasma. The plasma jet with reactants was expanded through nozzle into a deposition chamber, with the pressure dropping from 700 to 10 torr. Ultrafine particles accelerated in the free jet downstream of the nozzle, deposited by an inertial impaction onto a temperature controlled substrate. By using this process, nanostructured amorphous silicon coatings with grain size smaller than 10 nm could be synthesized. These samples were annealed in an Ar and crystallized at 900$^{\circ}C$ for 30 min. TEM analysis showed that the annealed coatings were also composed of nanoparticles smaller than 10 nm, which showed a good consistency that the average grain size of 7 nm was also estimated from a peak shift of 2.39 cm$\^$-1/ and Full Width at Half Maximum (FWHM) 5.92 cm$\^$-1/ of Raman analysis. The noteworthy is that a strong PL peak at 398 nm was also obtained for this sample, which indicates that the deposited coatings also contained 3∼4 nm nanostructured grains.