• Title/Summary/Keyword: Ultra high pressure

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Degradation of Ultra-thin SiO2 film Incorporated with Hydrogen or Deuterium Bonds during Electrical Stress (수소 및 중수소가 포함된 실리콘 산화막의 전기적 스트레스에 의한 열화특성)

  • Lee, Jae-sung;Back, Jong-mu;Jung, Young-chul;Do, Seung-woo;Lee, Yong-hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.11
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    • pp.996-1000
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    • 2005
  • Experimental results are presented for the degradation of 3 nm-thick gate oxide $(SiO_2)$ under both Negative-bias Temperature Instability (NBTI) and Hot-carrier-induced (HCI) stresses using P and NMOSFETS, The devices are annealed with hydrogen or deuterium gas at high-pressure $(1\~5\;atm.)$ to introduce higher concentration in the gate oxide. Both interface trap and oxide bulk trap are found to dominate the reliability of gate oxide during electrical stress. The degradation mechanism depends on the condition of electrical stress that could change the location of damage area in the gate oxide. It was found the trap generation in the gate oxide film is mainly related to the breakage of Si-H bonds in the interface or the bulk area. We suggest that deuterium bonds in $SiO_2$ film are effective in suppressing the generation of traps related to the energetic hot carriers.

Biochemical and NMR Characterization of MTH1880 Mutant Proteins for Folding-Unfolding Studies

  • Kim, Hee-Youn;Ryu, Soo-Young;Yun, Ji-Hye;Kim, Suhk-Mann;Chang, Ik-Soo;Lee, Weon-Tae
    • Bulletin of the Korean Chemical Society
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    • v.31 no.12
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    • pp.3521-3524
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    • 2010
  • MTH1880 is a hypothetical protein derived from Methanobacterium thermoautotrophicum, thermophilic methanogen. The solution structure determined by NMR spectroscopy showed that it has a novel $\alpha+\beta$-fold with a highly acidic ligand binding pocket. Since MTH1880 maintains its ultra-stable structural characteristics at both high temperature and pressure, it has been considered as an excellent model for studying protein folding. To initiate the structural and folding study of MTH1880 in proving its unusual stability, we performed the site directed mutagenesis and biochemical analysis of MTH1880 mutants. Data from circular dichroism and NMR spectroscopy suggest that the point mutations perturbed the structural stability of protein even though the secondary structure is retained. This study will provide the useful information in understanding the role of participating residues during folding-unfolding process and our result will be used in designing further folding experiments for hyper-thermopile proteins like MTH1880.

COSMIC RAY ACCELERATION AT COSMOLOGICAL SHOCKS: NUMERICAL SIMULATIONS OF CR MODIFIED PLANE-PARALLEL SHOCKS

  • KANG HYESUNG
    • Journal of The Korean Astronomical Society
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    • v.36 no.3
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    • pp.111-121
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    • 2003
  • In order to explore the cosmic ray acceleration at the cosmological shocks, we have performed numerical simulations of one-dimensional, plane-parallel, cosmic ray (CR) modified shocks with the newly developed CRASH (Cosmic Ray Amr SHock) numerical code. Based on the hypothesis that strong Alfven waves are self-generated by streaming CRs, the Bohm diffusion model for CRs is adopted. The code includes a plasma-physics-based 'injection' model that transfers a small proportion of the thermal proton flux through the shock into low energy CRs for acceleration there. We found that, for strong accretion shocks with Mach numbers greater than 10, CRs can absorb most of shock kinetic energy and the accretion shock speed is reduced up to $20\%$, compared to pure gas dynamic shocks. Although the amount of kinetic energy passed through accretion shocks is small, since they propagate into the low density intergalactic medium, they might possibly provide acceleration sites for ultra-high energy cosmic rays of $E\ll10^{18}eV$. For internal/merger shocks with Mach numbers less than 3, however, the energy transfer to CRs is only about $10-20\%$ and so nonlinear feedback due to the CR pressure is insignificant. Considering that intracluster medium (ICM) can be shocked repeatedly, however, the CRs generated by these weak shocks could be sufficient to explain the observed non-thermal signatures from clusters of galaxies.

Effect of Injection Temperature Condition on Root Mean Square and Peak-to-Valley of F-theta Lens (사출온도조건이 에프세타 렌즈의 표면조도와 표면형상에 미치는 영향에 관한 연구)

  • Park, Yong-Woo;Moon, Seong-Min;Lyu, Sung-Ki
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.20 no.6
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    • pp.114-120
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    • 2021
  • This study is focused on the root mean square and peak-to-valley based on the injection conditions of the f-theta lens, one of the main components of laser printers and laser scanning systems. The f-theta lens of an aspherical plastic lens requires ultra-preaction. Injection molding is typically used for the mass production of aspherical plastic lenses. In the injection-molding method, the resin in the lens shape is filled with the resin after melting the plastic pellets at a constant temperature and then cooled. It is necessary to maintain a uniform injection molding system to produce high-quality lenses. These injection-molding systems are influenced by different factors, such as pressure, speed, temperature, mold, and cooling. It is possible to obtain a lens that exhibits the optical characteristics required to achieve harmony. We investigated the root mean square and peak-to-valley caused by variations in temperature, a critical parameter in the melting and cooling of plastic resins generated inside and outside the injection mold.

Effect of Injection Molding Conditions of Effective Surface Properties of F-theta Lens (사출 성형 조건이 에프세타 렌즈의 유효면 특성에 미치는 영향)

  • Park, Yong-Woo;Zhang, Qi;Moon, Seong-Min;Lyu, Sung-Ki
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.20 no.9
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    • pp.20-27
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    • 2021
  • The effective surface of lens was studied for injection molding process and to enable mass production of f-theta lens, which is the primary component of laser printers and laser scanning systems. Injection molding is an optimal method if f-theta lens is frequently used for the mass production of plastic lenses as an aspherical lens that requires ultra-precision. A uniform injection molding system should be maintained to produce high quality lenses. Additionally, to maintain these injection molding systems, various factors such as pressure, speed, temperature, mold and cooling should be considered. However, a lens with the optical characteristics of an f-theta lens can be obtained. The effects of melting and cooling of plastic resin on the effective surface of f-theta lenses and the numerous factors that affect the injection molding process were studied.

Comparison of Wear Amount of Surface Coating Layers on Dies for Cold-Stamped Products with MART1470 (MART1470 판재 냉간 프레스 성형용 금형 코팅층의 마모량 비교)

  • Son, M.K.;Kim, S.H.
    • Transactions of Materials Processing
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    • v.31 no.1
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    • pp.11-16
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    • 2022
  • In this paper, wear characteristics of PVD coatings were compared on the die surface for cold stamping of MART1470 steel sheet with the finite element analysis and the pin-on-disc wear test. Three types of PVD coatings (CrN, TiAlCrN, and MoS2TiCr(W)N) were considered for the tool surface made of STD11 material. The stamping process of an auto-body part was analyzed with the finite element method. Ranges of process variables for the wear test such as contact pressure, relative speed, and sliding distance were predicted from analysis results. In order to quantitatively analyze wear characteristics of each coating, the amount of wear was measured and compared according to process variables with the pin-on-disc wear test. The influence of each process variable was investigated and the wear characteristics of the three coating layers were quantitatively compared. It was confirmed that the wear characteristics of MoS2TiCr(W)N coating were better than those of CrN and TiAlCrN. It was noted that the proposed prediction approach could predict and respond to the wear phenomenon occurring in the stamping process.

Densification Study of K+-beta-aluminas Prepared from Their Ultra-fine Milled Powder (초미세 분쇄 분말로 제조된 K+-beta-aluminas의 치밀화 연구)

  • Shin, Jae-Ho;Kim, Woo-Sung;Lim, Sung-Ki
    • Applied Chemistry for Engineering
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    • v.16 no.5
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    • pp.648-652
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    • 2005
  • A super ionic conductor, $K^+$-beta-aluminas, which is known to be difficult to obtain in the form of dense sintered density under atmospheric pressure, was pulverized to 350 nm mean particle size using attrition mill. The sample were pressed into tablet form by uniaxial pressing. The specimen was sintered under atmospheric pressure in powder form. Sintering temperature range was $1400^{\circ}C$ to $1650^{\circ}C$ at $50^{\circ}C$ intervals. Additionally, zone sintering was carried out to control the growth grain at high temperature ($1600^{\circ}C$). The density of specimens that were sintered at $1600^{\circ}C$ and $1650^{\circ}C$, and sintered at $1600^{\circ}C$ by zone sintering were about 93% and 95%, respectively. In the case of the lengthened sintering time to 2 h, the density of specimen was reduced to lower than 90%, since the particles were grown to the duplex microstructure.

Chemical vapor deposition of copper thin films for ultra large scale integration (초고집적회로를 위한 구리박막의 화학적 형성기술)

  • 박동일;조남인
    • Journal of the Korean Vacuum Society
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    • v.6 no.1
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    • pp.20-27
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    • 1997
  • We have investigated the formation techniques of copper thin films which would be useful for sub-quarter-micron integrated circuits. A chemical vapor deposition technology has been tried for the better side wall formation of the thin films, and a metal organic compound, named (hface)Cu(VTMS) (hexafluoroacetylacetonate vinyltrimethylsilane copper(I)) was used as the precursors. We have deposited the copper thin films on TiN and $SiO_2$substrates. The film resistivity and deposition selectivity have been measured as functions of substrate temperature and chamber pressure. Best electrical properties were obtained at $180^{\circ}C$ of substrate temperature and 0.6 Torr of chamber pressure. Under the optimum deposition conditions, polycrystalline copper structures were observed to be grown, and the deposition rate of 120 nm/min was measured. The electrical resistivity as low as 0.25$mu \Omega$.cm, and the surface roughness of 15.5 nm were also measured. These are the suitable electrical and material properties required in the sub-quarter-micron device fabrication. Also, in the substrate temperature range of 140-$250^{\circ}C$, high deposition selectivity was observed between TiN and $SiO_2$.

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A Pilot-Scale Microfiltration/Ultrafiltration system for Drinking Water Treatment (상수처리를 위한 파일롯 규모의 정밀여과/한외여과 시스템)

  • Kim, Hanseung;Oh, Jeongik;Kim, Chunghwan
    • Journal of Korean Society of Water and Wastewater
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    • v.18 no.6
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    • pp.770-777
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    • 2004
  • Three pilot-scale membrane systems were operated using lake water as influent in this study. Microfiltration (MF) membrane with pore size of 0.01 m was used in Systen I of which filtration mode was set at constant pressure of $1kgf/cm^2$. Ultrafiltration (UF) membranes with molecular cutoff (MWCO) of 80,000 and 13,000 were used in System II-1 and II-2, respectively. Constant flow mode was applied at the range between 0.7 and $1.5m^3/m^2{\cdot}d$ (average of $1.1m^3/m^2${\cdot}d) for System II-1 and between 0.37 and $1.65m^3/m^2{\cdot}d$ (average of $1.18m^3/m^2{\cdot}d$) for System II-2. In System I, the flux changed from $1m^3/m^2{\cdot}d$ to $0.2m^3/m^2{\cdot}d$ during the operation time of 5 months. System II showed recovery of 94% under the allowable maximum pressure of $3kgf/cm^2$ during the same operation period. From these results, the efficient operation was observed in constant flow mode with respect to filtration time and recovery. Average filtrate turbidity showed 0.0071 NTU in System I and 0.0054 NTU in System II, which implied that high turbidity removal was obtained in both MF and UF systems with no significant difference between MF and UF. From the fact that membrane flux depends largely on membrane type and operation mode, a guideline of optimum design and operation should be suggested for application of membrane systems to full scale water treatment.

Optical Behavior and Electrical Properties of Functional Dendrimer Thin Films (기능성 덴드리머 박막의 광학적 거동 및 전기적 특성)

  • 박재철;정상범;권영수
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.5
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    • pp.201-205
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    • 2003
  • We synthesized dendrimers containing light switchable units, azobenzene group. And the dendrimer containing 48 pyridinepropanol functional end group, which could form a complex structure with metal ions was synthesized. To apply to the molecular level devices or data storage system using Langmuir-Blodgett(LB) film, we firstly investigated the monolayer behavior using the surface pressure-area($\pi$-A) isotherms at air-water interface. And then the surface pressure shift of monolayer by light irradiation was also measured to the dendrimer with azobezene group. As a result, the monolayer of dendrimer with azobenzene group showed the reversible photo-switching behavior by the isomerization of azobenzene group in their periphery. The samples for electrical measurement were fabricated to two types which were pure dendrimer with pyridinepropanol group and its complexes with $Pt^4+$ ions by LB method. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage(I-V) characteristics of Metal/Dendrimer LB films/Metal(MIM) structure. And we have investigated different results in the surface activity at the air-water interface as well as the electrical properties for the monolayers of pure dendrimer with pyridinevopanol group and its complex with $Pt^4+$ ions. In conclusion, it is demonstrated that the metal ion around dendrimer with pyri야nepropanol group can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties. This results suggest that the dendrimers with azobenzene group and pvridinedropanol group can be applied to high efficient nano-device of molecular level.