• Title/Summary/Keyword: UV-c

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Pattern Dyeing of Cationized Cotton Fabrics by Ultra Violet Rays Irradiation (자외선조사에 의한 Cation화 면직물의 문양염색)

  • 김인회;이인석;남성우
    • Textile Coloration and Finishing
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    • v.14 no.2
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    • pp.1-8
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    • 2002
  • Cotton fabrics dipped in cationic agent(3-chloro-2-hydroxypropyl trimethyl ammonium chloride) were irradiated with deep Ultra Violet Rays(UV), in the region of UV-C using the low pressure mercury lamp. The chemical changes of cationized cotton fabric surfaces were investigated by FT-IR analysis. The dyeabilities of the irradiated portions were investigated by dyeing with acid dyes. Deep UV(UV-C) irradiation broke O-H bonds in cotton fiber and oxidized the fibers. The dyeability of the UV irradiated portion were different from that of the portion not irradiated. Various pattern were gained from one bath dig dyeing by pattern mask. The tensile strengths of cotton fabrics were decreased in the UV irradiated portion. Washing fastness of cotton dyeings were good about 3∼4 grade and light fastness were fair about 2∼3 grade.

A Study on Liquid Crystal Alignment effects by UV Alignment Method on a Diamond-Like-Carbon Thin Film Surface (Diamond-Like-Carbon 박막표면에 UV 배향법을 이용한 액정 배향 효과에 관한 연구)

  • 황정연;조용민;서대식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.3
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    • pp.214-218
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    • 2003
  • We studied the nematic liquid crystal (NLC) aligning capabilities by the UV alignment method on a diamond like carbon (DLC) thin film surface A good LC alignment by UV exposure on the DLC thin film surface at 200${\AA}$ of layer thickness was achieved. Also, a good LC alignment by the UV alignment method on the DLC thin film surface was observed at annealing temperature of 180$^{\circ}C$. However, the alignment defect of the NLC was observed above annealing temperature of 200$^{\circ}C$. Consequently, the good thermal stability of LC alignment by the UV alignment method o the DLC thin film surface can be achieved.

Effects of UV irradiation on the crystalline phase with$Li_2O-Al_2O_3-SiO_2-K_2O$system ($Li_2O-Al_2O_3-SiO_2-K_2O$ 계어서의 UV조사 시간에 따른 결정상 생성에 관한 연구)

  • 이명원;강원호
    • Electrical & Electronic Materials
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    • v.10 no.2
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    • pp.166-171
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    • 1997
  • The photomachinable glass-ceramics of Ag and CeO$_{2}$ added to Li$_{2}$O-Al$_{2}$O$_{3}$-SiO$_{2}$-K$_{2}$O glass system was investigated as a function of UV irradiation time. The temperature of optimum nucleation and crystal growth temperature were confirmed at 525.deg. C, 630.deg. C respectively using DTA and TMA. The phases of Li$_{2}$O.SiO$_{2}$ habit were lath-like and/or dendrite type and [002] direction of Li$_{2}$O.SiO$_{2}$ / Li$_{2}$O.2SiO$_{2}$ phases were changed according to the UV irradiation time by 400 W, 362 nm UV light source. Under that condition, the optimum UV irradiation time was 5 min.

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Effect of Nitrite and Nitrate as the Source of OH Radical in the O3/UV Process with or without Benzene

  • Son, Hyun-Seok;Ahammad, A.J. Saleh;Rahman, Md. Mahbubur;Noh, Kwang-Mo;Lee, Jae-Joon
    • Bulletin of the Korean Chemical Society
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    • v.32 no.spc8
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    • pp.3039-3044
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    • 2011
  • This study suggests the prediction model for the concentration variation of $NO_2{^-}$ and $NO_3{^-}$ along with the rate constants of all reactions during ozonation under UV radiation ($O_3$/UV process). While $NO_2{^-}$ was completely converted into $NO_3{^-}$ during the $O_3$-only process, the production of $NO_2$ radical or $N_2O_4$ was expected in the $O_3$/UV process. In addition, the quenching of OH radicals, by $NO_2$ radical in the $O_3$/UV process, resulted in regeneration of $NO_2{^-}$. However, the regeneration of $NO_2{^-}$ was not observed in the $O_3$/UV process in the presence of $C_6H_6$ where the concentrations of $NO_2{^-}$ and $NO_3{^-}$ were significantly reduced compared to in the process without $C_6H_6$. The pseudo-first order rate constants of all species were calculated with and without the presence of $C_6H_6$ to predict the variation of concentrations of all species during the $O_3$/UV process. It was suggested that $NO_2{^-}$ and $NO_3{^-}$ in the $O_3$/UV process can be more effectively removed from an aqueous system with an OH radical scavenger such as $C_6H_6$.

Influence of UV-B Radiation on Photosynthesis, Growth and Pigmentation of Chondrus ocellatus (Rhodophyta) from Shallow Water

  • Taejun Han;Han, Young-Seok;Cho, Man-Gee;Park, Jin-Hee;Goo, Jae-Gun;Kang, Sung-Ho
    • Korean Journal of Environmental Biology
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    • v.21 no.4
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    • pp.368-376
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    • 2003
  • The UV-B sensitivity was tested for the intertidal species Chondrus ocellatus from Korea, by measuring photosynthesis estimated as effective quantum yield ($\Phi_{PSII}$) of photosystem II (PS II), growth and content and composition of photosynthetic pigments and UV-absorbing pigments (UVAPs). The $$\Phi_{PSII}$ of the alga decreased with increasing time of exposure to UV-B radiation, followed by fast and nearly full recovery indicating dynamic photoinhibiton. Fresh weight-based growth and pigment contents of C. ocellatus were not seriously affected by UV-B radiation. A single broad peak at 327 nm was obtained from methanol extracts of C. ocellatus, and the absorbance peak increased with increasing UV. The single peak was resolved into three peaks (311, 330 and 336 nm) by the fourth -derivative, and quantitative change in response to UV-B radiation occurred only at 330 nm. High performance liquid chromatography (HPLC) analysis of purified extracts indicated that three MAAs (mycosporine-like amino acids) are present, asterina 330, palythine and shinorine. Field observations during three growing months showed that C. ocellatus exhibit the highest amount of UVAPs in May followed by July and little trace in September, coinciding with the species' phenology. In an ecological context, dynamic photoinhibition as well as accumulation of UVAPs may enable the shallow water red alga C. ocellatus to be well adapted to high UV-B environments.

Determination of C3G Content in Blackish Purple Rice using HPLC and UV-Vis Spectrophotometer

  • Ryu, Su-Noh;Park, Sun-Zik;Kang, Sam-Sik;Han, Sang-Jun
    • KOREAN JOURNAL OF CROP SCIENCE
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    • v.48 no.5
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    • pp.369-371
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    • 2003
  • Cyanidin 3-glucoside (C3G) content contained in the grains of blackish purple rice varieties, Heugjinjubyeo, Kilimheugmi, Heugnambyeo, Sanghaehy-anghyeolla, and the progenies derived from their crosses was evaluated by HPLC and UV-Vis spectroscopy. C3G content was higher in the range of 10-30% by using UV-Vis method compared to HPLC method. A significant linear relationship was, however, observed between two analytical methods. The correlation coefficient was 0.98. Thus, this results suggested that it would be able to use UV-Vis spectroscopy to determine C3G content which does not demanded precise value like selection.

Analyses of Additives Applied in a Polycarbonate (폴리카보네이트에 사용된 첨가제의 분석)

  • Kim, Seog-Jun
    • Analytical Science and Technology
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    • v.13 no.3
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    • pp.282-290
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    • 2000
  • In this study, polymer additives were extracted and separated by Soxhlet extraction method and the dissolution-precipitation method from a polycarbonate (optical grade) which completely absorbed UV light below 390 nm. Analytical techniques such as UV-Vis spectroscopy, FT-IR, and HPLC were applied to analyze additives in polycarbonate. Separated materials from the polycarbonate may be a complex mixture containing additives such as UV stabilizer, antioxidants (primary and secondary), monomers, and oligomers. Several compounds such as bisphenol A, Irganox 1010, and Cyasorb UV-5411 were identified by chromatograms and UV spectra obtained from RP HPLC analysis using Bondapak $C_{18}$ column, methanol mobile phase, and a photodiode array (PDA) detector. Also, the content of UV-5411 in the polycarbonate was about 0.12 wt% by a quantitative analysis through UV spectroscopy.

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Dry Cleaning of Si Contact Hole using$UV/O_3$ Method ($UV/O_3$을 이용한 Si contact hole 건식세정에 관한 연구)

  • 최진식;고용득;구경완;김성일;천희곤
    • Electrical & Electronic Materials
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    • v.10 no.1
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    • pp.8-14
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    • 1997
  • The UV/O$_{3}$ dry cleaning has been well known in removing organic molecules. The UV/O$_{3}$ dry cleaning method was performed to clean the Si wafer surfaces and contact holes contaminated by organic molecules such as residual PR. During the cleaning process, the Si surfaces were analyzed with X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and ellipsometer. When the UV/O$_{3}$ dry cleaning at 200'C was performed for 3 minutes, the residual photoresist was almost removed on Si wafer surfaces, but Si surfaces were oxidized. For UV/O$_{3}$ application of contact hole cleaning, the contact string were formed using the equipment of ISRC (Inter-university Semiconductor Research Center). Before Al deposition, UV/O$_{3}$ (at 200.deg. C) dry cleaning was performed for 3 minutes. After metal annealing, the specific contact resistivity was measured. Because UV/O$_{3}$ dry cleaning removed organic contaminants in contact holes, the specific contact resistivity decreased. Each contact hole size was different, but the specific contact resistivities were all much the same. Thus, it is expected that the UV/O$_{3}$ dry cleaning method will be useful method of removal of the organic contaminants at smaller contact hole cleaning.

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UV/visible Absorption Spectrum and I-V Characteristics of Thermally Annealed $C_{22}$-Quinolium(TCNQ) Langmuir-Blodgett Films ($C_{22}$-quinolium(TCNQ) LB막의 열처리에 따른 UV/visible 흡광도와 I-V 특성)

  • 이상국;송민종;김태완;강도열
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1993.11a
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    • pp.137-140
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    • 1993
  • Electrical properties and thermal annealing effects of $C_{22}$-quinolium(TCNQ) Langmuir-Blodgett(LB) films were studied. Typical current-voltage(I-V) characteristics along the perpendicular direction chow an anomalous behavior of breakdown near the electric-field strength of $10^{6}$V/cm. To see the thermal influence of the specimen, current was measured as a function of temperature(20∼$180^{\circ}C$). It shows that the current increases about 4 orders of magnitude near 60∼$70^{\circ}C$ and remains constant far a while up to ∼$150^{\circ}C$ and then suddenly drops. Such increase of current near 60∼$70^{\circ}C$ seems tn be related to a softness of alkyl chains. Besides the electrical measurements, UV/visible absorption(300∼800 nm) of the thermally annealed sample was measured to see the internal-structure change. It is found that there are four characteristic peaks. At 494 nm, the optical absorption of the thermally annealed specimen at $60^{\circ}C$ starts increase and stays almost constant upto∼ $140^{\circ}C$. And eventually it disappears above $180^{\circ}C$. After heat treatment of the specimen up to $150^{\circ}C$, Uv/visible absorption was measured while cooling.

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Performance Study on Odor Reduction of Indole/Skatole by Composite

  • Young-Do Kim
    • Journal of Wellbeing Management and Applied Psychology
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    • v.7 no.3
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    • pp.67-72
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    • 2024
  • This study developed a dry composite module-type deodorization facility with Twisting airflow changes and two forms (catalyst, adsorbent) within one module. Experiments were conducted to evaluate the reduction efficiency of odor substances C8H7N and C9H9N. The device combines UV oxidation using TiO2, catalytic oxidation using MnO2, and adsorption using A/C in five different methods. Data analysis of experimental results utilized the statistical package program Python 3.12. The program applied frequency analysis of odor removal efficiency, one-way ANOVA, and post-hoc tests, with statistical significance determined by p-value to ensure reliability and validity of the measurements. Results indicated that the highest removal efficiency of C8H7N and C9H9N was achieved by the UV+A/C method, suggesting the superior effectiveness and efficiency of the developed device. Combining multiple processes and technologies within one module enhanced odor treatment efficiency compared to using a single method. The device's modularity allows for flexibility in adapting to various sewage treatment scenarios, offering easy maintenance and cost-effective deodorization. This composite reaction module device can apply multiple technologies, such as biofilters, plasma, activated carbon filters, UV-photocatalysis, and electromagnetic-chemical systems. However, this study focused on UV-photocatalysis, catalysts, and activated carbon filters. Ultimately, the research demonstrates the practical applicability of this innovative device in real sewage treatment operations, showing excellent reduction efficiency and effectiveness by integrating UV oxidation, TiO2 photocatalysis, MnO2 catalytic oxidation, and A/C adsorption within a modular system.