• Title/Summary/Keyword: UV-O3

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Development of Practical Advanced Oxidation Treatment System for Decontamination of Soil and Groundwater Contaminated with Chlorinated Solvent (TCE, PCE) : Phase I (염소계 화합물(TCE, PCE)로 오염된 토양 및 지하수 처리를 위한 실용적 고도산화처리시스템 개발 (I))

  • Sohn, Seok-Gyu;Lee, Jong-Yeol;Jung, Jae-Sung;Lee, Hong-Kyun;Kong, Sung-Ho
    • Journal of Soil and Groundwater Environment
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    • v.12 no.5
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    • pp.105-114
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    • 2007
  • The most advanced oxidation processes (AOPs) are based on reactivity of strong and non-selective oxidants such as hydroxyl radical (${\cdot}OH$). Decomposition of typical DNAPL chlorinated compounds (TCE, PCE) using various advanced oxidation processes ($UV/Fe^{3+}$-chelating agent/$H_2O_2$ process, $UV/H_2O_2$ process) was approached to develop appropriate methods treating chlorinated compound (TCE, PCE) for further field application. $UV/H_2O_2$ oxidation system was most efficient for degrading TCE and PCE at neutral pH and the system could remove 99.92% of TCE after 150 min reaction time at pH 6($[H_2O_2]$ = 147 mM, UVdose = 17.4 kwh/L) and degrade 99.99% of PCE within 120 min ($[H_2O_2]$ = 29.4 mM, UVdose = 52.2 kwh/L). Whereas, $UV/Fe^{3+}$-chelating agent/$H_2O_2$ system removed TCE and PCE ca. > 90% (UVdose = 34.8 kwh/L, $[Fe^{3+}]$ = 0.1 mM, [Oxalate] = 0.6 mM, $[H_2O_2]$ = 147 mM) and 98% after 6hrs (UVdose = 17.4 kwh/L, $[Fe^{3+}]$ = 0.1 mM, [Oxalate] = 0.6 mM, $[H_2O_2]$ = 29.4 mM), respectively. We improved the reproduction system with addition of UV light to modified Fenton reaction by increasing reduction rate of $Fe^{3+}$ to $Fe^{2+}$. We expect that the system save the treatment time and improve the removal efficiencies. Moreover, we expect the activity of low molecular organic compounds such as acetate or oxalate be effective for maintaining pH condition as neutral. This oxidation system could be an economical, environmental friendly, and practical treatment process since the organic compounds and iron minerals exist in nature soil conditions.

Dy co-doping effect on photo-induced current properties of Eu-doped SrAl2O4 phosphor (Eu 도핑 SrAl2O4 형광체의 광 여기 전류 특성에 대한 Dy 코-도핑 효과)

  • Kim, Sei-Ki
    • Journal of Sensor Science and Technology
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    • v.18 no.1
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    • pp.48-53
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    • 2009
  • $Eu^{2+}$-doped ${SrAl_2}{O_4}$ and $Eu^{2+}$, $Dy^{3+}$ co-doped ${SrAl_2}{O_4}$ phosphors have been synthesized by conventional solid state method. Photocurrent properties of $Eu^{2+}$ doped ${SrAl_2}{O_4}$ and $Eu^{2+}$, $Dy^{3+}$ co-doped ${SrAl_2}{O_4}$ phosphors, in order to elucidate $Dy^{3+}$ co-doping effect, during and after ceasing ultraviolet-ray (UV) irradiation have been investigated. The photocurrent of $Eu^{2+}$, $Dy^{3+}$ co-doped ${SrAl_2}{O_4}$ phosphors during UV irradiation was 4-times lower than that of $Eu^{2+}$-doped ${SrAl_2}{O_4}$ during UV irradiation, and 7-times higher than that of $Eu^{2+}$-doped ${SrAl_2}{O_4}$ after ceasing UV irradiation. The photocurrent results indicated that holes of charge carriers captured in hole trapping center during the UV irradiation and liberated after-glow process, and made clear that $Dy^{3+}$ of co-dopant acted as a hole trap. The photocurrent of ${SrAl_2}{O_4}$ showed a good proportional relationship to UV intensity in the range of $1{\sim}5mW/cm^2$, and $Eu^{2+}$-doped ${SrAl_2}{O_4}$ was confirmed to be a possible UV sensor.

Surface characteristics of ITO treated with $UV/O_3-O_3$ and OLED device properties ($UV/O_3$$O_3$로 처리된 ITO의 표면 특성과 OLED 소자 특성)

  • Kim, Il;You, D.H.;Park, G.B.;Yuk, J.H.;Park, J.K.;Jo, G.S.;Lee, D.C.
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1361-1362
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    • 2006
  • In this research We investigated the effect of UV/O3, $O_3$ treatments of Indium-tin oxide(ITO) surface on the performance of organic light emitting devices(OLEDs). The fundamental structure of OLEDs was ITO(anode) / TPD(Hole Transport Layer) / $Alq_3$ / Al(cathode). We performed UV/O3, $O_3$ treatments and found that both treatments enhanced the performance of OLEDs. Current-Voltage, Luminance-Voltage characteristics were measured at room temperature.

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Effects of $UV/O_3$ and SC-1 Step in the HF Last Silicon Wafer Cleaning on the Properties of Gate Oxide (HF-last Cleaning에서 SC-1 step과 $UV/O_3$ step이 gate 산화막에 미치는 영향)

  • Choe, Hyeong-Bok;Ryu, Geun-Geol;Jeong, Sang-Don;Jeon, Hyeong-Tak
    • Korean Journal of Materials Research
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    • v.6 no.4
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    • pp.395-400
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    • 1996
  • 반도체 소자가 점점 고집적회되고 고성능화되면서 Si 기판 세정 방법은 그 중요성이 더욱 더 커지고 있다. 특히 ULSI급 소자에서는 세정 방법이 소자 생산수율 및 신뢰성에 큰 영향을 끼치고 있다. 본 연구에서는 HF-last 세정에 UV/O3과 SC-1 세정을 삽입하여 그 영향을 관찰하였다. 세정 방법은 HF-last 세정을 기본으로 split 1(piranha+HF), split 2(piranha+UV/O3+HF), split 3(piraha+SC-1+HF), split 4(piranha+(UV/O3+HF) x3회 반복)의 4가지 세정 방법으로 나누어 실험하였다. 세정을 마친 Si 기판은 Total X-Ray Fluorescence Spectroscopy(AFM)을 사용하여 표면거칠기를 측정하였다. 또한 세정류량을 측정하고, Atomic Force Microscopy(AFM)을 사용하여 표면거칠기를 측정하였다. 또한 세정후 250$\AA$의 gate 산화막을 성장시켜 전기적 특성을 측정하였다. UV/O3을 삽입한 split 2와 split 4세정방법이 물리적, 전기적 특성에서 우수한 특성을 나타냈고, SC-1을 삽입한 split 3세정 방법이 표준세정인 split 1세정 방법보다 우수하지 못한 결과를 나타냈다.

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Treatment of Refractory Dye Wastewater Using AOPs (고도산화공정(AOPs)을 이용한 난분해성 염색폐수 처리)

  • Kim, Jong-Oh;Lee, Kwon-Ki;Jung, Jong-Tae;Kim, Young-Noh
    • Journal of the Korean GEO-environmental Society
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    • v.7 no.3
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    • pp.21-29
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    • 2006
  • The treatment performance of ozonation and three types of advanced oxidation processes (AOPs) such as $O_3/H_2O_2$, $O_3/UV$, $O_3/H_2O_2/UV$ was experimentally investigated for the treatment of refractory synthetic dye wastewater. The removal efficiency of $COD_{cr}$, color and biodegradability ($BOD_5/COD_{cr}$) were relatively evaluated in each treatment unit with simulated dye wastewater. Optimal operational conditions of pH, temperature, dosage and circulation flow rate were also investigated. All suggested processes revealed an effectiveness for the removal of color within a short operational time, moreover, $O_3/H_2O_2/UV$ process showed the highest $COD_{cr}$ removal and biodegradability enhancement among proposed oxidation process.

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A Study on the Treatment of Dyeing Wastewater Using $TiO_2/H_2O_2/UV$ Processes ($TiO_2/H_2O_2/UV$ 공정을 이용한 염색폐수처리에 관한 연구)

  • 조일형;정효준;박경렬;성기석;이용규;이홍근
    • Journal of environmental and Sanitary engineering
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    • v.15 no.4
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    • pp.26-34
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    • 2000
  • In order to treat the dyeing wastewater, the $UV/TiO_2/H_2O_2$ system was investigated, and proper pretreatment methods were examined to reduce the load on the system considering economical and technical efficiency. The results of this study were as follows: 1. $UV/TiO_2/H_2O_2$ system with pretreatment process was adopted, the result of Chemical coagulation and pH control units was $pH{\;}11{\;}{\rightarrow}{\;}coagulation{\;}{\rightarrow}{\;}pH{\;}4$ and the optimum dosage of $FeCl_3$ was $600mg/{\ell}$. 2. Proper dosage of $TiO_2$ in the $UV/TiO_2/H_2O_2$ system with pretreatment process was $2g/{\ell}$ and $H_2O_2$ was $1000mg/{\ell}$, UV contact time was 20min to get $200mg/{\ell}$ of $COD_{Cr}$.

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UV Enhanced NO2 Sensing Properties of Pt Functionalized Ga2O3 Nanorods

  • An, Soyeon;Park, Sunghoon;Mun, Youngho;Lee, Chongmu
    • Bulletin of the Korean Chemical Society
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    • v.34 no.6
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    • pp.1632-1636
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    • 2013
  • $Ga_2O_3$ one-dimensional (1D) nanostructures were synthesized by using a thermal evaporation technique. The morphology, crystal structure, and sensing properties of the $Ga_2O_3$ nanostructures functionalized with Pt to $NO_2$ gas at room temperature under UV irradiation were examined. The diameters of the 1D nanostructures ranged from a few tens to a few hundreds of nanometers and the lengths ranged up to a few hundreds of micrometers. Pt nanoparticles with diameters of a few tens of nanometers were distributed around a $Ga_2O_3$ nanorod. The responses of the nanorods gas sensors fabricated from multiple networked $Ga_2O_3$ nanorods were improved 3-4 fold at $NO_2$ concentrations ranging from 1 to 5 ppm by Pt functionalization. The Pt-functionalized $Ga_2O_3$ nanorod gas sensors showed a remarkably enhanced response at room temperature under ultraviolet (UV) light illumination. In addition, the mechanisms via which the gas sensing properties of $Ga_2O_3$ nanorods are enhanced by Pt functionalization and UV irradiation are discussed.

A Study of Air Freshing by UV lamp and TiO2 Catalyst (UV lamp와 TiO2 광촉매를 이용한 공기 정화에 관한 연구)

  • Lee, Gun-Duck;Woo, In-Sung;Hwang, Myung-Hwan;Lee, In-Buk;Kim, Kwan-Jung;Park, Hwa-Young
    • Proceedings of the Safety Management and Science Conference
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    • 2011.04a
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    • pp.205-227
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    • 2011
  • On this study, the test for air-purification was executed as using the UV lamp and the UV lamp on which the TiO2 catalyst had been deposited with glass fiber in the reactor chamber. It aimed at the basic data of air-purifier as assessing the features of removing abilities for various contaminants including CH3COOH, NH3, NO, and SO2 as varying the number of TiO2 coating, the wave of UV lamp, and the amount of additive CaO as variables.

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A Study on the Comparison of Advanced Oxidation Reactions Including UV, $Fe^{2+}$, and $H_2O_2$ for the Degradation of Pentachlorophenol (UV와 $Fe^{2+}$, 그리고 $H_2O_2$를 조합한 고급산화 공정에서의 Pentachlorophenol의 분해 속도 연구)

  • Son, Hyun-Seok;Kim, Moon-Kyung;Zoh, Kyung-Duk
    • Journal of Korean Society of Environmental Engineers
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    • v.29 no.7
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    • pp.846-851
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    • 2007
  • This study was performed to compare and to examine the degradation efficiencies and degradation mechanism of pentachlorophenol(PCP) by UV, $UV/H_2O_2$, $Fe^{2+}$, $Fe^{2+}/H_2O_2$, and $UV/Fe^{2+}/H_2O_2$ processes. The pseudo-first order rate constant was compared in each process. The addition of $H_2O_2$ increased the rate constant by 13 times compared to the reaction with UV alone. The reaction rate in $Fe^{2+}$ reaction with PCP increased 4 times and 7.25 times by adding 180 mM $H_2O_2$ and 16 mM $H_2O_2$, respectively. Compared to that with $Fe^{2+}/H_2O_2$, the rate constant of the reaction with UV alone reaction increased 3.1 times. These results indicates the enhancement of reaction rate is closely related to the generation of OH radical. The degree of the iron sludge production observed in $Fe^{2+}/H_2O_2$ reaction was significantly reduced by irradiating UV in this process.

A Study on the Dye Wastewater Treatment Using TiO2 Photocatalyst/Ozonation (광촉매/오존을 이용한 염색폐수처리에 관한 연구)

  • Kim, Chang-Kyun;Chung, Ho-Jin;Kim, Jong-Suk
    • Journal of Korean Society of Water and Wastewater
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    • v.21 no.6
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    • pp.663-670
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    • 2007
  • This study was performed to provide basic information for evaluating the efficiency and applicable extent of photocatalysis and ozonation for the treatment of dye wastewater. The treatability of dye wastewater by $UV/TiO_2$ and $UV/TiO_2/O_3$ advanced oxidation process (AOP) was investigated under various conditions. The experiments were conducted in a batch reactor of 50 liters equipped with twelve UV Lamps of 16W. In $UV/TiO_2$ AOP, the removal efficiency of TCODMn and Color increased to 58% and 67% respectively with increasing UV intensity. Also, The removal efficiency of TCODMn and Color increased to 97% and 99% respectively with increasing $H_2O_2$. Acid area was more efficient than neutral and alkalic areas in wastewater treatment, and pH 5 was the most effective and the treatment efficiency continually increased as the amount of photocatalyst was increased. When the photocatalyst was increased, TCODMn was removed faster than Color.