• 제목/요약/키워드: UV sensitivity

검색결과 229건 처리시간 0.028초

한국인 피부의 자외선 감수성과 SPF 측정치에 미치는 인자의 영향 (UV Sensitivity of Korean Skin and The Effects of Factors affecting SPF Determination)

  • 이병곤
    • 대한화장품학회지
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    • 제17권1호
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    • pp.1-17
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    • 1991
  • Multiport-600 Solar SimulatorR is one of the most recent and convenient in-strument for evaluation of sun protection factor(SPF). In this study, we examined the practicability of the SPF determining system using Multiport -600 and the effects of several factors-light sources, seasons and experimental animals-on the minimal erythema dose(MED) and SPF. We also tested the UV sensitivity according to the sites of Korean people, And the ultraviolet radiation reaching the earth's surface In Seoul have been observed for one year. As a result of this study, the determinig system for SPF using Multiport-600 was proved to be a good system in accuracy and time-saving. The biological activity of fluorescence UV lamp of PUVA-800R was significantly higher than natural light or solar simulator with Xe arc lamp, and the determined MED became lower in inverse proportion to room temperature rise. Skin sensitivity by ultraviolet adiation was hights. in order \circled1 back \circled2 inns, upper arm \circled3 outer upper arm \circled4 foream. We also observed that UV radiation intensity was highest at noon in july and 1 sun burn unit(MED) was 28 minutes at that time.

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A Novel UV-Sensitivity Mutation Induces Nucleotide Excision Repair Phenotype and Shows Epistatic Relationships with UvsF and UvsB Groups in Aspergillus nidulans

  • Baptista, F.;Castro-Prado, M.A.A.
    • Journal of Microbiology
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    • 제39권2호
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    • pp.102-108
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    • 2001
  • DNA damage response has a central role in the maintenance of genomic integrity while mutations in related genes may result in a range of disorders including neoplasic formations. The uvsZl characterized in this report is a navel uvs mutation in Aspergillus nidulans, resulting in a nucleotide excision repair (NER) phenotype: UV-sensitivity before DNA synthesis (quiescent cells), high UV-induced mutation frequency and probable absence of involvement with mitotic and meiotic recombinations. The mutation is recessive and nan-allelic to the previously characterized uvsA101 mutation, also located on the paba-y interval on chromosome I. uvsZl skewed wild-type sensitivity to MMS, which suggests non-involvement of this mutation with BER. Epitasis tests showed that the uvsZ gene product is probably involved in the same repair pathways as UVSB or UVSH proteins. Although mutations in these proteins result in an NER phenotype, UVSB is related with cell cycle control and UVSH is associated with the post-replicational repair pathway. The epistatic interaction among uvsZl and uvsB413 and uvsH77 mutations indicates that different repair systems may be related with the common steps of DNA damage response in Aspergillus nidulans.

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극지미생물 Arthrobacter sp. PAMC 25486의 돌연변이 유발 물질에 대한 감수성 평가 (Investigation of the Susceptibility of Arctic Arthrobacter sp. PAMC 25486 to Mutagens)

  • 김상근;최종일;한세종
    • 방사선산업학회지
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    • 제8권2호
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    • pp.105-109
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    • 2014
  • This study was conducted to investigate the sensitivity of Arthrobacter sp. PAMC 25486 to various mutagens. ${\gamma}-ray$, UV-ray, Ethyl methane sulfonate (EMS) and hydrogen peroxide ($H_2O_2$) were used as mutagen, and the survival rate of Arthrobacter sp. was measured at various doses of ${\gamma}-ray$ and UV-ray, and concentrations of EMS and $H_2O_2$. Decimal reduction dose ($D_{10}$ value) of Arthrobacter sp. was determined 370 Gy for a gamma irradiation treatment, 0.019 J for a UV ray, 2.5 mM for EMS, and 230 mM for $H_2O_2$. This result will be applied for the development of superior mutant strain of Arctic bacteria producing valuable compounds.

UV 감지기로서 CCD어레이를 사용한 소형 디지털 광 오존모니터 (A New Small Size Digital Optical Ozone Monitor Using CCD Array as a UV Detector)

  • 정완영;이승철
    • 한국정보통신학회논문지
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    • 제12권1호
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    • pp.158-163
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    • 2008
  • UV기술에 기반한 오존모니터는 신호의 안정성 때문에 널리 활용되어오고 있다. 먼저 오존 발생기에서 나오는 오존농도를 실시간, 고정 밀로 측정하기 위해서 저압 수은램프를 UV광원으로 하고, 광증배관을 UV 감지기로 하는 시스템을 구성하였다. 이 구조는 저 비용의 고농도 오존의 계측에 유용한 시스템으로서 단순한 구조와 비교적 우수한 계측성 능을 얻을 수 있었다. 제조된 시스템은 $0.05{\sim}2w1.%$의 측정 농도영역에서 좋은 선형성을 나타내었다. ppm정도의 보다 정밀한 농도계측을 위해서는 UV광원으로서 고출력 펄스 크세논램프를 사용하고, CCD어레이를 광스펙트로메터로 사용하도록 시스템을 설계하였다. CCD출력으로부터의 광신호는 우수한 반응성과 띄어난 광해상도를 가지고 디지털신호로 변환되고, 이 디지털신호는 PC의 스크린에 디스플레이 되도록 설계되었다. 제작된 시스템은 $10{\sim}10,000ppm$ 영역에서 선형적이고 우수한 감도를 보였으며 저 농도의 오존을 측정하는 시스템으로서의 가능성을 보여주었다.

Differences in the Amino Acid Sequences of CPD Photolyases of UV-sensitive and UV-resistant Rice Cultivars

  • Teranishi, Mika;Hidema, Jun;Fujino, Takana;Hirouchi, Tokuhisa;Yamamoto, Kazuo;Kumagai, Tadashi
    • Journal of Photoscience
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    • 제9권2호
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    • pp.329-331
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    • 2002
  • There is a difference in the inhibitory effects to supplemental UVB (wavelengths 280 to 320 nm) among Japanese rice (Oryza sativa L.), the cultivar Norin I is less resistant while the cultivar Sasanishiki is resistant. UVB induces photodamage in DNA. Cyclobutane pyrimidine dimer (CPD) is a major UV-induced DNA lesion. Photorepair, which is mediated by photolyase, is the major pathway in plants for repairing CPD. We have analyzed CPD induction and repair in Sasanishiki and its close relative Norin I using alkaline agarose gel electrophoresis. Norin I is deficient in CPD photoreactivation and excision, thus UV sensitivity correlates with deficient dimer repair [I]. The photorepair deficiency in Norin I results from a functionally altered photolyase with a photoflash analysis [2]. In this paper, we examined the UVB-sensitivity of several other UV-sensitive and -resistant cultivars and found that the CPD photolyase activity was deficient in UV-sensitive ones. It was also evident that there was a variation in the deduced amino acid sequences of CPD photolyases of the UV-sensitive and -resistant cultivars, whereas each deduced amino acid sequence of the UV-sensitive cultivars and of the UV-resistant ones was the same. These results suggest that the difference in the CPD photolyases of UV-sensitive and -resistant rice might be due to the structural alteration of CPD photolyase.

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UV 레이저 노출조건에 따른 FBG 센서의 방사선 영향 (Radiation Effects on Fiber Bragg Grating Sensors by Irradiation Conditions of UV Laser)

  • 김종열;이남호;정현규
    • 한국정보통신학회논문지
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    • 제20권12호
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    • pp.2310-2316
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    • 2016
  • 본 논문에서는 격자 공정 중에 KrF 엑시머 UV 레이저 노출시간에 따른 광섬유 브래그 격자의 $Co^{60}$ 감마방사선 영향을 연구하였다. 광섬유 브래그 격자는 게르마늄이 첨가된 일반 광섬유를 이용하였으며, UV KrF 엑시머 레이저 노출시간(30, 60, 90, 120초)을 달리하여 제작하였다. 제작된 광섬유 브래그 격자에 106 Gy/min 선량률로 총 선량 34.3 kGy 감마선을 조사한 후 방사선에 의한 온도감도 계수와 브래그 파장 변화를 분석하였다. 실험결과를 통하여, 격자 공정을 위한 UV 레이저 노출시간이 광섬유 브래그 격자의 방사선 민감도에 큰 영향을 줄 수 있다는 것을 확인하였다. 레이저 노출조건 변화에 따른 방사선에 의한 광섬유 브래그 파장의 변화는 최대 50 % 이상의 차이를 보였다.

콩[Glycine max(L.) Merrill] 품종간의 UV-B에 대한 감수성의 차이

  • 김학윤;이천호
    • 한국환경과학회지
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    • 제7권4호
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    • pp.487-492
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    • 1998
  • The experiment was conducted to determine the effects of enhanced UV-B on growth and differential responses among cultivars in soybean. The soybean cultivars subjected to enhanced UV-B irradiation at daily dose of 11.32 kJ $m^{-2}(UV-B_{BE})$ revealed that the growth was significantly depressed. Plant height, leaf number, leaf area and dry weight were inhibited by UV-B irradiation showing differential responses among cultivars used. Danyeubkong seems to be less sensitive to the enhanced W-B irradiation, while Keunolkong more sensitive. Reduction of chlorophyll content was also found significantly greater to Keunolkong. Specific leaf weight an index of leaf thickness, and flavonoid content known as UV-absorbing compounds were significantly Increased in Danyeubkong by UV-B, but those In the other cultivars were not significantly affected. The results indicated that there are cultivar diferences in tile growth and phisiological responses to the enhanced UV-B irradiation and specific leaf weight and UV-absorbing compounds in the leaves were highly related to the sensitivity of soybean by UV-B irradiation.

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The Effect of Salt and pH on the Phase Transition Behaviors of pH and Temperature-Responsive Poly(N,N-diethylacrylamide-co-methylacrylic acid)

  • Liu, Tonghuan;Fang, Jian;Zhang, Yaping;Zeng, Zhengzhi
    • Macromolecular Research
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    • 제16권8호
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    • pp.670-675
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    • 2008
  • A series of pH and temperature-responsive (N,N-diethylacrylamide-co-methylacrylic acid) copolymers were synthesized by radical copolymerization and characterized by elemental analysis, Fourier-transform infrared (FT-IR), nuclear magnetic resonance (NMR) $^1H$, $^{13}C$ and LLS. The effects of salt and pH on the phase transition behaviors of the copolymers were investigated by uv. With increasing NaCl concentration, significant salt effects on their phase transition behaviors were observed. UV spectroscopic studies showed that the phase transition became faster with increasing NaCl concentration. In addition, the phase transition behaviors of copolymers were sensitive to pH. The pH and temperature sensitivity of these copolymers would make an interesting drug delivery system.

Sensitivity Analysis of the Optical System for UV-IR Space Telescope

  • Kim, Sanghyuk;Chang, Seunghyuk;Pak, Soojong;Jeong, Byeongjoon;Kim, Geon Hee;Hammar, Arvid
    • 천문학회보
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    • 제40권2호
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    • pp.56.4-57
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    • 2015
  • We present the optical design and a sensitivity analysis for a wide field of view (FOV) instrument operating at UV and IR wavelengths. The ongoing investigation is performed in collaboration with Omnisys Instruments (Sweden) and focuses on a telluric-limb-viewing instrument that will fly in a low Earth orbit to study mesospheric wave structures over a wide range of horizontal scales in the altitude range 80 - 100 km. The instrument has six wavelength channels which consist of 4 channels of IR and 2 of UV. We are proposing an optical design based on three mirror aplanatic off-axis reflective system. The entrance pupil diameter and effective focal length are 45 mm and 270 mm, respectively. The FOV is $5.5^{\circ}{\times}1^{\circ}$ and the secondary mirror is set for stop. The optical specification is required to have an encircled energy of at least 80 % within a diameter of 21 um. We performed sensitivity analysis for the longest wavelength of 772 nm in consideration of the diffraction limit of system. The results show that tolerance limits for positions and angles of the mirrors are not very sensitive compared with typical error budgets of manufacturing and assembling process. The secondary mirror has the most sensitive tolerance for surface figure of 250 nm in root-mean-square.

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산화물 세라믹 재료 기반 자외선 센서 (Ultra Violet (UV) Sensor based on Oxide Ceramic Materials)

  • 류학기
    • 세라미스트
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    • 제22권1호
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    • pp.27-35
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    • 2019
  • Research on ultraviolet (UV) light detection has attracted considerable attention from scientific researchers in related fields. It can be said that it is a very important time to accurately monitor the UV irradiation amount according to the wavelength region in real time. The oxide is very diverse in its kind and has the advantage of being able to efficiently control the band gap through band gap engineering. In addition, it is very stable in response to heat and atmospheric oxygen when UV is absorbed. Also, there is a known method that can effectively manufacture oxide nanoparticles and nanorods through various synthesis methods, and researches for improving the sensitivity of UV sensors have been carried out using this method. In this paper, we introduce the materials that can be used as UV sensors among various wide band oxide materials, and review the results of researches of various UV sensors using nano materials.