• Journal of Korean Society of Water and Wastewater
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• v.26 no.6
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• pp.779-786
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• 2012

The degradation of 2-chlorophenol(2-CP) by various AOPs(Advanced Oxidation Processes) including the photo-Fenton process has been examined. In sole $Fe^{2+}$, UV or $H_2O_2$ process without combination, low removal efficiencies have been achieved. But the photo-Fenton process showed higher removal efficiency for degradation of 2-chlorophenol than those of other AOPs including the Fenton process and the UV processes. In the photo-Fenton process, the optimal experimental conditions of 2-chlorophenol degradation were obtained at pH 3 and the $Fe^{2+}/H_2O_2$molar ratio of 1. Also the 2-chlorophenol removal efficiency increased with decreasing of the initial 2-chlorophenol concentration. 3-chlorocatechol and chlorohydroquinone were identified as photo-Fenton reaction intermediates, and a degradation pathway of 2-chlorophenol in the aqueous phase during the photo-Fenton reaction was proposed.

• Journal of Plant Biotechnology
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• v.50
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• pp.215-224
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• 2023

Disinfecting water containing pathogenic microbes is crucial to the food safety of fresh green agricultural products. The UV-activated peracetic acid (UV/PAA) treatment process is an efficient advanced oxidation process (AOP) and a versatile approach to disinfecting waterborne pathogens. However, its effects on plant growth remain largely unknown. This study found that low-dose UV/PAA treatment induced moderate oxidative stress but enhanced the innate immunity of Arabidopsis against Pseudomonas syringae pv. (Pst) DC3000. When applied as water sources, 5- and 10-ppm UV/PAA treatments slightly reduced biomass and root elongation in Arabidopsis seedlings grown under hydroponic conditions. Meanwhile, treatments of the same doses enhanced defense against Pst DC3000 infection in leaves. Accumulation of hydrogen peroxide and callose increased in UV/PAA-treated Arabidopsis samples, and during the post-infection period, UV/PAA-treated seedlings maintained vegetative growth, whereas untreated seedlings showed severe growth retardation. Regarding molecular aspects, priming-related defense marker genes were rapidly and markedly upregulated in UV/PAA-treated Arabidopsis samples. Conclusively, UV/PAA treatment is an efficient AOP for disinfecting water and protecting plants against secondary pathogenic attacks.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.1220-1223
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• 2003

The UV nanoimprint technology uses the UV light as the energy source. Because the imprint process is carried out in room temperature and low pressure, this technology has its own merits compared to the thermal nanoimprint. However, in UV nanoimprint technology, a resin which has low viscosity is essential for the improvement of accuracy. In this research, a resin (named as IMS01) which has relatively low viscosity was developed. And a measurement system was developed in order to measure the degree of cure of the resin. The measurement system which is composed of FT-IR, UV light source and optical guide can measure the degree of cure in real time. From the experimental results, it was found that the IMS01 is cured more rapidly than existing resin (PAK01).

• Journal of IKEEE
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• v.22 no.1
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• pp.1-5
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• 2018

In this research, sol-gel processed CuO p-type thin film transistors were fabricated with copper (II) acetate monohydrate precursors. After $500^{\circ}C$ annealing process, the deposited thin films were fully converted into CuO. We investigated $UV/O_3$ process time effect on electrical characteristics of sol-gel processed CuO thin film transistors. After 600 sec $UV/O_3$ process, the fabricated CuO thin film transistor delivered field effect mobility in saturation regime of $5{\times}10^{-3}\;cm^2/V{\cdot}s$ and on/off current ratio of ${\sim}10^2$.

• Journal of the Korean Society for Precision Engineering
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• v.32 no.9
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• pp.781-786
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• 2015

Recently, studies of 3D printing methods have been working in various applications. For example, the powder base method laminates the prints by using a binding or laser sintering method. However, the draw back of this method is that the post process is time consuming and does not allow for parts to be rapidly manufactured. The binding method requires the post process while the time required for the post process is longer than the manufacturing time. This paper proposes a UV curing binding method with an integrated piezo printing head system. The optimization of an arbitrary waveform generation for the control of a UV curable resin droplet was researched, in addition to developed optimized UV curing processes in multi nozzle ink jet heads.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1934-1938
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• 2008

Formation of air bubble is the one of common defects in UV nano imprint lithography. Location of dispensing and volume of droplets are among the most important parameters in the process. ]n this study, UV curable resin droplets with different volumes were dispensed at different locations and pressed to investigate air bubble formation. By varying volume of droplet and dispensing location, process conditions were found for minimum air bubble area.

• Journal of Environmental Health Sciences
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• v.39 no.2
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• pp.187-195
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• 2013

Objectives: For the practical application of the dielectric barrier discharge plasma reactor, a plasma reactor able to manage large volumes of water is needed. This study investigated the possibility of the practical application of a multi-plasma reactor which is a scaled-up version of a single plasma reactor. Methods: The multi-plasma reactor consists of several high-voltage transformers and plasma modules (discharge, ground electrodes and quartz dielectric tubes). The effects of water characteristics such as voltage (30-120 V), air flow rate (1-5 l/min), number of high-voltage transformers and plasma modules, and water quality on Escherichia coli (E. coli) disinfection and decrease of COD and $UV_{254}$ absorbance were investigated. Results: The experimental results showed that at a voltage of over 80 V, most of the E. coli were disinfected within 90 seconds. E. coli inactivation was not affected by the air flow rate. E. coli disinfection in the multiplasma process showed the traditional log-linear form of the disinfection curve. E. coli inactivation performance by transformer 3-Reactor 5 and transformer 3-Reactor 3 were similar. The disinfection performance of the UV process was affected by artificial sewage water. However, the plasma process was less affected by the artificial sewage within the standards for effluent water quality. Conclusions: Disinfection performance with several low voltages and plasma modules of three to five in number applied to the plasma process was higher than that concentrating a small amount of high voltage through a single plasma reactor. Removal of COD, $UV_{254}$ absorbance, and E. coli disinfection with the plasma process were better than with the UV process.

• Transactions of Materials Processing
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• v.14 no.5 s.77
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• pp.473-476
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• 2005

The demand of on-chip total analyzing system with MEMS (micro electro mechanical system) bio/chemical sensor is rapidly increasing. In on-chip total analyzing system, to detect the bio/chemical products with submicron feature size, a filtration system with nano-filter is required. One of the conventional methods to fabricate nano-filter is to use direct patterning or RIE (reactive ion etching). However, those procedures are very costly and are not suitable fur mass production. In this study, we suggested new fabrication method for a nano-filter based on replication process, which is simple and low cost process. After the Si master was fabricated by laser interference lithography and reactive ion etching process, the polymeric mold was replicated by UV-imprint process. Metallic nano-filter was fabricated after removing the polymeric part of metal deposited polymeric mold. Finally, our fabrication method was applied to metallic nano-filter with $1{\mu}m$ pitch size and $0.4{\mu}m$ hole size for bacteria sensor application.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.633-636
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• 2005

Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. As with other nanoimprint methods, ultraviolet-nanoimprint lithography (UV-NIL) resolution appears to be limited only by template resolution, and offers a significant cost of ownership reduction when compared to other next generation lithography (NGL) methods such as EUVL and 157 nm lithography. The purpose of this paper is to suggest optimum values of control parameters of Imprio 100 manufactured by Molecular Imprint, Inc., which is the first commercially available UV-NIL tool, for sound nanoimprint. UV-NIL experiments were performed on Imprio 100 to find dispensing recipe for avoiding air entrapment. Dispensing recipe related to residual layer thickness and uniformity was optimized and 40 nm thick residual layer was achieved.

• Proceedings of the Korean Fiber Society Conference
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• 2003.10a
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• pp.57-58
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• 2003

Thin coating layer of clay minerals was fabricated on nylon fiber and uv-light resistivity of the clay-coated nylons, schematically shown in Figure 1, were investigated. Clay minerals with higher absorbance protect the nylon fibers more effectively from uv light. The coating process is expected as safe and stable procedure because clay and aqueous dispersion of the clay used for the process is innocuous.