• Genomics & Informatics
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• v.3 no.2
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• pp.66-72
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• 2005

The epidermis is a physiological barrier to protect organisms against environment. During the aging process, skin tissues undergo various changes including morphological and functional changes. The transcriptional regulation of genes is part of cellular reaction of aging process. In order to examine the changes of gene expression during the aging process, we used the primary cell culture system of human keratinocytes. Since UV radiation is the most important environmental skin aggressor, causing skin cancer and other problems including premature skin aging, we examined the changes of gene expression in human keratinocytes after UV irradiation using oligonucleotide microarray containing over 10,000 genes. We also compared the gene expression patterns of the senescent and UV treated cells. Expression of the variety of genes related to transcription factors, cell cycle regulation, immune response was altered in human keratinocytes. Some of down-regulated genes are represented in both senescent and UV treated cells. The results may provide a new view of gene expression following UVB exposure and aging process in human keratinocytes.

• Current Photovoltaic Research
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• v.7 no.2
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• pp.33-37
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• 2019

In this paper, we compared the performance of $Cu(In,Ga)(S,Se)_2$ (CIGSSe) thin film solar cell with CdS buffer layer deposited by irradiating 365 nm UV light with 8 W power in Chemcial Bath Deposition (CBD) process. The effects of UV light irradiation on the thin film deposition mechanism during CBD-CdS thin film deposition were investigated through chemical and electro-optical studies. If the UV light is irradiated during the solution process, the hydrolysis of Thiourea is promoted even during the same time, thereby inhibiting the formation of the intermediate products developed in the reaction pathway and decreasing the pH of the solution. As a result, it is suggested that the efficiency of the CdS/CIGSSe solar cell is increased because the ratio of the S element in the CdS thin film increases and the proportion of the O element decreases. This is a very simple and effective approach to control the S/O ratio of the CdS thin film by the CBD process without artificially controlling the process temperature, solution pH or concentration.

• Journal of the Korean Society for Precision Engineering
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• v.19 no.8
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• pp.16-25
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• 2002

• Journal of the Korean Graphic Arts Communication Society
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• v.22 no.1
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• pp.39-52
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• 2004

A novel evaluation method is investigated for measuring the ability of acid amplification of acid amplifier. The method is based on the measurement of conductivity change by the acid generation according to UV radiation. It is found that the decrease of conductivity is caused by photopolymerization of epoxy monomer during UV curing process of ink film and the by the rate of UV curing. In this paper, the novel acid amplifiers were synthesized and measured thermal stability by means of DSC. It was found that mono-type acid amplifiers were more stable than di-type. It is possible to make the dynamical evaluation the curing rate of UV curable ink in curing process by this method.

• Environmental Engineering Research
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• v.16 no.4
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• pp.243-252
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• 2011

Several mathematical relationships have been developed to describe bacterial responses to UV irradiation. Pseudomonas aeruginosa was taken as a bacterial model. The results obtained showed that the kinetics of disinfection is far to be as uniform. In fact, application of the model of Chick-Watson in its original form or modification, taking into account the speed change during the disinfection process, has not significantly improved results. The application of both models of Collins-Selleck and Hom constitute a major opportunity to simulate goodly the kinetics of UV disinfection. The results obtained showed that despite the major advantage held by applying the Hom model in this process of disinfection and for all strains studied, the model of Collins-Selleck gave the best results for the description of the UV inactivation process. The design of reactors, operating in continuous disinfection system, requires taking into account the hydrodynamic behaviour of water in the reactor. Knowing that a reduction of 4-log is necessary in the case of wastewater reuse for irrigation, a model integrating the expression of disinfection kinetics and the hydrodynamics through the UV irradiation room was proposed. The results highlight the interest to develop reactors in series working as four perfectly mixed reactors.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.11 no.1
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• pp.62-67
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• 2012

Recently UV laser is widely used to process micro parts using various materials such as polymers, metals and ceramics because it has a very high intensity at the focused spot area. It is generally known that there are still some difficulties for alumina($Al_2O_3$) ceramics to directly make micro patterns like holes and lines on the surface of working material using 355nm UV laser because the alumina has a very low absorption coefficient at that wavelength. But nowadays new alumna with nano-porous holes is developed and applied to advanced micro functional parts of IT, BT and BT industries. In this paper, we are going to show the mechanism of photo-thermal ablation for nano-porous ceramics. Inside hole there is a lot of multiple reflections along the depth of hole. Experimentally we can find the micro hole drilling and micro grooving on the surface of nano-porous alumina.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.8
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• pp.598-604
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• 1999

This paper describes the research to minimize the film stress and maximize the aspect ratio of photoresist structure, especially about SU-8 for electroplating mold. UV LIGA process using SU-8 allows fabricating high aspect ratio polymer structures. However, it is hard to get fine patterns in the high aspect ratio structures because of high internal stress and difficulty of removing SU-8. The purpose of this paper is to setup the process condition for the obtainment of both low film stress and high aspect ratio and to find design rules that make the pattern be less dependent on stress problem. Firstly, the process of heat treatment and exposure of SU-8 are proposed. These two conditions control the amount of cross-linkage in polymer structure, which is the most important parameter of both pattern generation and remaining stress. Heat treatment is dealed with soft bake and post-exposure-bake. Temperature and time duration of each step are varied with heat treatment condition. Some test patterns are fabricated to evaluate the proposed process. Nickel electroplating is performed with the mold fabricated through the proposed process to confirm the SU-8 as a good electroplating mold.

• Transactions of the Society of Information Storage Systems
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• v.6 no.1
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• pp.37-40
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• 2010

Fresnel lens is a kind of refractive optical lens with various advantages. It has nearly flat shaped optical lens that has small mass. Fresnel lens has number of applications in the compact optical systems. Recently, demands of high quality Fresnel lens for small size optical systems such as illumination units, compact imaging systems, display units, information storage systems, optical detecting units had increased rapidly. Conventional manufacturing process of high quality Fresnel lens is direct machining. However, it is not suitable for mass production because of high cost and long cycle time. Replication method can provide cost effective mass production process. However, there are various issues about replication of Fresnel lens. Fresnel lens has number of sharp blade shape prism. In the replication process, this blade shape causes defects that can affect optical efficiency. In this study, replication processes; injection molding process and UV imprinting process, were developed and evaluated using Fresnel lens that has maximum pattern height of $250\;{\mu}m$ and aspect ratio of 1.5.

• Journal of the Korean Vacuum Society
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• v.13 no.1
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• pp.39-45
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. A 5${\times}$5${\times}$0.09 in. quartz stamp is fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. FAS(Fluoroalkanesilane) is used as a material for anti-adhesion surface treatment on the stamp and a thin organic film to improve adhesion on a wafer is formed by spin-coating. The low viscosity resin droplets with a nanometer scale volume are dispensed on the whole area of the coated wafer. The UV-NIL experiments have been performed using the EVG620-NIL. 370 nm - 1 m features on the stamp have been transferred to the thin resin layer on the wafer using the multi-dispensing method and UV-NIL process. We have measured the imprinted patterns and residual layer using SEM and AFM to evaluate the potential of the process.

• Journal of Korean Society of Water and Wastewater
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• v.33 no.6
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• pp.469-480
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• 2019

This study was conducted to evaluate the degradation and mineralization of PPCPs (Pharmaceuticals and Personal Care Products) using a CBD(Collimated Beam Device) of UV/H₂O₂ advanced oxidation process. The decomposition rate of each substance was regarded as the first reaction rate to the ultraviolet irradiation dose. The decomposition rate constants for PPCPs were determined by the concentration of hydrogen peroxide and ultraviolet irradiation intensity. If the decomposition rate constant is large, the PPCPs concentration decreases rapidly. According to the decomposition rate constant, chlortetracycline and sulfamethoxazole are expected to be sufficiently removed by UV irradiation only without the addition of hydrogen peroxide. In the case of carbamazepine, however, very high UV dose was required in the absence of hydrogen peroxide. Other PPCPs required an appropriate concentration of hydrogen peroxide and ultraviolet irradiation intensity. The UV dose required to remove 90% of each PPCPs using the degradation rate constant can be calculated according to the concentration of hydrogen peroxide in each sample. Using this reaction rate, the optimum UV dose and hydrogen peroxide concentration for achieving the target removal rate can be obtained by the target PPCPs and water properties. It can be a necessary data to establish design and operating conditions such as UV lamp type, quantity and hydrogen peroxide concentration depending on the residence time for the most economical operation.