• Journal of Korean Society of Water and Wastewater
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• v.20 no.5
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• pp.755-761
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• 2006

Recently, there is growing interest in ultraviolet (UV) irradiation as a disinfection technic in drinking water production due to its effectiveness to inactivate microorganisms such as Crytosporidium parvum without forming disinfection byproducts. However, UV disinfection is known for its drawback such as photoreactivation. Despite many works concerning the photoreactivation, most of works were focused on indicator or non pathogenic microorganisms. The objective of this study is to examine the photoreactivation of Pseudomonas aeruginosa which is an opportunistic pathogen as UV radiation by LP and MP UV lamp was applied. The result showed that P. aeruginosa had high photo repair efficiency regardless of the type of UV irradiation. Both of the effective log repair values of LP and MP UV irradiation were found approximately 2.6 log. In addition, photo repaired P. aeruginosa was not significantly different in forming biofilm in comparison with non treated P. aeruginosa.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.11
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• pp.985-993
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• 2006

An experiment to find out the removal mechanism of PEG(polyethyleneglycol) by using UV-enhanced $O_2$ GPC (gas phase cleaning) at low substrate temperature below $200^{\circ}C$ was executed under various process conditions, such as substrate temperature, UV exposure, and $O_2$ gas. The possibility of using $UV/O_2$ GPC as a low-temperature in-situ cleaning tool for organic removal was confirmed by the removal of a PEG film with a thickness of about 200 nm within 150 sec at a substrate temperature of $200^{\circ}C$. Synergistic effects by combining photo-dissociation and photo oxidation can only remove the entire PEG film without residues within experimental splits. In $UV/O_2$ GPC with substrate temperatures higher than the glass transition temperature, the substantial increase in the PEG removal rate can be explained by surface-wave formation. The photo-dissociation of PEG film by UV exposure results in the formation of end aldehyde by dissociation of back-bone chain and direct decomposition of light molecules. The role of oxygen is forming peroxide radicals and/or terminating the dis-proportionation reaction by forming peroxide.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2001.04a
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• pp.20-23
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• 2001

Plasma Display Panel(PDP) is a type of flat panel display utilizing the light emission produced by gas discharge. Barrier Ribs of PDP separating each sub-pixel prevents optical and electrical crosstalks from adjacent sub-pixels. The mold for forming the barrier ribs has been newly researched to overcome the disadvantages of conventional manufacturing processes such as screen printing, sand-blasting and photosensitive glass methods. The mold for PDP barrier ribs have stripes of micro grooves transferring glass-material wall. In this paper, Stripes of grooves of which width 48${\mu}{\textrm}{m}$, depth 124$\mu\textrm{m}$ , pitch 274$\mu\textrm{m}$ was acquired by machining of single crystal silicon with dicing saw blade. Maximum roughness of the bottom of the grooves was 59.6nm Ra in grooving Si. Barrier ribs were formed with silicone rubber mold, which is transferred from grooved Si forming hard mold. Silicone rubber mold has the elasticity, which enable to accommodate the waveness of lower glass plate of PDP. The methods assisted by the microwave and UV was adopted for reducing the forming time of glass paste.

• The Journal of the Korean Society for Microbiology
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• v.21 no.4
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• pp.407-415
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• 1986

This study investigated whether a correlation exists between environmental physical and biochemical factors and adherence of Candida albicans to human buccal epithelial cells by using normal and UV-irradiated strains. The results were as follows: 1. The percentage of germ tube forming activities of normal Candida albicans was 91.5% and UV-irradiated Candida albicans was 15.0%. The $LD_{50}$ of normal strains in mice were $1.0{\times}10\;cells/ml$, but could not be observed in the UV-irradiated strains even with $1.0{\times}10\;cells/ml$. It demonstrated that the virulence is decreased in the UV-irradiated strain. 2. The adherence of normal Candida albicans to human buccal epithelial cells($166{\pm}29{\sim}207{\pm}17\;cells$/100 epithelial cells) was significantly greater than UV-irradiated Candida albicans($99{\pm}21{\sim}131{\pm}25\;cells$/100 epithelial cells). 3. Candida albicans cultured at $37^{\circ}C$ adhered to buccal epithelial cells($166{\pm}16{\sim}207{\pm}17\;cells$/100 epithelial cells) in greater numbers than cultured at $25^{\circ}C$($80{\pm}15{\sim}143{\pm}22\;cells$/100 epithelial cells). 4. On comparison of the adherence of viable and nonviable(heat-killed) Candida albicans to human buccal epithelial cells, the nonviable Candida albicans demonstrated poorer adherence than viable Candida albicans. 5. Adherence in vitro of Candida albicans to human epithelial cells appeared to be effected by the pH. The adherence ability was maximum increased at pH 7.0($187{\pm}22\;cells$/100 epithelial cells) other than experimental pH. 6. The adherence was proportional to the incubation time and the Candida cell concentration in the suspension. 7. A strong correlation was shown between germ tube forming activity and increased adherence of Candida albicans to human epithelial cells, indicating that germ tube forming activity were responsible for candidal virulence.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.214.2-214.2
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• 2013

Device performance for the 45 and 32 nm node CMOS technology requires the integration of ultralow-k materials. To lower the dielectric constant for PECVD and spin-on materials, partial replacement of the solid network with air (k=1.01) appears to be more intuitive and direct option. This can be achieved introducting of second "labile" phase during depositoin that is removed during a subsequent UV curing and annealing step. Besides, with shrinking line dimensions the resistivity of barrier films cannot meet the International Technology Roadmap for Semiconductors (ITRS) requirements. To solve this issue self-forming diffusion barriers have drawn attention for great potential technique in meeting all ITRS requirments. In this present work, we report a Cu-V alloy as a materials for the self-forming barrier process. And we investigated diffusion barrier properties of self-formed layer on low-k dielectrics with or without UV curing treatment. Cu alloy films were directly deposited onto low-k dielectrics by co-sputtering, followed by annealing at various temperatures. X-ray diffraction revealed Cu (111), Cu (200) and Cu (220) peaks for both of Cu alloys. The self-formed layers were investigated by transmission electron microscopy. In order to compare barrier properties between V-based interlayer on low-k dielectric with UV curing and interlayer on low-k dielectric without UV curing, thermal stability was measured with various heat treatment temperature. X-ray photoelectron spectroscopy analysis showed that chemical compositions of self-formed layer. The compositions of the V based self-formed barriers after annealing were strongly dominated by the O concentration in the dielectric layers.

• The Bulletin of The Korean Astronomical Society
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• v.38 no.2
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• pp.45.2-45.2
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• 2013

We studied recent evolution of M31 and M33 with star-forming regions and hot massive stars. We use GALEX far-UV and near-UV imaging to detect the star-forming regions and trace the recent star formation across the entire disk of galaxies. The GALEX imaging, combining deep sensitivity and entire coverage of these galaxies, provides a complete picture of the recent star formation in M31 and M33, and its variation with environment throughout these galaxies. We also show results from recent extensive surveys in M31 and M33 with Hubble Space Telescope multi-wavelength data including UV filters, which imaged several regions at a linear resolution of less than half a pc in these galaxies. Both datasets allow us to study the hierarchical structure of star formation: the youngest stellar groups are the most compact, and are often arranged withing broader, sparser structures. The derived recent star-formation rates are rather similar for the two galaxies, when scaled for the respective areas.

• The Bulletin of The Korean Astronomical Society
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• v.41 no.2
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• pp.62.3-63
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• 2016

We studied the young stellar populations of star-forming (SF) regions in M33 based on the Galaxy Evolution Explorer (GALEX) ultraviolet (UV) imaging data. The SF regions are defined from far-UV data with various thresholds. We examined the reddening and spatial distribution of hot massive stars within SF regions from Hubble Space Telescope multi-band survey and Local Group Galaxy Survey (LGGS) data. The H-alpha sources from the LGGS are used for comparing with the spatial distribution of SF regions. The GALEX UV flux measurements of SF regions are used to derive their ages and masses. We also estimated the size and density of SF regions. The younger and compact SF regions are often arranged within older and sparser SF complexes. The results allow us to understand the hierarchical star formation and recent evolution of M33.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.352.2-352.2
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• 2014

In this present work, we report a Cu-Mn alloy as a materials for the self-forming barrier process. And we investigated diffusion barrier properties of self-formed layer on low-k dielectrics with or without UV curing treatment. Cu alloy films were directly deposited onto low-k dielectrics by co-sputtering, followed by annealing at various temperatures. X-ray diffraction revealed Cu (111), Cu (200) and Cu (220) peaks for both of Cu alloys. The self-formed layers were investigated by transmission electron microscopy. In order to compare barrier properties between Mn-based interlayer interlayer, thermal stability was measured with various low-k dielectrics. X-ray photoelectron spectroscopy analysis showed that chemical compositions of self-formed layer. The compositions of the Mn based self-formed barriers after annealing were determined by the C concentration in the dielectric layers.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1833-1836
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• 2008

Recently as the micro surface features become higher and diverse in their shapes, the releasing of the molded features becomes more crucial for manufacturing of the micro patterned products. The higher aspect ratio of the features or more complex shape of the features results in larger releasing force, elongation or cohesive failure of the features during the releasing. Another issue would be the uniformity of the released surface features after molding, especially for applications with large area surface. The micro patterned optical film, one of typical applications for micro surface features, consists of two layers, the thermoplastic base film and the micro formed UV resin layer. Therefore two interfaces are typically involved during the forming of this micro featured film; one is between the base film and the UV resin and another is between the resin and the pattern master. To improve the releasing of the molded surface features, the adhesive characteristic was investigated at these two interfaces. A PET film was used as a base film and two UV curable resins with different surface energy were prepared for different adhesiveness. Also the two different pattern masters were employed; one is made from brass-copper alloy and fabricated with PMMA. The adhesiveness at each interface was measured for some combinations of these base film, UV resins and the masters and the effect of this adhesiveness on the releasing was investigated.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.7
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• pp.761-768
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• 2011

The large surface micro machining system includes the equipments and processes for manufacturing the ultra precision micro patterned products with large surface through the mechanical machining. Recent major issue on the micro machining technology may be the development of optical parts for the back light unit of display which has the largest market. This special issue makes up with three parts; the large surface micro machining system and machine, machining process and forming process. In this paper, the state-of-the-art and core technology of large surface micro machining system is introduced with focus on the manufacturing technology for the back light unit of LCD TV. Then, some research results on the development of a roll die lathe is introduced which involves the concept of machine design, improvement of thermal characteristics in the spindle system, improvement of relative parallelism and straightness between spindle system and long stroke feed table, machining of micro pitch patterns. Finally, the direct forming process is introduced as the future work in the large surface micro machining field.