• Title/Summary/Keyword: UV filter

Search Result 155, Processing Time 0.022 seconds

Appropriate Digital Camera System for Digital Ultraviolet Photography (디지털 자외선 사진을 위한 적정 디지털 카메라 시스템)

  • Lee, Young-Kyu;Har, Dong-Hwan
    • The Journal of the Korea Contents Association
    • /
    • v.10 no.7
    • /
    • pp.40-48
    • /
    • 2010
  • Reflected-Ultraviolet photography is applied to the evidence of crime, Archaeology, and Dermatology. In the past, Ultraviolet photography was done with standard black-and-white film. Because emulsion of film is more sensitive to near UV light than CCD(Charge Coupled Device) or CMOS(Complementary Metal-Oxide-Semiconductor)of digital camera. In this research, we purpose to improve qulity of ultraviolet photographs and to find out the best alternative digital camera by utilizing a cunsumer digital camera. To achieve theses, we removed IR cutoff filter from digital camera. And by using modified UV pass filter, we verified the increase of image resolution of digital ultraviolet photographs. Also, we analyze reproducibility of digital ultraviolet photographs according to type, size, pixel of image sensor. Furthermore, this research resulted in the development of an practical digital camera system by utilizing a cunsumer digital camera. Eventually, it will contribute to practical use in the various field of digital ultraviolet photographs

Synergistic Effects of UV Absorbance of Nanoemulsions Formed with Organic UV filters and Wax (유기자외선차단제와 왁스를 함유한 나노에멀젼의 자외선 흡광도의 상승효과)

  • Cho, Wan Goo;Cha, Young Kweon
    • Journal of the Society of Cosmetic Scientists of Korea
    • /
    • v.41 no.1
    • /
    • pp.57-62
    • /
    • 2015
  • In this study, we investigated the effect on the increase of UV absorbance using a o/w nanoemulsion containing a blend of surfactants (Tween 80 and Span 80), an organic sunscreen, and wax. The particle size of nanoemulsion produced by PIC (Phase Inversion Composition), in Tween 80/Span 80 system containing candelilla wax was below 50 nm. As the concentration of Tween 80/Span 80/candelilla wax/organic UV filter was fixed at 4.5/0.5/3.0/2.0 wt%, and various organic sunscreens were added to the system, stable nanoemulsion was produced by Parsol MCX and Escalol 587, respectively. In addition, in the same system, when the ratio of Parsol MCX and candelilla wax was less than 2.0, a stable nanoemulsion was obtained. UV absorbance showed a high synergistic effect when Parsol MCX was used with candelilla wax.

Development of UV-IR Camera using IR Module and Improved UV Filter Transmittance (투과율 향상 UV 필터와 IR 모듈을 이용한 자외선-적외선(UV-IR) 카메라 개발)

  • Kim, Young-Seok;Shong, Kil-Mok;Bang, Sun-Bae;Kim, Chong-Min;Choi, Myeong-Il;Kim, Woo-Jin
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
    • /
    • v.26 no.12
    • /
    • pp.37-43
    • /
    • 2012
  • UV-IR diagnostic technology is being used for predictive maintenance of high voltage equipment together with IR-thermography and ultrasonic devices. In this paper, the UV-IR camera design, fabrication, and perform a simple test to be take advantage of the diagnostic equipment. UV-IR camera developed a $6.4^{\circ}{\times}4.8^{\circ}$ of the field of view as a conventional camera to diagnose a wide range of slightly enlarged, and power equipment to measure the distance between the camera and the distance meter has been attached. In a distance of 5m with the UV-IR it is possible to detect partial discharge with a PD level of 2.5 pC and a RIV(Radio Influence Voltage) level of $3.6dB{\mu}V$.

A Study on Electro-Optical Characteristics of the TN Cell Photoaligned on the Ν-(phenyl)maleimide Surface using the UVLPH Photodimerization Method (Ν-(phenyl)maleimide 표면에 UVLPH 광중합법을 이용한 광배향 TN 셀의 전기광학특성에 관한 연구)

  • 황정연;김준영;김태호;서대식;김영식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.15 no.8
    • /
    • pp.731-735
    • /
    • 2002
  • Electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photoaligned with linearly polarized UV exposure on the poly[4- (fluorocinnamate) phenylmaleimide](PFCPMI) surfaces using a new photodimerization method were investigated. For a new UVLPH (UV linearly polarized during heating) photodimerization method, the photopolymer layers were exposed by linearly polarized UV dichroic polarizer without a specific UV filter during heating at $150^{\circ}C$. The Voltage-transmittance (V-T) curve without backflow bounce in the photoaligned TN-LCD with UV exposure on the PFCPMI surface for 10 min using the UVLPH photodimerization method was observed. For response time measurement, the transmittance characteristics of the photoaligned TN-LCD using the UVLPH photodimerization method on the photopolymer surface was better than that of the photoaligned TN-LCD using the UVLP photodimerization method under a room temperature.

A DSP System for On-line Monitoring in Laser Welding Using a IR and UV Sensors (IR 및 UV센서를 이용한 레이저 용접시의 실시간 모니터링 DSP 시스템)

  • Yoon Choong-Sup
    • Journal of Welding and Joining
    • /
    • v.23 no.4
    • /
    • pp.53-58
    • /
    • 2005
  • We designed a weld monitoring system with UV and IR sensors using a embedded DSP controller for implementing a distribution system; running stand alone and communication with outside by industrial standard protocols. Also this system provided a USB port in order to be acquiring data in PC. The user interface program in PC visualized the IR and W data in time, frequency and state space. A correlation of IR and UV signals showed closely related to weld quality. A rapid change of geometry can be found through a moving average filter. And the average value of IR signal at an interval represented a welding width and depth. Through these results, we proposed a monitoring algorithm for a integer type DSP.

Implementation of a Real-time SIFT Pitch Detector (실시간 SIFT 기본주파수 검출기의 구현)

  • Lee, Jong Seok;Lee, Sang Uk
    • Journal of the Korean Institute of Telematics and Electronics
    • /
    • v.23 no.1
    • /
    • pp.101-113
    • /
    • 1986
  • In this paper, a real-time pitch detector LPC vocoder as implemented on a high speed digital signal processor, NEC 7720, is described. The pitch detector was based mainly on the SIFT algorithm. The SIFT pitch detector consists primarily of a digital low pass filter, inverse filter, computation of autocorrelation, a peak picker, interpolation, V/UV defcision and a final pitch smoother. In our approach, modification, mainly on the V/UV decision and a final pitch smoother, was made to estimate more accurate pitches. An 16-bit fixed-point aithmatic was employed for all necessary computation and the simulated results were compared with the eye detected pitches obtained from real speech data. The pitch detector occupies 98.8% of the instruction ROM, 37% of the data ROM, and 94% of internal RAM and takes 15.2ms to estimate a pitch when an analysis frame is consisted of 128 sampled speech data. It is observed that the tested results were well agreed with the computer simulation results.

  • PDF

A Numerical Analysis of the Abatement of VOC with Different Photocatalytic Honeycomb Filters (광촉매 필터형상에 따른 휘발성 유기화합물의 제거에 관한 수치해석적 연구)

  • 류무성;김창녕
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
    • /
    • v.16 no.1
    • /
    • pp.1-7
    • /
    • 2004
  • This study has been numerically conducted to investigate the removal efficiency of Volatile Organic Compound (VOC) for different photocatalytic honeycomb filters. Recently, the photocatalysis is being applied to air-cleaner, air-conditioner and vacuum-cleaner with the capability of air-purification, sterilization and antibiosis. However, photocatalysis is less efficient than other methods for removing VOC except in the case of low concentration. So far most of studies have focused on an improvement of the photocatalytic materials, but this study have placed emphasis on the improvements of shape of photocatalytic honeycomb filter. UV irradiation, concentration profile and pressure drop have been investigated for different cross sections of filters and for different filter lengths. Light intensity is dropped sharply with increasing distance from the UV-lamp, and becomes very low in the middle of the filters. Since photocatalytic reaction rate is a function of light intensity, VOC concentration gradient might be small in the middle of long filters. Thus, most of reaction have risen within only three times of dimensionless axial distance. These results can be used effectively for the design of advanced photocatalytic honeycomb filters.

EFFECTS OF UV-B RADIATION ON GROWTH AND DEVELOPMENT OF RICE CULTIVARS (ORYZA SATIVA L.).

  • Kumagai, T.
    • Journal of Photoscience
    • /
    • v.1 no.2
    • /
    • pp.135-141
    • /
    • 1994
  • Elevated near-UV radiation, containing a large amount of UV-B and a small amount of UV-C, inhibited the development of leaves and tillers, the increase in biomass production, the elongation of plant height, the photosynthetic rate and the chlorophyll content in rice plants in a phytotron. Elevated UV-B radiation filtered through cellulose diacetate film or UV-31 cut filter (transmission down to 290 nm) similarly suppressed each growth component above. Near-UV radiation-caused injuries were alleviated either by elevated CO$_2$ atmosphere or by exposure to high irradiance-visible radiation. On the basis of these findings, we examined cultivar differences in the resistance to UV radiation-caused injuries among 198 rice cultivars belonging to 5 Asian rice ecotypes ( aus, aman, boro, bulu and tjeleh) from the Bengal region and Indonesia and to Japanese lowland and upland rice groups. It was shown that .various cultivars having different sensitivities to the effects of near-UV radiation were involved in the same ecotype and the same group, and that the Japanese lowland rice group and the boro ecotype were more resistant. Among Japanese lowland rice cultivars, Sasanishiki (one of the leading varieties in Japan) exhibited more resistance to near-UV radiation, while Norin 1 showed less resistance, although these two cultivars are closely related. It was thus indicated that the resistance to the inhibitory effects of near-UV radiation of rice cultivars is not simply due to the difference in the geographical situation where rice cultivars are cultivated. From the genetic analysis of resistance to the inhibitory effects of UV radiation on growth of rice using F$_2$ plants generated by reciprocally crossing Sasanishiki and Norin 1 and F$_3$ lines generated by self-fertilizing F$_2$ plants, it was evident that the resistance to the inhibitory effects of elevated near-UV radiation in these rice plants was controlled by recessive polygenes.

  • PDF

Overview of New UV-filters (새로운 UV 필터에 대한 고찰)

  • Osterwalder, Uli;Kang, Chul-Sang;Herzog, Bernd
    • Journal of the Society of Cosmetic Scientists of Korea
    • /
    • v.31 no.3 s.52
    • /
    • pp.237-244
    • /
    • 2005
  • Sunscreens have been in use for about 70years and 'tanning without burning' was propagated as their major advantage. The objective changed from 'getting a tanned skin' to 'getting skin protection' since UV have been proposed to a major risk of skin cancer and the risk of developing skin cancer related also to non-burning UVA. The new expectation from consumers has triggered the development of new UV absorbers and led to the approval of 7 new, organic UV absorbers in Europe over the last few years. The significant progress due to these new UV absorbers will be discussed in this report. These UV absorbers provide an efficient absorption of UV radiation (UVB and/or UVA) and easily incorporate in any kind of formulation. These are also safe, i.e. devoid of adverse effects. These new filters give the formulators new possibilities to cover the whole UV range iron 290 to 400 nm, and also to use less filter due to the boosting effect of the new UVA and broadband fitters.