• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1934-1938
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• 2008

Formation of air bubble is the one of common defects in UV nano imprint lithography. Location of dispensing and volume of droplets are among the most important parameters in the process. ]n this study, UV curable resin droplets with different volumes were dispensed at different locations and pressed to investigate air bubble formation. By varying volume of droplet and dispensing location, process conditions were found for minimum air bubble area.

• 패션비즈니스
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• 제11권6호
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• pp.52-61
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• 2007

To increase the ultraviolet radiation (UVR) protection of cotton fabric, ultraviolet protection (UVP) materials were treated onto cotton fabric using a new technique, UV-curing. A photocrosslinkablepolymer, poly(ethylene glycol) dimethacrylate was used as a UV-curable resin in the presence of a small amount of photoinitiator. Two kinds of UVP materials were used, UV-absorber, 2,2'-dihydroxy-4-methoxy benzophenone, and UV-scatterer, $TiO_2/ZnO$ Pad-dry-cure method in employing these materials onto cotton was also conducted to compare the effectiveness and the washfastness of UVP treatment between curing methods. UVP treated cotton fabric showed a moderate increase in UVP in case of 2,2'-dihydroxy-4-methoxy benzophenone treatment and a high increase in case of $TiO_2/ZnO$. UV-curing method increased the washfastness of UVP property of $TiO_2/ZnO$ treated cotton fabrics. However, in case of 2,2'-dihydroxy-4-methoxy benzophenone, similar wash fastnesses of UV-cured and pad-dry-cured cotton were observed. It can be presumed that 2,2'-dihydroxy-4-methoxy benzophenone was not significantly affected by water since its hydrophobicity. In short, UV-curing of UVP materials onto cotton was successfully done, and treated cotton fabrics showed the increased UVP properties and an increased washfastness in some extent.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.623-624
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• 2010

• 한국산업융합학회 논문집
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• 제22권5호
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• pp.467-473
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• 2019

In this study, approached to improve durability of the multi-functional nano-pattern fabricated on the curved lens surface using nanoimprint lithography (NIL) was proposed, and the effects of the proposed methods on functionality after wear test were examined. To improve the mechanical property of ultraviolet(UV)-curable resin, UV-NIL was conducted at the elevated temperature around $60^{\circ}C$. In addition, micro/nano hierarchical structures was fabricated on the lens surface with a durable film mold. Analysis on the worn surfaces of nano-hole pattern and hierarchical structures and measurements on the static water contact angle and critical water volume for roll-off indicated that the UV curing process with elevated temperature is effective to maintain wettability by increasing hardness of resin. Also, it was found that the micro-scale pattern is effective to protect nano-pattern from damage during wear test.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.40-44
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• 2008

The interfacial adhesion energy between resist and a substrate is very important due to resist pull-off problems during separation of mold from a substrate in nanoimprint process. And effect of substrate surface roughness on interfacial adhesion energy is very important. In this paper, we have treated glass wafer surface using $CF_4$ gas for increase surface roughness and it has tested interfacial adhesion properties of UV resin/glass substrate interfaces by 4 point bending test. The interfacial adhesion energies by bare, 30, 60 and 90 sec surface treatments are 0.62, 1.4, 1.36 and 2 $J/m^2$, respectively. The test results showed quantitative comparisons of interfacial fracture energy (G) effect of glass wafer surface roughness.

• 소성∙가공
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• 제19권2호
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• pp.73-78
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• 2010

Recently, many researches on the development of super-hydrophobic surface have been concentrated on the fabrication of nano-patterned products. Nano-patterned mold is a key to replicate nano-patterned products by mass production process such as injection molding and UV molding. The present paper proposes the new fabricating method of nano-patterned mold at low cost. The nano-patterned mold was fabricated by electroforming the anodic aluminum oxide membrane filled with UV curable resin in nano-hole by capillary phenomenon. As a result, the final mold with nano-patterns which have the holes with the diameter of 100~200 nm was fabricated. Furthermore, the UV-molded products with clear nano- patterns which have the pillars with the diameter of 100~200nm were achieved.

• 한국정밀공학회지
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• 제28권7호
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• pp.777-782
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• 2011

Micro features on the surface are well-known to have significant effects on optical or mechanical properties such as the optical interference, reflectance at the surface, contact angle, interfacial friction, etc. These surface micro features are increasingly employed to enhance the functionality of the applications in various application areas such as optical components for LCD or solar panel. Diverse surface features have been proposed and some of them are showing excellent efficiency or functionality, especially in optical applications. Most applications employing the micro features need manufacturing process for mass production and the injection molding and roll-to-roll forming, which are typical processes for mass production adopting polymeric materials, may be also preferred for micro patterned plastic product. Since the functionality or efficiency of the surface structures generally depends on the shape and the size of the structure itself or the array of the structures on the surface, it would be very important to replicate the features very precisely as being designed during the molding the micro pattern applications. In this paper, a series of research activities is introduced for roll-to-roll forming of micro patterned film including filling of patterns with UV curable resin, demolding of surface structures from the roll tool, control of surface energy and cure shrinkage of resin and dispose time and intensity of the UV light for curing of UV curable resin.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.521-522
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• 2008

An etch-less simple method was developed to fabricate two-dimensional nanostructures on glass substrate directly by using UV curable polymer resin and UV nanoimprint lithography in order to improve output coupling efficiency of OLEDs. OLEDs integrated on nanoimprinted substrates enhanced electro-luminance intensity by up to 50% compared with the conventional device.

• 한국인쇄학회지
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• 제18권2호
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• pp.113-124
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• 2000

It is well known that the characteristics of liquid crystal polymer composite(LCPC) films are possessed of large-area and flexible display, polarizer free, high contrast, wide angle of visual filed and high responsiveness. In this study, we have investigated to the best optimal mixing rates chiral nematic liquid crystals and UV-curable resins having different properties acrylate moleculars. The purpose of this study has been the development of new functional application with liquid crystal polymer composite films. For example the films were applied a new thermal sensor. In results, best phase separation behaviors turned out liquid crystal/monomer/oilgomer mixture system.

• KSBB Journal
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• 제22권6호
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• pp.433-437
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• 2007

본 연구에서는 나노임프린트 리소그래피를 이용하여 500 nm line, 600 nm pore, $1{\mu}m$ pore, $2.5{\mu}m$ pore의 마이크로 수준에서 나노 수준에 이르는 다양한 크기와 모양의 nanopore 형태 패턴을 제작하였다. Thermal imprint 방식과 달리 상온, 저압에서 임프린팅이 가능하며 사용되는 스탬프의 수명을 늘리고 보다 미세하고 복잡한 형태의 패턴을 제작할 수 있는 UV-assisted imprint 방식을 사용하였다. E-beam lithography로 패턴을 각인한 quartz소재의 스탬프를 사용하였으며 스탬프의 재질이 투명하여 UV 조사시 UV curable resin이 경화될 수 있도록 하였다. 또한 스탬프의 표면을 (heptadecafluoro-1,1,2,2-tetrahydrodecyl) trichlorosilane의 monolayer 층으로 미리 코팅하여 임프린트 후 스탬프와 기판과의 releasing을 쉽게함과 동시에 패턴의 일부가 스탬프에 묻어 나와 전사된 패턴에 defect가 없도록 하였다. 또한, gold를 미리 증착하여 임프린팅함으로써 lift-off 시에 필요한 hi-layer 층이 필요 없게 되어 산소 플라즈마를 이용한 에칭이 더욱 쉽고 lift-off 공정이 생략될 수 있도록 하였다. 나노임프린트 공정에 있어 가장 큰 문제점은 잔여층의 생성이며 이러한 잔여층을 제거하고자 산소 플라즈마 에칭을 하였다. 에칭공정을 통해 gold의 표면이 완전히 드러났으며 산소 플라즈마를 통해 gold의 표면이 친수성으로 바뀌어 추후 단백질 고정화를 더욱 쉽게 하였다. 그리하여 나노임프린트 기술을 이용해 나노크기의 바이오소자 제작을 가능하게 하였다.