• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2003년도 추계학술대회논문집
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• pp.377-380
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• 2003

Recently, demand of digital products with optoelectronic device is increasing rapidly. A microlens array is applied to improve optical efficiency on optoelectronic device, and it is usually fabricated by photolithography and reflow process after planarization layer coating process. UV molding process is more suitable for mass production of high quality microlens array than photolithography and reflow process. In the present study, microlens array was fabricated on the simulated optoelectronic device with planarization layer by aligned UV molding process. The shape of replicated microlens was measured, and the section image of molded part was examined.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 춘계학술대회 논문집
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• pp.237-240
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• 2005

The demand of micro electrical mechanical system (MEMS) bio/chemical sensor is rapidly increasing. To prevent the contamination of sensing area, a filtration system is required in on-chip total analyzing MEMS bio/chemical sensor. A nano-filter was mainly applied in some application detecting submicron feature size bio/chemical products such as bacteria, fungi and so on. We suggested a simple nano-filter fabrication process based on replication process. The mother pattern was fabricated by holographic lithography and reactive ion etching process, and the replication process was carried out using polymer mold and UV-imprinting process. Finally the nano-filter is obtained after removing the replicated part of metal deposited replica. In this study, as a practical example of the suggested process, a nano-dot array was replicated to fabricate nano-filter fur bacteria sensor application.

• 한국콘텐츠학회논문지
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• 제17권12호
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• pp.64-76
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• 2017

생물활성탄 공정은 수처리 과정에서 유기 오염물질을 효과적으로 제거하는 것으로 알려져 있으며, 활성탄에 부착된 세균의 생체량과 종은 오염물질 제거 과정에서 중요한 역할을 한다. 본 연구에서는 입상활성탄 공정에서 활성탄조의 깊이와 가동 기간에 따른 세균 생체량의 변화에 대해 확인해 보았다. 또한 입상활성탄공정 전단에 자외선 (UV) 공정 전처리를 하였을 때 세균 생체량의 변화를 확인하였다. 결과를 살펴보면 활성탄조의 깊이가 깊어질수록 세균 생체량이 감소하는 것을 확인하였다. 그리고 UV 공정 전처리를 한 경우, 공정 기간이 증가할수록 세균 생체량이 감소하는 것을 확인하였다. 그러나, UV 공정 전처리를 하지 않은 경우에는 공정 기간에 따른 세균 생체량의 변화가 나타나지 않았다. 본 연구 결과를 토대로 수처리 실공정에서 생물활성탄 공정 관리에 대한 유용한 정보를 제공할 것이라 여겨진다.

• 상하수도학회지
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• 제23권1호
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• pp.69-75
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• 2009

The characteristics of disinfection and organic removal were investigated with pulse UV lamp in this study. The intensity and emission wavelength of pulse UV Lamp were compared with low pressure UV lamp. The emission spectrum range of pulse UV lamp was between 200 and 400 nm while the emission spectrum of low pressure UV lamp was only single wavelength of 254nm. 3 Log inactivation rate of B. subtilis spore by pulse UV and low pressure UV irradiation was determined as $44.71mJ/cm^2$ and $57.7mJ/cm^2$, respectively. This results implied that wide range of emission spectrum is more effective compared to single wavelength emission at 254nm. 500ng/L of initial 2-MIB concentration was investigated on the removal efficiency by UV only and $UV/H_2O_2$ process. The removal efficiency of UV only process achieved approximately 80% at $8,600mJ/cm^2$ dose. 2-MIB removal rate of $UV/H_2O_2$ (5 mg/L $H_2O_2$) process was 25 times increased compared to UV only process. DOC removal efficiency for the water treatment plant effluent was examined. The removal efficiency of DOC by UV and $UV/H_2O_2$ was no more than 20%. Removal efficiency of THMFP(Trihalomethane Formation Potential), one of the chlorination disinfection by-products, is determined on the UV irradiation and $UV/H_2O_2$ process. Maximum removal efficiency of THMFP was approximately 23%. This result indicates that more stable chemical structures of NOM(Natural Organic Matter) than low molecule compounds such as 2-MIB, hydrogen peroxide and other pollutants affect low removal efficiency for UV photolysis. Consequently, pulse UV lamp is more efficient compared to low pressure lamp in terms of disinfection due to it's broad wavelength emission of UV. Additional effect of pulse UV is to take place the reactions of both direct photolysis to remove micro organics and disinfection simultaneously. It is also expected that hydrogen peroxide enable to enhance the oxidation efficiency on the pulse UV irradiation due to formation of OH radical.

• 한국물환경학회지
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• 제22권4호
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• pp.672-677
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• 2006

Ozone/UV combined process is an effective technique to enhance generation of OH radical which is non-selective and powerful oxidant. The objective of this study is to evaluate the inactivation rates of B. subtilis spores by three candidate processes (ozone alone, UV alone, ozone/UV combined processes) at 4 and $20^{\circ}$ and to investigate the effects of OH radical on inactivation of B. subtilis spores. On the UV alone process, required UV dosages for lag phase and 3-log inactivation of B. subtilis spores were determined as $8.9mJ/cm^2$ and $47mJ/cm^2$. However, the inactivation of B. subtilis spores didn't occured beyond 4.5-log inactivation despite increasing UV dose. The inactivation of B. subtilis spores by ozone alone and ozone/UV combined process was investigated with ozone CT (Concentration of disinfectant ${\times}$ Contact time) concept. As a result, inactivation of B. subtilis spores by ozone/UV combined process was faster than by ozone alone, and especially $CT_{lag}$ value B. subtilis spores in the presence and absence of t-BuOH, OH radical scavenger, was investigated to evaluate effects of OH radical formed during ozone/UV combined process. We found that OH radical plays important roles on inactivation of B. subtilis spores.

• 산업기술연구
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• 제29권A호
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• pp.83-88
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• 2009

The removal efficiency of organic compounds and the toxicity evaluation of microorganism have been studied in dye wastewater treatment using $UV/TiO_2$ and $UV/H_2O_2$ photooxidation system. Sample waters tested in this work were raw dye wastewater and dye wastewater treated in $UV/TiO_2$ and $UV/H_2O_2$ photooxidation system respectively. Total organic carbon(TOC) removal rate was 50% in $UV/TiO_2$ process and 80% in $UV/H_2O_2$ process. It has been investigated with colony counting agar method and paper disk method whether the type of treatment process has affected the microorganism growth. In the raw wastewater, more than four types of microorganisms have survived. But, little of microorganisms were alive at TOC removal rate of 50% in $UV/TiO_2$ system. In contrast to that, two types of microorganisms were found at TOC removal rate of 80% in $UV/H_2O_2$ system.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.26-29
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• 2003

UV laser micromachining are generally used to create microstructures for micro product through a sequence of lithography-based photopatterning steps. However, the micromachining process is not suitable for the rapid realization of complex microscale 3D product because it depends on worker experiences, excessive cost and time to make many masks. In this paper, the more effective micro rapid manufacturing process, which is developed upon the base of laser micromachining. is proposed to fabricate micro products directly using UV laser ablation and phase change filling. The filling process is useful to hold the micro product during the next ablation step. The proposed micro rapid manufacturing process is also proven experimentally that enables to fabricate the 3D microscale products of UV sensitive polymer from 3D CAD data to functional micro parts.

• 한국정밀공학회지
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• 제22권11호
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• pp.196-201
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• 2005

UV laser micromachining are generally used to create microstructures for micro product through a sequence of lithography-based photopatterning steps. However, the micromachining process is not suitable for the rapid realization of complex 3D micro product because it depends on worker experiences, excessive cost and time to make many masks. In this paper, the more effective micro rapid manufacturing process, which is developed upon the base of laser micromachining, is proposed to fabricate micro products directly using UV laser ablation and phase change filling. The filling process is useful to hold the micro product during the next ablation step. The proposed micro rapid manufacturing process is also proven experimentally that enables to fabricate the 3D micro products of UV sensitive polymer from 3D CAD data to functional micro parts.

• Transactions on Electrical and Electronic Materials
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• 제17권4호
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• pp.204-207
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• 2016

Experimental study of UV-irradiated O₂/H₂ gas phase cleaning for PMMA (Polymethylmethacrylate) removal is carried out in a load-locked reactor equipped with a UV lamp and PBN heater. UV enhanced O₂/H₂ gas phase cleaning removes polymethylmethacrylate (PMMA) better at lower process pressure with higher content of H₂. O₂ gas compete for UV (184.9 nm) absorption with PMMA producing O₃, O(¹D) and lower dissociation of PMMA. In our experimental conditions, etching reaction of PMMA at the substrate temperature between 75℃ and 125℃ had activation energy of about 5.86 kcal/mol indicating etching was controlled by surface reaction. Above the 180℃, PMMA removal was governed by a supply of reaction gas rather than by substrate temperature.

• KSBB Journal
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• 제25권1호
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• pp.25-32
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• 2010

This study was carried out to evaluate the performance of three kinds of single process (electrolysis, UV and ultrasonic process) for the purpose of disinfection of Escherichia coli in water. Among the five kinds of electrode material, disinfection performance of Ir electrode was higher than that of the other electrodes. The order of disinfection performance for E. coli in single process lies in: electrolysis > UV $\gg$ ultrasonic process. Performance of the three single processes was increased with the increase of the electric power. Disinfection efficiency of the three processes was increased with the decrease of the pH. Disinfection of the UV process were decreased by the increase of NaCl dosage and air flow rate. However, ultrasonic process was not affected above two parameters. OH radical was not produced in UV and ultrasonic process. E. coli disinfection of the electrolysis process was well agreed with RNO degradation tendency, except pH.