• Journal of the Korean Society of Clothing and Textiles
• /
• v.31 no.5 s.164
• /
• pp.659-669
• /
• 2007

The purpose of this study was to investigate the degradation of silk fabrics dyed with gardenia and sappanwood by Ultraviolet Light(UV). To asses the effect of uv on dyed silk fabrics, physical and chemical properties of samples were explored. K/S value rapidly decreased with increasing exposure time. Mordanting improved ultraviolet-cut ability and the sappanwood dyed samples were superior to those of gardenia dyed in ultraviolet-cut ability. Color progressively faded away as uv exposure time increased, accordingly, $L^*,\;a^*,\;b^*$, H/VC, ${\Delta}E$ were changed. Morphological change observed with SEM represented degradation of silk fabrics from the outer fibril to the inner fibril. Tensile Strength abruptly decreased as uv exposure time increased and the mordanted samples showed higher tensile strength than the unmordanted. FT-IR analysis confirmed that main peaks at 3297 and $1704cm^{-1}$ band for silk fabric were due to N-H and C=O stretching, gardenia peaks at 1654 and $668cm^{-1}$ band representing C=O(ester), C=C(alken) and O-C=O(carboxylic acids) of crocin and sappanwood peaks at $1715cm^{-1}$ band representing C=O(cyclic keton) of brazilin appeared on the samples exposed for 14 days, but these peaks indicating colorants after 28 days of uv exposure faded away due to prolonged exposure of uv.

• Journal of agriculture & life science
• /
• v.45 no.6
• /
• pp.115-124
• /
• 2011

This study was conducted to find a useful alternative herbivore system with which to study the effects of ultraviolet exposure on the pathogenicity and survival of Korean isolated entomopathogenic nematodes (Heterorhabditis sp. 202 strain, Heterorhabditis sp. Gyeongsan strain, Steinernema sp. 223 strain, S. carpocapsae Pocheon strain, S. glaseri Dongrae strain and S. longicaudum Nonsan strain). Pathogenicity of entomopathogenic nematodes against silkworm, Bombyx mori, differed depending on the nematode species and strain and instar of silkworm challenged. Steinernematidae were relatively more pathogenic to the 5th instar silkworms, whereas Heterorhabditidae were more pathogenic to the 1st instars. UV-C exposure was harmful to entomopathogenic nematodes. All nematodes were killed within 60 minutes of exposure of UV-C, and after 10 min of exposure they caused only 6.7% corrected mortality of silkworms. Silkworms were not infected when they were fed S. carpocapsae Pocheon strain treated mulberry leaves which were exposed to UV intensity of about $2.3mW/cm^2$ for 4 hours in the field. Pathogenicity of S. carpocapsae was not significantly reduced after 1 hour of exposure to $4.0mW/cm^2$ UV intensity on the mulberry leaves against silkworms.

• Journal of the Microelectronics and Packaging Society
• /
• v.25 no.4
• /
• pp.53-58
• /
• 2018

Since the scaling-down of IC devices has been reached to their physical limitations, several innovative packaging technologies such as 3D packaging, embedded packaging, and fan-out wafer level packaging (FOWLP) are actively studied. In this study the fabrication of organic-inorganic dielectric material was evaluated for the use of multi-structured redistribution layers (RDL) in FOWLP. Compared to current organic dielectrics such as PI or PBO an organic-inorganic hybrid dielectric called polysilsesquioxane (PSSQ) can improve mechanical, thermal, and electrical stabilities. polysilsesquioxane has also an excellent advantage of simultaneous curing and patterning through UV exposure. The polysilsesquioxane samples were fabricated by spin-coating on 6-inch Si wafer followed by pre-baking and UV exposure. With the 10 minutes of UV exposure polysilsesquioxane was fully cured and showed $2{\mu}m$ line-pattern formation. And the dielectric constant of cured polysilsesquioxane dielectrics was ranged from 2.0 to 2.4. It has been demonstrated that polysilsesquioxane dielectric can be patterned and cured by UV exposure alone without a high temperature curing process.

• Journal of Sensor Science and Technology
• /
• v.13 no.5
• /
• pp.350-355
• /
• 2004

A novel UV sensor was manufactured and characterized using the evanescentfield coupling between fiber-planar waveguide (PWG) coupler and prism. A spiroxazine dye was chosen as planar waveguide because its photochromic isomerization induced by UV irradiation. A novel UV sensor was proposed to measure the variation of refractive index and absorption coefficient simultaneously. The wavelength responses of these sensors by UV exposure times were measured 0.48 nm/sec, 0.757 nm/sec, and ATR output power variations were measured $-0.424{\mu}W$/sec and $-0.62{\mu}W$/sec when UV exposure power were 3 mW and 5 mW, respectively.

• The Transactions of the Korean Institute of Electrical Engineers P
• /
• v.58 no.4
• /
• pp.455-460
• /
• 2009

A number of factors combine to make ultraviolet radiation a superior means of water purification for ground water, rainwater harvesting systems and so on. Ultraviolet radiation is capable of destroying all types of bacteria. Additionally, ultraviolet radiation disinfects rapidly without the use of heat or chemical additives which may undesirably alter the composition of water. In a typical operation, water enters the inlet of a UV lamp and flows through the annular space between the quartz sleeve and the outside chamber wall. The irradiated water leaves through the outlet nozzle. Several design features are combined to determine the dosage delivered. The first is Wavelength output of the lamp, the Second is Length of the lamp - when the lamp is mounted parallel to the direction of water flow, the exposure time is proportional to the length of the lamp, the third is Design water flow rate - exposure time is inversely related to the linear flow rate, the forth is Diameter of the purification chamber - since the water itself absorbs UV energy, the delivered dosage diminishes logarithmically with the distance from the lamp. In this paper, It describe the how to design optimal UV disinfection device for ground water and rainwater. To search the optimal design method, it was performed computer simulation with 3D-CFD discrete ordinates model and manufactured prototype. Using proposed design method manufactured prototype applied to disinfection test and proved satisfied performance.

• Proceedings of the Korean Society of Toxicology Conference
• /
• 2003.10b
• /
• pp.112-112
• /
• 2003

Air pollution is made up by complex mixture exhausted from cars, industries and incinerators etc. Those pollutants come from everywhere without border and contain phototoxic and photogenotoxic chemicals including PAHs exhausted in the air. We have published that the chemicals which show phototoxicity and photogenotoxicity are closely related in mechanistic and the PAHs react as a strong photocatalyzer by radical productions under UV exposure.(omitted)

• Applied Chemistry for Engineering
• /
• v.34 no.5
• /
• pp.522-528
• /
• 2023

In this work, adhesive tapes were prepared for the dicing process in semiconductor manufacturing. Compounds with different numbers of photoreactive groups (f = 1 to 3) were synthesized and incorporated into acrylic copolymers to formulate UV-curable acrylic adhesives. Structural confirmation of the synthesized photoreactive compounds (f = 2 or 3) was performed using nuclear magnetic resonance (NMR) spectroscopy. The introduction of the photoreactive compounds into the acrylic adhesive was accomplished by urethane reactions, and the successful synthesis of the UV-curable acrylic adhesive was verified by Fourier transform infrared (FT-IR) measurements. To evaluate the performance of the adhesive, the peel strength was evaluated before and after UV irradiation using a silicon wafer as a substrate. The adhesive exhibited high peel strength (~2000 gf/25 mm) before UV exposure, which was significantly reduced (~5 gf/25 mm) after UV exposure. Interestingly, the adhesive containing multifunctional photoreactive compounds showed the most significant reduction in peel strength. In addition, surface residue measurements by field emission scanning electron microscopy (FE-SEM) showed minimal surface residue (~0.2%) after UV exposure. Overall, these results contribute to the understanding of the behavior of UV-curable acrylic adhesives and pave the way for potential applications in semiconductor manufacturing processes.

• Journal of Conservation Science
• /
• v.21
• /
• pp.41-48
• /
• 2007

The resistance for atmospheric corrosion of the conventional 5 epoxy resins (Araldite rapid, Araldite AW 106, Araldite SV 427, Devcon, and CDK), those were used to restoration of the iron relics, were investigated in this study. Temperature, UV light, and water were chosen for the factors of the atmospheric corrosion. The drastic voluminous changes of the epoxy resins were found at the temperature range between $40^{\circ}C$ and $70^{\circ}C$ After UV exposure, the colors of the epoxy resins were severely changed. In case of the indoor exposure the chroma value(${\Delta}E$) of the resins were less than 2, which showed a little changes of the colors. The result of the water contact angle test was Araldite rapid>AW 106>Devcon>SV 427>CDK. Although the contact angles of the resins were reduced by UV exposure, SV 427 was stable comparatively.

• Journal of the Korean institute of surface engineering
• /
• v.46 no.3
• /
• pp.99-104
• /
• 2013

The simple and cost-effective microfabrication method of photosensitive glass (PSG) using metal patterning and blank exposure was proposed. Conventional photolithography for micromachining of PSG needs a costly quartz mask which has high transmittance as an optical property. However, in this study the process was improved through the combination of micro-patterned Ti thin film and blank UV exposure without quartz mask. The effect of UV exposure time as well as the DHF etching condition was investigated. UV exposure test was performed within the range from 3 min to 9 min. The color and etch result of PSG exposed for 5 min were the most clear and effective to etch more precisely, respectively. The etching results of PSG in diluted hydrofluoric acid (DHF) with a concentration of 5, 10, 15 vol% were compared. The effect on the side etch was insignificant while the etch rate was proportional as the concentration increased. 10 vol% DHF results not only high etch rate of 75 ${\mu}m/min$ also lower side etch value after PSG etching. This method facilitates the microfabrication of PSG with various patterns and high aspect ratio for applying to advanced applications.

• Journal of Korean Ophthalmic Optics Society
• /
• v.13 no.4
• /
• pp.43-49
• /
• 2008

Purpose: The current study was conducted to evaluate the compatibility of UV-A blocking contact lens on eye protection with regular contact lens. Methods: The protective activity of regular contact lens (UV-A blocking: 20%) and UV-A blocking contact lens (UV-A blocking: 85%) on the denaturation of RNase A, catalase, and superoxide dismutase (SOD) induced UV-A irradiation were compared by acrylamide gel electrophoresis. The enzyme solutions were irradiated with UV-A for 1, 3, 6, 24 and 96 hours at the wavelength of 365 nm. Covering area with contact lenses were varied as 50%, 70% and 100% according to the calculation of blocking areas of anterior eye that could be covered with RGP lens, soft contact lens, and eye glasses, respectively. Results: Denaturations of RNase, catalase and SOD were exaggerated when they were exposed to UV-A for a longer period. The denaturation was effectively prevented by UV-A blocking contact lens compared to regular contact lens. The capability of UV-A blocking contact lens was considerably reduced when the covering area with contact lens decreased and exposure time to UV-A extended. Conclusion: Therefore, it would be suggested that wearing contact lens for a long time under sunlight is carefully considered since the activity of UV-A blocking contact lens against UV-A irradiation may not be enough to protect enzymes presented in eyes when exposure time to UV-A increased.