• 제목/요약/키워드: UV Exposure

검색결과 549건 처리시간 0.03초

외부활동에 따른 자외선 노출이 피부에 미치는 영향 연구 -피부물리치료를 위한 기초 연구- (A study on the effect of UV exposure on the skin due to external activities)

  • 이광재;최영인
    • 대한물리치료과학회지
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    • 제21권1호
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    • pp.37-43
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    • 2014
  • Background : The purpose of this study is to verify the type of influence on the skin color according to the photoaging symptoms depending on the degree of external activities among the factors that influence the skin due to UV exposure and to obtain the basic study data on the physical therapy of the skin. Methods : In this study, in order to investigate the type of influence on the skin color according to the photoaging symptoms when the body is exposed to the UV rays having various effects on our body, a study was conducted using questionnaires and skin color measurement tool targeting 20 male college soccer students with many external activities and the senior high school students who has relatively less external activities due to the preparation for college entrance. The skin color was measured and the results were compared. Result : In the test group having relatively higher external activities, while they had less use of the sunscreen, they had more degree of UV exposure, and for the recognition of ultraviolet hazard, more were aware that it was harmful. In addition, in the skin color measurement test conducted targeting the son and the father in order to investigate the association between the skin color and the genetic factors, the experimental group showed a significant difference(p<.05) but the control group did not show any significant difference(p>.05). Conclusion : Based on such study results, the UV exposure time and the use of sunscreen are thought to be an important factor in the skin care.

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Disinfection and Reactivation of Microorganisms after UV Irradiation for Agricultural Water Reuse of Biofilter Effluent

  • Jung, Kwang-Wook;Yoon, Chun-G.;Hwang, Ha-Sun;Ham, Jong-Hwa
    • 한국농공학회지
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    • 제45권7호
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    • pp.94-106
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    • 2003
  • A pilot study was performed to examine the feasibility of UV disinfection system and the reactivation of indicator microorganisms (TC, FC, E. coli) after UV irradiation for agricultural reuse of reclaimed water. Photoreactivation and dark repair enable UV-inactivated microorganisms to recover and may reduce the efficacy of UV inactivation, which might be drawbacks of the UV disinfection method. The effluent of biofilter for 16-unit apartment house was used as input to the UV disinfection system, and average SS and BOD concentration were 3.8 and 5.7 mg/L, respectively, and the mean level of total coliform was in the range of $1.0\times10^4$ MPN/100mL. UV disinfection was found to be effective and it reduced mean concentration of indicator microorganisms (total coliform, fecal coliform, and E. coli) to less than 100 MPN/100mL within 60s exposure using 17, 25, and 40W lamps. Two UV doses of 6 and 16 mW$\cdot$s/$\textrm{km}^2$ were applied and microorganisms reactivation was monitored under the dark, photoreactivating light, and solar irradiation. Microorganisms reactivation was observed in the UV dose of 6 mW$\cdot$s/$\textrm{km}^2$, and numbers increased up to 5% at the photoreactivating light and 1% at the dark. However, microorganisms were inactivated rather than reactivated at the solar radiation and numbers decreased to non-detectible level about below 2 MPN/100mL in 4 hours. In the case of 16 mW$\cdot$s/$\textrm{km}^2$, microorganism reactivation was not observed indicating that UV dose might affect the reactivation process such as photoreactivation and dark repair. Therefore, concerns associated with microorganism reactivation could be controlled by sufficient UV dose application. Agricultural reuse of reclaimed water might be even less concerned due to exposure to the solar irradiation that could further inactivate microorganisms. The pilot study result is encouraging, however, sanitary concern in water reuse is so critical that more comprehensive investigation is recommended.

Effects of Hexaconazole on Growth and Antioxidant Potential of Cucumber Seedlings under UV-B Radiation

  • Kim, Tae-Yun;Hong, Jung-Hee
    • 한국환경과학회지
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    • 제21권12호
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    • pp.1435-1447
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    • 2012
  • The present study was conducted to determine the effect of hexaconazole (HEX), a triazole fungicide, on the growth, yield, photosynthetic response and antioxidant potential in cucumber (Cucumis sativus L.) plants subjected to UV-B stress. UV-B radiation and HEX were applied separately or in combination to cucumber seedlings. The growth parameters were significantly reduced under UV-B treatment, however, this growth inhibition was less in HEX treated plants. HEX caused noticeable changes in plant morphology such as reduced shoot length and leaf area, and increased leaf thickness. HEX was quite persistent in inhibiting shoot growth by causing a reduction in shoot fresh and dry weight. HEX noticeably recovered the UV-B induced inhibition of biomass production. Significant accumutation in anthocyanin and flavonoid pigments in the leaves occurred as a result of HEX or UV-B treatments. HEX permitted the survival of more green leaf tissue preventing chlorophyll content reduction and higher quantum yield for photosystemII under UV-B exposure. HEX treatment induced a transient rise in ABA levels in the leaves, and combined application of HEX and UV-B showed a significant enhancement of ABA content which activates $H_2O_2$ generation. UV-B exposure induced accumulation of $H_2O_2$ in the leaves, while HEX prevented UV-B induced increase in $H_2O_2$, indicating that HEX serves as an antioxidant agent able to scavenge $H_2O$ to protect cells from oxidative damage. An increase in the ascorbic acid was observed in the HEX treated cucumber leaves affecting many enzyme activities by removing $H_2O_2$ during photosynthetic processes. The activities of antioxidant enzymes including catalase(CAT), ascorbate peroxidase(APX), superoxide dismutase(SOD) and peroxidase(POD) in the leaves in the presence of HEX under UV-B stress were higher than those under UV-B stress alone. These findings suggest that HEX may participate in the enhanced tolerance to oxidative stress. From these results it can be concluded that HEX moderately ameliolate the effect of UV-B stress in cucumber by improving the components of antioxidant defense system.

Impact of UV curing process on mechanical properties and dimensional accuracies of digital light processing 3D printed objects

  • Lee, Younghun;Lee, Sungho;Zhao, Xing Guan;Lee, Dongoh;Kim, Taemin;Jung, Hoeryong;Kim, Namsu
    • Smart Structures and Systems
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    • 제22권2호
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    • pp.161-166
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    • 2018
  • In the last decade, there has been an exponential increase of scientific interest in smart additive manufacturing (AM) technology. Among the different AM techniques, one of the most commonly applied processes is digital light processing (DLP). DLP uses a digital projector screen to flash an ultraviolet light which cures photopolymer resins. The resin is cured to form a solid to produce parts with precise high dimensional accuracy. During the curing process, there are several process parameters that need to be optimized. Among these, the exposure time affects the quality of the 3D printed specimen such as mechanical strength and dimensional accuracy. This study examines optimal exposure times and their impact on printed part. It was found that there is optimal exposure time for printed part to have appropriate mechanical strength and accurate dimensions. The gel fraction and TGA test results confirmed that the improvement of mechanical properties with the increasing UV exposure time was due to the increase of crosslinked network formation with UV exposure time in acrylic resins. In addition, gel fraction and thermogravimetric analysis were employed to microscopically investigate how this process parameter impacts mechanical performance.

에폭시 기반 연성 폴리머 콘크리트의 자외선 노출에 의한 기계적 물성평가 (Evaluation of Mechanical Property Variation of Epoxy Based Compliant Polymer Concretes Exposed to UV Light)

  • 노인택;정경채;장승환
    • Composites Research
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    • 제27권6호
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    • pp.236-241
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    • 2014
  • 본 연구에서는 공항 포장용 유지보수 재료로 사용되는 폴리머 콘크리트의 자외선 노출에 대한 기계적 물성 변화를 확인하기 위해 자외선 노출 전/후 시편의 압축강도 및 연성인자의 변화를 평가하였다. 현재 공항 포장용으로 사용되는 폴리머 콘크리트의 비율과 선행연구를 통해 얻은 최적 배합비율을 참고하여 시편을 제작하였다. 자외선 발생 램프의 출력을 고려하여 자연상태에서 노출되는 등가시간을 계산한 후 최대 3년에 해당하는 시간만큼의 등가시간 동안 시편을 노출시켰다. 실험결과, 자외선 노출 자체는 재료물성에 거의 영향을 주지 않았으며, 자외선 노출에 따른 온도상승에 의한 재료물성 변화가 주로 관찰되었다. 자외선에 의해 발생된 열에 노출된 후 모든 시편에서 인성은 감소하고, 압축강도는 증가하는 경향을 나타내었다.

Liquid crystal alignment effects for the photo-aligned VA-LCD on the photo-polymer

  • Hwang, Jeoung-Yeon;Seo, Dae-Shik;Hahn, Eun-Joo;Kim, Jae-Hyung
    • Transactions on Electrical and Electronic Materials
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    • 제1권3호
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    • pp.10-13
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    • 2000
  • In this study the new photo-alignment material copoly(PM4Ch-ChMa)(copoly (poly (4-methancryloyloxy)chalcone-cholesteryl methacry late)) was synthesized, Also, the liquid crystal (LC) aligning capabilities and the electro-optical(EO) characteristics for the photo-aligned vertical-aligned(VA)-LC display(LCD) were studied. The monodomain alignment of the NLC for the photo-aligned VA-LCD by linearly polarized UB exposure on the Photo-dimerized copoly(PM4Ch-ChMA) surface was observed,. Excellent Voltage-transmittance characteristics for the VA-LCD photo-aligned by polarized UV exposure on the copoly (PM4Ch-ChMA) surfaces for 1 min was achieved. The response time of the VA-LCD photo-aligned by polarized UV exposure on the copoly (PM4Ch-ChMA) surfaces for 1 min was 39.3 ms, We suggest that the photo-dimerized chacone group increased with increasing UV exposure time, which then contributes to a low response time of the photo-aligned VA-LCD on the copoly (PM4Ch-ChMA) surfaces.

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호장근 추출액에 의한 염색성(Ⅱ) - 호장근 추출액의 자외 · 가시부 분광 특성 - (The Dyeing Properties of Korean Knotweed Extract(Ⅱ) - The UV-visible Spectrophotometric Characteristics of Korean Knotweed Extracts -)

  • 김미숙;최석철
    • 한국염색가공학회지
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    • 제13권5호
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    • pp.10-10
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    • 2001
  • The Purpose of this study was to investigate spectrophotometric characteristics of Korean knotweed extracts. The properties were evaluated by it′s extracting solvent, effect of metallic ion, variations of pH values and effect of light exposure. The results were as following; The highest absorbance was found in methanol extract of Korean knotweed, while the lowest absorbance was carbon tetrachloride extract. The UV-vis. spectra of Korean knotweed colors in several solvents showed hypsochromic shift of n-π/sup */ transition with the polarity of solvent. Absorbance and peak of UV-vis. spectra of Korean knotweed colors became lower and broader by addition of metallic ion. The light stability in irradiation with xenon ]amp of the color solution with Cu were higher than those of Al and Fe. The UV-vis. spectra of Korean knotweed extracts in various pH values showed bathochromic shift under alkaline condition, and their peaks disappeared after 5 hours exposure.

호장근 추출액에 의한 염색성(II) -호장근 추출액의 자외 . 가시부 분광 특성 - (The Dyeing Properties of Korean Knotweed Extract( II ) - The UV-visible Spectrophotometric Characteristics of Korean Knotweed Extracts -)

  • 김미숙;최석철
    • 한국염색가공학회지
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    • 제13권5호
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    • pp.298-305
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    • 2001
  • The Purpose of this study was to investigate spectrophotometric characteristics of Korean knotweed extracts. The properties were evaluated by it's extracting solvent, effect of metallic ion, variations of pH values and effect of light exposure. The results were as following; The highest absorbance was found in methanol extract of Korean knotweed, while the lowest absorbance was carbon tetrachloride extract. The UV-vis. spectra of Korean knotweed colors in several solvents showed hypsochromic shift of $n->\pi^*$ transition with the polarity of solvent. Absorbance and peak of UV-vis. spectra of Korean knotweed colors became lower and broader by addition of metallic ion. The light stability in irradiation with xenon ]amp of the color solution with Cu were higher than those of Al and Fe. The UV-vis. spectra of Korean knotweed extracts in various pH values showed bathochromic shift under alkaline condition, and their Peaks disappeared after 5 hours exposure.

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Photosensitive Polymers: Effects of Photoreactive Group and UV-Exposure on Alignment of Liquid-Crystals on the Film Surface

  • Ree, Moon-Hor;Kim, Sang-Il;Lee, Seung-Woo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.41-42
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    • 2000
  • Photosensitive polyimides containing cinnamoyl and coumarin side groups were synthesized in a high molecular weight, giving a good quality of films. Nematic liquid-crystal (LC) molecules on the film were aligned along the direction with an angle of $97-99^{\circ}$ respect to the polarization of ultraviolet (UV) light. The LC alignment was induced mainly by the photoaligned polymer chains made by the first UV-exposure even though the film was treated by multiple exposures with changing the polarization of UV light. From these results, it is concluded that the LC alignment on the film is induced by the photodimerization rather than the trans-cis photoisomerization.

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