• Journal of the Korean Wood Science and Technology
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• 제24권4호
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• pp.47-55
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• 1996

UV transmission spectra of water-soluble acrylic resin films containing hydroxybenzophenolic, hydroxyphenylbenzotriazolic UV absorber and HALS(hindered amine light stabilizer) were investigated by exposure time(before exposure weathered for 160 and 320hours) in QUV Weather-Ometer. Also the YID(yellowness index difference), LID(lightness index difference) and CD(color difference) of dried water-soluble acrylic resin films and the coated woods of Larix leptolepis were analyzed by addition level of UV absorber(0, 1, 2 and 3%) and HALS(0, 0.5, 1 and 1.5%) and by exposure time in QUV Weather-Ometer. They showed no significant effects on UV transmission spectra of dried water-soluble acrylic resin films in the range of 300 to 400nm irrespective of exposure time. However, UV transmission decreased as increase of exposure time. UV transmission spectra were lower in dried water-soluble acrylic resin films containing hydroxybenzophenolic UV absorber and HALS than in these containing hydroxyphenylbenzotriazolic UV absorber and HALS in the range of 350 to 400nm. The least YID, LID and CD in the coated woods of Larix leptolepis appeared at the addition level of 3%, based on non-volatile content, in hydroxybenzophenolic and hydroxyphenylbenzotriazolic UV absorber, and of 1.5% in HALS to water-soluble acrylic resin.

• 대한가정학회지
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• 제46권10호
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• pp.1-9
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• 2008

The purpose of this study was to increase uv-cut ability of cotton, ramie, and rayon fabrics dyed with safflower red colorants. For this purpose, samples treated with uv-cut agent and tannic acid were compared with the untreated samples after ultraviolet(uv)-light exposure in terms of K/S value, color changes(${\Delta}E$), SEM, and tensile strength retention. K/S value rapidly decreased with increasing exposure time, but K/S value of the samples treated with both uv-cut agent and tannic acid decreased less than that of untreated samples. As increasing exposure time, $L^*$ and $b^*$ increased, $a^*$ decreased, and so ${\Delta}E$ increased, indicating less red character and more yellow character in color. This leads to change hue, value and chroma value. But color change of samples treated with both uv-cut agent and tannic acid was less than that of untreated samples. SEM pictures showed a severe degradation by uv exposure in all samples. Tensile strength slowly decreased for 21 days. And after this point, the decreased proceeded more rapidly. Tensile strength retention of the samples treated with uv-cut agent and tannic acid was higher than that of untreated samples.

• 한국전기전자재료학회논문지
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• 제13권11호
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• pp.950-953
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• 2000

Aligning capabilities of nematic liquid crystal(NLC) using an in-situ photo-alignment method with obliquely polarized UV exposure on a polyimide (PI) surface for homeotropic alignment were studied. The high angle for NLC can be measured by obliquely UV exposure of 30°on the PI surface for 10∼20 min. The pretilt angle of NLC generated using the in-situ photo-alignment was higher than that of a conventional photo-alignment method. Finally, we suggest that the control of pretilt angle in NLC with obliquely polarized UV exposure during imidization of the polymer for homeotropic alignment is promising method to generate high pretilt angle.

• Membrane and Water Treatment
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• 제8권3호
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• pp.211-223
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• 2017

In this work, an attempt was made to compare the effects of UV irradiation on the intrinsic and separation properties of membranes made of two different polymeric materials, i.e., polyvinylidene fluoride (PVDF) and polyetherimide (PEI). The changes on membrane structural morphologies and chemical characteristics upon UV-A exposure (up to 60 h) were studied by FESEM and FTIR, respectively. It was found that cracks and fractures were detected on the PVDF-based membrane surface when the membrane was exposed directly to UV light for up to 60 h. Furthermore, the mechanical strength and thermal stability of irradiated PVDF-based membrane was reported to decrease with increasing UV exposure time. The PEI membrane surface meanwhile remained almost intact throughout the entire UV irradiation process. Filtration experiments showed that the permeate flux of UV-irradiated PVDF membrane was significantly increased from approximately 11 to $16L/m^2.h$ with increasing UV exposure time from zero to 60 h. Oil rejection meanwhile was decreased from 98 to 85%. For the PEI-based membrane, oil rejection of >97% was recorded and its overall structural integrity was marginally affected throughout the entire UV irradiation process. The findings of this work showed that the PEI-based membrane should be considered as the host for photocatalyts incorporation if the membrane was to be used for UV-assisted wastewater treatment process.

• 응용화학
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• 제15권1호
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• pp.17-20
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• 2011

A disposable light exposure detector kit has been developed by UV curing of a hydrogel material. The devised light exposure detector kit consisted of light sensitive structures, bottom plate, character sheet and sticky back plate. A light exposure detector kit has a serial light sensitive structures that contain various light sensitive dyes such as rhodamine and fluorescein. The light sensitive structure composed of UV curable hydrogel polymer material as a supporing material and photosensitive dye in a certain concentration. The fabrication procedure of the ligh exposure detector kit is very simple and fast due to UV curing procedure of a photopolymerizable hydrogel material such as poly(ethylene glycol) methyl ether acrylate (PEGMEA) and poly(ethylene glycol) diacrylate (PEGDA) with a photosensitive dye. By the proposed fabrication method, various size and shape of a light exposure detector kit could be fabricated using a flexible elastomer mold. Due to a fast and inexpensive fabrication method, the light exposure detector kit could be use a single use for various industrial applications. According to light irradation, the light sensitive structure on a light exposure detector kit could be lose its color by decomposition of a photosensitive dye chemical in the structure. Thus the amount of the exposed light on a substrate could easily be recognised by changing color or transparency of the structure.

• KIEE International Transactions on Electrophysics and Applications
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• 제11C권4호
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• pp.133-137
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• 2001

In this research, we synthesized various photo-crosslinkable polyimide based polymers. The control of pretilt angles for a nematic liquid crystal (NLC) using the photodimerization method on the photopolymers was studied. A good thermal stability of the photopolymers was measured by thermogravimetric analysis (TGA) measurement until 450C. High pretilt angles of the NLC were otained by polarized UV exposure on the photopolymers containing biphenyl (BP), decyl (de), and cholesteryl (chal) groups, respectively. However, low pretilt angles of the NLC were measured by polarized UV exposure on the photopolymers containing fluorine and chalcone groups. The high NLC pretilt angles generated are attributable to the biphenyl and alkyl moieties, and the photodimerized chalocone group of the photopolymers. Additionally, good voltage-transmittance and response time characteristics were observed by UV exposure on the photopolymers.

• 한국산학기술학회논문지
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• 제13권9호
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• pp.3822-3826
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• 2012

소형 UV 챔버 내부온도 및 챔버 내 체류시간이 Urethane Acrylate 의 경화속도에 미치는 영향을 조사하였다. UV 램프에 가해지는 Power를 60, 80, 100% 로 조절하여 UV 조사량 (UV dose)를 변경하였고 필름이 지나가는 챔버 내부의 가이드롤 (또는 패턴롤)에 냉각수를 투입하여 롤 자체의 온도에 변화를 주었다. 또한 코팅속도를 조절하여 챔버 내부에서의 체류 시간을 변경시켰는데 이들 조건들이 Urethane Acrylate 의 경화에 어떠한 영향을 미치는지를 알아보기 위하여 경화된 필름의 gel 분율을 측정, 비교하였다. 본 연구를 통해 Power가 증가 할수록 경화기 내부의 온도는 상승 하였으며 냉각수 투입에 따라 경화기 내부의 온도는 감소하였는데 이러한 경화기 내부의 온도변화는 UV 경화에 큰 영향을 미치지 않음을 알 수 있었다. 반면에 코팅속도가 증가할수록 경화필름의 gel 분율은 감소하였는데 이는 충분한 경화를 위해서는 경화기내부에서의 체류시간이 일정 이상이 되어야 함을 의미하였다. 한편, 체류시간에 따른 UV dose 측정 및 UV 램프주변의 열유동 해석을 통하여 램프주변의 온도분포 해석을 시도하였는데 이러한 결과들을 바탕으로 UV 경화기 구조 및 운전 조건이 UV 경화된 제품의 특성에 어떠한 영향을 미치는지 알 수 있었다.

• 생태와환경
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• 제56권4호
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• pp.430-439
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• 2023

UV와 O₃는 정수처리 공정에 이용되는 물질로 유기물, 오염물질 및 미생물을 제거하는 것으로 많은 연구가 보고되어 있다. 본 연구에서는 저서성 대형무척추동물 중 오염지표 생물이며 실내 사육 중인 깔따구(C. flaviplumus, C. riparius)를 이용하여 UV와 O₃ 노출에 따른 생존율, 체 Fig. 5. Heatmap of relative mRNA expression of HSP70 in C. riparius and C. flaviplumus exposed to UV and O₃. 색 변화 및 열충격 단백질(Heat Shock Protein 70) 발현 변화를 관찰하였다. UV에 노출된 C. flaviplumus의 생존율은 24시간 후 70% 감소하였으며, C. riparius는 50%로 감소하였다. O₃에 노출된 C. flaviplumus는 생존율의 변화가 없었으며 C. riparius는 노출 10분 후 95%로 감소하였으나, 이후 노출 시간 동안 변화가 없었다. 또한, 체색 변화에서 두 종에 대한 UV와 O₃ 노출은 시간 의존적으로 붉은색의 체색이 옅어지는 현상을 관찰하였다. HSP70 유전자 발현에서 C. riparius는 UV 노출 후 대조군에 비해 발현이 증가하였으며, 노출 12시간 후에서 유의한 차이를 보였다(P<0.05). O₃에 노출된 C. flaviplumus는 대조군에 비해 상대적으로 낮은 발현이 관찰되었으며, 노출 10분과 1시간 후에서 유의한 차이를 보였다 (P<0.05). 이와 같은 결과는 UV와 O₃ 노출에 따른 깔따구에 대한 생태독성학적 영향을 보고하였다. 따라서 본 연구 결과는 정수장에서 이용되는 소독물질인 UV와 O₃가 정수장 내로 유입되는 깔따구에 주는 영향을 파악할 수 있는 기초자료로서 활용될 수 있을 것이다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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• pp.62-65
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• 2005

We studied the nematic liquid crystal (NLC) alignment capability by the Ultraviolet (UV) alignment method on a-C:H thin-films, and investigated electro-optical performances of the UV aligned twisted nematic (TN)-liquid crystal display (LCD) with the UV exposure on a-C:H thin film surface. A good LC alignment by UV irradiation on a-C:H thin-film surfaces was achieved. Monodomain alignment of the UV aligned TN-LCD can be observed. The good electro-optical (EO) characteristics of the UV aligned TN-LCD was observed with oblique UV exposure on the a-C:H thin film surface for 1min.

• Bulletin of the Korean Chemical Society
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• 제22권11호
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• pp.1207-1212
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• 2001

A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) spectroscopies. The result of spectroscopic analysis substantiated that the two chalcone-based compounds have functions of both photocrosslinking and photopolymerization by UV exposure in the presence of photoinitiator. Two kinds of photochemical reactions proceeded competitively during UV exposure. Particularly, we studied the effect of photopolymerization on the rate of photocrosslink due to cycloaddition in the two oligomeric compounds.