Five Mirror System with Minimal Central Obscuration and All Zero 3rd Order Aberrations Suitable for DUV Optical Lithography (모든 3차 수차를 영으로 하고 Central Obscuration이 최소화된 극자외선 리소그라피용 5-반사광학계)
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- Korean Journal of Optics and Photonics
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- v.5 no.1
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- pp.1-8
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- 1994