• Title/Summary/Keyword: Tungsten filament

Search Result 33, Processing Time 0.03 seconds

Mechanical Properties of CVD Diamond

  • Yoshikawa, Masanori;Hirata, Atsushi
    • The Korean Journal of Ceramics
    • /
    • v.2 no.4
    • /
    • pp.212-215
    • /
    • 1996
  • This paper focuses the strength and wear resistance of CVD diamond films. The strength of free-standing CVD diamond films synthesized by microwave plasm CVD, DC plasma CVD, RF plasma CVD and arc discharge plasma jet CVD has been measured by three-point bending test. The wear resistance of CVD diamod films has been evaluated by the pin-on-disk type testing. diamond films coated on the base of sintered tungsten carbide pin by hot filament CVD have been rubbed with a sintered diamond disk in muddy water. Volume removed wear of CVD diamond has been compared with stellite, WC alloy and bearing steel.

  • PDF

Fabrication via Ultrasonication and Study of Silicon Nanoparticles

  • Kim, Jin Soo;Sohn, Honglae
    • Journal of Integrative Natural Science
    • /
    • v.8 no.3
    • /
    • pp.147-152
    • /
    • 2015
  • Photoluminescent porous silicon (PSi) were prepared by an electrochemical etch of n-type silicon under the illumination with a 300 W tungsten filament bulb for the duration of etch. The red photoluminescence emitting at 620 nm with an excitation wavelength of 450 nm is due to the quantum confinement of silicon nanocrystal in porous silicon. As-prepared PSi was sonicated, fractured, and centrifuged in toluene to obtain photoluminescence silicon quantum dots. BET and BHJ methods were employed to study the specific surface area of as-prepared PSi. Optical characterization of red photoluminescent silicon nanocrystal was investigated by UV-vis and fluorescence spectrometer. Also SEM and TEM images of porous silicon and nanoparticles were investigated.

Modulation Transfer Function Measurement of a Linear Charge Coupled Device Imager by Using a Knife-Edge Scanner (칼날주사방법에 의한 일차원 CCD의 MTF 측정)

  • 조현모;이윤우;이인원;이상태;이종웅
    • Korean Journal of Optics and Photonics
    • /
    • v.6 no.3
    • /
    • pp.173-177
    • /
    • 1995
  • The scanning type modulation transfer function (MTF) measurement system of linear charge coupled device (CCD) imagers is fabricated and the MTF of a linear CCD imager is tested. Measured MTF values are very sensitive to small angle knife-edge skew within 1 degree and show different results in several wavelengths. The MTF of the linear CCD imager is measured in different color temperatures of a tungsten filament lamp and the MTF uniformity of ti,t eel) pixels is tested.tested.

  • PDF

Hydrosilylation of Photoluminescent Porous Silicon with Aromatic Molecules; Stabilization of Photoluminescence and Anti-photobleaching Properties of Surface-Passivated Luminescent Porous Silicon

  • Sohn, Honglae
    • Journal of Integrative Natural Science
    • /
    • v.14 no.4
    • /
    • pp.147-154
    • /
    • 2021
  • A luminescent porous silicon sensor, whose surface was passivated with organic molecule via hydrosilylation under various conditions, has been researched to measure the photoluminescence (PL) stability of porous silicon (PSi). Photoluminescent PSi were synthesized by an electrochemical etching of n-type silicon wafer under the illumination with a 300 W tungsten filament bulb during the etching process. The PL of PSi displayed at 650 nm, which is due to the quantum confinement of silicon quantum dots in the PSi. To stabilized the photoluminescence of PSi, the hydrosilylation of PSi with silole molecule containg vinyl group was performed. Surface morphologies of fresh PSi and surface-modified PSi were obtained with a cold FE-SEM. Optical characterization of red photoluminescent silicon quantum dots was investigated by UV-vis and fluorescence spectrometer.

Predicting of Ignition Time and Critical Distance for Ignition of Douglas fir by Radiant Heat of Incandescent Lamp (백열전구 복사열에 의한 미송판의 발화 임계거리 및 발화시간 예측)

  • Lee, Heung-Su;Kim, Doo-Hyun
    • Journal of the Korean Society of Safety
    • /
    • v.31 no.2
    • /
    • pp.18-25
    • /
    • 2016
  • The incandescent lamp is an electric light fixture with a tungsten filament heated to a high temperature, by passing an electric current through it, until it glows with visible light. The hot filament is protected from oxidation with a glass bulb that is filled with inert gas. The incandescent lamp has fire risk when combustible materials are close to its glass bulb. Because its lamp has the property which converts 90~95 percents of the electric power to heat energy. 2015 national fire statistics show that fires caused by lighting fixtures were 652 cases, and incandescent lamps(44 cases) and halogen lamps(53 cases) accounted for 15 percents in those of high heating light fixtures. Since incandescent lamp fires account for about 45 percents in the high heating light fixture, we could not overlook the fire risks by the incandescent lamp. Although many studies related with those have been conducted, incandescent lamp fires are continuously occurred. This study was carried out to study the fire risk of ignition of wood due to radiant heat of incandescent lamp. Radiant heat flux of the incandescent lamp was predicted by applying point source model, and critical distance for ignition of wood was calculated by applying integral model. The results from this study could applied to fire prevention activities related to light bulb, and it could be used in fire cause investigations related to radiant heat of incandescent lamp.

Vapor Phase Deposition and Characterization of Diamond Thin Films on Refractory Metals (내열금속 기판위에 다이아몬드 박막의 증착과 특성분석)

  • 홍성현;형준호
    • Korean Journal of Crystallography
    • /
    • v.5 no.1
    • /
    • pp.39-50
    • /
    • 1994
  • Diamond thin films were deposited on silicon, molybdebum, titanum and tugsten substrates, and were chlwntnizen using scanning electron microscopy, X-ray diffraction analysis and Raman spectroscopy. From the result of experiment in various deposition periods, it was found that found that were nucleated and grown on interlayed carbide layers, which were formed on refractory metal substrates at the initial stage of.

  • PDF

The Effect of Contamination of Ion Source on Ionic Current of Quadrupole Mass Spectrometer (사중극 질량 분석기의 이온소스 오염이 이온전류에 미치는 영향)

  • Lee, K.C.;Park, C.J.;Kim, J.T.;Oh, E.S.;Hong, K.S.;Hong, S.S.;Lim, I.T.;Yun, J.Y.;Kang, S.W.;Shin, Y.H.
    • Journal of the Korean Vacuum Society
    • /
    • v.18 no.3
    • /
    • pp.197-202
    • /
    • 2009
  • The long term stability of ion current of QMS has been one of key parameters for monitoring gas process in vacuum. The time dependence of ionic current was monitored while the pressure of nitrogen gas was kept at a fixed pressure by introducing the gas into vacuum chamber. The chamber was evacuated to ${\sim}3{\times}10^{-9}\;Torr$ to reduce background signals before the measurement. Two ion sources were tested; one had brownish or black color due to gas contamination and the other one was new, i.e. cleaner. At a nitrogen pressure of $1{\times}10^{-5}\;Torr$, the ionic currents measured by the contaminated ion source decreased faster with time. The decrease rate was respectively ${\sim}46%$ for cleaner one and ${\sim}84%$ for contaminated one after ${\sim}5.5%$ hours. In order to test the effect of filament material on the ion current decrease, we fabricated a tungsten(W) filament which consisted of two parts; one half was made of W and the other was coated with yttria. The similar decrease of ionic currents were shown for the two types of filaments, indicating that slight change of temperature of filament due to material difference i.e. baking effect could not improve the origin of ionic current decrease. Overall the decreasing rate of ionic current is more closely associated with contaminated ion source of QMS rather than its filament materials.

Study on Real-Time Digital Filter Design as Function of Scanning Frequency of Focused Electron Beam (집속 전자 빔 장치에서 스캔 주파수에 따른 실시간 디지털 필터 설계에 관한 연구)

  • Kim, Seung-Jae;Oh, Se-Kyu;Yang, Kyung-Sun;Jung, Kwang-Oh;Kim, Dong-Hwan
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.35 no.5
    • /
    • pp.479-485
    • /
    • 2011
  • To acquire images in a thermionic-scanning electron-beam system, a scanning unit is needed to control the electron beam emitted from the tungsten filament source. In scanning the electron beam on the solid surface, the signalto-noise ratio depends on the scanning frequency. We used a digital filter to reduce noise by analyzing the real-time frequency of a secondary electron signal. The noise and the true image signal were well separated. We designed the digital filter via a DSP floating-point operation, and the noise elimination resulted in enhanced image quality in a highresolution mode.

Measurement Bias of Heat Flux Gauge based on Calibration Constant supported by Manufacturer (제조사 보정상수에 기인한 열유속계의 측정 오차)

  • Kim, Sung-Chan;Hamins, Anthony
    • Fire Science and Engineering
    • /
    • v.32 no.4
    • /
    • pp.1-6
    • /
    • 2018
  • As a preliminary study to quantify the measurement uncertainty of the Schmidt-Boelter type heat flux gauge, the present study has been conducted to evaluate the measurement error due to the calibration constant supported by manufacturer. Calibrations of heat flux gauges are performed at NIST Fire Research Division using a calibration facility with heat source of a 2000 W halogen-tungsten filament lamp and the calibration constant is obtained by comparing the response of the reference and a standard heat flux gauge at the same irradiance conditions. Calibration for heat flux gauges made by three different manufacturers is compared with their factory calibration constant. Relative error due to fluctuation of output signal from heat flux gauges does not exceed 1% of the mean value and the relative error between calibration of this study and factory calibration constant ranged from 1.5% to 14.3%. The present study shows that a continuous and periodic calibration is necessary for accurate heat flux measurement.

A Large Area Plasma Source Using Multi-cathode Electron Beam (다중 음극 전자빔을 이용한 대면적 플라즈마 소스)

  • Gang, Yang-Beom;Jeon, Hyeong-Tak;Kim, Tae-Yeong;Jeong, Gi-Hyeong;Go, Dong-Gyun;Jeong, Jae-Guk;No, Seung-Jeong
    • Korean Journal of Materials Research
    • /
    • v.9 no.9
    • /
    • pp.861-864
    • /
    • 1999
  • A new plasma source using the multi-cathode electron beam has been designed and manufactured. A multi-cathode was adopted to produce bulk plasmas in a large volume. Multi-cathode electron beam plasma source(MCEBPS) was found to generate stable plasmas over the wafer diameter of 300 mm or above. W(tungsten) filament was used as a cathode. Over a 320 mm diameter, both the plasma potential $V_p$ and floating potential $V_f$ were uniformly maintained and the difference between $V_p and V_f$ was measured to be small. The plasma density was around $10^{10} cm^{-3}$ and its variation along the radial distance was small.

  • PDF