• 제목/요약/키워드: Transparent OLED

검색결과 121건 처리시간 0.027초

Study of Plasma Process Induced Damages on Metal Oxides as Buffer Layer for Inverted Top Emission Organic Light Emitting Diodes

  • Kim, Joo-Hyung;Lee, You-Jong;Jang, Jin-Nyoung;Song, Byoung-Chul;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.543-544
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    • 2008
  • In the fabrication of inverted top emission organic light emitting diodes (ITOLEDs), the organic layers are damaged by high-energy plasma sputtering process for transparent top anode. In this study, the plasma process induced damages on metal oxide hole injection layers (HILs) including $WO_3$, $MoO_3$, and $V_2O_5$ as buffer layer are examined. With the result of IV characteristic of hole-only devices, we propose that $MoO_3$ and $V_2O_5$ are stable materials against plasma sputtering process.

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High Performance Tandem OLEDs for Large Area Full Color AM Displays and Lighting Applications

  • Hatwar, T.K.;Spindler, J.P.;Slyke, S.A. Van
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1577-1582
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    • 2006
  • Tandem OLED structures formed by connecting two or more low-voltage electroluminescent units (stacks) are effective for achieving high efficiency at low current density as well as long operational lifetime. We have fabricated white emitting tandem structures with two or three low-voltage white-emitting stacks using transparent organic "PN"-type connectors. Three- stack white tandem structures with efficiency greater than 24 cd/A at D65 and operational stability of about 110,000 h. (extrapolated) at $1000\;cd/m^2$ have been demonstrated. With a stacked structure, the power consumption for displays using an RGBW format can be reduced by 25% compared to previously described formulations. We have also fabricated advanced white tandem structures where the color gamut (NTSC x,y ratio) has been improved to greater than 70% using standard color filters. The white OLEDs can also be used to increase the colorrendering index CRI (>80%), an important consideration for solid-state lighting.

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투명전자소자의 기술 동향 (Technical Trends of Transparent Electronic Devices)

  • 황치선;추혜용;전황수;조경익
    • 전자통신동향분석
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    • 제22권5호
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    • pp.46-56
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    • 2007
  • 투명전자소자는 투명한 특성을 이용하여 기존의 전자기기가 가지고 있는 공간적/시각적 제약을 해소하려는 목적을 가진 소자이며 투명트랜지스터를 기반으로 한다. 투명 트랜지스터는 투명반도체(주로 산화물), 투명절연체, 투명전도체로 구성되어 있다. 투명 트랜지스터와 투명 OLED를 결합한 투명디스플레이에 정보 인식/정보 처리 기능이 추가로 구현되어 있는 공간 임베디드 정보 단말기를 스마트 창이라고 부른다. 투명전자소자는 초기에는 투명하지 않은 형태의 산화물 트랜지스터를 이용한 디스플레이 분야에 주로 이용될 가능성이 높고 2010년 이후에 투명 IC, 스마트 창 형태의 신규 시장이 창출될 것으로 예측된다. 또한, 투명전자소자 분야는 세계적으로 개발 초기단계이기 때문에 원천 특허 확보 등에 주력할 필요가 있다.

Structure and Properties of Indium Tin Oxide Thin Films Sputtered from Different Target Densities

  • Kim Kyoo Ho;Jung Young Hee;Munir Badrul;Wibowo Rachmat Adhi
    • 한국표면공학회지
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    • 제38권5호
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    • pp.179-182
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    • 2005
  • Indium Tin Oxide (ITO) thin films were deposited from various target densities ($98.7\%\~99.6\%$) using RF magnetron sputtering. Effect of the sputtering target densities on the structural, electrical and optical properties of deposited ITO thin films was investigated. The preferable (400) crystalline orientation peak was observed on the films deposited from > $99.0\%$ target density. Higher target density produced films with higher roughness but lower resistivity. All of the deposited films showed optical transmittance more than $85\%$ in the visible wavelength region. It is necessary to use the highest target density for sputtering deposition of ITO thin films.

Hybrid Transparent Electrode with Metal Grid for Organic Electronics

  • 안원민;정성훈;김도근
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2014년도 추계학술대회 논문집
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    • pp.219-220
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    • 2014
  • Organic Light Emitting Diodes (OLED) 나 Organic Photovoltaics (OPV)와 같은 유기소자에 투명전극으로 쓰이고 있는 Indium Tin Oxide (ITO)는 유연한 소자에 적용하기에는 유연성이 떨어진다는 문제가 있다. 이를 해결하기 위해서 CNT, Graphene, AgNW, 전도성 고분자 등의 투명전극에 관한 연구가 활발히 진행되고 있으나, 여전히 전기적 특성이 좋지 못하다는 문제가 있다. 이러한 문제를 해결하기 위해서 본 연구에서는 금속배선을 보조전극으로 형성하여 배선을 폴리머 기판에 함몰시킴으로써 유연성과 표면 평탄도, 전기적 특성이 우수한 배선함몰 투명전극을 형성하였다. 그 결과, $1{\Omega}/{\Box}$의 면저항과 90%의 투과도를 가지는 투명전극을 구현하였다. 이렇게 제작된 배선함몰 전극위에 유기태양전지와 유기발광 다이오드를 제작하여 상용화된 ITO 유리기판과 유사한 효율을 얻을 수 있었다.

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디스플레이용 ITO 투명전도막의 저온 제작 (Preparation of ITO Transparent Conductive thin film for Display at Room Temperature)

  • 김경환;김현웅
    • 반도체디스플레이기술학회지
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    • 제4권4호
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    • pp.5-8
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    • 2005
  • In this study, we prepared the ITO thin film for TOLED(Top-emitting OLED) or flexible display at room temperature using the FTS(Facing Targets Sputtering Apparatus). We observed characteristics of deposited thin films as a function of sputtering conditions. XRD patterns were independence trom oxygen gas flow and input current. But electrical and optical properties were strongly dependence. In the results, we could prepare good properties of ITO thin films resistivity of $4.27X10^{-4}[\Omega-cm]$, transmittance of over 80% at working gas pressure 1[mTorr], input current 0.6[A], oxygen gas ratio 0.3[sccm], at room temperature.

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Tandem white organic light emitting diodes comprising of red, green, blue emission

  • Yang, Jung-Jin;Suman, C.K.;Lee, Chang-Hee
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.820-822
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    • 2009
  • Tandem white organic light emitting diodes (WOLEDs) are fabricated by using a transparent interconnecting layer of Al:LiF composite/molybdenum oxides ($MoO_3$). We demonstrate two types of tandem WOLEDs consisting of two color emissions (red and blue emission) and three color emissions (red, green and blue emission). Tandem WOLED consisting of three color emission shows higher external quantum efficiency and current efficiency.

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Plasma Treatment Effects on Tungsten Oxide Hole Injection Layer for Application to Inverted Top-Emitting Organic Light-Emitting Diodes

  • Kim, Joo-Hyung;Lee, You-Jong;Jang, Yun-Sung;Kim, Doo-Hyun;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.354-355
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    • 2009
  • In the fabrication of inverted top-emitting organic light emitting diodes (ITOLEDs), the sputtering process is needed for deposition of transparent conducting oxide (TCO) as top anode. Energetic particle bombardment, however, changes the physical properties of underlying layers. In this study, we examined plasma process effects on tungsten oxide ($WO_3$) hole injection layer (HIL). From our results, we suggest the theoretical mechanism to explain the correlation between the physical property changes caused by plasma process on $WO_3$ HIL and degradation of device performances.

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Self-Alignment Ink-Jet Printed Light Emitting Devices and Light Emitting Seals

  • Okada, Hiroyuki;Matsui, Kenta;Naka, Shigeki;Shibata, Miki;Ohmori, Masahiko;Kurachi, Naomi;Sawamura, Momoe;Suzuki, Shin-Ichi;Inoue, Toyokazu;Miyabayashi, Takeshi;Murase, Makoto;Takao, Yuuzou;Hibino, Shingo;Bessho, Hisami
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.449-452
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    • 2009
  • Ink-jet printed (IJP) self-aligned (SA) organic light emitting diodes (OLEDs) and its application to light emitting seal have investigated. Ink-jet printing of light emitting material is carried out onto transparent anode covered with insulating material. Laminated light emitting seal with SA IJP OLED without photo - lithographic process and any vacuum process, noncontact type electromagnetic power supply without electric power supply line, and light emitting tag with network type RF communication terminal by controlling display information were demonstrated.

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RF 플라즈마를 이용한 유기 EL 소자의 전극형성에 관한 연구 (A Study on the Electrode formation of an Organic EL Devices using the RF Plasma)

  • 이은학
    • 한국전기전자재료학회논문지
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    • 제17권2호
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    • pp.228-235
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    • 2004
  • In this thesis, it is designed efficient electrode formation on the organic luminescent device. ITO electrode is treated with $O_2$plasma. In order to inject hole efficiently, there is proposed the shape of anode that inserted plasma polymerized films as buffer layer between anode and organic layer using thiophene monomer. It is realized efficiently electron injection to aluminum due to introduce the quantum well in cathode. In the case of device inserted the buffer layer by using the plasma poiymerization after $O_2$plasma processing for ITO transparent electrode, since it forms the stable interface and reduce the moving speed of hole, the recombination of hole and electronic ate made in the omitting layer. Compared with the devices without buffer layer, the turn-on voltage was lowered by 1.0(V) doc to the introduction of buffer layer Since the quantum well structure is formed in front of cathode to optimize the tunneling effect, there is improved the power efficiency more than two times.