• 제목/요약/키워드: Tin Oxide Layer

검색결과 382건 처리시간 0.025초

RF 마그네트론 스퍼터링에서 증착거리와 증착온도가 무기 액정 배향막의 물리적 성질에 미치는 영향에 대한 연구 (Influences of Target-to-Substrate Distance and Deposition Temperature on a-SiOx/Indium Doped Tin Oxide Substrate as a Liquid Crystal Alignment Layer)

  • 박정훈;손필국;김기범;박혁규
    • 한국재료학회지
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    • 제18권10호
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    • pp.521-528
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    • 2008
  • We present the structural, optical, and electrical properties of amorphous silicon suboxide (a-$SiO_x$) films grown on indium tin oxide glass substrates with a radio frequency magnetron technique from a polycrystalline silicon oxide target using ambient Ar. For different substrate-target distances (d = 8 cm and 10 cm), the deposition temperature effects were systematically studied. For d = 8cm, oxygen content in a-$SiO_x$ decreased with dissociation of oxygen onto the silicon oxide matrix; temperature increased due to enlargement of kinetic energy. For d = 10 cm, however, the oxygen content had a minimum between $150^{\circ}\;and\;200^{\circ}$. Using simple optical measurements, we can predict a preferred orientation of liquid crystal molecules on a-$SiO_x$ thin film. At higher oxygen content (x > 1.6), liquid crystal molecules on an inorganic liquid crystal alignment layer of a-$SiO_x$ showed homogeneous alignment; however, in the lower case (x < 1.6), liquid crystals showed homeotropic alignment.

Effects of indium tin oxide top electrode formation conditions on the characteristics of the top emission inverted organic light emitting diodes

  • Kho, Sam-Il;Cho, Dae-Yong;Jung, Dong-Geun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.714-716
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    • 2002
  • Indium tin oxide (ITO) was used as the top anode of top emission inverted organic light emitting diodes (TEIOLEDs). TEIOLEDs were fabricated by deposition of an aluminum bottom cathode, an N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1, 1'-diphenyl-4, 4 1'-diamine (TPD) hole transport layer, a tris-8-hydroxyquinoline aluminum ($Alq_3$) emission layer, and an ITO top anode sequentially. ITO was deposited by r.f. magnetron sputtering without $O_2$ flow during the deposition. After the deposition, the deposited ITO layer was kept under oxygen atmosphere for the oxidation. The characteristics of the TEOILED were affected significantly by the post-deposition oxidation condition.

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Properties of Indium Tin Oxide Multilayer Fabricated by Glancing Angle Deposition Method

  • Oh, Gyujin;Lee, Kyoung Su;Kim, Eun Kyu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.367-367
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    • 2013
  • Commercial applications of indium tin oxide (ITO) can be separated into two useful areas. As it is perceived to bear electrical properties and optical transparency at once, its chance to apply to promising fields, usually for an optical device, gets greater in the passing time. ITO is one of the transparent conducting oxides (TCO), and required to carry the relative resistance less than $10^{-3}{\Omega}$/cm and transmittances over 80 % in the visible wavelength of light. Because ITO has considerable refractive index, there exist applications for anti-reflection coatings. Anti-reflection properties require gradual change in refractive index from films to air. Such changes are obtained from film density or nano-clustered fractional void. Glancing angle deposition (GLAD) method is a well known process for adjusting nanostructure of the films. From its shadowing effects, GLAD helps to deposit well-controlled porous films effectively. In this study, we are comparing the reference sample to samples coated with controlled ITO multilayer accumulated by an e-beam evaporation system. At first, the single ITO layer samples are prepared to decide refractive index with ellipsometry. Afterwards, ITO multilayer samples are fabricated and fitted by multilayer ellipsometric model based on single layer data. The structural properties were measured by using atomic force microscopy (AFM), and by scanning X-ray diffraction (XRD) measurements. The ellipsometry was used to determine refractive indices and extinction coefficient. The optical transmittance of the film was investigated by using an ultraviolet-visible (UV-Vis) spectrophotometer.

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진공에서 열처리된 ITO 박막의 특성 (Properties of indium tin oxide thin films annealed in vacuum)

  • 이임연;이기암
    • 한국광학회지
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    • 제11권3호
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    • pp.152-157
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    • 2000
  • 전자빔 증착된 Indium Tin Oxide(ITO) 박막의 진공 열처리 효과를 알아보기 위해 진공 및 대기 중에서 열처리 온도( $200-335^{\circ}C$) 및 산소 분압 변화($1\times^10^{-5}-1$\times10^{-4} torr$)에 따른 투과율과 면-저항의 변화 및 결정구조를 조사하였다. 시편은 (222) 계열의 면의로 우세 배향된 다결정박막이다. 진고 열처리 변수를 적절하게 조절하여 $62\Omega/\box$의 면저항과 99%(500nm) 이상의 투과율을 가지는 고품질의 박막을 얻을 수 있었다.

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Characteristics of Laser Direct Patterned Indium Tin Oxide Layer by Overlapping Rates of Laser Beam

  • Li, Zhao-Hui;Ahn, Min-Hyung;Choi, Kyung-Min;Im, Seung-Hyeok;Jung, Kyung-Seo;Cho, Eou-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1496-1499
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    • 2009
  • A diode-pumped Nd:$YVO_4$ laser was used to obtain indium tin oxide (ITO) patterns on glass substrate with various overlapping rates. The results showed that the overlapping rate of laser beam influences on the edge structure of ITO pattern and the surface roughness of ablated groove bottom. At a laser repetition rate of 40 kHz, the optimized condition of overlapping rate was 75 %.

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게이트절연막의 열처리가 Zinc Tin Oxide 투명 박막트랜지스터의 특성에 미치는 영향 (Annealing Effects of Gate-insulator on the Properties of Zinc Tin Oxide Transparent Thin Film Transistors)

  • 마대영
    • 한국전기전자재료학회논문지
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    • 제28권6호
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    • pp.365-370
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    • 2015
  • Zinc tin oxide transparent thin film transistors (ZTO TTFTs) were fabricated on oxidized $n^+$ Si wafers. The thickness of ~30 nm $Al_2O_3$ films were deposited on the oxidized Si wafers by atomic layer deposition, which acted as the gate insulators of ZTO TTFTs. The $Al_2O_3$ films were rapid-annealed at $400^{\circ}C$, $600^{\circ}C$, $800^{\circ}C$, and $1,000^{\circ}C$, respectively. Active layers of ZTO films were deposited on the $Al_2O_3/SiO_2$ coated $n^+$ Si wafers by rf magnetron sputtering. Mobility and threshold voltage were measured as a function of the rapid-annealing temperature. X-ray photoelectron spectroscopy (XPS) were carried out to observe the chemical bindings of $Al_2O_3$ films. The annealing effects of gate-insulator on the properties of TTFTs were analyzed based on the results of XPS.

알루미나 단섬유 보강 청동기지 복합재의 상온 및 고온 마모 (Wear of the Alumina Short Fiber Reinforced Tin-Bronze Matrix Composites at the Room Temperature and an Elevated Temperature)

  • 최준호;허무영
    • Tribology and Lubricants
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    • 제11권4호
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    • pp.45-52
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    • 1995
  • The wear behavior of alumina short fiber reinforced tin-bronze matrix composites was studied at the room temperature and an elevated temperature. The effect of the composition of specimens and the variation of wear conditions on the wear properties was examined by a pin-on-disc type wear testing machine. The wear mechanism according to the compositon of specimens at various wear conditions was discussed by the observation of the microstructure and the analysis of the composition on the worn surfaces. A thicker oxide layer on worn surfaces led to a lower wear loss because of the lubricating effect of oxide layers between pin and disc. As the testing temperature was raised to 350$^{\circ}$C, the fiber reinforced composites exibited markedly increased wear resistance even at a higher applied load since the reinforcement of composites with alumina fibers was not affected to a large extent by raising temperature. The results obtained by AES and EDS analysis indicated that the oxide layer of the worn surfaces formed at 350$^{\circ}$C was proved as Fe-oxide. This was explained by the faster formation of Fe-oxide than Cu-oxide at 350$^{\circ}$C.

초음파 분무 열분해법을 이용한 NiCrAl 합금 폼에 코팅된 불소 도핑된 주석 산화물의 영향 (Influence of Fluorine-Doped Tin Oxide Coated on NiCrAl Alloy Foam Using Ultrasonic Spray Pyrolysis Deposition)

  • 신동요;배주원;구본율;안효진
    • 한국재료학회지
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    • 제27권7호
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    • pp.392-397
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    • 2017
  • Fluorine-doped tin oxide (FTO) coated NiCrAl alloy foam is fabricated using ultrasonic spray pyrolysis deposition (USPD). To confirm the influence of the FTO layer on the NiCrAl alloy foam, we investigated the structural, chemical, and morphological properties and chemical resistance by using USPD to adjust the FTO coating time (12, 18, and 24 min). As a result, when an FTO layer was coated for 24 min on NiCrAl alloy foam, it was found to have an enhanced chemical resistance compared to those of the other samples. This improvement in the chemical resistance of using USPD NiAlCr alloy foam can be the result of the existence of an FTO layer, which can act as a protection layer between the NiAlCr alloy foam and the electrolyte and also the result of the increased thickness of the FTO layer, which enhances the diffusion length of the metal ion.

XPS Study of MoO3 Interlayer Between Aluminum Electrode and Inkjet-Printed Zinc Tin Oxide for Thin-Film Transistor

  • Choi, Woon-Seop
    • Transactions on Electrical and Electronic Materials
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    • 제12권6호
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    • pp.267-270
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    • 2011
  • In the process of inkjet-printed zinc tin oxide thin-film transistor, the effect of metallic interlayer underneath of source and drain electrode was investigated. The reason for the improved electrical properties with thin molybdenum oxide ($MoO_3$) layer was due to the chemically intermixed state of metallic interlayer, aluminum source and drain, and oxide semiconductor together. The atomic configuration of three Mo $3d_3$ and $3d_5$ doublets, three different Al 2p core levels, two Sn $3d_5$, and four different types of oxygen O 1s in the interfaces among those layers was confirmed by X-ray photospectroscopy.

카퍼 프탈로시아닌의 완충효과 (Buffer Effect of Copper Phthalocyanine(CuPC))

  • 김정현;신동명;손병청
    • 한국응용과학기술학회지
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    • 제16권4호
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    • pp.307-311
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    • 1999
  • Interfacial properties of electrode and organic thin layer is one of the most important factor in performing a Light Emitting Diodes(LED). Phthalocyanine copper was used as a buffer layer to improve interface characteristic, so that device efficiency was improved. In this study, LEDs were fabricated as like structures of Indium-Tin-Oxide (ITO) / N,N' -Diphenyl-N,N'-di(m-tolyl)-benzidine (TPD) / 8-Hydroxyquinoline aluminum(Alq) / Aluminum(Al) and Indium-Tin-Oxide(ITO) / N,N'-Diphenyl-N,N' -di(m-tolyl)-benzidine(TPD) / 2-(4-Biphenylyl)-5(4-tert-butyl-phenyl)-1,3,4-oxadiazole(PBD) / Aluminum(Al). In these devices, CuPC was layered at electrode/organic layer interface. As position is changing and thickness is changing, devices showed characteristic luminescence efficiency and luminescence inensity respectively. We showed in this study that luminescence efficiency was improved with CuPC layer in LEDs. The efficiency of device with layer CuPC is higher than that of 2 layer CuPC. However, the luminescence of 2 layer CuPC device got higher value.