• Title/Summary/Keyword: TiCu

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Phase Transformation and Reversible Shape Memory Effect of Ti-Ni-Cu Alloys (Ti-Ni-Cu 합금의 상변태 및 가역형상기억효과)

  • Hong, S.W.;Lee, O.Y.;Kim, D.K.
    • Journal of the Korean Society for Heat Treatment
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    • v.5 no.3
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    • pp.149-156
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    • 1992
  • Transformation behavior and reversible shape memory effct of Ti-Ni-Cu alloys with various Cu content has been investigated by means of electrical resistivity measurement, differential scanning calorimetry. X-ray diffraction and strain gage sensor. The transformation sequence in Ti-Ni-Cu alloys substituted by Cu for Ni up to 5at.% occurs to $B2{\leftrightarrow}B19^{\prime}$ and it proceeds in two stages by addition of 10 at.%Cu. i.e. $B2{\leftrightarrow}B19{\leftrightarrow}B19^{\prime}$. But the content of Cu increases up to 20at.%, it has been transformed in one stage ; $B2{\leftrightarrow}B19$. The shape change of Ti-40Ni-10Cu alloy which was constrain aged in circular form bended in $B2{\leftrightarrow}B19$ transformation but it spreaded out in $B19{\leftrightarrow}B19^{\prime}$ transformation. The amount of reversible shape change (${\Delta}{\varepsilon}$) of Ti-47Ni-3Cu alloy constrain aged at $400^{\circ}C$ after solution treatment has a maximum value of about $5.6{\times}10^{-3}$, but that of cold rolled and constrain aged specimens exhibits a little value independent of Cu concentrations.

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Interfacial Properties of Friction-Welded TiAl and SCM440 Alloys with Cu as Insert Metal (삽입금속 Cu를 이용한 TiAl 합금과 SCM440의 마찰용접 계면 특성)

  • Park, Sung-Hyun;Kim, Ki-Young;Park, Jong-Moon;Choi, In-Chul;Ito, Kazuhiro;Oh, Myung-Hoon
    • Korean Journal of Materials Research
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    • v.29 no.4
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    • pp.258-263
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    • 2019
  • Since the directly bonded interface between TiAl alloy and SCM440 includes lots of cracks and generated intermetallic compounds(IMCs) such as TiC, FeTi, and $Fe_2Ti$, the interfacial strength can be significantly reduced. Therefore, in this study, Cu is selected as an insert metal to improve the lower tensile strength of the joint between TiAl alloy and SCM440 during friction welding. As a result, newly formed IMCs, such as $Cu_2TiAl$, CuTiAl, and $TiCu_2$, are found at the interface between TiAl alloy and Cu layer and the thickness of IMCs layers is found to vary with friction time. In addition, to determine the relationship between the thickness of the IMCs and the strength of the welded interfaces, a tensile test was performed using sub-size specimens obtained from the center to the peripheral region of the friction-welded interface. The results are discussed in terms of changes in the IMCs and the underlying deformation mechanism. Finally, it is found that the friction welding process needs to be idealized because IMCs generated between TiAl alloy and Cu act to not only increase the bonding strength but also form an easy path of fracture propagation.

Thermal Stability of Ti-Si-N as a Diffusion Barrier (Cu와 Si간의 확산방지막으로서의 Ti-Si-N에 관한 연구)

  • O, Jun-Hwan;Lee, Jong-Mu
    • Korean Journal of Materials Research
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    • v.11 no.3
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    • pp.215-220
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    • 2001
  • Amorphous Ti-Si-N films of approximately 200 and 650 thickness were reactively sputtered on Si wafers using a dc magnetron sputtering system at various $N_2$/Ar flow ratios. Their barrier properties between Cu (750 ) and Si were investigated by using sheet resistance measurements, XRD, SEM, RBS, and AES depth profiling focused on the effect of the nitrogen content in Ti-Si-N thin film on the Ti-Si-N barrier properties. As the nitrogen content increases, first the failure temperature tends to increase up to 46 % and then decrease. Barrier failure seems to occur by the diffusion of Cu into the Si substrate to form Cu$_3$Si, since no other X- ray diffraction intensity peak (for example, that for titanium silicide) than Cu and Cu$_3$Si Peaks appears up to 80$0^{\circ}C$. The optimal composition of Ti-Si-N in this study is $Ti_{29}$Si$_{25}$N$_{46}$. The failure temperatures of the $Ti_{29}$Si$_{25}$N$_{465}$ barrier layers 200 and 650 thick are 650 and $700^{\circ}C$, respectively.ely.

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A study on the development of Ti-Cu-Ni-Si insert metal for Ti alloys (Ti합금 접합용 Ti-Cu-Ni-Si계 삽입금속의 개발에 관한 연구)

  • 김경미;우인수;강정윤;이상래
    • Journal of Welding and Joining
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    • v.14 no.1
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    • pp.47-56
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    • 1996
  • The purpose of this study is to develope an insert metal which can be brazed at lower temperature than the conventionally used insert metal and provide higher strength joint than base metal. In the review of binary phase diagram concerning Ti, Cu and Ni resulted in the discovery of Si having eutectic composition with them. The microstructure and the distribution of elements in reaction zone between CP Ti and insert metal were investigated by Optical Microscopy, SEM/EDX, EPMA, X-RAY. The newly developed insert metal is Ti-15wt%Cu-18wt%Ni-2wt%Si, which can yield the lower brazing temperature(1183K) compared with the conventional Ti-Cu-Ni system insert metal. The joints with this insert metal had tensile strength of 385MPa in the bonding temperature range of 1183K to 1243K.

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Effects of Alloying Element and Heat Treatment on Properties of Cu-Ti Alloys

  • Suk, Han-Gil;Hong, Hyun-Seon
    • Journal of the Korean institute of surface engineering
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    • v.42 no.5
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    • pp.246-249
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    • 2009
  • Cu-Ti alloys with titanium in the range of 0.5-6.0 wt% were developed to evaluate the effect of the titanium content and heat treatment on microstructure, hardness, and electrical conductivity. The hardness of the Ti-added copper alloys generally increased with the increase in titanium content and hardening was effective up to the 2.5 wt%-Ti addition. Microstructural examination showed that the second phase of $Cu_4Ti$ started to precipitate out from the 3.0 wt% Ti-addition, and the precipitate size and volume fraction increased with further Ti addition. Aging of the present Cu-Ti alloys at $450^{\circ}C$ for 1 h increased the hardness; however, the further aging up to 10 h did not much change the hardness. In the present study, it was inferred that in optimal Ti addition and aging condition Cu-Ti alloy could have the hardness and electrical conductivity values which are comparable to those of commercial Cu-Be alloy.

Preferential Oxidation of CO over Cu/Ti-SBA-15 Catalysts (Cu 담지 Ti-SBA-15 촉매의 선택적 CO 산화 반응)

  • Kim, Joon-Woo;Park, Jae-Woo;Lee, Jong-Soo;Choi, Han-Seul;Choung, Suk-Jin
    • Korean Chemical Engineering Research
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    • v.51 no.4
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    • pp.432-437
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    • 2013
  • The CO preferential oxidation reaction (PROX) has been done using Cu catalytic active species supported on some of mesoporous silica materials which can facilitate the diffusion of the reactants in order to prevent the poisoning of anode active materials by CO molecules during driving polymer electrolyte fuel cells (PEMFC) in this study. As a result when SBA-15 with large pore used as a support showed excellent CO oxidation activity, especially the activity increased in proportion to the amount of supported Cu. Ti components which was inserted to increase the degree of dispersion of Cu, contributed to improving the performance for CO oxidation at low-temperature. The degree of dispersion of Cu ingredients was the best in the catalyst inserted 20 mol-% Ti into the framework of SBA-15, and CO oxidation activity was also improved.

Effect of air-contaminated TiN on the deposition characteristics of Cu film by MOCVD (공기 중에 노출된 MOCVD TiN 기판이 MOCVD Cu 증착에 미치는 효과)

  • Choe, Jeong-Hwan;Byeon, In-Jae;Yang, Hui-Jeong;Lee, Won-Hui;Lee, Jae-Gap
    • Korean Journal of Materials Research
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    • v.10 no.7
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    • pp.482-488
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    • 2000
  • The deposition characteristics of Cu film by MOCVD using (hfac)Cu(1,5-COD)(1,1,1,5,5,5-hexafluro-2,4-pentadionato Cu(I) 1,5-cryclooctadiene) as a precursor have been investigated in terms of substrate conditions. Two different substrates such as air-exposed TiN and non-contaminated TiN were used for the MOCVD of Cu. MOCVD of Cu on the air-exposed TiN affected the nucleation rate of Cu as well as its growth, resulting in the Cu films having poor interconnection between particles with relatively small grains. On the other hand, in-situ MOCVD of Cu led to the Cu films having a significantly improved interconnection between particles with larger grains, indicating the resistivity as low as $2.0{\mu}{\Omega}-cm$ for the films having more than 1900$\AA$ thickness. Moreover, better adhesion of Cu films to the TiN by using in-situ MOCVD has been obtained. Finally, initial coalescence mechanism of Cu was suggested in this paper in terms of different substrate conditions by observing the surface morphology of the Cu films deposited by MOCVD.

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Electrical Characteristics of p+/n Junctions with Cu/Ti-capping/NiSi Electrode (Cu/Ti-cappng/NiSi 전극구조 p+/n 접합의 전기적 특성)

  • Lee Keun-Yoo;Kim Ju-Youn;Bae Kyoo-Sik
    • Korean Journal of Materials Research
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    • v.15 no.5
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    • pp.318-322
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    • 2005
  • Ti-capped NiSi contacts were formed on $p^+/n$ junctions to improve the leakage problem and then Cu was deposited without removing the Ti-capping layer in an attempt to utilize as a diffusion barrier. The electrical characteristics of these $p^+/n$ diodes with Cu/Ti/NiSi electrodes were measured as a function of drive-in RTA(rapid-thermal annealing) and silicidation temperature and time. When drive-in annealed at $900^{\circ}C$, 10 sec. and silicided at $500^{\circ}C$, 100 sec., the diodes showed the most excellent I-V characteristics. Especially, the leakage current was $10^{-10}A$, much lower than reported data for diodes with NiSi contacts. However, when the $p^+/n$ diodes with Cu/Ti/NiSi contacts were furnace-annealed at $400^{\circ}C$ for 40 min., the leakage current increased by 4 orders. The FESEM and AES analysis revealed that the Ti-capping layer effectively prohibited the Cu diffusion, but was ineffective against the NiSi dissociation and consequent Ni diffusion.

Observation on the Microstructures of Cu-TiB2 Composites with Wear Behavior (Cu-TiB2 복합재료의 마모거동에 따른 미세조직 관찰)

  • Lee, Tae-Woo;Kang, Kae-Myung
    • Korean Journal of Materials Research
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    • v.16 no.8
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    • pp.511-515
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    • 2006
  • The dispersion hardened $Cu-TiB_2$ composites are a promising candidate for applications as electrical contact materials. The $Cu-TiB_2$ composites for electrical contact materials can reduce material cost and resource consumption caused by wear, due to their good mechanical and electrical properties. In this study, we investigated the wear phenomenon for $Cu-TiB_2$ composites fabricated with hot extrusion, by varying particle sizes and volume fractions of $TiB_2$. The wear tests were performed under the dry sliding condition with a fixed total sliding distance of 40 m. The contact loads at a constant speed of 3.5 Hz were 20, 40, 60, and 80 N. The friction coefficients and wear losses were measured during wear tests. Worn surfaces and wear debris after wear tests were investigated using the scanning electron microscope and the optical microscope. The microstructures of interface between Cu matrix and $TiB_2$ particle before and after wear tests were studied by the transmission electron microscope.

The Influence of TiB2 Particle on the Mechanical Property of Cu-TiB2 Composites (Cu-TiB2 복합재료의 기계적 성질에 미치는 TiB2 입자의 영향)

  • Kang Kae-Myung;Choi Jong Un
    • Korean Journal of Materials Research
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    • v.14 no.1
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    • pp.73-77
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    • 2004
  • The mechanical and electrical properties of $Cu-TiB_2$ composites prepared by hot extrusion and cold drawing according to the variation of $TiB_2$ contents and the size of $TiB_2$ particle have been studied. The experimental results showed that the electrical conductivity was decreased with increasing the $TiB_2$ content, and their tensile strength and hardness increased inversely. In the case of the same content of $TiB_2$ particle, the smaller $TiB_2$ particle, the higher their mechanical properties. The electrical conductivity of $Cu-TiB_2$ composites showed more than 70%IACS. Their yield strength and hardness were more than 120 MPa and HRB 60~70, respectively.