• Title/Summary/Keyword: Ti 확산

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Fundamental Study on the Production of TiFe Hydrogen Alloy by the Reduction-Diffusion Process (환원확산법에 의한 TiFe 수소 흡장합금의 제조에 관한 기초적 연구)

  • 권호영;일본명;일본명
    • Journal of the Korean Society of Safety
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    • v.8 no.2
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    • pp.3-9
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    • 1993
  • For comparison, we used Ca and Mg as reducers to produce TiFe hydrogen stroage alloy from Fe and TiO$_2$by the Reduction-Diffusion process. The results obtained were as follow. \circled1 Ca was found to be effective both for reduction and diffusion processes. Moreover, Ca oxide was easily removed in an NH$_4$Cl solution after the reaction. \circled2 In the case of using Ca as a reducer, the Reduction-Diffusion process is considered to take place in the foiling three steps. First, TiO$_2$is reduced to Ti by Ca over 100$0^{\circ}C$. Second, the atomic Ti drifts in the Ca melt and meets Fe particles. Finally, the atomic Ti diffuses in to the Fe particles. \circled3 In the case of using Mg as a reducer, We found that the reduction reaction of TiO$_2$went well. But the reduced Ti scarcely diffused into Fe particles. This was probably because no Mg melt was formed due to the high vapor pressure of Mg.

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Deposition Characteristics of Ti-Si-N Films Deposited by Radio Frequency Reactive Sputtering of Various Ratio of Ti/Si Targets in an $N_2$/Ar Ambient (Ti/Si의 조성비율이 다른 타겟을 이용한 sputtered Ti-Si-N 박막의 증착특성 연구)

  • Park, Sang-Gi;Kang, Bong-Joo;Yang, Hee-Jeong;Lee, Won-Hee;Lee, Eun-Goo;Kim, Hee-Jae;Lee, Jae-Gap
    • Korean Journal of Materials Research
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    • v.11 no.7
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    • pp.580-584
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    • 2001
  • We have investigated the deposition characteristics of Ti-Si-N films obtained by rf magnetron sputtering with ratios of Ti/Si targets in an $Ar/N_2$ gas mixture. The growth rate and stoichiometry dependence of the Ti-Si-N films on the ratio of Ti/Si and $N_2$ flow rate ratio were found to be due to the different nitriding rate of Ti and Si targets. Additionally, their different sputtering yield of nitrified Ti and Si make a reason as well. Lowering Si content in the film favored the formation of crystalline TiN, leading to the low resistivity. Increasing N content led to the Ti-Si-N films having a higher density and compressive stress, suggesting that the N content in the film is one of the most important factors determining the diffusion barrier characteristics. In the current work, the optimum process conditions for the formation of efficient diffusion barrier of Ti-Si-N film has successfully obtained by manipulating the Ti/Si ratio of target and $N_2$ flow rate ratio.

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Development of Thermal Properties on the Roof Waterproof with Insulation System using the Diffused Reflection Material (확산반사를 이용한 경질시트 옥상 단열방수공법의 열성능 개선에 관한 연구)

  • Koo, Jae-Oh
    • KIEAE Journal
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    • v.7 no.1
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    • pp.73-80
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    • 2007
  • This paper aims to develop the diffused reflection material in order to reduce the solar absorption coefficient, and to compare the thermal properties with the different roof structure system; one is using the diffused reflection material applied the upper side of the rigid sheet waterproof system and the other is using the conventional up-side down waterproof system on the roof. For this purpose two experimental test boxes were made of same iso-panel wall and floor with different roof system. The experiment was carried out under these process; measure the surface temperature exposed solar radiation of the variation of the reflection materials(cement paste, silica, galvanized steel and titanium dioxide(TiO2)), measure and analyze the variation of the temperature distribution of the each roof system and indoor air in order to evaluate the thermal properties according to the different roof system. The result shows clearly that using the titanium dioxide(TiO2) might be more effective to reduce the solar insolation.

Differential Thermal Analysis of the Self-propagating High-temperature Synthesis of Ti-Al mixture (Ti-Al의 고온 자전 반응 합성과정의 열시차 분석)

  • Mun, Jong-Tae;Lee, Yong-Ho
    • Korean Journal of Materials Research
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    • v.5 no.3
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    • pp.345-356
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    • 1995
  • 본 연구에서는 TiAl 금속간 화합물을 자전 고온 반응법을 이용하여 제조시 반응과정을 열시차 분석 방법으로 분석하였다. 합금 조성은 Ti-45at% Al, 53at%Al, 알루미늄 분말 크기, 승온 속도, 성형 밀도 등을 변화시켜 이들이 반응 과정에 미치는 영향을 관찰하였다. 분말이 미세할수록, 승온속도가 느릴수록, 성형 밀도가 낮을수록 반응 점화 온도 및 연소 온도가 감소하였으며, 고상 Ti와 고상 Al간의 반응정도가 증가하는 것이 관찰되었다. 고상 Ti와 고상 Al간의 반응에서 생성되는 것은 XRD 분석 결과 Ti$Al_{3}$상으로 확인되었다. 이에 비하여 반응 점화 온도가 알루미늄의 용융 온도보가 높을 경우에는 생성되는 상이 $Ti_{3}$Al, TiAl상으로 확인되었다. 이러한 상의 생성 원인에 대하여 확산 계수 및 알루미늄의 용해도등의 요인으로 설명하였다.

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Computational Investigation of the Thermal Performances of Polymer Heat Sinks Passively-Cooled by Seawater for Thermoelectric Waste Heat Recovery (열전폐열회수를 위해 수동적으로 해수냉각되는 폴리머 히트싱크 열성능의 수치적 연구)

  • Kim, Kyoung Joon
    • Journal of Advanced Marine Engineering and Technology
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    • v.39 no.4
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    • pp.432-436
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    • 2015
  • This study computationally explored the thermal performance of passively-cooled polymer heat sinks utilizing seawater. Polymer heat sinks are proposed as cooling modules of the cold sides of thermoelectric generators for waste heat recovery. 3-D Computational Fluid Dynamics (CFD) modelling was conducted for a detailed numerical study. Polyphenylene sulfide (PPS) and pyrolytic graphite (PG) were selected for the base materials of polymer heat sinks. The computational study evaluated the performance of the PPS and PG heat sinks at various fin numbers and fin thicknesses. Their performances were compared with those of aluminum (Al) and titanium (Ti) heat sinks. The study results showed that the thermal performance of the PG heat sink was 3~4 times better than that of the Ti heat sink. This might be due mainly to the better heat spreading of the PG heat sink than the Ti heat sink. The effect of the number of fins on the performance of the PG heat sink was dissimilar to the cases of the PPS and Ti heat sinks. This result can be explained by the interrelationships among heat spreading, surface area enhancement, and fluidic resistance incorporating with an increase in the number of fins.

Characteristics of Optical TiN Films upon RF power (RF 출력의 변화에 따른 광학용 TiN 박막의 특성 연구)

  • 손영배;김남영;황보창권
    • Proceedings of the Optical Society of Korea Conference
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    • 2000.08a
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    • pp.172-173
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    • 2000
  • TiN 박막은 부착력이 좋은 기계적 성질을 갖고 있으며 화학적 안정성이 뛰어난 장점을 갖고 있어 수명이 긴 박막으로 사용 할 수 있다. 또한 반도체 집적 회로소자에서는 Al과 Si 사이의 확산 방지막으로 널리 사용하고 있으며, 티타늄과 질소의 화학 조성비를 적절히 조절하여 노란 금빛을 띠는 TiN 박막을 시계나 장신구 등의 표면에 코팅하여 장식에도 많이 사용하고 있다$^{[1]}$ . 최근에는 얇은 전도성 TiN 박막을 사용하여 무반사 영역을 넓히고, 무정전 효과를 지니며, TiN 박막의 두께를 변화시켜 투과율을 조절하여 명도대비(contrast)를 향상시킬 수 있는 2층 무반사 무정전 박막을 연구하고 있다.$^{[2]}$ 여기서는 티타늄과 질소의 원소조성비에 따른 TiN 박막의 복소수 굴절률의 분산이 단 2층으로 넓은 가시광선 영역에서 무반사 효과를 가질 수 있도록 TiN 박막을 증착해야 한다. (중략)

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