• 제목/요약/키워드: Three dimension electric field

검색결과 5건 처리시간 0.023초

Analysis on Electric Field Based on Three Dimensional Atmospheric Electric Field Apparatus

  • Xing, Hong-yan;He, Gui-xian;Ji, Xin-yuan
    • Journal of Electrical Engineering and Technology
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    • 제13권4호
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    • pp.1697-1704
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    • 2018
  • As a key component of lighting location system (LLS) for lightning warning, the atmospheric electric field measuring is required to have high accuracy. The Conventional methods of the existent electric field measurement meter can only detect the vertical component of the atmospheric electric field, which cannot acquire the realistic electric field in the thunderstorm. This paper proposed a three dimensional (3D) electric field system for atmospheric electric field measurement, which is capable of three orthogonal directions in X, Y, Z, measuring. By analyzing the relationship between the electric field and the relative permittivity of ground surface, the permittivity is calculated, and an efficiency 3D measurement model is derived. On this basis, a three-dimensional electric field sensor and a permittivity sensor are adopted to detect the spatial electric field. Moreover, the elevation and azimuth of the detected target are calculated, which reveal the location information of the target. Experimental results show that the proposed 3D electric field meter has satisfactory sensitivity to the three components of electric field. Additionally, several observation results in the fair and thunderstorm weather have been presented.

E-$\Omega$ 법을 이용한 3차익 교류 자장 해석 (Three-Dimensional Time Varing Magnetic Field Analysis: Using E-$\Omega$ Method)

  • 김동수;한송엽
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1989년도 추계학술대회 논문집 학회본부
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    • pp.49-52
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    • 1989
  • Some limits are in two-dimensional analysis by finite element method to electromagnetic machine having finite dimension. Therefore three-dimensional analysis by finite element method, which are modeling original form of models are needed in order to gain accurate solutions. This paper present three-dimensional time varing magnetic field analysis method using electric field E and magnetic scarlar potential $\Omega$, and examine sample model.

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Development of an Improved Numerical Methodology for Design and Modification of Large Area Plasma Processing Chamber

  • 김호준;이승무;원제형
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.221-221
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    • 2014
  • The present work proposes an improved numerical simulator for design and modification of large area capacitively coupled plasma (CCP) processing chamber. CCP, as notoriously well-known, demands the tremendously huge computational cost for carrying out transient analyses in realistic multi-dimensional models, because electron dissociations take place in a much smaller time scale (${\Delta}t{\approx}10-8{\sim}10-10$) than time scale of those happened between neutrals (${\Delta}t{\approx}10-1{\sim}10-3$), due to the rf drive frequencies of external electric field. And also, for spatial discretization of electron flux (Je), exponential scheme such as Scharfetter-Gummel method needs to be used in order to alleviate the numerical stiffness and resolve exponential change of spatial distribution of electron temperature (Te) and electron number density (Ne) in the vicinity of electrodes. Due to such computational intractability, it is prohibited to simulate CCP deposition in a three-dimension within acceptable calculation runtimes (<24 h). Under the situation where process conditions require thickness non-uniformity below 5%, however, detailed flow features of reactive gases induced from three-dimensional geometric effects such as gas distribution through the perforated plates (showerhead) should be considered. Without considering plasma chemistry, we therefore simulated flow, temperature and species fields in three-dimensional geometry first, and then, based on that data, boundary conditions of two-dimensional plasma discharge model are set. In the particular case of SiH4-NH3-N2-He CCP discharge to produce deposition of SiNxHy thin film, a cylindrical showerhead electrode reactor was studied by numerical modeling of mass, momentum and energy transports for charged particles in an axi-symmetric geometry. By solving transport equations of electron and radicals simultaneously, we observed that the way how source gases are consumed in the non-isothermal flow field and such consequences on active species production were outlined as playing the leading parts in the processes. As an example of application of the model for the prediction of the deposited thickness uniformity in a 300 mm wafer plasma processing chamber, the results were compared with the experimentally measured deposition profiles along the radius of the wafer varying inter-electrode gap. The simulation results were in good agreement with experimental data.

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765 kV 초고압 송전선 주변의 인체 유도전류 계산 (Calculation of Induced Current in the Human Body around 765 kV Transmission Lines)

  • 명성호;이재복;허창수
    • 한국전자파학회논문지
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    • 제9권6호
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    • pp.802-812
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    • 1998
  • 고전압 발/ 변전소의 근무자나 송전선 작업자 및 주변거주자가 전계 노출에 안전해야 함은 중요한 일이다. 본 논문에서는 복잡하고 계산시간이 많이 소요되는 인체의 3차원 유도전류를 계산하기 위해 전압원(송전선 로)의 효과적인 모델링 기법을 사용하여 전압원과 피유도체를 분리하지 않고 직접 3차원 정전용량을 구함으 로써 불평등 전계하의 임의의 3차원 공간상에서도 인체에 미치는 유도전류 해석이 가능한 장접을 갖도록 하 였다. 사례연구로 본 연구에서 제안한 알고리즘을 765 kV급 초고압 송전선로에 적용하여 인체 유도 안전 성을 평가한 결과 765 kV 송전선에서 인체의 단락전류는 인체의 위치에 따라 0.3 mA에서 6.8 mA로 분포 되었다. 특히, 송전선로에서 활선 작업시 단락전류 $I_{sc}$의 크기는 ANSI 허용기준인 5 mA를 념을 수 있어 활 선 작업시 작업자의 전계의 방호 대책을 위해서는 도전물질로 구성된 보호복이 필요함을 알 수 있었다.

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Analysis of Subwavelength Metal Hole Array Structure for the Enhancement of Quantum Dot Infrared Photodetectors

  • 하재두;황정우;강상우;노삼규;이상준;김종수
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.334-334
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    • 2013
  • In the past decade, the infrared detectors based on intersubband transition in quantum dots (QDs) have attracted much attention due to lower dark currents and increased lifetimes, which are in turn due a three-dimensional confinement and a reduction of scattering, respectively. In parallel, focal plane array development for infrared imaging has proceeded from the first to third generations (linear arrays, 2D arrays for staring systems, and large format with enhanced capabilities, respectively). For a step further towards the next generation of FPAs, it is envisioned that a two-dimensional metal hole array (2D-MHA) structures will improve the FPA structure by enhancing the coupling to photodetectors via local field engineering, and will enable wavelength filtering. In regard to the improved performance at certain wavelengths, it is worth pointing out the structural difference between previous 2D-MHA integrated front-illuminated single pixel devices and back-illuminated devices. Apart from the pixel linear dimension, it is a distinct difference that there is a metal cladding (composed of a number of metals for ohmic contact and the read-out integrated circuit hybridization) in the FPA between the heavily doped gallium arsenide used as the contact layer and the ROIC; on the contrary, the front-illuminated single pixel device consists of two heavily doped contact layers separated by the QD-absorber on a semi-infinite GaAs substrate. This paper is focused on analyzing the impact of a two dimensional metal hole array structure integrated to the back-illuminated quantum dots-in-a-well (DWELL) infrared photodetectors. The metal hole array consisting of subwavelength-circular holes penetrating gold layer (2DAu-CHA) provides the enhanced responsivity of DWELL infrared photodetector at certain wavelengths. The performance of 2D-Au-CHA is investigated by calculating the absorption of active layer in the DWELL structure using a finite integration technique. Simulation results show the enhanced electric fields (thereby increasing the absorption in the active layer) resulting from a surface plasmon, a guided mode, and Fabry-Perot resonances. Simulation method accomplished in this paper provides a generalized approach to optimize the design of any type of couplers integrated to infrared photodetectors.

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