• Elastomers and Composites
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• 제34권1호
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• pp.45-52
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• 1999

본 논문에서는 미세 상분리된 블럭 공중합체 박막의 특이상에서 금 입자들이 어떻게 자기응집(self assemble) 되고 잘 배열된 패턴을 형성하는지를 살펴보았다. 본 연구에서는 원통형 모폴로지를 갖는 PS-PB-PS 삼블럭 공중합체(30wt% PS) 박막(${\sim}100nm$)을 0.1wt% 톨루엔 용액으로부터 캐스팅하여 고분자 박막 형판(template)으로 사용하였다. 각각의 상이한 용매 증발조건으로부터 PB matrix내에 수평배열 PS cylinder와 수직 PS cylinder를 함께 갖는 막이 얻어졌다. 블럭 공중합체박막의 표면 및 bulk 몰폴로지를 살펴보기 위하여 단면투과전자현미경(TEM)을 사용하였다. Nano-scale 패턴을 얻기 위하여는 소량의 금입자를 블럭 공중합체 박막상에 증발시켰다. 캐스팅된 상태 그 대로의 박막형판이 사용되어질때 금입자들은 표면 장력이 적은 PB상에 우선적으로 자기응집(self as-semble)하여 비교적 잘 배열된 nano-scale의 패턴을 형성하였다. 그러나 열처리(annealing)에 의하여 표면장력이 적은 PB-rich충이 형성된 후에는 금입자의 자기응집에 의한 패턴은 관찰되지 않았다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.54.2-54.2
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• 2012

Solid-state dewetting of thin films is a process through which continuous solid films decay to form islands. Dewetting of thin films has long been a critical issue in microelectronics and much effort has been made to prevent the process and enhance the stability of films. On the other hand, dewetting has also been purposely induced to create arrays of particles and other structures for applications, including plasmonic structures and catalysts for growing nanotube and nanowire. We have investigated ways of producing regular structures via templated dewetting of thin films. Mainly, two different approaches have been used in our works to template dewetting of thin films: periodic topographical templating and planar patterning of epitaxially-grown films. Dewetting of topographically-patterned thin films results in the formation of nanoparticle arrays with spatial and crystallographic orders. Morphological evolution during templated-dewetting of single crystal films occurs in deterministic ways because of geometric and crystallographic constraints, and leads to the formation of regular structures with smaller sizes and more complex shapes than the initial patches. These results will be reviewed in this presentation.

• E2M - 전기 전자와 첨단 소재
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• 제9권1호
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• pp.59-66
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• 1996

Polyimides containing cyclobutane ring in main chain is known to be thermally stable and able to be developed in organic solvents after photolysis with 254 nm UV light. This type of polyimides can be used as promising positive photoresist in VLSI fabrication process. In the current VLSI process, photoresist films are formed by spin coating. The film thickness is more than several hundred nano meters. It seems that there is room for improvement of film coating process by introducing Langmuir Blodgett technique. Thereby ultra thin film photoresist can be formed, and higher density of integration in VLSI be achieved. In the present work, depositing procedure of LB films of this polyimide was investigated. LB film thickness was measured by ellipsometry to evaluate deposited film status. Chemical imidization procedure was studied to avoid several problems in thermal imidization. The pattern of submicron dimension has successfully formed on LB film of 8nm thick, which found showing good contrast.

• KSBB Journal
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• 제24권6호
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• pp.515-520
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• 2009

This study presented facile method of cell patterning using fabricated PDMS patterns on polyelectrolyte coated surface. This basic principle is the fabrication of functional surface presenting two orthogonal surfaces such as cell adhesive and repellent properties. Cell adhesive surface was firstly fabricated with simple coating of polyelectrolyte multilayer. And then, the desired patterns of PDMS for the prevention of nonspecific binding of cells were transferred onto the previously formed thin film of polyelectrolyte multilayer. Thus, we could prepare novel functional surface simultaneously containing PDMS and polyelectrolyte region. As expected, the PDMS regions showed effective prevention of nonspecific binding of cell and the other region, exposed polyelectrolyte area, provided cell adhesive environment. The height of formed PDMS structure was about 100 nm. Based on this method, cell patterning can be successfully obtained with various pattern shapes and sizes. Therefore, we expect that this simple method will be useful platform technology for the development of cell chip, cell based assay system, and biochip.

• Journal of Information Display
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• 제7권3호
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• pp.1-4
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• 2006

2.22-inch qVGA $(240{\times}320)$ amorphous silicon thin film transistor liquid active matrix crystal display (a-Si TFT-AMLCD) panel has been successfully demonstrated employing a 2.5 um fine-patterning technology by a wet etch process. Higher resolution 2.22-inch qVGA LCD panel with an aperture ratio of 58% can be fabricated as the 2.5 um fine pattern formation technique is integrated with high thermal photo-resist (PR) development. In addition, a novel concept of unique a-Si TFT process architecture, which is advantageous in terms of reliability, was proposed in the fabrication of 2.22-inch qVGA LCD panel. Overall results show that the 2.5 um fine-patterning is a considerably significant technology to obtain higher aperture ratio for higher resolution a-Si TFT-LCD panel realization.

• 전기전자학회논문지
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• 제25권1호
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• pp.64-68
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• 2021

정렬 패턴을 전사공정을 이용하여 BiLaO 박막 위에 패터닝하고 소성온도에 따른 액정 배향 특성에 대하여 연구 하였다. 졸겔 공정을 제작한 BiLaO 은 유리 기판 위에 스핀코팅으로 증착한 후 미리 제작된 정렬패턴을 전사하여 100, 150, 200, 250 ℃ 의 온도에서 소성하였다. POM분석으로부터 200℃ 이하의 소성온도에서 액정배향은 균일하지 않았고, 250 ℃의 소성온도에서 균일한 액정 배향 특성을 확인 할 수 있었고, 결정 회절 법 분석으로 부터도 확인 가능하였다. 전사 공정 시 250 ℃의 온도에서 패턴이 전사되었음을 Atomic force microscopy 을 통하여 확인 할 수 있었다. 250 ℃의 온도에서 전사된 정렬 패턴에 의하여 박막의 이방성을 획득 하였고 이방성 박막 위에서 액정 분자들이 고르게 배향 될 수 있었다. 따라서 BiLaO 산화막의 전사에 의한 액정 배향 공정은 소성온도에 영향을 받는다는 것을 확인 할 수 있었다.

• 한국자기학회지
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• 제22권1호
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• pp.6-10
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• 2012

본 연구에서는 인산 용액 하에서 2차 양극 산화 기법에 의해 제작된 양극 산화 알루미나 기판 상에 최대 13 nm 두께의 얇은 니켈 박막을 증착하며 증착 시 박막 두께에 따라 감소하는 박막의 저항 변화를 살펴보았다. 양극 산화 알루미나 막 표면에 존재하는 미세 기공 구조를 따라 증착된 니켈 박막 역시 다공 구조의 박막으로 성장하게 되며 증착된 박막의 두께 범위 내에서 박막의 저항은 $150k{\Omega}$ 이상의 값을 보이면서 박막 두께에 따른 저항의 감소가 매우 천천히 일어나는 것을 확인할 수 있었다. 측정된 저항 값은 기존에 보고된 균일한 기판 상에 증착된 동일 두께의 니켈 박막에 비해 매우 큼을 볼 수 있었으며 기판 표면에 존재하는 기공 구조에 의해 핵자가 형성될 수 있는 표면 면적 비가 박막 성장을 설명하는 스미기(percolation) 현상이론에서 예측하는 임계 값보다 매우 적어 미세 기공에 의해 박막의 성장과 함께 나타나는 전자 전도 채널의 형성이 저해됨으로 이해될 수 있다. 이와 함께 기존의 박막 두께에 따른 비저항 모델과 비교해 보았을 때 미세 기공의 경계에서 나타나는 전자 산란 현상 역시 박막저항의 증가에 기여함을 알 수 있다.

• Current Photovoltaic Research
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• 제2권3호
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• pp.95-102
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• 2014

Light trapping techniques can change the propagation direction of incident light and keep the light longer in the absorption layers of solar cells to enhance the power conversion efficiency. In thin film silicon (Si) solar cells, the thickness of absorption layer is generally not enough to absorb entire available photons because of short carrier life time, and light induced degradation effect, which can be compensated by the light trapping techniques. These techniques have been adopted as textured transparent conduction oxide (TCO) layers randomly or periodically textured, intermediate reflection layers of tandem and triple junction, and glass substrates etched by various patterning methods. We reviewed the light trapping techniques for thin film Si solar cells and mainly focused on the commercially available techniques applicable to textured TCO on patterned glass substrates. We described the characterization methods representing the light trapping effects, texturing of TCO and showed the results of multi-scale textured TCO on etched glass substrates. These methods can be used tandem and triple thin film Si solar cells to enhance photo-current and power conversion efficiency of long term stability.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.410.1-410.1
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• 2016

Vanadium dioxide ($VO_2$) is a well-known material that exhibits a metal-semiconductor transition at 340 K, with drastic change of transmittance at NIR region. However, $VO_2$ based thermochromics accompany with low visible transmittance value and unfavorable color (brownish yellow). Herein, we demonstrate the adjustment of visible transmittance of $VO_2$ thin film by nanosphere template assisted patterning process using sol-gel method. 2-Dimenstional honeycomb shape was varied as function of diameter of nanosphere and coating conditions. The morphological geometry of the films was investigated by FE-SEM and AFM. Result shows that inversed shape of nanosphere was formed clearly and pattern width was altered according to the bead size. This structure creates the geometrical blank area from the position of nanosphere which improves the optical transmittance at the visible region. Moreover, such patterned $VO_2$ thin film not only maintains the optical switching efficiency, but also generate the gorgeous scattering effect which presumably support the glazing application.

• Progress in Superconductivity
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• 제9권1호
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• pp.119-125
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• 2007

We investigated recovery in $Au/YBa_2Cu_3O_7$ (YBCO) thin film meander lines on sapphire substrates. The meander lines were fabricated by patterning YBCO films coated with gold layers. The lines were subjected to simulated AC fault current and then small current was applied for recovery measurements. The samples were immersed in liquid nitrogen during the experiment. After the fault, the resistance decreased linearly, first slowly and then fast to zero. The initial slow decrease was due to the decrease of the meander line temperature, whereas the fast decrease was originated from the transition from the normal state to the superconducting state. The recovery speed depended on the size of samples, and was faster in the smaller samples during the whole period of recovery. The experimental results were analyzed quantitatively with the concept of heat transfer within the sample and to the surrounding liquid nitrogen. A heat balance equation was solved for the initial phase of recovery, and an expression for the time dependence of resistance was obtained. The result agreed with data well.