• 제목/요약/키워드: Thin film Transistor

검색결과 955건 처리시간 0.025초

Temperature Dependence of SiInZnO Thin Film Transistor Fabricated by Solution Process

  • Lee, Sang Yeol;Kang, Taehyun;Han, Sang Min;Lee, Young Seon;Choi, Jun Young
    • Transactions on Electrical and Electronic Materials
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    • 제16권1호
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    • pp.46-48
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    • 2015
  • Thin film transistor (TFT) with silicon indium zinc oxide (SIZO) was fabricated by solution process, and the effect of annealling temperature on the electrical performance has been explored. The performance of SIZO TFT exhibited saturation mobility of $1.37cm^2$/Vs, a threshold voltage of -7.2 V, and an on-off ratio of $1.1{\times}10^5$.

산화물반도체 트랜지스터 안정성 향상 연구 (Investigation on the Stability Enhancement of Oxide Thin Film Transistor)

  • 이상렬
    • 한국전기전자재료학회논문지
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    • 제26권5호
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    • pp.351-354
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    • 2013
  • Thin-film transistors(TFTs) with silicon-zinc-tin-oxide(SiZnSnO, SZTO) channel layer are fabricated by rf sputtering method. Electrical properties were changed by different annealing treatment of dry annealing and wet annealing. This procedure improves electrical property especially, stability of oxide TFT. Improved electrical properties are ascribed to desorption of the negatively charged oxygen species from the surfaces by annealing treatment. The threshold voltage ($V_{th}$) shifted toward positive as increasing Si contents in SZTO system. Because the Si has a lower standard electrode potential (SEP) than that that of Sn, Zn, resulting in the degeneration of the oxygen vacancy ($V_O$). As a result, the Si acts as carrier suppressor and oxygen binder in the SZTO as well as a $V_{th}$ controller, resulting in the enhancement of stability of TFTs.

파릴렌 게이트 절연층을 사용한 신축성 박박 트랜지스터의 제작 및 특성 (Fabrication and Characterizations of Stretchable Thin-Film Transistor using Parylene Gate Insulating Layer)

  • 정순원;류봉조;구경완
    • 전기학회논문지
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    • 제66권4호
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    • pp.721-726
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    • 2017
  • We fabricated stretchable thin-film transistors(TFTs) on a polydimethylsiloxane substrate with patterned polyimide island structures by using an amorphous InGaZnO semiconductor and parylene gate insulator. The TFTs exhibited a field- effect mobility of $5cm^2V^{-1}s^{-1}$ and a current on/off ratio of $10^5$ at a relatively low operating voltage. Furthermore, the fabricated transistors showed no noticeable changes in their electrical performance for large strains of up to 50 %.

누설전류 감소를 위한 Bird's Beak 공정을 이용한 다결정 실리콘 박막 트랜지스터의 구조 연구 (A Researching about Reducing Leakage Current of Polycrystalline Silicon Thin Film Transistors with Bird's Beak Structure)

  • 이진민
    • 한국전기전자재료학회논문지
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    • 제24권2호
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    • pp.112-115
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    • 2011
  • To stabilize the electric characteristic of Silicon Thin Film Transistor, reducing the current leakage is most important issue. To reduce the current leakage, many ideas were suggested. But the increase of mask layer also increased the cost. On this research Bird's Beak process was use to present element. Using Silvaco simulator, it was proven that it was able to reduce current leakage without mask layer. As a result, it was possible to suggest the structure that can reduce the current leakage to 1.39nA without having mask layer increase. Also, I was able to lead the result that electric characteristic (on/off current ratio) was improved compare from conventional structure.

PNP 게이트를 가지는 폴리 실리콘 박막 트랜지스터의 전기적 특성 (Electrical characteristics of polysilicon thin film transistors with PNP gate)

  • 민병혁;박철민;한민구
    • 전자공학회논문지A
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    • 제33A권3호
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    • pp.96-106
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    • 1996
  • One of the major problems for poly-Si TFTs is the large off state leakage current. LDD (lightly doped drain) and offset gated structures have been employed in order to reduce the leakage current. However, these structures also redcue the oN current significantly due to the extra series resistance caussed by the LDD or offset region. It is desirable to have a device which would have the properties of the offset gated structure in the OFF state, while behaving like a fully gated device in the oN state. Therefore, we propose a new thin film transistor with pnp junction gate which reduce the leakage curretn during the OFF state without sacrificing the ON current during the ON state.

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Investigation of charge injection in organic thin film transistor using ink-jet printed silver electrodes

  • Kim, Dong-Jo;Jeong, Sun-Ho;Lee, Sul;Jang, Dae-Hwan;Moon, Joo-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.730-732
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    • 2007
  • We fabricated a coplanar type organic thin-film transistors using ink-jet printed silver source/drain electrodes and ${\alpha},{\omega}-dihexylquaterthiophene$ (DH4T) which is an active layer. Use of ink-jet printed silver nanoparticle-based metal electrode assists the energetic mismatch with p-type organic semiconductor via modification of their interfacial properties to enable ohmic contact formation.

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Fabrication of An Organic Thin-Film Transistor Array by Wettability Patterning for Liquid Crystal Displays

  • Kim, Sung-Jin;Bae, Jin-Hyuk;Ahn, Taek;Suh, Min-Chul;Chang, Seung-Wook;Mo, Yeon-Gon;Chung, Ho-Kyoon;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.151-154
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    • 2007
  • We demonstrate a novel selective patterning process of a semiconducting polymer for channel regions to fabricate an array of organic thin-film transistors (OTFTs). This process is applicable for various organic films over large area. A reflective liquid crystal display based on the OTFT array was produced using the selective patterning through a wettability control.

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새로운 방식의 유기박막트랜지스터 패시베이션 기술 (The novel encapsulation method for organic thin-film transistor)

  • 이정헌;김성현;김기현;임상철;조은나리;장진;정태형
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.177-180
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    • 2004
  • In this study, we report a novel encapsulation method for longevity of an organic thin-film transistor (OTFT) using pentaceneby means of an adhesive multiplayerincluded Al film. For encapsulation of OTFTs, the Al film adhered onto the OTFT in a dry nitrogen atmosphere using a proper adhesive. A lifetime, which was defined as the time necessary to reduce mobility to 2% of initial mobility value, was observed from the typical $I_{D-VD}$ characteristics of the field-effect transistor (FET). The initial field effect mobility ${\mu}$ was measured to be $2.0{\times}10^{-1}\;cm^2/Vs$. The characterization was maintained for long times in air. No substantial degeneration occurred. The performance and the stability are probably due to the encapsulation effect.

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Oxide Semiconductor Thin Film Transistor based Solution Charged Cellulose Paper Gate Dielectric using Microwave Irradiation

  • 이기용;조광원;조원주
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.207.2-207.2
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    • 2015
  • 차세대 디스플레이 소자로서 TAOS TFT (transparent amorphous oxide semiconductor Thin Film Transistor)가 주목 받고 있다. 또한, 최근에는 값 비싼 전자 제품을 저렴하고 간단히 처분 할 수 있는 시스템으로 대신 하는 연구가 진행되고 있다. 그중, cellulose-fiber에 전기적 시스템을 포함시키는 e-paper에 대한 관심이 활발하다. cellulose fiber는 가볍고 깨지지 않으며 휘는 성질을 가지고 있다. 가격도 저렴하고 가공이여 용이하여 차세대 기판의 재료로서 주목받고 있다. 하지만, cellulose-fiber 위에는 고온의 열처리공정과 고품질 박막 성장이 어려워서 TFT 제작에 어려움을 겪고 있다. 이러한 문제를 해결하기 위해서 산화물 반도체를 이용하여 TFT를 제작한 사례가 보고되고 있다. 또한, 채널 물질 뿐만 아니라 cellulose fiber에도 다른 물질을 첨가하거나 증착하여 전기적 화학적 특성을 개선시킨 사례도 많이 보고되고 있다. 본 연구에서는 가장 저품질의 용지로 알려진 신문지와 A4용지를 gate dielectric을 이용하여서 a-IGZO TFT를 제작하였다. 하지만, cellulose fiber로 만들어진 TFT의 경우에는 고온의 열처리가 불가능 하다. 따라서 저온에서 높을 효율은 보이는 microwave energy를 이용하여 열처리를 진행하였다. 추가적으로 저품질의 종이의 특성을 개선시키기 위해서 high-k metal-oxide solution precursor를 첨가 하여 TFT의 특성을 개선시켰다. 결과적으로 cellulose fiber에 metal-oxide solution precursor을 첨가하는 공정과 micro wave를 조사하는 방법을 사용하여 100도 이하에서 cellulose fiber를 저렴하고 우수한 성능의 TFT를 제작에 성공하였다.

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금속 유도 일측면 선결정화에 의해 제작된 다채널 다결정 실리콘 박막 트랜지스터 소자 및 회로의 전기적 특성 평가 (Dynamic Characteristics of Multi-Channel Metal-Induced Unilaterally Precrystallized Polycrystalline Silicon Thin-Film Transistor Devices and Circuits)

  • 황욱중;강일석;임성규;김병일;양준모;안치원;홍순구
    • 한국재료학회지
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    • 제18권9호
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    • pp.507-510
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    • 2008
  • Electrical properties of multi-channel metal-induced unilaterally precrystallized polycrystalline silicon thin-film transistor (MIUP poly-Si TFT) devices and circuits were investigated. Although their structure was integrated into small area, reducing annealing process time for fuller crystallization than that of conventional crystal filtered MIUP poly-Si TFTs, the multi-channel MIUP poly-Si TFTs showed the effect of crystal filtering. The multi-channel MIUP poly-Si TFTs showed a higher carrier mobility of more than 1.5 times that of the conventional MIUP poly-Si TFTs. Moreover, PMOS inverters consisting of the multi-channel MIUP poly-Si TFTs showed high dynamic performance compared with inverters consisting of the conventional MIUP poly-Si TFTs.