• Title/Summary/Keyword: ThermophoresisElectrophoresis

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Numerical Simulation of Deposition Chamber for Aerosol Nanoparticles Upward 300 mm Wafer (300 mm 웨이퍼 위의 에어로졸 나노 입자의 증착 장비 개발을 위한 수치 해석적 연구)

  • Ahn, Kang-Ho;Ahn, Jin-Hong;Lee, Kwan-Soo;Lim, Kwang-Ok;Kang, Yoon-Ho
    • Journal of the Semiconductor & Display Technology
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    • v.4 no.1 s.10
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    • pp.49-53
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    • 2005
  • The nanoparticle deposition chamber, which is used for quantum dot semiconductor memory applications, is designed by means of numerical simulation. In this research, the numerical simulations for deposition chamber were performed by commercial software, FLUENT. The deposition of nanoparticles is calculated by diffusion force, thermophoresis and electrophoresis of particles. As a results, when the diffusion force was considered, the most of particles deposited in the wall of deposition chamber. But as considering thermophoresis and electrophoresis of particles, the particles were deposited wafer surface, perfectly.

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Analysis on Particle Deposition onto a Heated Rotating Disk with Electrostatic Effect (정전효과가 있는 가열 회전원판으로의 입자침착 해석)

  • 유경훈
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.14 no.5
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    • pp.424-432
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    • 2002
  • Numerical analysis has been conducted to characterize deposition rates of aerosol particles onto a heated, rotating disk with electrostatic effect under the laminar flow field. The particle transport mechanisms considered were convection, Brownian diffusion, gravitational settling, thermophoresis and electrophoresis. The aerosol particles were assumed to have a Boltzmann charge distribution. The electric potential distribution needed to calculate local electric fields around the disk was calculated from the Laplace equation. The Coulomb, the image, the dielectrophoretic and the dipole-dipole forces acting on a charged particle near the conducting rotating disk were included in the analysis. The averaged particle deposition vetocities and their radial distributions on the upper surface of the disk were calculated from the particle concentration equation in a Eulerian frame of reference, along with a rotation speed of 0∼1,000rpm, a temperature difference of 0∼5K and a charged disk voltage of 0∼1000V.Finally, an approximate deposition velocity model for the rotating disk was suggested. The present numerical results showed relatively good agreement with the results of the present approximate model and the available experimental data.