• Elastomers and Composites
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• v.43 no.4
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• pp.271-280
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• 2008

Aromatic polyhydroxyamides (PHAs) having bulky groups and ether linkages in the polymer main chain were synthesized by the low temperature solution polycondensation reaction. FT-IR, $^{1}H-NMR$, DSC, and TGA were used to study the properties of these polymers. The PHAs were converted into polybenzoxazoles (PBOs) by a thermal cyclization reaction, and endothermic peaks were observed in the range of $220{\sim}400^{\circ}C$. The introduction of the ether and bulky groups in the main chain improved the solubility of the PHAs in aprotic solvents such as DMSO and DMF, but the PBOs were nearly insoluble in common solvents. All the PBOs, except for PBO 5 with 2,6-dimethylphenoxy pendant and 2,3-dihydroxyquinoxaline ring, and PBO 6 with 2,6-dimethylphenoxy pendant and 2,3-dihydroxyquinoxaline ring, exhibited $T_g's$ in the range from 149 to $217^{\circ}C$ by DSC. The thermogravimetric analyses indicated that most of the PBOs were thermally stable up to $400^{\circ}C$ in nitrogen. Maximum weight loss temperatures of PHA 5 and PBO 5 with 2,6-dimethylphenoxy pendant and 2,3-dihydroxyquinoxaline ring were $707^{\circ}C$ and $683^{\circ}C$, respectively, which were the hightest temperatures among the corresponding copolymers. The PBOs in nitrogen exhibited relatively high char yields in the range of $63{\sim}70%$ at $900^{\circ}C$.

• Polymer(Korea)
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• v.29 no.2
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• pp.183-189
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• 2005

Films of poly(vinyl alcohol)(PVA)/chitosan blends and its blend hydrogels were prepared by the solution casting method. The state of miscibility of the blends and blend hydrogels were examined over the entire composition range by differential scanning carorimetry (DSC), thermogravimetry (TGA), and dynamic mechanical analysis (DMA). DSC analysis shows the depression of melting point of PVA in the blends and the decrease of crystallization temperature of PVA in the blends were observed with increasing chitosan content in the blends. TGA analysis indicates that chitosan was thermally more stable than PVA and the thermal stability of PVA in the blends was higher than that of pure PVA, due to some interactions between two component polymers in the blend. The glass transition temperature $(T_g)$ of the chitosan and of PVA, measured by DMA, were at 160 and $90^{\circ}C$, respectively. The $T_g$ of the blends was changed with the content of chitosan in the blends. The results of thermal and viscoelastic analysis indicate some miscibility between component polymers in the blend exists. Moisture and cross linking in the blend and blend hydrogel, which strongly change thermal and physical properties of hydrophilic polymers, affected the miscibility of chitosan and PVA to a small extent.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.9 no.1
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• pp.16-22
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• 2008

We fabricated thermally-evaporated 10 nm-Ni/30 nm and 70 nm Poly-Si/200 nm-$SiO_2/Si$ structures to investigate the thermal stability of nickel silicides formed by rapid thermal annealing(RTA) of the temperature of $300{\sim}1100^{\circ}C$ for 40 seconds. We employed for a four-point tester, field emission scanning electron microscope(FE-SEM), transmission electron microscope(TEM), high resolution X-ray diffraction(HRIXRD), and scanning probe microscope(SPM) in order to examine the sheet resistance, in-plane microstructure, cross-sectional microstructure evolution, phase transformation, and surface roughness, respectively. The silicide on 30 nm polysilicon substrate was stable at temperature up to $900^{\circ}C$, while the one on 70 nm substrate showed the conventional $NiSi_2$ transformation temperature of $700^{\circ}C$. The HRXRD result also supported the existence of NiSi-phase up to $900^{\circ}C$ for the Ni silicide on the 30 nm polysilicon substrate. FE-SEM and TEM confirmed that 40 nm thick uniform silicide layer and island-like agglomerated silicide phase of $1{\mu}m$ pitch without residual polysilicon were formed on 30 nm polysilicon substrate at $700^{\circ}C\;and\;1000^{\circ}C$, respectively. All silicides were nonuniform and formed on top of the residual polysilicon for 70 nm polysilicon substrates. Through SPM analysis, we confirmed the surface roughness was below 17 nm, which implied the advantage on FUSI gate of CMOS process. Our results imply that we may tune the thermal stability of nickel monosilicide by reducing the height of polysilicon gate.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.3 no.3
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• pp.249-256
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• 2005

Thermal decomposition and stabilization characteristics of the solid cake after the dissolution of nitrate of the lagoon sludge was investigated. Most of the nitrates were dissolved in the water and removed to the filtrate, but small amount of nitrates, calcium carbonate and uranium were remained in the solid cake. The solid cake was thermally decomposed in the muffle furnace at $900^{\circ}C$ for 5 hours. Uranium, which is in the lagoon 1, was stabilized with $NaNO_3$ decomposition to $Na_{2}O{\cdot}2UO_3$ form. For the lagoon 2, it is confirmed that CaO, which was created by thermal decomposition of the $Ca(NO_3)_2$ and $CaCO_3$, was transferred to $Ca(OH)_2$ in the air with water. Because it is known that $Ca(OH)_2$ is stable material, further additives did not need to the stabilization of the thermal decomposition of the lagoons.

• Transactions on Electrical and Electronic Materials
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• v.1 no.1
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• pp.26-31
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• 2000

The ~1540 nm $^4$ $I_{13}$ 2/ longrightarro $w^4$ $I_{15}$ 2/ emissions of E $r^{3+}$ in Er-implanted GaN annealed at temperatures in the 400 to 100$0^{\circ}C$ range were investigated to gain a better understanding of the formation and dissociation processes of the various E $r^{3+}$ sites and the recovery of damage caused by the implantation with increasing annealing temperature ( $T_{A}$).The monotonic increase in the intensity of the broad defect photoluminescence(PL) bands with incresing $T_{A}$ proves that these are stable radiative recombination centers introduced by the implantation and annealing process. Theser centers cannot be attributed to implantation-induced damage that is removed by post-implantation annealing. Selective wavelength pumpling of PL spectra at 6K reveals the existence of at least nine different E $r^{3+}$ sites in this Er-implanted semiconductor. Most pf these E $r^{3+}$ PL centers are attributed to complexed of Er atoms with defects and impurities which are thermally activated at different $T_{A}$. Only one of the nine observed E $r^{3+}$ PL centers can be pumped by direct 4f absorption and this indicates that it is highest concentration E $r^{3+}$ center and it represents most of the optically active E $r^{3+}$ in the implanted sample. The fact that this E $r^{3+}$ center cannot be strongly pumped by above-gap light or broad band below-gap absorption indicates that it is an isolated center, i.e not complexed with defects or impurities, The 4f-pumped P: spectrum appears at annealing temperatures as low as 40$0^{\circ}C$, and although its intensity increase monotonically with increasing $T_{A}$ the wavelengths and linewidths of its characteristic peaks asre unaltered. The observation of this high quality E $r_{3+}$PL spectrum at low annealing temperatures illustrates that the crystalline structure of GaN is not rendered amorphous by the ion implantation. The increase of the PL intensities of the various E $R_{3+}$sites with increasing $T_{A}$is due to the removal of competing nonradiative channels with annealing. with annealing.annealing.

• Applied Chemistry for Engineering
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• v.29 no.1
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• pp.10-17
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• 2018

POU (point of use) scrubbers were applied for the treatment of waste gases including PFCs (perfluorocompounds) exhausted from the CVD (chemical vapor deposition), etching, and cleaning processes of semiconductor and display manufacturing plant. The GWP (global warming potential) and atmosphere lifetime of PFCs are known to be a few thousands higher than that of $CO_2$, and extremely high temperature more than 3,000 K is required to thermally decompose PFCs. Therefore, POU gas scrubbers based on the thermal plasma technology were developed for the effective control of PFCs and industrial application of the technology. The thermal plasma technology encompasses the generation of powerful plasma via the optimization of the plasma torch, a highly stable power supply, and the matching technique between two components. In addition, the effective mixture of the high temperature plasma and waste gases was also necessary for the highly efficient abatement of PFCs. The purpose of this paper was to provide not only a useful technical information of the post-treatment process for the waste gas scrubbing but also a short perspective on R&D of POU plasma gas scrubbers.

• Clean Technology
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• v.11 no.3
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• pp.129-139
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• 2005

Fluoride-type cleaning agents such as TFEA (2,2,2-trifluoroethanol) and HFE (hydrofluoroether) are noticed to be next generation cleaning agents alternative to CFCs since they do not destruct ozones in the stratosphere due to no containment of chloride in the molecule, have lower global warming potential compared to HFCs and HCFCs, and are thermally stable compounds. Thus, the physical properties and cleaning agents were measured and compared with those of CFC-113, 1,1,1-TCE and HCFC-141b which are ozone destruction substances. They were also compared and evaluated with those of IPA and methanol which are currently employing as alternative cleaning agents. And TFEA-based cleaning agents consisted of TFEA and alcohols or HFEs were formulated, their physical properties and cleaning abilities were measured and their utilization as alternative cleaning agents was evaluated. As a result, TFEA and HFEs have lower cleaning ability for their removal of various soils compared to chloride-type cleaning agents, but theyshow excellent cleaning ability for Fluoride-type soils. And it is observed that the formulated cleaning agents of TFEA and alcohols or HFEs caused to increase cleaning ability of flux and unsoluble cutting oil more than 100% compared to their individual component. Therefore, the fluoride-type cleaning agents are expected to be utilized for development of environmental-friendly non aqueous cleaning agents with excellent cleaning ability if they are formulated with proper solvents or additives.

• Composites Research
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• v.16 no.2
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• pp.54-61
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• 2003

In this study, manufacturing process for microcapsules with the self-healing agent was introduced and the characteristics of microcapsules manufactured by varying with various manufacturing process variables were evaluated through a particle size analyzer, an optical microscope, and a TGA. Urea-formaldehyde resin was used for the thin wall of microcapsules and DCPD (dicyclopentadiene) was used for the self-healing agent. The various manufacturing process variables, such as (1) 24hr, 40hr, 48hr, 60hr of the solution time of the EMA copolymer, (2) pH3.5, pH4.0, pH4.5 of the hydrogen ion concentration of the emulsified solution, (3) 400rpm, 500rpm, 600rpm, 1000rpm of the agitation speed of the emulsified solution, (4) $50^{\circ}$, $55^{\circ}$, $60^{\circ}$ of the reaction temperature of the emulsified solution, were considered. According to the results, the particle size distribution of microcapsules was affected on the agitation speed, and the thermal stability of microcapsules was influenced by the solution time of the EMA copolymer, the hydrogen ion concentration, and the reaction temperature of the emulsified solution. Therefore, suitable manufacturing process variables should be applied to obtain thermally stable microcapsules capable of containing the healing agent capable until the thin wall of microcapsules were to be burned.

• Resources Recycling
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• v.18 no.4
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• pp.24-30
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• 2009

Rare earth based calcium aluminate phosphor ($CaAl_2O_4:Eu^{2+}$, $Nd^{3+}$) supported $TiO_2$ nanoparticles are synthesized by using sol-gel method, which are further characterized using powder X-ray diffraction (XRD), fourier transform infrared (FT-IR), diffuse reflectance UV-Visible spectroscopy (DRS UV-Vis) and transmission electron microscopy (TEM). The XRD pattern of as-prepared and sintered phosphor supported $TiO_2$ does not show the tendency to change the crystal structure from anatase to rutile phase up to $600^{\circ}C$. This indicates that the phosphor support might inhibit the densification and crystallite growth by providing dissimilar boundaries. The diffuse reflectance spectral (DRS) measurements showed shift towards longer wavelength indicating reduction in the band-gap energy as compared to free $TiO_2$. The FT-IR spectra of phosphor supported $TiO_2$ nanoparticles show shift in the peak positions to lower wavelengths. This indicates that the $TiO_2$ nanoparticles are not free, but covalently bonded to the phosphor support. TEM micrographs show presence of crystalline and spherical $TiO_2$ nanoparticles (8 - 15 nm diameter) dispersed uniformly on the surface of phosphor.

• Applied Chemistry for Engineering
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• v.20 no.2
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• pp.195-200
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• 2009

To develop a crosslinker for the polyester powder coatings, $N^1,N^1,N^4,N^4$-tetrakis(hydroxyethyl)cyclohexane-1,4-dicarboxamide (Cy-${\beta}-HAA$), incorporated with a cyclohexane ring within the main chain of commercial ${\beta}-hydroxyalkylamide$ (${\beta}-HAA$), was prepared from the amidation of dimethyl trans-1,4-cyclohexanedicarboxylate and diethanolamine in the presence of $NaOCH_3$, The structure of $Cy-{\beta}-HAA$ was confirmed by its NMR, FT-IR and ESI-MS spectra. $Cy-{\beta}-HAA$ was thermally more stable than ${\beta}-HAA$. When $Cy-{\beta}-HAA$ was used as a crosslinker for the polyester powder coatings, it provided the smooth coating surface and reduced the formation of pinholes in the coating surface with comparison with ${\beta}-HAA$.