• 제목/요약/키워드: The simultaneous cyclic on/off modulation of $CH_4$ and $O_2$ flow

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$CH_4/O_2$의 사이클릭 유량제어에 의한 다이아몬드 박막의 특성향상 (Cyclic on/off Modulation of $CH_4\;and/or\;O_2$ Flows for the Enhancement of the Diamond Film Characteristics)

  • 김태규;김성훈;윤수종
    • 한국표면공학회지
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    • 제39권2호
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    • pp.82-86
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    • 2006
  • Diamond films were deposited on 10.0$\times$10.0$mm^2$ pretreated (100) Si substrate using $CH_4$, $H_2$ and $O_2$ source gases in a horizontal-type microwave plasma enhanced chemical vapor deposition system. We introduced a cyclic on/off modulation of $CH_4$ and/or $O_2$ flows is a function of the reaction time during the initial deposition stage. Surface morphology and diamond quality of the films were investigated as a function of the different cyclic modulation process of the source gases flows: For the enhancement of the nucleation density, there is an optimal process for the incorporation of oxygen. Diamond qualities of the films were improved by introducing oxygen gas during the initial deposition stage.