• Journal of the Korea Academia-Industrial cooperation Society
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• v.9 no.1
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• pp.23-28
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• 2008

Due to the modem MEMS technologies, the electron lenses that are used in the microcolumn can have much smaller optical aberrations compared with conventional electron lenses for the bulky electron columns. Since the electron lens system have great effect on the performance of the microcolumn, it is important to study the dependence of image quality on the configuration of the electronic imaging system, among which the source-lens part is most sensitive. In this work, we investigated the electron beam characteristics according to the shapes of extractor and limiting aperture that are elements of the source-lens part. By analyzing the data obtained, we proposed the optimum configuration of the electron lens system.